Center for Quantum Devices - Most Downloaded Journal Articles

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23.	Type II superlattice infrared detectors and focal plane arrays Vaidya Nathan; Manijeh Razeghi Proc. SPIE 6542, Infrared Technology and Applications XXXIII, 654209 (May 14, 2007)-- May 14, 2007 ...[Visit Journal] Type II superlattce photodetectors have recently experienced significant improvements in both theoretical structure design and experimental realization. Empirical Tight Binding Method is initiated and developed for Type II superlattice. Growth characteristics such as group V segregation and incorporation phenomena are taken into account in the model and shown higher precision. A new Type II structure, called M-structure, is introduced and theoretically demonstrated high R₀A, high quantum efficiency. Device design is optimized to improve the performance. As a result, 55% quantum efficiency and 10 Ohm·cm² R₀A are achieved for an 11.7 μm cut-off photodetector at 77K. FPA imaging at longwavelength is demonstrated with a capability of imaging up to 171K. At 81K, the noise equivalent temperature difference presented a peak at 0.33K. [reprint (PDF)]
23.	Performance enhancement of GaN ultraviolet avalanche photodiodes with p-type delta-doping C. Bayram, J.L. Pau, R. McClintock and M. Razeghi Applied Physics Letters, Vol. 92, No. 24, p. 241103-1-- June 16, 2008 ...[Visit Journal] High quality delta-doped p-GaN is used as a means of improving the performance of back-illuminated GaN avalanche photodiodes (APDs). Devices with delta-doped p-GaN show consistently lower leakage current and lower breakdown voltage than those with bulk p-GaN. APDs with delta-doped p-GaN also achieve a maximum multiplication gain of 5.1×10⁴, more than 50 times higher than that obtained in devices with bulk p-GaN. The better device performance of APDs with delta-doped p-GaN is attributed to the higher structural quality of the p-GaN layer achieved via delta-doping. [reprint (PDF)]
23.	High power, continuous wave, room temperature operation of λ ~ 3.4 μm and λ ~ 3.55 μm InP-based quantum cascade lasers N. Bandyopadhyay, S. Slivken, Y. Bai and M. Razeghi Applied Physics Letters, Vol. 100, No. 21, p. 212104-1-- May 21, 2012 ...[Visit Journal] We report two highly strain-balanced InP-based AlInAs/GaInAs quantum cascade lasers emitting near 3.39 and 3.56 . A pulsed threshold current density of only 1.1 kA/cm² has been achieved at room temperature for both lasers with characteristic temperatures (T₀) of 166 K and 152 K, respectively. The slope efficiency is also relatively temperature insensitive with characteristic temperatures (T₁) of 116 K and 191 K, respectively. Continuous wave powers of 504 mW and 576 mW are obtained at room temperature, respectively. This was accomplished without buried ridge processing. [reprint (PDF)]
23.	Demonstration of long wavelength infrared Type-II InAs/InAs_1-xSb_x superlattices photodiodes on GaSb substrate grown by metalorganic chemical vapor deposition D. H. Wu, A. Dehzangi, Y. Y. Zhang, M. Razeghi Applied Physics Letters 112, 241103-- June 12, 2018 ...[Visit Journal] We report the growth and characterization of long wavelength infrared type-II InAs/InAs_1−xSb_x superlattices photodiodes with a 50% cut-off wavelength at 8.0 μm on GaSb substrate grown by metalorganic chemical vapor deposition. At 77 K, the photodiodes exhibited a differential resistance at zero bias (R₀A) 8.0 Ω·cm², peak responsivity of 1.26 A/W corresponding to a quantum efficiency of 21%. A specific detectivity of 5.4×10¹⁰ cm·Hz^1/2/W was achieved at 7.5 μm. [reprint (PDF)]
23.	Multi-color 4–20 μm In-P-based Quantum Well Infrared Photodetectors C. Jelen, S. Slivken, G.J. Brown, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] In order to tune the wavelength of lattice-matched QWIP detectors over the range from 4 - 20 &mum, new designs are demonstrated for the first time which combine InGaAlAs and InGaAsP layers lattice-matched to InP and grown by gas-source molecular beam epitaxy. We demonstrate the first long-wavelength quantum well infrared photodetectors using the lattice-matched n-doped InGaAlAs/InP materials system. Samples with AlAs mole fractions of 0.0, 0.1, and 0.15 result in cutoff wavelengths of 8.5, 13.3, and 19.4 μm, respectively. A 45 degree facet coupled illumination responsivity of R equals 0.37 A/W and detectivity of D*(λ) equals 1x10⁹ cm·Hz^½·W^-1 at T = 77 K, for a cutoff wavelength λ_c equals 13.3 