Center for Quantum Devices - Most Downloaded Journal Articles

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22.	Ultrafast Pulse Generation from Quantum Cascade Lasers Feihu Wang, Xiaoqiong Qi, Zhichao Chen, Manijeh Razeghi, and Sukhdeep Dhillon Wang, F.; Qi, X.; Chen, Z.; Razeghi, M.; Dhillon, S. Ultrafast Pulse Generation from Quantum Cascade Lasers. Micromachines 2022, 13, 2063. https://doi.org/10.3390/ mi13122063 ...[Visit Journal] Quantum cascade lasers (QCLs) have broken the spectral barriers of semiconductor lasers and enabled a range of applications in the mid-infrared (MIR) and terahertz (THz) regimes. However, until recently, generating ultrashort and intense pulses from QCLs has been difficult. This would be useful to study ultrafast processes in MIR and THz using the targeted wavelength-by-design properties of QCLs. Since the first demonstration in 2009, mode-locking of QCLs has undergone considerable development in the past decade, which includes revealing the underlying mechanism of pulse formation, the development of an ultrafast THz detection technique, and the invention of novel pulse compression technology, etc. Here, we review the history and recent progress of ultrafast pulse generation from QCLs in both the THz and MIR regimes. [reprint (PDF)]
22.	InGaAs/InGaP Quantum-Dot Photodetector with a High Detectivity H. Lim, S. Tsao, M. Taguchi, W. Zhang, A. Quivy and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 61270N-- January 23, 2006 ...[Visit Journal] Quantum-dot infrared photodetectors (QDIPs) have recently been considered as strong candidates for numerous applications such as night vision, space communication, gas analysis and medical diagnosis involving middle and long wavelength infrared (MWIR and LWIR respectively) operation. This is due to their unique properties arising from their 3-dimensional confinement potential that provides a discrete density of states. They are expected to outperform quantum-well infrared photodetectors (QWIPs) as a consequence of their natural sensitivity to normal incident radiation, their higher responsivity and their higher-temperature operation. So far, most of the QDIPs reported in the literature were based on the InAs/GaAs system and were grown by molecular beam epitaxy (MBE). Here, we report on the growth of a high detectivity InGaAs/InGaP QDIP grown on a GaAs substrate using low-pressure metalorganic chemical vapor deposition (MOCVD). [reprint (PDF)]
22.	Quantum hall effect and hopping conduction in InxGa1−xAs-InP heterojunctions at low temperature Y. Guldner, J.P. Hirtz, A. Briggs, J.P. Vieren, M. Voos, M. Razeghi Y. Guldner, J.P. Hirtz, A. Briggs, J.P. Vieren, M. Voos, M. Razeghi, Quantum hall effect and hopping conduction in InxGa1−xAs-InP heterojunctions at low temperature, Surface Science, Volume 142, Issues 1–3, 1984, Pages 179-181,-- July 1, 1984 ...[Visit Journal] We report investigations of the temperature dependence of the quantum Hall effect in modulation doped InxGa1−xAs-InP heterojunctions. The diagonal conductivity σxx is studied at several minima of the magneto-resistance ϱxx between 50 mK and 2 K. A hopping conduction mechanism is observed when the Fermi level is in the tail of the Landau levels. [reprint (PDF)]
22.	Fabrication of 12 µm pixel-pitch 1280 × 1024 extended short wavelength infrared focal plane array using heterojunction type-II superlattice-based photodetector Arash Dehzangi , Abbas Haddadi, Romain Chevallier, Yiyun Zhang and Manijeh Razegh Semicond. Sci. Technol. 34, 03LT01-- February 4, 2019 ...[Visit Journal] We present an initial demonstration of a 1280 × 1024 extended short-wavelength infrared focal plane array (FPA) imager with 12μm pixel-pitch based on type–II InAs/AlSb/GaSb superlattice heterojunction photodetectors, with a novel bandstructure-engineered photo-generated carrier extractor as the window layer in the hetero structure to efﬁciently extract the photo-generated carriers. This heterostructure with a larger bandgap top window/contact layer leads to the device having lower dark current density compared to conventional pn junction devices. The large format FPA was fabricated with 12 μm pixel-pitch using a developed fabrication process. Test pixels fabricated separately exhibit 100% cut–off wavelengths of ∼2.22, ∼2.34μm, and ∼2.45μm at 150, 200K, and 300K. The test devices achieve saturated quantum efﬁciency values under zero bias of 54.3% and 68.4% at 150 and 300K, under back-side illumination and without any anti-reﬂection coating. At 150K, these photodetectors exhibit dark current density of 1.63 × 10⁻⁷ A·cm⁻² under −20mV applied bias providing a speciﬁc detectivity of 1.01 × 10¹¹ cm ·Hz^½/W at 1.9μm. [reprint (PDF)]
