Center for Quantum Devices - Most Downloaded Journal Articles

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22.	Nickel oxide growth on Si (111), c-Al₂O₃ and FTO/glass by pulsed laser deposition V. E. Sandana ; D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; R. McClintock ; M. Razeghi 03/07/2014-- March 7, 2014 ...[Visit Journal] NiO was grown on Si (111), c-Al₂O₃ and FTO/glass substrates by pulsed laser deposition (PLD). X-Ray Diffraction (XRD) and scanning electron microscope (SEM) studies revealed that layers grown on c-Al₂O₃ were fcc NiO with a dense morphology of cubic grains that were strongly (111) oriented along the growth direction. The relatively low ω rocking curve linewidth, of 0.12°suggests that there may have been epitaxial growth on the c-Al₂O₃ substrate. XRD and SEM indicated that films grown on Si (111) were also fcc NiO, with cubic grains, but that the grain orientation was random. This is consistent with the presence of an amorphous SiO₂ layer at the surface of the Si substrate, which precluded epitaxial growth. NiO grown at lower temperature (200°C) on temperature-sensitive FTO/glass substrates showed no evidence of crystallinity in XRD and SEM studies. After flash annealing in air, however, peaks characteristic of randomly oriented fcc NiO appeared in the XRD scans and the surface morphology became more granular in appearance. Such layers appear promising for the development of future dye-sensitised solar cell devices based on NiO grown by PLD. [reprint (PDF)]
22.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
22.	Thermal stability of GaN thin films grown on (0001) Al₂O₃, (0112) Al₂O₃ and (0001)Si 6H-SiC substrates C.J. Sun, P. Kung, A. Saxler, H. Ohsato, E. Bigan, M. Razeghi, and D.K. Gaskill Journal of Applied Physics 76 (1)-- July 1, 1994 ...[Visit Journal] Single crystals of GaN were grown on (0001), (0112) Al₂O₃ and (0001)Si 6H‐SiC substrates using an atmospheric pressure metalorganic chemical‐vapor‐deposition reactor. The relationship has been studied between the thermal stability of the GaN films and the substrate’s surface polarity. It appeared that the N‐terminated (0001) GaN surface grown on (0001)Si 6H‐SiC has the most stable surface, followed by the nonpolar (1120) GaN surface grown on (0112) Al₂O₃, while the Ga‐terminated (0001) GaN surface grown on (0001) Al₂O₃ has the least stable surface. This is explained with the difference in the atomic configuration of each of these surfaces which induces a difference in their thermal decomposition. [reprint (PDF)]
22.	High Power Mid-Infrared Quantum Cascade Lasers Grown on GaAs Steven Slivken and Manijeh Razeghi Photonics 2022, 9(4), 231 (COVER ARTICLE) ...[Visit Journal] The motivation behind this work is to show that InP-based intersubband lasers with high power can be realized on substrates with significant lattice mismatch. This is a primary concern for the integration of mid-infrared active optoelectronic devices on low-cost photonic platforms, such as Si. As evidence, an InP-based mid-infrared quantum cascade laser structure was grown on a GaAs substrate, which has a large (4%) lattice mismatch with respect to InP. Prior to laser core growth, a metamorphic buffer layer of InP was grown directly on a GaAs substrate to adjust the lattice constant. Wafer characterization data are given to establish general material characteristics. A simple fabrication procedure leads to lasers with high peak power (>14 W) at room temperature. These results are extremely promising for direct quantum cascade laser growth on Si substrates. [reprint (PDF)]
21.	Room Temperature Epitaxy of Ni1−xMgxO on c Plane Sapphire by Plasma Assisted Pulsed Laser Deposition David J. Rogers, Eric V. Sandana, Ferechteh H. Teherani, M. Razeghi physica status solidi (b) 2026, 263 (7), e202500648. ...