Center for Quantum Devices - Most Downloaded Journal Articles

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21.	High speed type-II superlattice based photodetectors transferred on sapphire Arash Dehzangi, Ryan McClintock, Donghai Wu, Jiakai Li, Stephen Johnson, Emily Dial and Manijeh Razeghi Applied Physics Express, Volume 12, Number 11-- October 3, 2019 ...[Visit Journal] We report the substrate transfer of InAs/GaSb/AlSb based type-II superlattice (T2SL) e-SWIR photodetector from native GaSb substrates to low loss sapphire substrate in order to enhance the frequency response of the device. We have demonstrated the damage-free transfer of T2SL-based thin-films to sapphire substrate using top–down processing and a chemical epilayer release technique. After transfer the −3 dB cut-off frequency increased from 6.4 GHz to 17.2 GHz, for 8 μm diameter circular mesas under -15 V applied bias. We also investigated the cut-off frequency verses applied bias and lateral scaling to assess the limitations for even higher frequency performance. Direct Link [reprint (PDF)]
21.	High performance Type-II InAs/GaSb superlattices for mid, long, and very long wavelength infrared focal plane arrays M. Razeghi, Y. Wei, A. Gin, A. Hood, V. Yazdanpanah, M.Z. Tidrow, and V. Nathan SPIE Conference, Orlando, FL, Vol. 5783, pp. 86-- March 28, 2005 ...[Visit Journal] We present our most recent results and review our progress over the past few years regarding InAs/GaSb Type-II superlattices for photovoltaic detectors and focal plane arrays. Empirical tight binding methods have been proven to be very effective and accurate in designing superlattices for various cutoff wavelengths from 3.7 µm up to 32 µm. Excellent agreement between theoretical calculations and experimental results has been obtained. High quality material growths were performed using an Intevac modular Gen II molecular beam epitaxy system. The material quality was characterized using x-ray, atomic force microscopy, transmission electron microscope and photoluminescence, etc. Detector performance confirmed high material electrical quality. Details of the demonstration of 256×256 long wavelength infrared focal plane arrays are presented. [reprint (PDF)]
21.	MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates M. Razeghi, M. Defour , F. Omnes, P. Maurel , E. Bigan , O. Acher, J. Nagle, F. Brillouet , J.C. Portal M. Razeghi, M. Defour, F. Omnes, P. Maurel, E. Bigan, O. Acher, J. Nagle, F. Brillouet, J.C. Portal, MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates, Journal of Crystal Growth, Volume 93, Issues 1–4, 1988, Pages 776-781,-- January 1, 1988 ...[Visit Journal] High quality II[-V semiconductor heterojunctions, quantum wells and superlauices have been grown on lattice matched and alternative substrates such as silicon for photonic and electronic devices, using low pressure metalorganic chemical vapor deposition growth technique. [reprint (PDF)]
21.	Novel Method for Reclaim/Reuse of Bulk GaN Substrates using Sacrifical ZnO Release Layers A. Rajan, S. Sundaram, Y. El Gmili, P. L. Voss, K. Pantzas, T. Moudakir, A. Ougazzaden, D. J. Rogers, F. Hosseini Teherani, V. E. Sandana, P. Bove, K. Prior, R. McClintock & M. Razeghi Proc. SPIE 8987, Oxide-based Materials and Devices V, 898719-- April 2, 2014 ...[Visit Journal] Free-standing (0002)-oriented GaN substrates (f = 2”) were coated with 200 nm of ZnO and used as templates for the growth of GaN thin films. SEM and AFM revealed that such GaN layers had a relatively homogenous surface morphology with an RMS roughness (5 μm x 5 μm) of less than 4nm. XRD studies revealed strained ZnO growth on the GaN substrate and the reproduction of the substrate rocking curve for the GaN overlayers after only a hundred nm of growth, thus indicating that the GaN films had superior crystallographic quality compared to those grown on sapphire or ZnO/sapphire substrates. Quarter-wafer areas of GaN were removed from the GaN substrate (by selective chemical etching away of the ZnO interlayer). The expensive GaN substrates were then reclaimed/reused (without the need for polishing) for a second cycle of ZnO and GaN growth, which gave similar XRD, SEM, CL and AFM results to the first cycle. [reprint (PDF)]
