Center for Quantum Devices - Most Downloaded Journal Articles

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21.	The quantum Hall effect in modulation doped In0.53Ga0.47As-InP heterojunctions Y. Guldner, J.P. Hirtz, J.P. Vieren, P. Voisin, M. Voos, M. Razeghi Journal de Physique Lettres, 43 (16), pp.613-616 (1982)-- November 30, 1999 ...[Visit Journal] We report the first observation of the quantum Hall effect in modulation doped In0.53Ga0.47As-InP heterojunctions at 4.2 and 1.5 K. The results are then compared to data obtained in a GaAs-AlxGa1-xAs heterojunction having similar electronic characteristics. [reprint (PDF)]
21.	Low Dark Current Deep UV AlGaN Photodetectors on AlN Substrate Lakshay Gautam, Junhee Lee, Gail Brown, Manijeh Razeghi IEEE Journal of Quantum Electronics, vol. 58, no. 3, pp. 1-5, June 2022, Art no. 4000205 ...[Visit Journal] We report high quality, low dark current, deep Ultraviolet AlGaN/AlN Photodetectors on AlN substrate. AlGaN based Photodetectors are grown and fabricated both on AlN and Sapphire substrates with the same epilayer structure. Subsequently, electrical characteristics of both photodetectors on AlN substrate and Sapphire are compared. A reduction of 4 orders of magnitude of dark current density is reported in UV detectors grown on AlN substrate with respect to Sapphire substrate. [reprint (PDF)]
21.	High Power Mid-Infrared Quantum Cascade Lasers Grown on GaAs Steven Slivken and Manijeh Razeghi Photonics 2022, 9(4), 231 (COVER ARTICLE) ...[Visit Journal] The motivation behind this work is to show that InP-based intersubband lasers with high power can be realized on substrates with significant lattice mismatch. This is a primary concern for the integration of mid-infrared active optoelectronic devices on low-cost photonic platforms, such as Si. As evidence, an InP-based mid-infrared quantum cascade laser structure was grown on a GaAs substrate, which has a large (4%) lattice mismatch with respect to InP. Prior to laser core growth, a metamorphic buffer layer of InP was grown directly on a GaAs substrate to adjust the lattice constant. Wafer characterization data are given to establish general material characteristics. A simple fabrication procedure leads to lasers with high peak power (>14 W) at room temperature. These results are extremely promising for direct quantum cascade laser growth on Si substrates. [reprint (PDF)]
21.	On the interface properties of ZnO/Si electroluminescent diodes J.L. Pau, J. Piqueras, D.J. Rogers, F. Hosseini Teherani, K. Minder, R. McClintock, and M. Razeghi Journal of Applied Physics, Vol. 107, No. 3, p. 033719-1-- February 1, 2010 ...[Visit Journal] ZnO layers grown on n⁻–Si(100), n⁺–Si(100), and n^––Si(111) substrates by pulsed-laser deposition were found to give electroluminescence. Light emission was observed in the form of discrete spots for currents over 1 mA with a white appearance to the naked eye. The intensity of these spots showed an erratic behavior over time, appearing and disappearing at random, while showing an associated random telegraph noise in the current signal. Regardless the substrate used, the electroluminescence spectra had a main broadband emission centered at about 600 nm and a relatively small peak at around 380 nm which corresponds to the energy of ZnO near band edge emission. Furthermore, the devices exhibited rectifying characteristics, whose current blocking direction depended on the substrate orientation. Optimization of ZnO conductivity and performing sample growth in N₂ ambient were found to be critical to enhance the emission intensity. Rutherford backscattering characterization revealed the existence of an intermixed region at the interface between ZnO and Si. To study the electronic properties at the interface, frequency dependent capacitance measurements were carried out. The junction capacitance became frequency dependent at the bias voltages at which light emission occurs due to the relatively slow trapping and generation processes at deep centers. These centers are believed to play an important role in the mechanism of light emission. [reprint (PDF)]