22.	Al_xGa_1-xN (0 ≤ x ≤ 1) Ultraviolet Photodetectors Grown on Sapphire by Metal-organic Chemical-vapor Deposition D. Walker, X. Zhang, A. Saxler, P. Kung, J. Xu, and M. Razeghi Applied Physics Letters 70 (8)-- February 24, 1997 ...[Visit Journal] Al_xGa_1–xN (0 ≤ x ≤ 1) ultraviolet photoconductors with cutoff wavelengths from 365 to 200 nm have been fabricated and characterized. The maximum detectivity reached 5.5 × 10⁸ cm·Hz^1/2/W at a modulating frequency of 14 Hz. The effective majority carrier lifetime in Al_xGa_1–xN materials, derived from frequency-dependent photoconductivity measurements, has been estimated to be from 6 to 35 ms. The frequency-dependent noise spectrum shows that it is dominated by Johnson noise at high frequencies for low-Al-composition samples. [reprint (PDF)]
22.	1-5 jim ROOM-TEMPERATURE PULSED OPERATION OF GalnAsP/lnP DOUBLE HETEROSTRUCTURE GROWN BY LP MOCVD Manijeh Razeghi, P. Hirtz, J.P. Larivain, R. Blondeau, B. de Crémoux, J.P. Duchemin, ELECTRONICS LETTERS, vol. 17, no.18-- September 3, 1981 ...[Visit Journal] The letter reports the first successful room-temperature pulsed operation of a broad-area contact laser of GaInAsP/InP double heterostructure, grown by LP MOCVD, emitting at 1.5 μm. Pulsed thresholds as low as 2.5 kA/cm2 have been obtained for 1.5 μm, for an active layer thickness of 0.48 μm. This is equal to a current density per micrometre of 5.2 kA cm−2 μm−1. InxGa1−xAsyP1−y, III, III, V, V alloys are of great interest for use in infra-red devices. They can be grown lattice matched on InP over a wide range of compositions. The resulting bandgap (1.35–0.75 eV) covers a spectral range which contains the region of lowest losses and lowest dispersion in modern optical fibres. This property makes In1−xGaxASyP1−y, very attractive as a semiconductor laser and detector material for future fibre communication systems. [reprint (PDF)]
22.	Background Limited Performance in p-doped GaAs/Ga[0.71]In[0.29]As[0.39]P[0.61] Quantum Well Infrared Photodetectors J. Hoff, S. Kim, M. Erdtmann, R. Williams, J. Piotrowski, E. Bigan, M. Razeghi and G. Brown Applied Physics Letters 67 (1)-- July 3, 1995 ...[Visit Journal] Background limited infrared photodetection has been achieved up to 100 K at normal incidence with p-type GaAs/Ga_0.71In_0.29As_0.39P_0.61 quantum well intersubband photodetectors grown by low-pressure metalorganic chemical vapor deposition. Photoresponse covers the wavelength range from 2.5 μm up to 7 μm. The device shows photovoltaic response, the cutoff wavelength increases slightly with bias, and the responsivity increases nonlinearly with bias. These effects are attributed to an asymmetric quantum well profile. [reprint (PDF)]
22.	Nickel oxide growth on Si (111), c-Al₂O₃ and FTO/glass by pulsed laser deposition V. E. Sandana ; D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; R. McClintock ; M. Razeghi 03/07/2014-- March 7, 2014 ...[Visit Journal] NiO was grown on Si (111), c-Al₂O₃ and FTO/glass substrates by pulsed laser deposition (PLD). X-Ray Diffraction (XRD) and scanning electron microscope (SEM) studies revealed that layers grown on c-Al₂O₃ were fcc NiO with a dense morphology of cubic grains that were strongly (111) oriented along the growth direction. The relatively low ω rocking curve linewidth, of 0.12°suggests that there may have been epitaxial growth on the c-Al₂O₃ substrate. XRD and SEM indicated that films grown on Si (111) were also fcc NiO, with cubic grains, but that the grain orientation was random. This is consistent with the presence of an amorphous SiO₂ layer at the surface of the Si substrate, which precluded epitaxial growth. NiO grown at lower temperature (200°C) on temperature-sensitive FTO/glass substrates showed no evidence of crystallinity in XRD and SEM studies. After flash annealing in air, however, peaks characteristic of randomly oriented fcc NiO appeared in the XRD scans and the surface morphology became more granular in appearance. Such layers appear promising for the development of future dye-sensitised solar cell devices based on NiO grown by PLD. [reprint (PDF)]
