Center for Quantum Devices - Most Downloaded Journal Articles

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22.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
22.	Nickel oxide growth on Si (111), c-Al₂O₃ and FTO/glass by pulsed laser deposition V. E. Sandana ; D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; R. McClintock ; M. Razeghi 03/07/2014-- March 7, 2014 ...[Visit Journal] NiO was grown on Si (111), c-Al₂O₃ and FTO/glass substrates by pulsed laser deposition (PLD). X-Ray Diffraction (XRD) and scanning electron microscope (SEM) studies revealed that layers grown on c-Al₂O₃ were fcc NiO with a dense morphology of cubic grains that were strongly (111) oriented along the growth direction. The relatively low ω rocking curve linewidth, of 0.12°suggests that there may have been epitaxial growth on the c-Al₂O₃ substrate. XRD and SEM indicated that films grown on Si (111) were also fcc NiO, with cubic grains, but that the grain orientation was random. This is consistent with the presence of an amorphous SiO₂ layer at the surface of the Si substrate, which precluded epitaxial growth. NiO grown at lower temperature (200°C) on temperature-sensitive FTO/glass substrates showed no evidence of crystallinity in XRD and SEM studies. After flash annealing in air, however, peaks characteristic of randomly oriented fcc NiO appeared in the XRD scans and the surface morphology became more granular in appearance. Such layers appear promising for the development of future dye-sensitised solar cell devices based on NiO grown by PLD. [reprint (PDF)]
22.	Dark current suppression in Type-II InAs/GaSb superlattice long wavelength infrared photodiodes with M-structure barrier B.M. Nguyen, D. Hoffman, P.Y. Delaunay, and M. Razeghi Applied Physics Letters, Vol. 91, No. 16, p. 163511-1-- October 15, 2007 ...[Visit Journal] We presented an alternative design of Type-II superlattice photodiodes with the insertion of a mid-wavelength infrared M-structure AlSb/GaSb/InAs/GaSb/AlSb superlattice for the reduction of dark current. The M-structure superlattice has a larger carrier effective mass and a greater band discontinuity as compared to the standard Type-II superlattices at the valence band. It acts as an effective medium that weakens the diffusion and tunneling transport at the depletion region. As a result, a 10.5 µm cutoff Type-II superlattice with 500 nm M-superlattice barrier exhibited a R₀A of 200 cm² at 77 K, approximately one order of magnitude higher than the design without the barrier. The quantum efficiency of such structures does not show dependence on either barrier thickness or applied bias. [reprint (PDF)]
22.	Polarization-free GaN emitters in the ultraviolet and visible spectra via heterointegration on CMOS-compatible Si (100) C. Bayram, J. Ott, K. T. Shiu, C. W. Cheng, Y. Zhu, J. Kim, D. K. Sadana, M. Razeghi Proc. SPIE 9370, Quantum Sensing and Nanophotonic Devices XII, 93702F -- February 8, 2015 ...[Visit Journal] This work presents a new type of polarization-free GaN emitter. The unique aspect of this work is that the ultraviolet and visible emission originates from the cubic phase GaN and the cubic phase InGaN/GaN multi-quantum-wells, respectively. Conventionally, GaN emitters (e.g. light emitting diodes, laser diodes) are wurtzite phase thus strong polarization fields exist across the structure contributing to the “droop” behavior – a phenomenon defined as “the reduction in emitter efficiency as injection current increases”. The elimination of piezoelectric fields in GaN-based emitters as proposed in this work provide the potential for achieving a 100% internal efficiency and might lead to droopfree light emitting diodes. In addition, this work demonstrates co-integration of GaN emitters on cheap and scalable CMOS-compatible Si (100) substrate, which yields possibility of realizing a GaN laser diode uniquely – via forming mirrors along the naturally occurring cubic phase GaN-Si(100) cleavage planes. [reprint (PDF)]