μm have been achieved. Based on the measured intersubband photoresponse wavelength, a null conduction band offset is expected for In_0.52Ga_0.21Al_0.27As/InP heterojunctions. We also report quantum well infrared photodetector structures of In_0.53Ga_0.47As/Al_0.48In_0.52As grown on InP substrate with photoresponse at 4 μm suitable for mid-wavelength infrared detectors. These detectors exhibit a constant peak responsivity of 30 mA/W independent of temperature in the range from T equals 77 K to T equals 200 K. Combining these two materials, we report the first multispectral detectors that combine lattice-matched quantum wells of InGaAs/InAlAs and InGaAs/InP. Utilizing two contacts, a voltage tunable detector with (lambda) p equals 8 micrometer at a bias of V equals 5 V and λ_p equals 4 μm at V equals 10 V is demonstrated. [reprint (PDF)]
23.	Optimized structure for InGaAsP/GaAs 808nm high power lasers H. Yi, J. Diaz, L.J. Wang, I. Eliashevich, S. Kim, R. Williams, M. Erdtmann, X. He, E. Kolev and M. Razeghi Applied Physics Letters 66 (24)-- June 12, 1995 ...[Visit Journal] The optimized structure for the InGaAsP/GaAs quaternary material lasers (λ=0.808 μm) is investigated for the most efficient high‐power operation through an experiment and theoretical study. A comparative study is performed of threshold current density J_th and differential efficiency η_d dependence on cavity length (L) for two different laser structures with different active layer thickness (150 and 300 Å) as well as for laser structures with different multiple quantum well structures. A theoretical model with a more accurate formulation for minority leakage phenomenon provides explanation for the experimental results and sets general optimization rules for other lasers with similar restrictions on the band gap and refractive index difference between the active layer and the cladding layers. [reprint (PDF)]
23.	EPR STUDY OF Mn 2. AROUND THE FERROELASTIC TRANSITION POINT OF Pb3(PO4)2 M. Razeghi, B. Houlier and M. Yuste M. Razeghi et al. EPR STUDY OF Mn 2. AROUND THE FERROELASTIC TRANSITION POINT OF Pb3(PO4)2, Solid State Communications, Vol. 26, pp. 665-668. -- January 26, 1978 ...[Visit Journal] The spin Hamiltonian parameters of Mn 2÷ have been measured above and below the transition point (180"C) of the lead phosphate. They show that Mn 2+ substitutes a Pbl ion. Between 175 and 180vC the principal axis OX of the fine tensor is parallel to the wave vector of the soft mode which condensates at the transition point. An exaltation of the linewidth is observed. The linewidth remains constant within 50C of Te; in this temperature range, the "static regime" is achieved, and the correlation time of the fluctuations is less than 10 -s sec. [reprint (PDF)]
23.	Type-II ‘M’ Structure Photodiodes: An Alternative Material Design for Mid-Wave to Long Wavelength Infrared Regimes B-M. Nguyen, M. Razeghi, V. Nathan, and G.J. Brown SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices IV, Vol. 6479, p. 64790S-1-10-- January 29, 2007 ...[Visit Journal] In this work, an AlSb-containing Type-II InAs/GaSb superlattice, the so-called M-structure, is presented as a candidate for mid and long wavelength infrared detection devices. The effect of inserting an AlSb barrier in the GaSb layer is discussed and predicts many promising properties relevant to practical use. A good agreement between the theoretical calculation based on Empirical Tight Binding Method framework and experimental results is observed, showing the feasibility of the structure and its properties. A band gap engineering method without material stress constraint is proposed. [reprint (PDF)]
23.	InSb Infrared Photodetectors on Si Substrates Grown by Molecular Beam Epitaxy E. Michel, J. Xu, J.D. Kim, I. Ferguson, and M. Razeghi IEEE Photonics Technology Letters 8 (5) pp. 673-- May 1, 1996 ...[Visit Journal] The InSb infrared photodetectors grown heteroepitaxially on Si substrates by molecular beam epitaxy (MBE) are reported. Excellent InSb material quality is obtained on 3-in Si substrates (with a GaAs predeposition) as confirmed by structural, optical, and electrical analysis. InSb infrared photodetectors on Si substrates that can operate from 77 K to room temperature have been demonstrated. The peak voltage-responsitivity at 4 μm is about 1.0×10³ V/W and the corresponding Johnson-noise-limited detectivity is calculated to be 2.8×10¹⁰ cm·Hz^½/W. This is the first important stage in developing InSb detector arrays or monolithic focal plane arrays (FPAs) on silicon. The development of this technology could provide a challenge to traditional hybrid FPA's in the future. [reprint (PDF)]