21.	Pulsed metalorganic chemical vapor deposition of high quality AlN/GaN superlattices for intersubband transitions C. Bayram, B. Fain, N. Pere-Laperne, R. McClintock and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-12-- January 26, 2009 ...[Visit Journal] A pulsed metalorganic chemical vapor deposition (MOCVD) technique, specifically designed for high quality AlN/GaN superlattices (SLs) is introduced. Optical quality and precise controllability over layer thicknesses are investigated. Indium is shown to improve interface and surface quality. An AlN/GaN SL designed for intersubband transition at a telecommunication wavelength of ~1.5 µm, is grown, and processed for intersubband (ISB) absorption measurements. Room temperature measurements show intersubband absorption centered at 1.49 µm. Minimal (n-type) silicon doping of the well is shown to be crucial for good ISB absorption characteristics. The potential to extend this technology into the far infrared and even the terahertz (THz) region is also discussed. [reprint (PDF)]
21.	III-Nitride Avalanche Photodiodes P. Kung, R. McClintock, J. Pau Vizcaino, K. Minder, C. Bayram and M. Razeghi SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices IV, Vol. 6479, p. 64791J-1-12-- January 29, 2007 ...[Visit Journal] Wide bandgap III-Nitride semiconductors are a promising material system for the development of ultraviolet avalanche photodiodes (APDs) that could be a viable alternative to photomultiplier tubes. In this paper, we report the epitaxial growth and physical properties of device quality GaN layers on high quality AlN templates for the first backilluminated GaN p-i-n APD structures on transparent sapphire substrates. Under low bias and linear mode avalanche operation where they exhibited gains near 1500 after undergoing avalanche breakdown. The breakdown electric field in GaN was determined to be 2.73 MV/cm. The hole impact ionization coefficients were shown to be greater than those of electrons. [reprint (PDF)]
21.	High performance GaAs/GaInP heterostructure bipolar transistors grown by low-pressure metal-organic chemical vapour deposition M Razeghi, F Omnes, M Defour, P Maurel, J Hu, E Wolk and D Pavlidis M Razeghi et al 1990 Semicond. Sci. Technol. 5 278-- December 11, 1989 ...[Visit Journal] The authors report the fabrication of high-quality GaAs/GaInP n-p-n heterojunction bipolar transistors grown by low-pressure metal-organic chemical vapour deposition on semi-insulating substrates. Various structures with homogeneous and graded bases have been fabricated. Doping profiles together with X-ray double diffraction patterns demonstrate the excellent control of growth parameters such as thicknesses, doping levels and interface quality. The static characteristics of the devices show current gains as high as 400, which is the highest value reported in that system [reprint (PDF)]
21.	Recent advances in IR semiconductor laser diodes and future trends M. Razeghi; Y. Bai; N. Bandyopadhyay; B. Gokden; Q.Y. Lu; S. Slivken Photonics Society Summer Topical Meeting Series, IEEE [6000041], pp. 55-56 (2011)-- July 18, 2011 ...[Visit Journal] The wall plug efficiency of the mid-infrared quantum cascade laser in room temperature continuous wave (cw) operation is brought to 21%, with a maximum output power of 5.1 W. Using a surface grating distributed feedback (DFB) approach, we demonstrated 2.4 W single mode output in room temperature cw operation. With a photonic crystal distributed feedback (PCDFB) design, we achieved single mode spectrum and close to diffraction limited far field with a room temperature high peak power of 34 W. [reprint (PDF)]
21.	Type-II superlattice dual-band LWIR imager with M-barrier and Fabry-Perot resonance E.K. Huang, A. Haddadi, G. Chen, B.M. Nguyen, M.A. Hoang, R. McClintock, M. Stegall, and M. Razeghi OSA Optics Letters, Vol. 36, No. 13, p. 2560-2562-- July 1, 2011 ...[Visit Journal] We report a high performance long-wavelength IR dual-band imager based on type-II superlattices with 100% cutoff wavelengths at 9.5 μm (blue channel) and 13 μm (red channel). Test pixels reveal background-limited behavior with specific detectivities as high as ∼5×10¹¹ Jones at 7.9 μm in the blue channel and ∼1×10¹¹ Jones at 10.2 μm in the red channel at 77 K. These performances were attributed to low dark currents thanks to the M-barrier and Fabry–Perot enhanced quantum efficiencies despite using thin 2 μm absorbing regions. In the imager, the high signal-to-noise ratio contributed to median noise equivalent temperature differences of ∼20 mK for both channels with integration times on the order of 0.5 ms, making it suitable for high speed applications. [reprint (PDF)]