22.	Thermal stability of GaN thin films grown on (0001) Al₂O₃, (0112) Al₂O₃ and (0001)Si 6H-SiC substrates C.J. Sun, P. Kung, A. Saxler, H. Ohsato, E. Bigan, M. Razeghi, and D.K. Gaskill Journal of Applied Physics 76 (1)-- July 1, 1994 ...[Visit Journal] Single crystals of GaN were grown on (0001), (0112) Al₂O₃ and (0001)Si 6H‐SiC substrates using an atmospheric pressure metalorganic chemical‐vapor‐deposition reactor. The relationship has been studied between the thermal stability of the GaN films and the substrate’s surface polarity. It appeared that the N‐terminated (0001) GaN surface grown on (0001)Si 6H‐SiC has the most stable surface, followed by the nonpolar (1120) GaN surface grown on (0112) Al₂O₃, while the Ga‐terminated (0001) GaN surface grown on (0001) Al₂O₃ has the least stable surface. This is explained with the difference in the atomic configuration of each of these surfaces which induces a difference in their thermal decomposition. [reprint (PDF)]
21.	Growth of InAsSb Alloys on GaAs and Si Substrates for Uncooled Infrared Photodetector Applications J.D. Kim, H. Mohseni, J.S. Wojkowski, J.J. Lee and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] In this paper, we report on the growth and characterization of InAsSb alloys on GaAs and Si substrates for uncooled infrared photodetector applications. The fabrication and characterization of photodetectors from the grown layers are also reported. The photovoltaic and photoconductive devices were grown on (100) GaAs and Si substrates, respectively, using molecular beam epitaxy (MBE). The composition of InAs>sub>1-xSb_x layers was 0.95 in both cases and cut-off wavelength of 7-8 μm has been obtained. At 300 K, the photovoltaic detectors on GaAs substrates resulted in a sharp cut-off wavelength of 7.5 μm with a peak responsivity as high as 0.32 V/W at 6.5 micrometer. For the photoconductive detectors on Si substrates, cut-off wavelength of 8 μm has been observed with a responsivity of 6.3x10^-2 V/W at 7 μm under an electric field of 420 V/m. [reprint (PDF)]
21.	Impact of scaling base thickness on the performance of heterojunction phototransistors Arash Dehzangi, Abbas Haddadi, Sourav Adhikary, and Manijeh Razeghi Nanotechnology 28, 10LT01-- February 2, 2017 ...[Visit Journal] In this letter we report the effect of vertical scaling on the optical and electrical performance of mid-wavelength infrared heterojunction phototransistors based on type-II InAs/GaSb/AlSb superlattices. The performance of devices with different base thickness was compared as the base was scaled from 60 down to 40 nm. The overall optical performance shows enhancement in responsively, optical gain, and specific detectivity upon scaling the base width. The saturated responsivity for devices with 40 nm bases reaches 8,845 and 9,528 A/W at 77 and 150 K, respectively, which is almost five times greater than devices with 60 nm bases. The saturated optical gain for devices with 40 nm bases is measured as 2,760 at 77 K and 3,081 at 150 K. The devices with 40 nm bases also exhibit remarkable enhancement in saturated current gain, with 17,690 at 77 K, and 19,050 at 150 K. [reprint (PDF)]