23.	Extended short-wavelength infrared nBn photodetectors based on type-II InAs/AlSb/GaSb superlattices with an AlAsSb/GaSb superlattice barrier A. Haddadi, R. Chevallier, A. Dehzangi, and M. Razeghi Applied Physics Letters 110, 101104-- March 8, 2017 ...[Visit Journal] Extended short-wavelength infrared nBn photodetectors based on type-II InAs/AlSb/GaSb superlattices on GaSb substrate have been demonstrated. An AlAsSb/GaSb H-structure superlattice design was used as the large-bandgap electron-barrier in these photodetectors. The photodetector is designed to have a 100% cut-off wavelength of ∼2.8 μm at 300 K. The photodetector exhibited a room-temperature (300 K) peak responsivity of 0.65 A/W at 1.9 μm, corresponding to a quantum efficiency of 41% at zero bias under front-side illumination, without any anti-reflection coating. With an R × A of 78 Ω·cm² and a dark current density of 8 × 10⁻³ A/cm² under −400 mV applied bias at 300 K, the nBn photodetector exhibited a specific detectivity of 1.51 × 10¹⁰ Jones. At 150 K, the photodetector exhibited a dark current density of 9.5 × 10⁻⁹ A/cm² and a quantum efficiency of 50%, resulting in a detectivity of 1.12 × 10¹³ Jones. [reprint (PDF)]
22.	Al_xGa_1-xN (0 ≤ x ≤ 1) Ultraviolet Photodetectors Grown on Sapphire by Metal-organic Chemical-vapor Deposition D. Walker, X. Zhang, A. Saxler, P. Kung, J. Xu, and M. Razeghi Applied Physics Letters 70 (8)-- February 24, 1997 ...[Visit Journal] Al_xGa_1–xN (0 ≤ x ≤ 1) ultraviolet photoconductors with cutoff wavelengths from 365 to 200 nm have been fabricated and characterized. The maximum detectivity reached 5.5 × 10⁸ cm·Hz^1/2/W at a modulating frequency of 14 Hz. The effective majority carrier lifetime in Al_xGa_1–xN materials, derived from frequency-dependent photoconductivity measurements, has been estimated to be from 6 to 35 ms. The frequency-dependent noise spectrum shows that it is dominated by Johnson noise at high frequencies for low-Al-composition samples. [reprint (PDF)]
22.	Ultrafast Pulse Generation from Quantum Cascade Lasers Feihu Wang, Xiaoqiong Qi, Zhichao Chen, Manijeh Razeghi, and Sukhdeep Dhillon Wang, F.; Qi, X.; Chen, Z.; Razeghi, M.; Dhillon, S. Ultrafast Pulse Generation from Quantum Cascade Lasers. Micromachines 2022, 13, 2063. https://doi.org/10.3390/ mi13122063 ...[Visit Journal] Quantum cascade lasers (QCLs) have broken the spectral barriers of semiconductor lasers and enabled a range of applications in the mid-infrared (MIR) and terahertz (THz) regimes. However, until recently, generating ultrashort and intense pulses from QCLs has been difficult. This would be useful to study ultrafast processes in MIR and THz using the targeted wavelength-by-design properties of QCLs. Since the first demonstration in 2009, mode-locking of QCLs has undergone considerable development in the past decade, which includes revealing the underlying mechanism of pulse formation, the development of an ultrafast THz detection technique, and the invention of novel pulse compression technology, etc. Here, we review the history and recent progress of ultrafast pulse generation from QCLs in both the THz and MIR regimes. [reprint (PDF)]
22.	InGaAs/InGaP Quantum-Dot Photodetector with a High Detectivity H. Lim, S. Tsao, M. Taguchi, W. Zhang, A. Quivy and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 61270N-- January 23, 2006 ...[Visit Journal] Quantum-dot infrared photodetectors (QDIPs) have recently been considered as strong candidates for numerous applications such as night vision, space communication, gas analysis and medical diagnosis involving middle and long wavelength infrared (MWIR and LWIR respectively) operation. This is due to their unique properties arising from their 3-dimensional confinement potential that provides a discrete density of states. They are expected to outperform quantum-well infrared photodetectors (QWIPs) as a consequence of their natural sensitivity to normal incident radiation, their higher responsivity and their higher-temperature operation. So far, most of the QDIPs reported in the literature were based on the InAs/GaAs system and were grown by molecular beam epitaxy (MBE). Here, we report on the growth of a high detectivity InGaAs/InGaP QDIP grown on a GaAs substrate using low-pressure metalorganic chemical vapor deposition (MOCVD). [reprint (PDF)]