22.	Tight-binding theory for the thermal evolution of optical band gaps in semiconductors and superlattices S. Abdollahi Pour, B. Movaghar, and M. Razeghi American Physical Review, Vol. 83, No. 11, p. 115331-1-- March 15, 2011 ...[Visit Journal] A method to handle the variation of the band gap with temperature in direct band-gap III–V semiconductors and superlattices using an empirical tight-binding method has been developed. The approach follows closely established procedures and allows parameter variations which give rise to perfect fits to the experimental data. We also apply the tight-binding method to the far more complex problem of band structures in Type-II infrared superlattices for which we have access to original experimental data recently acquired by our group. Given the close packing of bands in small band-gap Type-II designs, k·p methods become difficult to handle, and it turns out that the sp3s* tight-binding scheme is a practical and powerful asset. Other approaches to band-gap shrinkage explored in the past are discussed, scrutinized, and compared. This includes the lattice expansion term, the phonon softening mechanism, and the electron-phonon polaronic shifts calculated in perturbation theory. [reprint (PDF)]
22.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
22.	Thermal stability of GaN thin films grown on (0001) Al₂O₃, (0112) Al₂O₃ and (0001)Si 6H-SiC substrates C.J. Sun, P. Kung, A. Saxler, H. Ohsato, E. Bigan, M. Razeghi, and D.K. Gaskill Journal of Applied Physics 76 (1)-- July 1, 1994 ...[Visit Journal] Single crystals of GaN were grown on (0001), (0112) Al₂O₃ and (0001)Si 6H‐SiC substrates using an atmospheric pressure metalorganic chemical‐vapor‐deposition reactor. The relationship has been studied between the thermal stability of the GaN films and the substrate’s surface polarity. It appeared that the N‐terminated (0001) GaN surface grown on (0001)Si 6H‐SiC has the most stable surface, followed by the nonpolar (1120) GaN surface grown on (0112) Al₂O₃, while the Ga‐terminated (0001) GaN surface grown on (0001) Al₂O₃ has the least stable surface. This is explained with the difference in the atomic configuration of each of these surfaces which induces a difference in their thermal decomposition. [reprint (PDF)]
22.	Dark current suppression in Type-II InAs/GaSb superlattice long wavelength infrared photodiodes with M-structure barrier B.M. Nguyen, D. Hoffman, P.Y. Delaunay, and M. Razeghi Applied Physics Letters, Vol. 91, No. 16, p. 163511-1-- October 15, 2007 ...[Visit Journal] We presented an alternative design of Type-II superlattice photodiodes with the insertion of a mid-wavelength infrared M-structure AlSb/GaSb/InAs/GaSb/AlSb superlattice for the reduction of dark current. The M-structure superlattice has a larger carrier effective mass and a greater band discontinuity as compared to the standard Type-II superlattices at the valence band. It acts as an effective medium that weakens the diffusion and tunneling transport at the depletion region. As a result, a 10.5 µm cutoff Type-II superlattice with 500 nm M-superlattice barrier exhibited a R₀A of 200 cm² at 77 K, approximately one order of magnitude higher than the design without the barrier. The quantum efficiency of such structures does not show dependence on either barrier thickness or applied bias. [reprint (PDF)]
22.	Polarization-free GaN emitters in the ultraviolet and visible spectra via heterointegration on CMOS-compatible Si (100) C. Bayram, J. Ott, K. T. Shiu, C. W. Cheng, Y. Zhu, J. Kim, D. K. Sadana, M. Razeghi Proc. SPIE 9370, Quantum Sensing and Nanophotonic Devices XII, 93702F -- February 8, 2015 ...[Visit Journal] This work presents a new type of polarization-free GaN emitter. The unique aspect of this work is that the ultraviolet and visible emission originates from the cubic phase GaN and the cubic phase InGaN/GaN multi-quantum-wells, respectively. Conventionally, GaN emitters (e.g. light emitting diodes, laser diodes) are wurtzite phase thus strong polarization fields exist across the structure contributing to the “droop” behavior – a phenomenon defined as “the reduction in emitter efficiency as injection current increases”. The elimination of piezoelectric fields in GaN-based emitters as proposed in this work provide the potential for achieving a 100% internal efficiency and might lead to droopfree light emitting diodes. In addition, this work demonstrates co-integration of GaN emitters on cheap and scalable CMOS-compatible Si (100) substrate, which yields possibility of realizing a GaN laser diode uniquely – via forming mirrors along the naturally occurring cubic phase GaN-Si(100) cleavage planes. [reprint (PDF)]