21.	Room Temperature Epitaxy of Ni1−xMgxO on c Plane Sapphire by Plasma Assisted Pulsed Laser Deposition David J. Rogers, Eric V. Sandana, Ferechteh H. Teherani, M. Razeghi physica status solidi (b) 2026, 263 (7), e202500648. ...[Visit Journal] This paper reports on room-temperature (RT) epitaxial growth of NiO and Ni1-xMgxO (x ≈ 0.50) thin films on c-plane sapphire (0001) using plasma-assisted pulsed laser deposition. Optical transmission reveals absorption edges at ~3.6 eV (NiO) and ~4.4 eV (Ni0.5Mg0.50O), confirming bandgap engineering via Mg incorporation consistent with prior alloy data. X-ray reflectivity (XRR) indicates smooth surfaces and thicknesses of ~60 nm (NiO) and ~65 nm (Ni0.5Mg0.50O). High-resolution X-ray diffraction 2θ/ω scans indicate fcc (111) orientation for both films; ω-rocking curves exhibit full width half maxima of 0.07°—remarkably low mosaic spread for RT-grown oxides. (002) pole figures display six-fold symmetry, evidencing epitaxial relationships featuring two rotational domains (±60°) about [111] on c-sapphire. AFM (1 µm × 1 µm) yields root mean square roughness of ~0.5 nm (NiO) and ~2.6 nm (Ni0.5Mg0.50O). Four-point probe gives ρ ≈ 26 Ω·cm (NiO) and insulating behavior for Ni0.5Mg0.50O, consistent with bandgap widening and reduced hole concentration. These results establish RT epitaxial Mg-alloyed NiO with exceptional crystallinity, directly relevant to Ga2O3 heterojunctions for power electronics and solar-blind ultra violet C-band photodetectors, where tunable band alignment and sharp interfaces are critical. [reprint (PDF)]
21.	High Power 280 nm AlGaN Light Emitting Diodes Based on an Asymmetric Single Quantum Well K. Mayes, A. Yasan, R. McClintock, D. Shiell, S.R. Darvish, P. Kung, and M. Razeghi Applied Physics Letters, 84 (7)-- February 16, 2004 ...[Visit Journal] We demonstrate high-power AlGaN-based ultraviolet light-emitting diodes grown on sapphire with an emission wavelength of 280 nm using an asymmetric single-quantum-well active layer configuration on top of a high-quality AlGaN/AlN template layer. An output power of 1.8 mW at a pulsed current of 400 mA was achieved for a single 300 µm×300 µm diode. This device reached a high peak external quantum efficiency of 0.24% at 40 mA. An array of four diodes produced 6.5 mW at 880 mA of pulsed current. [reprint (PDF)]
21.	Al_xGa_1-xN Materials and Device Technology for Solar Blind Ultraviolet Photodetector Applications R. McClintock, P. Sandvik, K. Mi, F. Shahedipour, A. Yasan, C. Jelen, P. Kung, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 4288, pp. 219-- January 22, 2001 ...[Visit Journal] There has been a growing interest for the development of solar blind ultraviolet (UV) photodetectors for use in a variety of applications, including early missile threat warning, flame monitoring, UV radiation monitoring and chemical/biological reagent detection. The Al_xGa_1-xN material system has emerged as the most promising approach for such devices. However, the control of the material quality and the device technology are still rather immature. We report here the metalorganic chemical vapor deposition, the n-type and the p-type doping of high quality Al_xGa_1-xN thin films on sapphire substrates over a wide range of Al concentration. [reprint (PDF)]
21.	Cavity Length Effects of High-Temperature High-Power Continuous Wave Characteristics in Quantum-Cascade Lasers J.S. Yu, A. Evans, J. David, L. Doris, S. Slivken, and M. Razeghi Applied Physics Letters, 83 (25)-- December 22, 2003 ...[Visit Journal] We report the cavity-length dependent high-temperature high-power cw characteristics in λ=6 µm quantum-cascade lasers with a thick electroplated Au top contact layer. For a high-reflectivity (HR) coated 15 µm wide and 3 mm long laser, the cw operation is achieved up to 313 K (40 °C) with an output power of 17 mW. At 298 K, a very high cw output power of 213 mW is obtained for a HR coated 15 µm wide and 4 mm long laser. Thermal resistance is analyzed at temperatures above 283 K for HR coated lasers with different cavities. [reprint (PDF)]