21.	Quantum-dot infrared photodetectors and focal plane arrays M. Razeghi, H. Lim, S. Tsao, M. Taguchi, W. Zhang, and A.A. Quivy SPIE Infrared Technology and Applications Conference, April 17-21, 2006, Orlando, FL Proceedings – Infrared Technology and Applications XXXII, Vol. 6206, p. 62060I-1-- April 21, 2006 ...[Visit Journal] We report our recent results about mid-wavelength infrared quantum-dot infrared photodetectors (QDIPs) grown by low-pressure metalorganic chemical vapor deposition. A very high responsivity and a very low dark current were obtained. A high peak detectivity of the order of 3×10¹² Jones was achieved at 77 K. The temperature dependent device performance was also investigated. The improved temperature insensitivity compared to QWIPs was attributed to the properties of quantum dots. The device showed a background limited performance temperature of 220 K with a 45° field of view and 300K background. [reprint (PDF)]
21.	Core-shell GaN-ZnO Moth-eye Nanostructure Arrays Grown on a-SiO₂/Si (111) as a basis for Improved InGaN-based Photovoltaics and LEDs D.J. Rogers, V.E. Sandana, S. Gautier, T. Moudakir, M. Abid, A. Ougazzaden, F. Hosseini Teherani, P. Bove, M. Molinari, M. Troyon, M. Peres, Manuel J. Soares, A.J. Neves, T. Monteiro, D. McGrouther, J.N. Chapman, H.-J. Drouhin, R. McClintock, M. Razeghi Photonics and Nanostructures - Fundamentals and Applications, Volume 15, Pages 53-58-- March 30, 2015 ...[Visit Journal] Self-forming, vertically-aligned, ZnO moth-eye-like nanoarrays were grown by catalyst-free pulsed laser deposition on a-SiO₂/Si (111) substrates. X-Ray Diffraction (XRD) and Cathodoluminescence (CL) studies indicated that nanostructures were highly c-axis oriented wurtzite ZnO with strong near band edge emission. The nanostructures were used as templates for the growth of non-polar GaN by metal organic vapor phase epitaxy. XRD, scanning electron microscopy, energy dispersive X-ray microanalysis and CL revealed ZnO encapsulated with GaN, without evidence of ZnO back-etching. XRD showed compressive epitaxial strain in the GaN, which is conducive to stabilization of the higher indium contents required for more efficient green light emitting diode (LED) and photovoltaic (PV) operation. Angular-dependent specular reflection measurements showed a relative reflectance of less than 1% over the wavelength range of 400–720 nm at all angles up to 60°. The superior black-body performance of this moth-eye-like structure would boost LED light extraction and PV anti-reflection performance compared with existing planar or nanowire LED and PV morphologies. The enhancement in core conductivity, provided by the ZnO, would also improve current distribution and increase the effective junction area compared with nanowire devices based solely on GaN. [reprint (PDF)]
21.	Type-II ‘M’ Structure Photodiodes: An Alternative Material Design for Mid-Wave to Long Wavelength Infrared Regimes B-M. Nguyen, M. Razeghi, V. Nathan, and G.J. Brown SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices IV, Vol. 6479, p. 64790S-1-10-- January 29, 2007 ...[Visit Journal] In this work, an AlSb-containing Type-II InAs/GaSb superlattice, the so-called M-structure, is presented as a candidate for mid and long wavelength infrared detection devices. The effect of inserting an AlSb barrier in the GaSb layer is discussed and predicts many promising properties relevant to practical use. A good agreement between the theoretical calculation based on Empirical Tight Binding Method framework and experimental results is observed, showing the feasibility of the structure and its properties. A band gap engineering method without material stress constraint is proposed. [reprint (PDF)]