[Visit Journal] This paper reports on room-temperature (RT) epitaxial growth of NiO and Ni1-xMgxO (x ≈ 0.50) thin films on c-plane sapphire (0001) using plasma-assisted pulsed laser deposition. Optical transmission reveals absorption edges at ~3.6 eV (NiO) and ~4.4 eV (Ni0.5Mg0.50O), confirming bandgap engineering via Mg incorporation consistent with prior alloy data. X-ray reflectivity (XRR) indicates smooth surfaces and thicknesses of ~60 nm (NiO) and ~65 nm (Ni0.5Mg0.50O). High-resolution X-ray diffraction 2θ/ω scans indicate fcc (111) orientation for both films; ω-rocking curves exhibit full width half maxima of 0.07°—remarkably low mosaic spread for RT-grown oxides. (002) pole figures display six-fold symmetry, evidencing epitaxial relationships featuring two rotational domains (±60°) about [111] on c-sapphire. AFM (1 µm × 1 µm) yields root mean square roughness of ~0.5 nm (NiO) and ~2.6 nm (Ni0.5Mg0.50O). Four-point probe gives ρ ≈ 26 Ω·cm (NiO) and insulating behavior for Ni0.5Mg0.50O, consistent with bandgap widening and reduced hole concentration. These results establish RT epitaxial Mg-alloyed NiO with exceptional crystallinity, directly relevant to Ga2O3 heterojunctions for power electronics and solar-blind ultra violet C-band photodetectors, where tunable band alignment and sharp interfaces are critical. [reprint (PDF)]
21.	High Power 280 nm AlGaN Light Emitting Diodes Based on an Asymmetric Single Quantum Well K. Mayes, A. Yasan, R. McClintock, D. Shiell, S.R. Darvish, P. Kung, and M. Razeghi Applied Physics Letters, 84 (7)-- February 16, 2004 ...[Visit Journal] We demonstrate high-power AlGaN-based ultraviolet light-emitting diodes grown on sapphire with an emission wavelength of 280 nm using an asymmetric single-quantum-well active layer configuration on top of a high-quality AlGaN/AlN template layer. An output power of 1.8 mW at a pulsed current of 400 mA was achieved for a single 300 µm×300 µm diode. This device reached a high peak external quantum efficiency of 0.24% at 40 mA. An array of four diodes produced 6.5 mW at 880 mA of pulsed current. [reprint (PDF)]
21.	Impact of scaling base thickness on the performance of heterojunction phototransistors Arash Dehzangi, Abbas Haddadi, Sourav Adhikary, and Manijeh Razeghi Nanotechnology 28, 10LT01-- February 2, 2017 ...[Visit Journal] In this letter we report the effect of vertical scaling on the optical and electrical performance of mid-wavelength infrared heterojunction phototransistors based on type-II InAs/GaSb/AlSb superlattices. The performance of devices with different base thickness was compared as the base was scaled from 60 down to 40 nm. The overall optical performance shows enhancement in responsively, optical gain, and specific detectivity upon scaling the base width. The saturated responsivity for devices with 40 nm bases reaches 8,845 and 9,528 A/W at 77 and 150 K, respectively, which is almost five times greater than devices with 60 nm bases. The saturated optical gain for devices with 40 nm bases is measured as 2,760 at 77 K and 3,081 at 150 K. The devices with 40 nm bases also exhibit remarkable enhancement in saturated current gain, with 17,690 at 77 K, and 19,050 at 150 K. [reprint (PDF)]
21.	Growth of InAsSb Alloys on GaAs and Si Substrates for Uncooled Infrared Photodetector Applications J.D. Kim, H. Mohseni, J.S. Wojkowski, J.J. Lee and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] In this paper, we report on the growth and characterization of InAsSb alloys on GaAs and Si substrates for uncooled infrared photodetector applications. The fabrication and characterization of photodetectors from the grown layers are also reported. The photovoltaic and photoconductive devices were grown on (100) GaAs and Si substrates, respectively, using molecular beam epitaxy (MBE). The composition of InAs>sub>1-xSb_x layers was 0.95 in both cases and cut-off wavelength of 7-8 μm has been obtained. At 300 K, the photovoltaic detectors on GaAs substrates resulted in a sharp cut-off wavelength of 7.5 μm with a peak responsivity as high as 0.32 V/W at 6.5 micrometer. For the photoconductive detectors on Si substrates, cut-off wavelength of 8 μm has been observed with a responsivity of 6.3x10^-2 V/W at 7 μm under an electric field of 420 V/m. [reprint (PDF)]
21.	Cavity Length Effects of High-Temperature High-Power Continuous Wave Characteristics in Quantum-Cascade Lasers J.S. Yu, A. Evans, J. David, L. Doris, S. Slivken, and M. Razeghi Applied Physics Letters, 83 (25)-- December 22, 2003 ...[Visit Journal] We report the cavity-length dependent high-temperature high-power cw characteristics in λ=6 µm quantum-cascade lasers with a thick electroplated Au top contact layer. For a high-reflectivity (HR) coated 15 µm wide and 3 mm long laser, the cw operation is achieved up to 313 K (40 °C) with an output power of 17 mW. At 298 K, a very high cw output power of 213 mW is obtained for a HR coated 15 µm wide and 4 mm long laser. Thermal resistance is analyzed at temperatures above 283 K for HR coated lasers with different cavities. [reprint (PDF)]