21.	Performance analysis of infrared heterojunction phototransistors based on Type-II superlattices Jiakai Li, Arash Dehzangi, Manijeh Razeghi Infrared Physics & Technology Volume 113, March 2021, 103641 ...[Visit Journal] In this study, a comprehensive analysis of the n-p-n infrared heterojunction phototransistors (HPTs)based on Type-II superlattices has been demonstrated. Different kinds of Type-II superlattices were carefully chosen for the emitter, base, and collector to improve the optical performance. The effects of different device parameters include emitter doping concentration, base doping concentration, base thickness and energy bandgap difference between emitter and base on the optical gain of the HPTs have been investigated. By scaling the base thickness to 20 nm, the HPT exhibits an optical gain of 345.3 at 1.6 μm at room temperature. For a 10 μm diameter HPT device, a −3 dB cut-off frequency of 5.1 GHz was achieved under 20 V at 150 K. [reprint (PDF)]
21.	High power frequency comb based on mid-infrared quantum cascade laser at λ ~9μm Q. Y. Lu, M. Razeghi, S. Slivken, N. Bandyopadhyay, Y. Bai, W. J. Zhou, M. Chen, D. Heydari, A. Haddadi, R. McClintock, M. Amanti, and C. Sirtori Appl. Phys. Lett. 106, 051105-- February 2, 2015 ...[Visit Journal] We investigate a frequency comb source based on a mid-infrared quantum cascade laser at λ ∼9 μm with high power output. A broad flat-top gain with near-zero group velocity dispersion has been engineered using a dual-core active region structure. This favors the locking of the dispersed Fabry-Pérot modes into equally spaced frequency lines via four wave mixing. A current range with a narrow intermode beating linewidth of 3 kHz is identified with a fast detector and spectrum analyzer. This range corresponds to a broad spectral coverage of 65 cm⁻¹ and a high power output of 180 mW for ∼176 comb modes. [reprint (PDF)]
21.	Recent advances in MOCVD growth of InxGa1-xAsyP1-y alloys M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Recent advances in MOCVD growth of InxGa1-xAsyP1-y alloys, Journal of Crystal Growth, Volume 70, Issues 1–2, 1984, Pages 145-149,-- December 1, 1984 ...[Visit Journal] The low pressure metalorganic chemical vapour deposition (LPMOCVD) growth of GaxIn1-xAsyP1-y-InP lattice matched system, with high mobilities, sharp interfaces, low background doping densities, and the formation of a two-dimensional electron gas (2DEG) at the interfaces, has recently made spectacular advances, as in evidenced by the availability of high quality DH lasers, PIN photodiodes, and Gunn diodes. We present here some new results obtained on the above-mentioned material and devices. [reprint (PDF)]
21.	Back-illuminated solar-blind photodetectors for imaging applications R. McClintock, A. Yasan, K. Mayes, P. Kung, and M. Razeghi SPIE Conference, Jose, CA, Vol. 5732, pp.175-- January 22, 2005 ...[Visit Journal] Back-illuminated solar-blind ultraviolet p-i-n photodetectors and focal plane arrays are investigated. We initially study single-pixel devices and then discuss the hybridization to a read-out integrated circuit to form focal plane arrays for solar-blind UV imaging. [reprint (PDF)]
21.	Two‐dimensional electron gas in a In0.53Ga0.47As‐InP heterojunction grown by metalorganic chemical vapor deposition Y. Guldner; J. P. Vieren; P. Voisin; M. Voos; M. Razeghi; M. A. Poisson Y. Guldner, J. P. Vieren, P. Voisin, M. Voos, M. Razeghi, M. A. Poisson; Two‐dimensional electron gas in a In0.53Ga0.47As‐InP heterojunction grown by metalorganic chemical vapor deposition. Appl. Phys. Lett. 15 May 1982; 40 (10): 877–879.-- April 15, 1982 ...[Visit Journal] We report, from Shubnikov-de Haas and cyclotron resonance experiments, the first observation of a two-dimensional, high-mobility electron gas in a selectively doped 1110.53 G~l.47 As-InP heterojunction grown by metalorganic chemical vapor deposition. Several parameters of the electronic system under consideration are determined. [reprint (PDF)]