22.	Quantum Sensing Using Type-II InAs/GaSb Superlattice for Infrared Detection M. Razeghi, A. Gin, Y. Wei, J. Bae, and J. Nah Microelectronics Journal, 34 (5-8)-- May 1, 2003 ...[Visit Journal] Large, regular arrays of bulk GaSb and InAs/GaSb Type-II superlattice pillars have been fabricated by electron beam lithography and dry etching. A 2.5 keV electron beam lithography system and metal evaporation are used to form the Au mask on superlattice and bulk substrates. Dry etching of these materials has been developed with BCl3:Ar, CH4:H2:Ar and cyclic CH₄:H₂:Ar/O₂ plasmas. Etch temperatures were varied from 20 to 150 °C. The diameter of the superlattice pillars was below 50 nm with regular 200 nm spacing. Bulk GaSb pillars were etched with diameters below 20 nm. Areas of dense nanopillars as large as 500 μm×500 μm were fabricated. The best height/diameter aspect ratio was approximately 10:1. To date, these are the smallest diameter III–V superlattice pillar structures reported, and the first nanopillars in the InAs/GaSb material system. The basic theory of these devices and surface passivation with SiO₂ and Si₃N₄ thin films has also been discussed. [reprint (PDF)]
22.	High Power Mid-Infrared Quantum Cascade Lasers Grown on GaAs Steven Slivken and Manijeh Razeghi Photonics 2022, 9(4), 231 (COVER ARTICLE) ...[Visit Journal] The motivation behind this work is to show that InP-based intersubband lasers with high power can be realized on substrates with significant lattice mismatch. This is a primary concern for the integration of mid-infrared active optoelectronic devices on low-cost photonic platforms, such as Si. As evidence, an InP-based mid-infrared quantum cascade laser structure was grown on a GaAs substrate, which has a large (4%) lattice mismatch with respect to InP. Prior to laser core growth, a metamorphic buffer layer of InP was grown directly on a GaAs substrate to adjust the lattice constant. Wafer characterization data are given to establish general material characteristics. A simple fabrication procedure leads to lasers with high peak power (>14 W) at room temperature. These results are extremely promising for direct quantum cascade laser growth on Si substrates. [reprint (PDF)]
22.	Positive and negative luminescence in binary Type-II InAs/GaSb superlattice photodiodes D. Hoffman and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 61271H-- January 23, 2006 ...[Visit Journal] In the present work, we show measurements of both positive and negative luminescence of binary Type-II InAs/GaSb superlattice photodiodes in the 3 to 13 μm spectral range. Through a radiometric calibration technique, we demonstrate temperature independent negative luminescence efficiencies of 45 % in the midwavelength (MWIR) sample from 220 K to 320 K without anti-reflective coating and values reaching 35 % in the long wavelength infrared (LWIR) spectrum sample. [reprint (PDF)]
22.	Room temperature operation of In_xGa_1-xSb/InAs type-II quantum well infrared photodetectors grown by MOCVD D. H. Wu, Y. Y. Zhang, and M. Razeghi Applied Physics Letters 112, 111103-- March 14, 2018 ...[Visit Journal] We demonstrate room temperature operation of In_0.5Ga_0.5Sb/InAs type-II quantum well photodetectors on InAs substrate grown by metal-organic chemical vapor deposition. At 300 K, the detector exhibits a dark current density of 0.12 A/cm², peak responsivity of 0.72 A/W corresponding to a quantum efficiency of 23.3%, with calculated specific detectivity of 2.4×10⁹ cm.Hz^1/2/W at 3.81 μm. [reprint (PDF)]