21.	Graphene versus oxides for transparent electrode applications Sandana, V. E.; Rogers, D. J.; Teherani, F. Hosseini; Bove, P.; Razeghi, M. Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862603 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] Due to their combination of good electrical conductivity and optical transparency, Transparent Conducting Oxides (TCOs) are the most common choice as transparent electrodes for optoelectronics applications. In particular, devices, such as LEDs, LCDs, touch screens and solar cells typically employ indium tin oxide. However, indium has some significant drawbacks, including toxicity issues (which are hampering manufacturing), an increasing rarefication (due to a combination of relative scarcity and increasing demand [1]) and resulting price increases. Moreover, there is no satisfactory option at the moment for use as a p-type transparent contact. Thus alternative materials solutions are actively being sought. This review will compare the performance and perspectives of graphene with respect to TCOs for use in transparent conductor applications. [reprint (PDF)]
21.	High quantum efficiency back-illuminated GaN avalanche photodiodes C. Bayram, J.L. Pau, R. McClintock, M. Razeghi, M.P. Ulmer, and D. Silversmith Applied Physics Letters, Vol. 93, No. 21, p. 211107-1-- November 24, 2008 ...[Visit Journal] Back-illuminated avalanche photodiodes (APDs) composed of heterojunctions of either p-GaN/i-GaN/n-AlGaN or p-GaN/i-GaN/n-GaN/n-AlGaN were fabricated on AlN templates. At low voltage, an external quantum efficiency of 57% at 352 nm with a bandpass response was achieved by using AlGaN in the n-layer. Dependency of gain and leakage current on mesa area for these heterojunction APDs were studied. Back-illumination via different wavelength sources was used to demonstrate the advantages of hole-initiated multiplication in GaN APDs. [reprint (PDF)]
21.	High Power Mid-Infrared Quantum Cascade Lasers Grown on GaAs Steven Slivken and Manijeh Razeghi Photonics 2022, 9(4), 231 (COVER ARTICLE) ...[Visit Journal] The motivation behind this work is to show that InP-based intersubband lasers with high power can be realized on substrates with significant lattice mismatch. This is a primary concern for the integration of mid-infrared active optoelectronic devices on low-cost photonic platforms, such as Si. As evidence, an InP-based mid-infrared quantum cascade laser structure was grown on a GaAs substrate, which has a large (4%) lattice mismatch with respect to InP. Prior to laser core growth, a metamorphic buffer layer of InP was grown directly on a GaAs substrate to adjust the lattice constant. Wafer characterization data are given to establish general material characteristics. A simple fabrication procedure leads to lasers with high peak power (>14 W) at room temperature. These results are extremely promising for direct quantum cascade laser growth on Si substrates. [reprint (PDF)]
21.	Performance analysis of infrared heterojunction phototransistors based on Type-II superlattices Jiakai Li, Arash Dehzangi, Manijeh Razeghi Infrared Physics & Technology Volume 113, March 2021, 103641 ...[Visit Journal] In this study, a comprehensive analysis of the n-p-n infrared heterojunction phototransistors (HPTs)based on Type-II superlattices has been demonstrated. Different kinds of Type-II superlattices were carefully chosen for the emitter, base, and collector to improve the optical performance. The effects of different device parameters include emitter doping concentration, base doping concentration, base thickness and energy bandgap difference between emitter and base on the optical gain of the HPTs have been investigated. By scaling the base thickness to 20 nm, the HPT exhibits an optical gain of 345.3 at 1.6 μm at room temperature. For a 10 μm diameter HPT device, a −3 dB cut-off frequency of 5.1 GHz was achieved under 20 V at 150 K. [reprint (PDF)]