21.	Low-Threshold 7.3 μm Quantum Cascade Lasers Grown by Gas-Source Molecular Beam Epitaxy S. Slivken, A. Matlis, A. Rybaltowski, Z. Wu and M. Razeghi Applied Physics Letters 74 (19)-- May 19, 1999 ...[Visit Journal] We report low-threshold 7.3 μm superlattice-based quantum cascade lasers. The threshold current density is 3.4 kA/cm² at 300 K and 1.25 kA/cm² at 79 K in pulsed mode for narrow (∼20 μm), 2 mm-long laser diodes. The characteristic temperature (T₀) is 210 K. The slope efficiencies are 153 and 650 mW/A at 300 and 100 K, respectively. Power output is in excess of 100 mW at 300 K. Laser far-field intensity measurements give divergence angles of 64° and 29° in the growth direction and in the plane of the quantum wells, respectively. Far-field simulations show excellent agreement with the measured results. [reprint (PDF)]
21.	First GaInAsP‐InP double‐heterostructure laser emitting at 1.27 μm on a silicon substrate M. Razeghi; M. Defour; F. Omnes; Ph. Maurel; J. Chazelas; F. Brillouet Appl. Phys. Lett. 53, 725–727 (1988)-- June 21, 1988 ...[Visit Journal] We report the first successful room-temperature GalnAsP-InP double-heterostructure laser emitting at 1.27 pm, grown by low-pressure metalorganic chemical vapor deposition on a Si substrate. A pulsed threshold current density of 10 kAlcm2 at room temperature with an external quantum efficiency of 10% per facet and an output power of20 mW (for an oxidedefined stripe geometry with 12 pm stripe width and 250 pm cavity length) has been measured. The first aging test in pulse operation shows an increase of threshold current of only 7% for a cumulative time of 80 s at room temperature. [reprint (PDF)]
21.	High performance GaAs/GaInP heterostructure bipolar transistors grown by low-pressure metal-organic chemical vapour deposition M Razeghi, F Omnes, M Defour, P Maurel, J Hu, E Wolk and D Pavlidis M Razeghi et al 1990 Semicond. Sci. Technol. 5 278-- December 11, 1989 ...[Visit Journal] The authors report the fabrication of high-quality GaAs/GaInP n-p-n heterojunction bipolar transistors grown by low-pressure metal-organic chemical vapour deposition on semi-insulating substrates. Various structures with homogeneous and graded bases have been fabricated. Doping profiles together with X-ray double diffraction patterns demonstrate the excellent control of growth parameters such as thicknesses, doping levels and interface quality. The static characteristics of the devices show current gains as high as 400, which is the highest value reported in that system [reprint (PDF)]
21.	MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates M. Razeghi, M. Defour , F. Omnes, P. Maurel , E. Bigan , O. Acher, J. Nagle, F. Brillouet , J.C. Portal M. Razeghi, M. Defour, F. Omnes, P. Maurel, E. Bigan, O. Acher, J. Nagle, F. Brillouet, J.C. Portal, MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates, Journal of Crystal Growth, Volume 93, Issues 1–4, 1988, Pages 776-781,-- January 1, 1988 ...[Visit Journal] High quality II[-V semiconductor heterojunctions, quantum wells and superlauices have been grown on lattice matched and alternative substrates such as silicon for photonic and electronic devices, using low pressure metalorganic chemical vapor deposition growth technique. [reprint (PDF)]
21.	Quantum Dot Intersubband Photodetectors C. Jelen, M. Erdtmann, S. Kim, and M. Razeghi SPIE Conference, San Jose, CA, -- January 22, 2001 ...[Visit Journal] Quantum dots are recognized as very promising candidates for the fabrication of intersubband photodetectors in the infrared spectral range. At present, material quality is making rapid progress and some devices have been demonstrated. Examples of mid-infrared quantum dot intersubband photodetectors are presented along with device design and data analysis. Nonetheless, the performance of these devices remains less than comparable quantum well intersubband photodetectors due to difficulties in controlling the quantum dot size and distribution during epitaxy. [reprint (PDF)]