21.	High-power, continuous-operation intersubband laser for wavelengths greater than 10 micron S. Slivken, A. Evans, W. Zhang and M. Razeghi Applied Physics Letters, Vol. 90, No. 15, p. 151115-1-- April 9, 2007 ...[Visit Journal] In this letter, high-power continuous-wave emission (>100 mW) and high temperature operation (358 K) at a wavelength of 10.6 µm is demonstrated using an individual diode laser. This wavelength is advantageous for many medium-power applications previously reserved for the carbon dioxide laser. Improved performance was accomplished using industry-standard InP-based materials and by careful attention to design, growth, and fabrication limitations specific to long-wave infrared semiconductor lasers. The main problem areas are explored with regard to laser performance, and general steps are outlined to minimize their impact. [reprint (PDF)]
21.	Reliable High-Power Uncoated Al-free InGaAsP/GaAs Lasers for Cost-Sensitive Optical Communication and Processing Applications M. Razeghi SPIE Conference, Dallas, TX, -- November 4, 1997 ...[Visit Journal] Unlike InP-based systems for long-distance communication applications, GaAs-based optoelectronic systems mostly for local-area network, optical interconnection or optical computing are very cost-sensitive because often these optoelectronic devices constitute most of the cost for these applications and fewer users share the cost. Thus besides technical issues, the processing cost should be addressed in the selection of materials and fabrication methods. We discuss a number of major advantages of Al-free InGaAsP/GaAs lasers for these applications, such as not coating- requirement, low cost, high long-term reliability, high performance. We discuss recent preliminary results of Al- free lasers as a first step toward these optoelectronic applications. [reprint (PDF)]
21.	Ga₂O₃ Metal-oxide-semiconductor Field Effect Transistors on Sapphire Substrate by MOCVD Ji-Hyeon Park, Ryan McClintock and Manijeh Razeghi Semiconductor Science and Technology, Volume 34, Number 8-- June 26, 2019 ...[Visit Journal] Si-doped gallium oxide (Ga₂O₃) thin films were grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) and fabricated into metal oxide semiconductor field effect transistors (MOSFETs). The Ga₂O₃ MOSFETs exhibited effective gate modulation of the drain current with a complete channel pinch-off for VG < −25 V, and the three-terminal off-state breakdown voltage was 390 V. The device shows a very low gate leakage current (~50 pA/mm), which led to a high on/off ratio of ~10⁸. These transistor characteristics were stable from room temperature to 250 °C [reprint (PDF)]
21.	Engineering the Fermi Level in NiO Thin Films D. Rogers, E. Sandana, M. Chamberlin, F. Teherani; V. Safarov, M. Konczykowski, R. Grasset, A. Alessi, H. Drouhin ; M. Razeghi SPIE OPTO PC13897 (2026) ...[Visit Journal] We investigate practical routes to engineer the Fermi level—and thus the effective work function—of p-type nickel oxide (NiO) thin films grown on c-sapphire by plasma-assisted pulsed laser deposition (PA-PLD) at room temperature (RT). We examine three levers: (i) oxygen-rich growth at low substrate temperature, (ii) post-deposition annealing in air or oxygen across 320–620 °C, and (iii) impurity (Li) acceptor doping. RT-grown NiO exhibits high crystalline quality with (111) out-of-plane orientation, narrow rocking-curve width, and a film thickness near 60 nm. RT epitaxy yields the lowest resistivity among the studied conditions, and resistance increases progressively with temperature for iso-chronic post-annealing in air. Oxygen ambient post-annealing shows no distinctive monotonic trend in resistivity, although the conductivity falls off for annealing over about 500°C. Optical transmission spectra suggest progressive healing of in-gap defect states with post-annealing temperature. Doping NiO with 20at% of Li lowers resistivity relative to undoped NiO by an order of magnitude. Post-annealing at 300°C under oxygen ambient significantly boosts conductivity. Over a decade of storage, all films exhibited significant loss of conductivity, underscoring the need for stabilisation strategies. The results map practical processing windows to tune the NiO Fermi level for integration in oxide heterojunctions (e.g., p-NiO/n-Ga2O3) used in ultraviolet detection and wide-bandgap electronics. [reprint (PDF)]