21.	High power frequency comb based on mid-infrared quantum cascade laser at λ ~9μm Q. Y. Lu, M. Razeghi, S. Slivken, N. Bandyopadhyay, Y. Bai, W. J. Zhou, M. Chen, D. Heydari, A. Haddadi, R. McClintock, M. Amanti, and C. Sirtori Appl. Phys. Lett. 106, 051105-- February 2, 2015 ...[Visit Journal] We investigate a frequency comb source based on a mid-infrared quantum cascade laser at λ ∼9 μm with high power output. A broad flat-top gain with near-zero group velocity dispersion has been engineered using a dual-core active region structure. This favors the locking of the dispersed Fabry-Pérot modes into equally spaced frequency lines via four wave mixing. A current range with a narrow intermode beating linewidth of 3 kHz is identified with a fast detector and spectrum analyzer. This range corresponds to a broad spectral coverage of 65 cm⁻¹ and a high power output of 180 mW for ∼176 comb modes. [reprint (PDF)]
21.	Recent advances in MOCVD growth of InxGa1-xAsyP1-y alloys M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Recent advances in MOCVD growth of InxGa1-xAsyP1-y alloys, Journal of Crystal Growth, Volume 70, Issues 1–2, 1984, Pages 145-149,-- December 1, 1984 ...[Visit Journal] The low pressure metalorganic chemical vapour deposition (LPMOCVD) growth of GaxIn1-xAsyP1-y-InP lattice matched system, with high mobilities, sharp interfaces, low background doping densities, and the formation of a two-dimensional electron gas (2DEG) at the interfaces, has recently made spectacular advances, as in evidenced by the availability of high quality DH lasers, PIN photodiodes, and Gunn diodes. We present here some new results obtained on the above-mentioned material and devices. [reprint (PDF)]
21.	Back-illuminated solar-blind photodetectors for imaging applications R. McClintock, A. Yasan, K. Mayes, P. Kung, and M. Razeghi SPIE Conference, Jose, CA, Vol. 5732, pp.175-- January 22, 2005 ...[Visit Journal] Back-illuminated solar-blind ultraviolet p-i-n photodetectors and focal plane arrays are investigated. We initially study single-pixel devices and then discuss the hybridization to a read-out integrated circuit to form focal plane arrays for solar-blind UV imaging. [reprint (PDF)]
21.	Quantum Dot Intersubband Photodetectors C. Jelen, M. Erdtmann, S. Kim, and M. Razeghi SPIE Conference, San Jose, CA, -- January 22, 2001 ...[Visit Journal] Quantum dots are recognized as very promising candidates for the fabrication of intersubband photodetectors in the infrared spectral range. At present, material quality is making rapid progress and some devices have been demonstrated. Examples of mid-infrared quantum dot intersubband photodetectors are presented along with device design and data analysis. Nonetheless, the performance of these devices remains less than comparable quantum well intersubband photodetectors due to difficulties in controlling the quantum dot size and distribution during epitaxy. [reprint (PDF)]
21.	High performance antimony based type-II superlattice photodiodes on GaAs substrates B.M. Nguyen, D. Hoffman, E.K. Huang, P.Y. Delaunay, and M. Razeghi SPIE Porceedings, Vol. 7298, Orlando, FL 2009, p. 72981T-- April 13, 2009 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattices grown on GaSb substrate have achieved significant advances in both structural design and material growth, making Type-II superlattice infrared detector a rival competitor to the state-of-the-art MCT technology. However, the limited size and strong infrared absorption of GaSb substrates prevent large format type-II superlattice infrared imagers from being realized. In this work, we demonstrate type-II superlattices grown on GaAs substrates, which is a significant step toward third generation infrared imaging at low cost. The device performances of Type-II superalttice photodetectors grown on these two substrates are compared. [reprint (PDF)]
21.	Avalanche Photodetector Based on InAs/InSb Superlattice Arash Dehzangi, Jiakai Li, Lakshay Gautam and Manijeh Razeghi Quantum rep. 2020, 2(4), 591-599; https://doi.org/10.3390/quantum2040041 (registering DOI)-- December 4, 2020 ...[Visit Journal] This work demonstrates a mid-wavelength infrared InAs/InSb superlattice avalanche photodiode (APD). The superlattice APD structure was grown by molecular beam epitaxy on GaSb substrate. The device exhibits a 100 % cut-off wavelength of 4.6 µm at 150 K and 4.30 µm at 77 K. At 150 and 77 K, the device responsivity reaches peak values of 2.49 and 2.32 A/W at 3.75 µm under −1.0 V applied bias, respectively. The device reveals an electron dominated avalanching mechanism with a gain value of 6 at 150 K and 7.4 at 77 K which was observed under −6.5 V bias voltage. The gain value was measured at different temperatures and different diode sizes. The electron and hole impact ionization coefficients were calculated and compared to give a better prospect of the performance of the device. [reprint (PDF)]