22.	Background Limited Performance in p-doped GaAs/Ga[0.71]In[0.29]As[0.39]P[0.61] Quantum Well Infrared Photodetectors J. Hoff, S. Kim, M. Erdtmann, R. Williams, J. Piotrowski, E. Bigan, M. Razeghi and G. Brown Applied Physics Letters 67 (1)-- July 3, 1995 ...[Visit Journal] Background limited infrared photodetection has been achieved up to 100 K at normal incidence with p-type GaAs/Ga_0.71In_0.29As_0.39P_0.61 quantum well intersubband photodetectors grown by low-pressure metalorganic chemical vapor deposition. Photoresponse covers the wavelength range from 2.5 μm up to 7 μm. The device shows photovoltaic response, the cutoff wavelength increases slightly with bias, and the responsivity increases nonlinearly with bias. These effects are attributed to an asymmetric quantum well profile. [reprint (PDF)]
22.	1-5 jim ROOM-TEMPERATURE PULSED OPERATION OF GalnAsP/lnP DOUBLE HETEROSTRUCTURE GROWN BY LP MOCVD Manijeh Razeghi, P. Hirtz, J.P. Larivain, R. Blondeau, B. de Crémoux, J.P. Duchemin, ELECTRONICS LETTERS, vol. 17, no.18-- September 3, 1981 ...[Visit Journal] The letter reports the first successful room-temperature pulsed operation of a broad-area contact laser of GaInAsP/InP double heterostructure, grown by LP MOCVD, emitting at 1.5 μm. Pulsed thresholds as low as 2.5 kA/cm2 have been obtained for 1.5 μm, for an active layer thickness of 0.48 μm. This is equal to a current density per micrometre of 5.2 kA cm−2 μm−1. InxGa1−xAsyP1−y, III, III, V, V alloys are of great interest for use in infra-red devices. They can be grown lattice matched on InP over a wide range of compositions. The resulting bandgap (1.35–0.75 eV) covers a spectral range which contains the region of lowest losses and lowest dispersion in modern optical fibres. This property makes In1−xGaxASyP1−y, very attractive as a semiconductor laser and detector material for future fibre communication systems. [reprint (PDF)]
22.	Quantum hall effect and hopping conduction in InxGa1−xAs-InP heterojunctions at low temperature Y. Guldner, J.P. Hirtz, A. Briggs, J.P. Vieren, M. Voos, M. Razeghi Y. Guldner, J.P. Hirtz, A. Briggs, J.P. Vieren, M. Voos, M. Razeghi, Quantum hall effect and hopping conduction in InxGa1−xAs-InP heterojunctions at low temperature, Surface Science, Volume 142, Issues 1–3, 1984, Pages 179-181,-- July 1, 1984 ...[Visit Journal] We report investigations of the temperature dependence of the quantum Hall effect in modulation doped InxGa1−xAs-InP heterojunctions. The diagonal conductivity σxx is studied at several minima of the magneto-resistance ϱxx between 50 mK and 2 K. A hopping conduction mechanism is observed when the Fermi level is in the tail of the Landau levels. [reprint (PDF)]
22.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
22.	Nickel oxide growth on Si (111), c-Al₂O₃ and FTO/glass by pulsed laser deposition V. E. Sandana ; D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; R. McClintock ; M. Razeghi 03/07/2014-- March 7, 2014 ...[Visit Journal] NiO was grown on Si (111), c-Al₂O₃ and FTO/glass substrates by pulsed laser deposition (PLD). X-Ray Diffraction (XRD) and scanning electron microscope (SEM) studies revealed that layers grown on c-Al₂O₃ were fcc NiO with a dense morphology of cubic grains that were strongly (111) oriented along the growth direction. The relatively low ω rocking curve linewidth, of 0.12°suggests that there may have been epitaxial growth on the c-Al₂O₃ substrate. XRD and SEM indicated that films grown on Si (111) were also fcc NiO, with cubic grains, but that the grain orientation was random. This is consistent with the presence of an amorphous SiO₂ layer at the surface of the Si substrate, which precluded epitaxial growth. NiO grown at lower temperature (200°C) on temperature-sensitive FTO/glass substrates showed no evidence of crystallinity in XRD and SEM studies. After flash annealing in air, however, peaks characteristic of randomly oriented fcc NiO appeared in the XRD scans and the surface morphology became more granular in appearance. Such layers appear promising for the development of future dye-sensitised solar cell devices based on NiO grown by PLD. [reprint (PDF)]