21.	MOCVD Growth of ZnO Nanostructures Using Au Droplets as Catalysts V.E. Sandana, D.J. Rogers, F.H. Teherani, R. McClintock, M. Razeghi, H.J. Drouhin, M.C. Clochard, V. Sallett, G. Garry and F. Fayoud SPIE Conference, January 20-25, 2008, San Jose, CA Proceedings – Zinc Oxide Materials and Devices III, Vol. 6895, p. 68950Z-1-6.-- February 1, 2008 ...[Visit Journal] ZnO nanostructures were synthesised by Metal Organic Chemical Vapor Deposition growth on Si (100) and c-Al₂O₃ substrates coated with a 5nm thick layer of Au. The Au coated substrates were annealed in air prior to deposition of ZnO so as to promote formation of Au nanodroplets. The development of the nanodroplets was studied as a function of annealing duration and temperature. Under optimised conditions, a relatively homogeneous distribution of regular Au nanodroplets was obtained. Using the Au nanodroplets as a catalyst, MOCVD growth of ZnO nanostructures was studied. Scanning electron microscopy revealed nanostructures with various forms including commonly observed structures such as nanorods, nanoneedles and nanotubes. Some novel nanostructures were also observed, however, which resembled twist pastries and bevelled-multifaceted table legs. [reprint (PDF)]
21.	Polarity inversion of Type-II InAs/GaSb superlattice photodiodes B.M. Nguyen, D. Hoffman, P.Y. Delaunay, M. Razeghi and V. Nathan Applied Physics Letters, Vol. 91, No. 10, p. 103503-1-- September 3, 2007 ...[Visit Journal] The authors demonstrated the realization of p-on-n Type-II InAs/GaSb superlattice photodiodes. Growth condition for high quality InAsSb layer lattice matched to GaSb was established for the use of an effective n-contact layer. By studying the effect of various GaSb capping layer thicknesses on the optical and electrical performances, an optimized thickness of 160 nm was determined. In comparison to as grown n-on-p superlattice photodiodes, this inverted design of p on n has shown similar quality. Finally, by analyzing Fabry-Perot interference fringes in the front side illuminated spectral measurement, the refractive index of the superlattice was determined to be approximately 3.8. [reprint (PDF)]
21.	Internal Stress Around Micropipes in 6H-SiC Substrates H. Ohsato, T. Kato, T. Okuda and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] 6H-SiC single crystals are expected to be suitable substrates for thin film growth of the wide bandgap semiconductor (GaN, because it has a small lattice mismatch with GaN. Moreover, SiC single crystals are also expected for high-power and high- temperature electric applications because of its wide band gap, high breakdown voltage, high thermal conductivity and high temperature stability. Single crystals with large size used for electronic devices can be grown on seed crystals only by the modified Lely method based on sublimation deposition. But, single crystals have serious defects so called micropipes. These micropipes penetrate almost along the [001] direction. The internal strain around micropipes was investigated using the polarizing optical microscope for the purpose of clarifying the formation mechanisms and decreasing the amount of micropipes. A special interference figure was found around a micropipe under the crossed polars on the polarizing microscope. In this work, the special interference figure around micropipes due to internal stress was explained, and the magnitude and distribution of the stress was measured by means of photoelasticity and the mapping of Raman spectra. [reprint (PDF)]