22.	Engineering future light emitting diodes and photovoltaics with inexpensive materials: Integrating ZnO and Si into GaN-based devices C. Bayram ; K. T. Shiu ; Y. Zhu ; C. W. Cheng ; D. K. Sadana ; F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; Y. Zhang ; S. Gautier ; C.-Y. Cho ; E. Cicek ; Z. Vashaei ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86260L (March 18, 2013)-- March 18, 2013 ...[Visit Journal] Indium Gallium Nitride (InGaN) based PV have the best fit to the solar spectrum of any alloy system and emerging LED lighting based on InGaN technology and has the potential to reduce energy consumption by nearly one half while enabling significant carbon emission reduction. However, getting the maximum benefit from GaN diode -based PV and LEDs will require wide-scale adoption. A key bottleneck for this is the device cost, which is currently dominated by the substrate (i.e. sapphire) and the epitaxy (i.e. GaN). This work investigates two schemes for reducing such costs. First, we investigated the integration of Zinc Oxide (ZnO) in InGaN-based diodes. (Successful growth of GaN on ZnO template layers (on sapphire) was illustrated. These templates can then be used as sacrificial release layers for chemical lift-off. Such an approach provides an alternative to laser lift-off for the transfer of GaN to substrates with a superior cost-performance profile, plus an added advantage of reclaiming the expensive single-crystal sapphire. It was also illustrated that substitution of low temperature n-type ZnO for n-GaN layers can combat indium leakage from InGaN quantum well active layers in inverted p-n junction structures. The ZnO overlayers can also double as transparent contacts with a nanostructured surface which enhances light in/out coupling. Thus ZnO was confirmed to be an effective GaN substitute which offers added flexibility in device design and can be used in order to simultaneously reduce the epitaxial cost and boost the device performance. Second, we investigated the use of GaN templates on patterned Silicon (100) substrates for reduced substrate cost LED applications. Controlled local metal organic chemical vapor deposition epitaxy of cubic phase GaN with on-axis Si(100) substrates was illustrated. Scanning electron microscopy and transmission electron microscopy techniques were used to investigate uniformity and examine the defect structure in the GaN. Our results suggest that groove structures are very promising for controlled local epitaxy of cubic phase GaN. Overall, it is concluded that there are significant opportunities for cost reduction in novel hybrid diodes based on ZnO-InGaN-Si hybridization. [reprint (PDF)]
22.	High power InAsSb/InPAsSb/InAs mid-infrared lasers A. Rybaltowski, Y. Xiao, D. Wu, B. Lane, H. Yi, H. Feng, J. Diaz, and M. Razeghi Applied Physics Letters 71 (17)-- October 27, 1997 ...[Visit Journal] We demonstrate high-power InAsSb/InPAsSb laser bars (λ ≈ 3.2 μm) consisting of three 100 μm-wide laser stripes of 700 μm cavity length, with peak output power up to 3 W at 90 K, and far-fields for the direction perpendicular to the junction as narrow as 12° full width half maximum. Spectra and far-field patterns of the laser bars are shown to have excellent characteristics for a wide range of operating conditions, suggesting the possibility of even higher light power emission with good beam quality. Joule heating is shown to be the major factor limiting higher power operation. [reprint (PDF)]
22.	Aluminum gallium nitride short-period superlattices doped with magnesium A. Saxler, W.C. Mitchel, P. Kung and M. Razeghi Applied Physics Letters 74 (14)-- April 9, 1999 ...[Visit Journal] Short-period superlattices consisting of alternating layers of GaN:Mg and AlGaN:Mg were grown by low-pressure organometallic vapor phase epitaxy. The electrical properties of these superlattices were measured as a function of temperature and compared to conventional AlGaN:Mg layers. It is shown that the optical absorption edge can be shifted to shorter wavelengths while lowering the acceptor ionization energy by using short-period superlattice structures instead of bulk-like AlGaN:Mg. [reprint (PDF)]
22.	Background limited performance of long wavelength infrared focal plane arrays fabricated from M-structure InAs/GaSb superlattices P.Y. Delaunay, B.M. Nguyen, D. Hoffman, E.K. Huang, P. Manurkar, S. Bogdanov and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-0W-- January 26, 2009 ...[Visit Journal] Recent advances in the design and fabrication of Type-II InAs/GaSb superlattices allowed the realization of high performance long wavelength infrared focal plane arrays. The introduction of an Mstructure barrier between the n-type contact and the pi active region reduced the tunneling component of the dark current. The M-structure design improved the noise performance and the dynamic range of FPAs at low temperatures. At 81K, the NEDT of the focal plane array was 23 mK. The noise of the camera was dominated by the noise component due to the read out integrated circuit. At 8 µm, the median quantum efficiency of the detectors was 71%, mainly limited by the reflections on the backside of the array. [reprint (PDF)]