21.	Continuous wave, room temperature operation of λ ~ 3μm quantum cascade laser N. Bandyopadhyay, Y. Bai, S. Tsao, S. Nida, S. Slivken and M. Razeghi SPIE Proceedings, Vol. 8631, p. 86310M-1, Photonics West, San Francisco, CA-- February 3, 2013 ...[Visit Journal] Quantum Cascade Lasers (QCLs), operating in continuous wave (CW) at room temperature(RT) in 3-3.5 μm spectral range, which overlaps the spectral fingerprint region of many hydrocarbons, is essential in spectroscopic trace gas detection, environment monitoring, and pollution control. A 3 μm QCL, operating in CW at RT is demonstrated. This initial result makes it possible, for the most popular material system (AlInAs/GaInAs on InP) used in QCLs in mid-infrared and long-infrared, to cover the entire spectral range of mid-infrared atmospheric window (3-5 μm). In_0.79Ga_0.21As/In_0.11Al_0.89As strain balanced superlattice, which has a large conduction band offset, was grown. The strain was balanced with composite barriers (In_0.11Al_0.89As /In_0.4Al_0.6As) in the injector region, to eliminate the need of extremely high compressively strained GaInAs, whose pseudomorphic growth is very difficult. [reprint (PDF)]
21.	Electron capture processes in optically excited In0.53Ga 0.47As/InP quantum wells U. Cebulla, G. Bacher, A. Forchel, D. Schmitz, H. Jürgensen, M. Razeghi Appl. Phys. Lett. 55, 933–935 (1989)-- September 4, 1989* ...[Visit Journal] We have performed picosecond time-resolved measurements on Ir:.O. 53 GaO. 47 As/lnP quantum wells with varying barrier thicknesses using 10 ps Nd:Y AG excitation. For this excitation, holes and electrons are created in the Ino . 53 GaOA7 As layers. Due to momentum conservation the Nd:YAG excitation accelerates the electrons above the InP barrier where they can diffuse but cannot recombine. By examining the rise time of the quantum well emission, we can show that for samples with thick barriers, the harrier geometry largely controls the dynamic properties of the carriers after Nd:YAG excitation. [reprint (PDF)]
21.	Investigations of p-type signal for ZnO thin films grown on (100) GaAs substrates by pulsed laser deposition D.J. Rogers, F. Hosseini Teherani, T. Monteiro, M. Soares, A. Neves, M. Carmo, S. Periera, M.R. Correia, A. Lusson, E. Alves, N.P. Barradas, J.K. Morrod, K.A. Prior, P. Kung, A. Yasan, and M. Razeghi Phys. Stat. Sol. C, 3 (4)-- March 1, 2006 ...[Visit Journal] n this work we investigated ZnO films grown on semi-insulating (100) GaAs substrates by pulsed laser deposition. Samples were studied using techniques including X-ray diffraction (XRD), scanning electron microscopy, atomic force microscopy, Raman spectroscopy, temperature dependent photoluminescence, C-V profiling and temperature dependent Hall measurements. [reprint (PDF)]
21.	280 nm UV LEDs Grown on HVPE GaN Substrates A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, M. Razeghi, and R.J. Molnar Opto-Electronics Review, 10 (4)-- January 1, 2002 ...[Visit Journal] We report on the enhancement of optical and electrical properties of 280 nm UV LEDs using low dislocation density HVPE-grown GaN substrate. Compared with the same structure grown on sapphire, these LEDs show ~30% reduction in current-voltage differential resistance, ~15% reduction in turn-on voltage, more than 200% increase in output power slope efficiency and saturation at higher currents. Lower density of defects due to higher material quality and better heat dissipation are believed to be the reason behind these improvements. [reprint (PDF)]