21.	Monolithic Integration of GaInAs/InP Quantum Well Infrared Photodetectors on Si Substrate M. Erdtmann and M. Razeghi SPIE Conference, San Jose, CA, -- January 22, 2001 ...[Visit Journal] Using low-pressure metalorganic chemical vapor deposition, we have grown GaInAs/InP QWIP structures on GaAs-coated Si substrate. First, the procedure to optimize the epitaxy of the InP buffer layer on Si substrate is given. Excellent crystallinity and a mirror-like surface morphology were obtained by using both a two-step growth process at the beginning of the InP buffer layer growth and several series of thermal cycle annealing throughout the InP buffer layer growth. Second, results of fabricated GaInAs/InP QWIPs on Si substrate are presented. At a temperature of 80 K, the peak response wavelength occurs at 7.4 μm. The responsivities of QWIPs on both Si and InP substrates with identical structures are equal up to biases of 1.5 V. At a bias of 3 V, the responsivity of the QWIPs on Si substrate is 1.0 A/W. [reprint (PDF)]
21.	Two-dimensional magnetophonon resonance in GaInAs-InP and GaInAs-AlInAs heterojunctions and superlattices J.C. Portal, G. Gregoris a b , M.A. Brummell , R.J. Nicholas, M. Razeghi, M.A. Di Forte-Poisson, K.Y. Cheng, A.Y. Cho J.C. Portal, G. Gregoris, M.A. Brummell, R.J. Nicholas, M. Razeghi, M.A. Di Forte-Poisson, K.Y. Cheng, A.Y. Cho, Two-dimensional magnetophonon resonance in GaInAs-InP and GaInAs-AlInAs heterojunctions and superlattices, Surface Science, Volume 142, Issues 1–3, 1984, Pages 368-374,-- July 1, 1984 ...[Visit Journal] We report the observation of magnetophonon resonance in GaInAs-InP heterojunctions and measurements of the temperature dependence of the oscillations. A single series of oscillations due to scattering by the “GaAs-like” mode of GaInAs is seen, in contrast to GaInAs-InP superlattices, where scattering from InP phonons is also observed, and GaInAs-AlInAs heterojunctions, where coupling to “InAs-like” modes only is seen. This behaviour is discussed in terms of long-range phonon interactions and interface phonons. [reprint (PDF)]
21.	High-power, high-wall-plug-efficiency quantum cascade lasers with high-brightness in continuous wave operation at 3–300μm Manijeh Razeghi, Yanbo Bai and Feihu Wang Razeghi et al. Light: Science & Applications (2025) 14:252 ...[Visit Journal] Quantum cascade lasers (QCLs) are unipolar quantum devices based on inter-sub-band transitions. They break the electron-hole recombination mechanism in traditional semiconductor lasers, overcome the long-lasting bottleneck which is that the emission wavelength of semiconductor laser is completely dependent on the bandgap of semiconductor materials. Therefore, their emission wavelength is able to cover the mid-infrared (mid-IR) range and the “Terahertz gap” that is previously inaccessible by any other semiconductor lasers. [reprint (PDF)]
21.	Band gap tunability of Type-II Antimonide-based superlattices M. Razeghi and B.M. Nguyen Physics Procedia, Vol. 3, Issue 2, p. 1207-1212 (14th International Conference on Narrow Gap Semiconductors and Systems NGSS-14, Sendai, Japan, July 13-17, 2009)-- January 31, 2010 ...[Visit Journal] Current state-of-the art infrared photon detectors based on bulk semiconductors such as InSb or HgCdTe are now relatively mature and have almost attained the theoretical limit of performance. It means, however, that the technology can not be expected to demonstrate revolutionary improvements, in terms of device performances. In contrasts, low dimensional quantum systems such as superlattices, quantum wells, quantum dots, are still the development stage, yet have shown comparable performance to the bulk detector family. Especially for the Type-II Antimony-based superlattices, recent years have seen significant improvements in material quality, structural design as well as fabrication techniques which lift the performance of Type-II superlattice photodetectors to a new level. In this talk, we will discuss the advantages of Type-II-superlattices, from the physical nature of the material to the practical realisms. We will demonstrate the flexibility in controlling the energy gap and their overall band alignment for the suppression of Auger recombination, as well as to create sophisticated hetero-designs. [reprint (PDF)]