21.	Low-Threshold 7.3 μm Quantum Cascade Lasers Grown by Gas-Source Molecular Beam Epitaxy S. Slivken, A. Matlis, A. Rybaltowski, Z. Wu and M. Razeghi Applied Physics Letters 74 (19)-- May 19, 1999 ...[Visit Journal] We report low-threshold 7.3 μm superlattice-based quantum cascade lasers. The threshold current density is 3.4 kA/cm² at 300 K and 1.25 kA/cm² at 79 K in pulsed mode for narrow (∼20 μm), 2 mm-long laser diodes. The characteristic temperature (T₀) is 210 K. The slope efficiencies are 153 and 650 mW/A at 300 and 100 K, respectively. Power output is in excess of 100 mW at 300 K. Laser far-field intensity measurements give divergence angles of 64° and 29° in the growth direction and in the plane of the quantum wells, respectively. Far-field simulations show excellent agreement with the measured results. [reprint (PDF)]
21.	Performance analysis of infrared heterojunction phototransistors based on Type-II superlattices Jiakai Li, Arash Dehzangi, Manijeh Razeghi Infrared Physics & Technology Volume 113, March 2021, 103641 ...[Visit Journal] In this study, a comprehensive analysis of the n-p-n infrared heterojunction phototransistors (HPTs)based on Type-II superlattices has been demonstrated. Different kinds of Type-II superlattices were carefully chosen for the emitter, base, and collector to improve the optical performance. The effects of different device parameters include emitter doping concentration, base doping concentration, base thickness and energy bandgap difference between emitter and base on the optical gain of the HPTs have been investigated. By scaling the base thickness to 20 nm, the HPT exhibits an optical gain of 345.3 at 1.6 μm at room temperature. For a 10 μm diameter HPT device, a −3 dB cut-off frequency of 5.1 GHz was achieved under 20 V at 150 K. [reprint (PDF)]
21.	High performance GaAs/GaInP heterostructure bipolar transistors grown by low-pressure metal-organic chemical vapour deposition M Razeghi, F Omnes, M Defour, P Maurel, J Hu, E Wolk and D Pavlidis M Razeghi et al 1990 Semicond. Sci. Technol. 5 278-- December 11, 1989 ...[Visit Journal] The authors report the fabrication of high-quality GaAs/GaInP n-p-n heterojunction bipolar transistors grown by low-pressure metal-organic chemical vapour deposition on semi-insulating substrates. Various structures with homogeneous and graded bases have been fabricated. Doping profiles together with X-ray double diffraction patterns demonstrate the excellent control of growth parameters such as thicknesses, doping levels and interface quality. The static characteristics of the devices show current gains as high as 400, which is the highest value reported in that system [reprint (PDF)]
21.	MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates M. Razeghi, M. Defour , F. Omnes, P. Maurel , E. Bigan , O. Acher, J. Nagle, F. Brillouet , J.C. Portal M. Razeghi, M. Defour, F. Omnes, P. Maurel, E. Bigan, O. Acher, J. Nagle, F. Brillouet, J.C. Portal, MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates, Journal of Crystal Growth, Volume 93, Issues 1–4, 1988, Pages 776-781,-- January 1, 1988 ...[Visit Journal] High quality II[-V semiconductor heterojunctions, quantum wells and superlauices have been grown on lattice matched and alternative substrates such as silicon for photonic and electronic devices, using low pressure metalorganic chemical vapor deposition growth technique. [reprint (PDF)]
21.	Growth and characterization of InAs/GaSb photoconductors for long wavelength infrared range H. Mohseni, E. Michel, J. Sandven, M. Razeghi, W. Mitchel, and G. Brown Applied Physics Letters 71 (10)-- September 8, 1997 ...[Visit Journal] In this letter we report the molecular beam epitaxial growth and characterization of InAs/GaSb superlattices grown on semi-insulating GaAs substrates for long wavelength infrared detectors. Photoconductive detectors fabricated from the superlattices showed photoresponse up to 12 µm and peak responsivity of 5.5 V/W with Johnson noise limited detectivity of 1.33 × 10⁹ cm·Hz^½/W at 10.3 µm at 78 K. [reprint (PDF)]