22.	High Quality Type-II InAs/GaSb Superlattices with Cutoff Wavelength ~3.7 µm Using Interface Engineering Y. Wei, J. Bae, A. Gin, A. Hood, M. Razeghi, G.J. Brown, and M. Tidrow Journal of Applied Physics, 94 (7)-- October 1, 2003 ...[Visit Journal] We report the most recent advance in the area of Type-II InAs/GaSb superlattices that have cutoff wavelength of ~3.7 µm. With Ga_xIn_1–x type interface engineering techniques, the mismatch between the superlattices and the GaSb (001) substrate has been reduced to <0.1%. There is no evidence of dislocations using the best examination tools of x-ray, atomic force microscopy, and transmission electron microscopy. The full width half maximum of the photoluminescence peak at 11 K was ~4.5 meV using an Ar+ ion laser (514 nm) at fluent power of 140 mW. The integrated photoluminescence intensity was linearly dependent on the fluent laser power from 2.2 to 140 mW at 11 K. The temperature-dependent photoluminescence measurement revealed a characteristic temperature of one T1 = 245 K at sample temperatures below 160 K with fluent power of 70 mW, and T1 = 203 K for sample temperatures above 180 K with fluent power of 70 and 420 mW. [reprint (PDF)]
22.	High efficiency quantum cascade laser frequency comb Quanyong Lu, Donghai Wu, Steven Slivken & Manijeh Razeghi Scientific Reports 7, Article number: 43806-- March 6, 2017 ...[Visit Journal] An efficient mid-infrared frequency comb source is of great interest to high speed, high resolution spectroscopy and metrology. Here we demonstrate a mid-IR quantum cascade laser frequency comb with a high power output and narrow beatnote linewidth at room temperature. The active region was designed with a strong-coupling between the injector and the upper lasing level for high internal quantum efficiency and a broadband gain. The group velocity dispersion was engineered for efficient, broadband mode-locking via four wave mixing. The comb device exhibits a narrow intermode beatnote linewidth of 50.5 Hz and a maximum wall-plug efficiency of 6.5% covering a spectral coverage of 110 cm⁻¹ at λ ~ 8 μm. The efficiency is improved by a factor of 6 compared with previous demonstrations. The high power efficiency and narrow beatnote linewidth will greatly expand the applications of quantum cascade laser frequency combs including high-precision remote sensing and spectroscopy. [reprint (PDF)]
22.	Resonant cavity enhanced heterojunction phototransistors based on type-II superlattices Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi Infrared Physics & Technology Available online 27 October 2020, 103552 https://doi.org/10.1016/j.infrared.2020.103552-- October 27, 2020 ...[Visit Journal] Resonant cavity enhanced heterojunction phototransistor based on InAs/GaSb/AlSb type-II superlattice grown by molecular beam epitaxy has been demonstrated. The resonant wavelength was designed to be at near 1.9 μm wavelength range at room temperature. An eleven-pair lattice matched GaSb-AlAsSb quarter-wavelength Bragg reflector was used in the RCE-HPT to enhance the photoresponse. The device showed the wavelength selectivity and a cavity enhancement of the responsivity at 1.9 μm at room temperature. [reprint (PDF)]
22.	Demonstration of negative differential resistance in GaN/AlN resonant tunneling didoes at room temperature Z. Vashaei, C. Bayram and M. Razeghi Journal of Applied Physics, Vol. 107, No. 8, p. 083505-- April 15, 2010 ...[Visit Journal] GaN/AlN resonant tunneling diodes (RTD) were grown by metal-organic chemical vapor deposition (MOCVD) and negative differential resistance with peak-to-valley ratios as high as 2.15 at room temperature was demonstrated. Effect of material quality on RTDs’ performance was investigated by growing RTD structures on AlN, GaN, and lateral epitaxial overgrowth GaN templates. Our results reveal that negative differential resistance characteristics of RTDs are very sensitive to material quality (such as surface roughness) and MOCVD is a suitable technique for III-nitride-based quantum devices. [reprint (PDF)]

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