20.	GaN p-i-n photodiodes with high visible-to-ultraviolet rejection ratio P. Kung, X. Zhang, D. Walker, A. Saxler, and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] UV photodetectors are critical components in many applications, including UV astronomy, flame sensors, early missile threat warning and space-to-space communications. Because of the presence of strong IR radiation in these situations, the photodetectors have to be solar blind, i.e. able to detect UV radiation while not being sensitive to IR. Al_xGa_1-xN is a promising material system for such devices. Al_xGa_1-xN materials are wide bandgap semiconductors, with a direct bandgap whose corresponding wavelength can be continuously tuned from 200 to 365 nm. Al_xGa_1-xN materials are thus insensitive to visible and IR radiation whose wavelengths are higher than 365 nm. We have already reported the fabrication and characterization of Al_xGa_1-xN-based photoconductors with a cut-off wavelength tunable from 200 to 365 nm by adjusting the ternary alloy composition. Here, we present the growth and characterization of GaN p-i- n photodiodes which exhibit a visible-to-UV rejection ratio of 6 orders or magnitude. The thin films were grown by low pressure metalorganic chemical vapor deposition. Square mesa structures were fabricated using dry etching, followed by contact metallization. The spectral response, rejection ratio and transient response of these photodiodes is reported. [reprint (PDF)]
20.	Tunability of intersubband absorption from 4.5 to 5.3 µm in a GaN/Al_0.2Ga_0.8N superlattices grown by metalorganic chemical vapor deposition N. Péré-Laperne, C. Bayram, L. Nguyen-Thê, R. McClintock, and M. Razeghi Applied Physics Letters, Vol. 95, No. 13, p. 131109-- September 28, 2009 ...[Visit Journal] Intersubband (ISB) absorption at wavelengths as long as 5.3 µm is realized in GaN/Al_0.2Ga_0.8N superlattices grown by metalorganic chemical vapor deposition. By employing low aluminum content Al_0.2Ga_0.8N barriers and varying the well width from 2.6 to 5.1 nm, ISB absorption has been tuned from 4.5 to 5.3 µm. Theoretical ISB absorption and interband emission models are developed and compared to the experimental results. The effects of band offsets and the piezoelectric fields on these superlattices are investigated. [reprint (PDF)]
20.	Very Long Wavelength GaAs/GaInP Quantum Well Infrared Photodetectors C. Jelen, S. Slivken, G.J. Brown, and M. Razeghi SPIE Conference, San Jose, CA, -- February 12, 1997 ...[Visit Journal] We demonstrate long wavelength quantum well infrared photodetectors with GaAs quantum wells and GaInP barriers grown using gas-source molecular beam epitaxy. Wafers were grown with varying well widths. The optimum well width was 75 angstrom, which resulted in a detection peak at 13 μm and a cutoff wavelength of 15 μm. Dark current measurements of the samples with 15 μm cutoff wavelength show low dark current densities. The dark current characteristics have been investigated as a function of temperature and electron density in the well and compared to a model which takes into account thermionic emission and thermally assisted tunneling. The model is used to extract a saturation velocity of 1.5 x 10⁵ cm/s for electrons. The photoelectron lifetime before recapture has been deduced from this carrier velocity and photoconductive gain measurements. The lifetime is found to be approximately 5 ps. Preliminary focal plane array imaging is demonstrated. [reprint (PDF)]
20.	Focal plane arrays based on quantum dot infrared photodetectors Manijeh Razeghi; Wei Zhang; Ho-Chul Lim; Stanley Tsao; John Szafraniec; Maho Taguchi; Bijan Movaghar Proc. SPIE 5838, Nanotechnology II, 125 (June 28, 2005);-- June 28, 2005 ...