21.	High performance antimony based type-II superlattice photodiodes on GaAs substrates B.M. Nguyen, D. Hoffman, E.K. Huang, P.Y. Delaunay, and M. Razeghi SPIE Porceedings, Vol. 7298, Orlando, FL 2009, p. 72981T-- April 13, 2009 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattices grown on GaSb substrate have achieved significant advances in both structural design and material growth, making Type-II superlattice infrared detector a rival competitor to the state-of-the-art MCT technology. However, the limited size and strong infrared absorption of GaSb substrates prevent large format type-II superlattice infrared imagers from being realized. In this work, we demonstrate type-II superlattices grown on GaAs substrates, which is a significant step toward third generation infrared imaging at low cost. The device performances of Type-II superalttice photodetectors grown on these two substrates are compared. [reprint (PDF)]
21.	Avalanche Photodetector Based on InAs/InSb Superlattice Arash Dehzangi, Jiakai Li, Lakshay Gautam and Manijeh Razeghi Quantum rep. 2020, 2(4), 591-599; https://doi.org/10.3390/quantum2040041 (registering DOI)-- December 4, 2020 ...[Visit Journal] This work demonstrates a mid-wavelength infrared InAs/InSb superlattice avalanche photodiode (APD). The superlattice APD structure was grown by molecular beam epitaxy on GaSb substrate. The device exhibits a 100 % cut-off wavelength of 4.6 µm at 150 K and 4.30 µm at 77 K. At 150 and 77 K, the device responsivity reaches peak values of 2.49 and 2.32 A/W at 3.75 µm under −1.0 V applied bias, respectively. The device reveals an electron dominated avalanching mechanism with a gain value of 6 at 150 K and 7.4 at 77 K which was observed under −6.5 V bias voltage. The gain value was measured at different temperatures and different diode sizes. The electron and hole impact ionization coefficients were calculated and compared to give a better prospect of the performance of the device. [reprint (PDF)]
21.	Al_xGa_1-xN p-i-n Photodiodes on Sapphire Substrates D. Walker, P. Kung, P. Sandvik, J. Wu, M. Hamilton, I.H. Lee, J. Diaz, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] We report the fabrication and characterization of Al_xGa1-xN p-i-n photodiodes (0.05 ≤ to X ≤ 0.30) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The devices present a visible-rejection of about four orders of magnitude with a cutoff wavelength that shifts from 350 nm to 291 nm. They also exhibit a constant responsivity for five decades (30 mW/m² to 1 kW/m²) of optical power density. Using capacitance measurements, the values for the acceptor concentration in the p-Al_xGa_1-xN region and the unintentional donor concentration in the intrinsic region are found. Photocurrent decays are exponential for high load resistances, with a time constant that corresponds to the RC product of the system. For low load resistances the transient response becomes non-exponential, with a decay time longer than the RC constant. [reprint (PDF)]
21.	Growth and characterization of InAs/GaSb photoconductors for long wavelength infrared range H. Mohseni, E. Michel, J. Sandven, M. Razeghi, W. Mitchel, and G. Brown Applied Physics Letters 71 (10)-- September 8, 1997 ...[Visit Journal] In this letter we report the molecular beam epitaxial growth and characterization of InAs/GaSb superlattices grown on semi-insulating GaAs substrates for long wavelength infrared detectors. Photoconductive detectors fabricated from the superlattices showed photoresponse up to 12 µm and peak responsivity of 5.5 V/W with Johnson noise limited detectivity of 1.33 × 10⁹ cm·Hz^½/W at 10.3 µm at 78 K. [reprint (PDF)]

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