21.	Monolithic integration of a short‐length GaInAs photoconductor with a GaAs/GaAlAs optical waveguide on a GaAs semi‐insulating substrate F. Mallecot; J. F. Vinchant; M. Razeghi; D. Vandermoere; J. P. Vilcot; D. Decoster Appl. Phys. Lett. 53, 2522–2524 (1988)-- December 19, 1988 ...[Visit Journal] We report the first fabrication of a GaO. 47 Inn. 53 As planar photoconductive detector, associated with a GaAs/GaAIAs rib waveguide grown on a semi-insulating GaAs substrate, which needs a short-length absorbing layer to detect the optical signal. Because of the GaAIAs epilayer, a GalnAs length of about 100 tl1n only is needed to detect 90% of the opticai signal, accordingly to results predicted using a four-layer model with complex refractive indices in each layer. [reprint (PDF)]
21.	Quantum Hall liquid-to-insulator transition in In_1-xGa_xAs/InP heterostructures W. Pan, D. Shahar, D.C. Tsui, H.P. Wei, and M. Razeghi Physical Review B 55 (23)-- June 15, 1997 ...[Visit Journal] We report a temperature- and current-scaling study of the quantum Hall liquid-to-insulator transition in an In_1-xGa_xAs/InP heterostructure. When the magnetic field is at the critical field B_c, ρ_xx=0.86h/e². Furthermore, the transport near B_c scales as \|B- Bc\|T^-κ with κ=0.45±0.05, and as \|B- Bc\|I^-b with b=0.23±0.05. The latter can be due to phonon emission in a dirty piezoelectric medium, or can be the consequence of critical behavior near B_c, within which z=1.0±0.1 and ν=2.1±0.3 are obtained from our data. [reprint (PDF)]
21.	High Detectivity GaInAs/InP Quantum Well Infrared Photodetectors Grown on Si Substrates J. Jiang, C. Jelen, M. Razeghi and G.J. Brown IEEE Photonics Technology Letters 14 (3)-- March 1, 2002 ...[Visit Journal] In this letter, we report an improvement in the growth and the device performance of GaInAs-InP quantum well infrared photodetectors grown on Si substrates. Material growth techniques, like low-temperature nucleation layers and thick buffer layers were used to grow InP on Si. An in situ thermal cycle annealing technique was used to reduce the threading dislocation density in the InP-on-Si. Detector dark current was reduced 2 orders of magnitude by this method. Record high detectivity of 2.3 × 10⁹ cm·Hz^½·W^-1 was obtained for QWIP-on-Si detectors in the 7-9 μm range at 77 K [reprint (PDF)]
21.	High-Power (~9 μm) Quantum Cascade Lasers S. Slivken, Z. Huang, A. Evans, and M. Razeghi Applied Physics Letters 80 (22)-- June 3, 2002 ...[Visit Journal] High-power quantum cascade lasers emitting at λ > 9 μm are demonstrated. Accurate control of layer thickness and interfaces is evidenced by x-ray diffraction. Excellent peak power for uncoated lasers, up to 3.5 W per facet for a 25 μm emitter width, is obtained at 300 K for 75 period structures. The threshold current density at 300 K is only 1.4 kA/cm². From 300 to 425 K, the laser exhibits a characteristic temperature, T₀, of 167 K. Over 150 mW of average power is measured per facet for a duty cycle of 6%. Simulation of the average power output reveals a thermal resistance of 12 K/W for epilayer-up mounted ridges. [reprint (PDF)]
21.	Graphene versus oxides for transparent electrode applications Sandana, V. E.; Rogers, D. J.; Teherani, F. Hosseini; Bove, P.; Razeghi, M. Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862603 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] Due to their combination of good electrical conductivity and optical transparency, Transparent Conducting Oxides (TCOs) are the most common choice as transparent electrodes for optoelectronics applications. In particular, devices, such as LEDs, LCDs, touch screens and solar cells typically employ indium tin oxide. However, indium has some significant drawbacks, including toxicity issues (which are hampering manufacturing), an increasing rarefication (due to a combination of relative scarcity and increasing demand [1]) and resulting price increases. Moreover, there is no satisfactory option at the moment for use as a p-type transparent contact. Thus alternative materials solutions are actively being sought. This review will compare the performance and perspectives of graphene with respect to TCOs for use in transparent conductor applications. [reprint (PDF)]

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