[Visit Journal] Here we report the first demonstrations of infrared focal plane array (FPA) based on GaAs and InP based quantum dot infrared photodetectors (QDIPs). QDIPs are extension of quantum well infrared photodetectors (QWIPs) and are predicted to outperform QWIPs due to their potential advantages including normally incident absorption, higher responsivity and high temperature operation. Two material systems have been studied: InGaAs/InGaP QDIPs on GaAs substrates and InAs QDIP on InP substrates. An InGaAs/InGaP QDIP has been grown on GaAs substrate by LP-MOCVD. Photoresponse was observed at temperatures up to 200 K with a peak wavelength of 4.7 μm and cutoff wavelength of 5.2 μm. A detectivity of 1.2x10¹¹ cm·Hz^1/2/W was obtained at T=77 K and bias of -0.9 V, which is the highest for QDIPs grown by MOCVD. An InAs QDIP structure has also been grown on InP substrate by LP-MOCVD. Photoresponse of normal incidence was observed at temperature up to 160K with a peak wavelength of 6.4 μm and cutoff wavelength of 6.6 μm. A detectivity of 1.0x10¹⁰ cm·Hz^1/2/W was obtained at 77K at biases of -1.1 V, which is the first and highest detectivity reported for QDIP on InP substrate. 256×256 detector arrays were fabricated first time in the world for both the GaAs and InP based QDIPs. Dry etching and indium bump bonding were used to hybridize the arrays to a Litton readout integrated circuit. For the InGaAs/InGaP QDIP FPA, thermal imaging was achieved at temperatures up to 120 K. At T=77K, the noise equivalent temperature difference (NEDT) was measured as 0.509K with a 300K background and f/2.3 optics. For the InP based QDIPs, thermal imaging was achieved at 77 K. [reprint (PDF)]
20.	Dark current suppression in Type-II InAs/GaSb superlattice long wavelength infrared photodiodes with M-structure barrier B.M. Nguyen, D. Hoffman, P.Y. Delaunay, and M. Razeghi Applied Physics Letters, Vol. 91, No. 16, p. 163511-1-- October 15, 2007 ...[Visit Journal] We presented an alternative design of Type-II superlattice photodiodes with the insertion of a mid-wavelength infrared M-structure AlSb/GaSb/InAs/GaSb/AlSb superlattice for the reduction of dark current. The M-structure superlattice has a larger carrier effective mass and a greater band discontinuity as compared to the standard Type-II superlattices at the valence band. It acts as an effective medium that weakens the diffusion and tunneling transport at the depletion region. As a result, a 10.5 µm cutoff Type-II superlattice with 500 nm M-superlattice barrier exhibited a R₀A of 200 cm² at 77 K, approximately one order of magnitude higher than the design without the barrier. The quantum efficiency of such structures does not show dependence on either barrier thickness or applied bias. [reprint (PDF)]
20.	Techniques for High-Quality SiO₂ Films J. Nguyen and M. Razeghi SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices IV, Vol. 6479, p. 64791K-1-8-- January 29, 2007 ...[Visit Journal] We report on the comparison of optical, structural, and electrical properties of SiO₂ using plasma-enhanced chemical vapor deposition and ion-beam sputtering deposition. High-quality, low-temperature deposition of SiO₂ by ion-beam sputtering deposition is shown to have lower absorption, smoother and more densely packed films, a lower amount of fixed oxide charges, and a lower trapped-interface density than SiO₂ by plasma-enhanced chemical vapor deposition. This high-quality SiO₂ is then demonstrated as an excellent electrical and mechanical surface passivation layer on Type-II InAs/GaSb photodetectors [reprint (PDF)]
20.	Effect of sidewall surface recombination on the quantum efficiency in a Y₂O₃ passivated gated type-II InAs/GaSb long-infrared photodetector array G. Chen, A. M. Hoang, S. Bogdanov, A. Haddadi, S. R. Darvish, and M. Razeghi Appl. Phys. Lett. 103, 223501 (2013)-- November 25, 2013 ...[Visit Journal] Y₂O₃ was applied to passivate a long-wavelength infrared type-II superlattice gated photodetector array with 50% cut-off wavelength at 11 μm, resulting in a saturated gate bias that was 3 times lower than in a SiO₂ passivated array. Besides effectively suppressing surface leakage, gating technique exhibited its ability to enhance the quantum efficiency of 100 × 100 μm size mesa from 51% to 57% by suppressing sidewall surface recombination. At 77 K, the gated photodetector showed dark current density and resistance-area product at −300 mV of 2.5 × 10⁻⁵ A/cm² and 1.3 × 10⁴ Ω·cm², respectively, and a specific detectivity of 1.4 × 10¹² Jones. [reprint (PDF)]

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