21.	1.2–1.6 μm GaxIn1−xAsyP1−y-InP DH lasers grown by LPMOCVD M. Razeghi, B. de Crémoux, J.P. Duchemin M. Razeghi, B. de Crémoux, J.P. Duchemin, 1.2–1.6 μm GaxIn1−xAsyP1−y-InP DH lasers grown by LPMOCVD, Journal of Crystal Growth, Volume 68, Issue 1, 1984, Pages 389-397,-- September 1, 1984 ...[Visit Journal] Room temperature pulse operation and continuous wave (CW) operation in the 1.2–1.6 μm region have been achieved in GaInAsP-InP DH lasers fabricated on material grown by LPMOCVD. Threshold currents density as low as 430 A/cm2 (cavity length of 950 μm) have been measured for devices emitting at 1.3 μm. Threshold current densities of 1060 A/cm2 (cavity length of 400 μm) have been obtained for devices emitting at 1.55 μm, with active layer thicknesses of 0.22 μm. Values of T0 between 60 and 70 K have been obtained. Fundamental transverse mode oscillation has been achieved (for CW operation) up to an output power of 10 mW. The preliminary results on the aging test are most encouraging and demonstrate that the LPMOCVD lasers emitting at 1.2–1.6 μm have comparable degradation rates to those of LPE lasers suggesting the LPMOCVD technique is promising for large scale production of laser diodes. [reprint (PDF)]
21.	High operating temperature MWIR photon detectors based on Type-II InAs/GaSb superlattice M. Razeghi, B.M. Nguyen, P.Y. Delaunay, S. Abdollahi Pour, E.K.W. Huang, P. Manukar, S. Bogdanov, and G. Chen SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 76081Q-1-- January 22, 2010 ...[Visit Journal] Recent efforts have been paid to elevate the operating temperature of Type-II InAs/GaSb superlattice Mid Infrared photon detectors. Optimized growth parameters and interface engineering technique enable high quality material with a quantum efficiency above 50%. Intensive study on device architecture and doping profile has resulted in almost one order of magnitude of improvement to the electrical performance and lifted up the 300 K-background BLIP operation temperature to 166 K. At 77 K, the ~4.2 µm cut-off devices exhibit a differential resistance area product in excess of the measurement system limit (10⁶ Ω·cm²) and a detectivity of 3x10¹³ cm·Hz^½·W⁻¹. High quality focal plane arrays were demonstrated with a noise equivalent temperature of 10 mK at 77 K. Uncooled camera is capable to capture hot objects such as soldering iron. [reprint (PDF)]
21.	Terahertz emitters at Center for Quantum Devices: recent advances and future trends Manijeh Razeghi Proc. SPIE 10177, Infrared Technology and Applications XLIII, 1017705-- August 23, 2018 ...[Visit Journal] This paper reviews the recent advances and future trends of terahertz (THz) emitters at CQD/NU, highlights the high-performance THz sources based on intracavity nonlinear frequency generation in mid-infrared quantum cascade lasers. Significant performance improvements of our THz sources in the power, wall plug efficiency are achieved by systematic optimizing the device's active region, waveguide, and chip bonding strategy. High THz power up to 1.9 mW and 0.014 mW for pulsed mode and continuous wave operations at room temperature are demonstrated, respectively. Even higher power and efficiency are envisioned based on enhancements in outcoupling efficiency and mid-IR performance. Our compact THz device with high power and wide tuning range is highly suitable for the imaging, sensing, spectroscopy, medical diagnosis, and many other applications. [reprint (PDF)]
21.	Impact of scaling base thickness on the performance of heterojunction phototransistors Arash Dehzangi, Abbas Haddadi, Sourav Adhikary, and Manijeh Razeghi Nanotechnology 28, 10LT01-- February 2, 2017 ...[Visit Journal] In this letter we report the effect of vertical scaling on the optical and electrical performance of mid-wavelength infrared heterojunction phototransistors based on type-II InAs/GaSb/AlSb superlattices. The performance of devices with different base thickness was compared as the base was scaled from 60 down to 40 nm. The overall optical performance shows enhancement in responsively, optical gain, and specific detectivity upon scaling the base width. The saturated responsivity for devices with 40 nm bases reaches 8,845 and 9,528 A/W at 77 and 150 K, respectively, which is almost five times greater than devices with 60 nm bases. The saturated optical gain for devices with 40 nm bases is measured as 2,760 at 77 K and 3,081 at 150 K. The devices with 40 nm bases also exhibit remarkable enhancement in saturated current gain, with 17,690 at 77 K, and 19,050 at 150 K. [reprint (PDF)]
20.	High Performance Quantum Cascade Lasers Grown by Gas-Source Molecular Beam Epitaxy M. Razeghi, S. Slivken, A. Tahraoui and A. Matlis SPIE Conference, San Jose, CA, -- January 22, 2001 ...[Visit Journal] Recent improvements in quantum cascade laser technology have led to a number of very impressive results. This paper is a brief summary of the technological development and state-of- the-art performance of quantum cascade lasers produced at the Center for Quantum Devices. Laser design will be discussed, as well as experimental details of device fabrication. Room temperature QCL operation has been reported for lasers emitting between 5 - 11 μm, with 9 - 11 μm lasers operating up to 425 K. We also demonstrate record room temperature peak output powers at 9 and 11 μm(2.5 W and 1 W respectively) as well as record low 80 K threshold current densities (250 A/cm²) for some laser designs. Finally, some of the current limitations to laser efficiency are mentioned, as well as a means to combat them. [reprint (PDF)]
20.	Lateral epitaxial overgrowth of GaN films on sapphire and silicon substrates P. Kung, D. Walker, M. Hamilton, J. Diaz, and M. Razeghi Applied Physics Letters 74 (4)-- January 25, 1999 ...[Visit Journal] We report the lateral epitaxial overgrowth of GaN films on (00.1) Al₂O₃ and (111) Si substrates by metalorganic chemical vapor deposition. The lateral epitaxial overgrowth on Si substrates was possible after achieving quasi-monocrystalline GaN template films on (111) Si substrates. X-ray diffraction, photoluminescence, scanning electron microscopy, and atomic force microscopy were used to assess the quality of the lateral epitaxial overgrown films. Lateral growth rates more than five times as high as vertical growth rates were achieved for both lateral epitaxial overgrowths of GaN on sapphire and silicon substrates. [reprint (PDF)]
20.	Tl incorporation in InSb and lattice contraction of In_1-xTl_xSb J.J. Lee and M. Razeghi Applied Physics Letters 76 (3)-- January 17, 2000 ...[Visit Journal] Ternary In_1−xTl_xSb thin films are grown by low pressure metalorganic chemical vapor deposition in the high In composition region. Infrared photoresponse spectra of the In_1−xTl_xSb epilayers show a clear shift toward a longer wavelength compared to that of InSb. Tl incorporation is confirmed by Auger electron spectroscopy. In contrast to the theoretical expectation, high resolution x-ray diffraction study reveals that the lattice of the In_1−xTl_xSb epilayers is contracted by the incorporation of Tl. As more Tl is incorporated, the lattice contraction is observed to increase gradually in the experimental range. A possible origin of this phenomenon is discussed. Our experimental results suggest that the Tl incorporation behavior in In_1−xTl_xSb differs from that of other group III impurities in III antimonides. [reprint (PDF)]
20.	Sb-based infrared materials and photodetectors for the near room temperature applications J.D. Kim, E. Michel, H. Mohseni, J. Wojkowski, J.J. Lee and M. Razeghi SPIE Conference, San Jose, CA, Vol. 2999, pp. 55-- February 12, 1997 ...[Visit Journal] We report on the growth of InSb, InAsSb, and InTlSb alloys for infrared photodetector applications. The fabrication and characterization of photodetectors based on these materials are also reported. Both photoconductive and photovoltaic devices are investigated. The materials and detector structures were grown on (100) and (111)B semi-insulating GaAs and GaAs coated Si substrates by low pressure metalorganic chemical vapor deposition and solid source molecular beam epitaxy. Photoconductive detectors fabricated from InAsSb and InTlSb have been operated in the temperature range from 77 K to 300 K. The material parameters for photovoltaic device structures have been optimized through theoretical calculations based on fundamental mechanisms. InSb p-i-n photodiodes with 77 K peak responsivities approximately 103 V/W were grown on Si and (111) GaAs substrates. An InAsSb photovoltaic detector with a composition of x equals 0.85 showed photoresponse up to 13 micrometers at 300 K with a peak responsivity of 9.13 X 10-2 V/W at 8 micrometers . The RoA product of InAsSb detectors has been theoretically and experimentally analyzed. [reprint (PDF)]

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