22.	Recent advances in IR semiconductor laser diodes and future trends M. Razeghi; Y. Bai; N. Bandyopadhyay; B. Gokden; Q.Y. Lu; S. Slivken Photonics Society Summer Topical Meeting Series, IEEE [6000041], pp. 55-56 (2011)-- July 18, 2011 ...[Visit Journal] The wall plug efficiency of the mid-infrared quantum cascade laser in room temperature continuous wave (cw) operation is brought to 21%, with a maximum output power of 5.1 W. Using a surface grating distributed feedback (DFB) approach, we demonstrated 2.4 W single mode output in room temperature cw operation. With a photonic crystal distributed feedback (PCDFB) design, we achieved single mode spectrum and close to diffraction limited far field with a room temperature high peak power of 34 W. [reprint (PDF)]
22.	Dark current suppression in Type-II InAs/GaSb superlattice long wavelength infrared photodiodes with M-structure barrier B.M. Nguyen, D. Hoffman, P.Y. Delaunay, and M. Razeghi Applied Physics Letters, Vol. 91, No. 16, p. 163511-1-- October 15, 2007 ...[Visit Journal] We presented an alternative design of Type-II superlattice photodiodes with the insertion of a mid-wavelength infrared M-structure AlSb/GaSb/InAs/GaSb/AlSb superlattice for the reduction of dark current. The M-structure superlattice has a larger carrier effective mass and a greater band discontinuity as compared to the standard Type-II superlattices at the valence band. It acts as an effective medium that weakens the diffusion and tunneling transport at the depletion region. As a result, a 10.5 µm cutoff Type-II superlattice with 500 nm M-superlattice barrier exhibited a R₀A of 200 cm² at 77 K, approximately one order of magnitude higher than the design without the barrier. The quantum efficiency of such structures does not show dependence on either barrier thickness or applied bias. [reprint (PDF)]
22.	Tight-binding theory for the thermal evolution of optical band gaps in semiconductors and superlattices S. Abdollahi Pour, B. Movaghar, and M. Razeghi American Physical Review, Vol. 83, No. 11, p. 115331-1-- March 15, 2011 ...[Visit Journal] A method to handle the variation of the band gap with temperature in direct band-gap III–V semiconductors and superlattices using an empirical tight-binding method has been developed. The approach follows closely established procedures and allows parameter variations which give rise to perfect fits to the experimental data. We also apply the tight-binding method to the far more complex problem of band structures in Type-II infrared superlattices for which we have access to original experimental data recently acquired by our group. Given the close packing of bands in small band-gap Type-II designs, k·p methods become difficult to handle, and it turns out that the sp3s* tight-binding scheme is a practical and powerful asset. Other approaches to band-gap shrinkage explored in the past are discussed, scrutinized, and compared. This includes the lattice expansion term, the phonon softening mechanism, and the electron-phonon polaronic shifts calculated in perturbation theory. [reprint (PDF)]
22.	Positive and negative luminescence in binary Type-II InAs/GaSb superlattice photodiodes D. Hoffman and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 61271H-- January 23, 2006 ...[Visit Journal] In the present work, we show measurements of both positive and negative luminescence of binary Type-II InAs/GaSb superlattice photodiodes in the 3 to 13 μm spectral range. Through a radiometric calibration technique, we demonstrate temperature independent negative luminescence efficiencies of 45 % in the midwavelength (MWIR) sample from 220 K to 320 K without anti-reflective coating and values reaching 35 % in the long wavelength infrared (LWIR) spectrum sample. [reprint (PDF)]
22.	Thermal stability of GaN thin films grown on (0001) Al₂O₃, (0112) Al₂O₃ and (0001)Si 6H-SiC substrates C.J. Sun, P. Kung, A. Saxler, H. Ohsato, E. Bigan, M. Razeghi, and D.K. Gaskill Journal of Applied Physics 76 (1)-- July 1, 1994 ...[Visit Journal] Single crystals of GaN were grown on (0001), (0112) Al₂O₃ and (0001)Si 6H‐SiC substrates using an atmospheric pressure metalorganic chemical‐vapor‐deposition reactor. The relationship has been studied between the thermal stability of the GaN films and the substrate’s surface polarity. It appeared that the N‐terminated (0001) GaN surface grown on (0001)Si 6H‐SiC has the most stable surface, followed by the nonpolar (1120) GaN surface grown on (0112) Al₂O₃, while the Ga‐terminated (0001) GaN surface grown on (0001) Al₂O₃ has the least stable surface. This is explained with the difference in the atomic configuration of each of these surfaces which induces a difference in their thermal decomposition. [reprint (PDF)]
22.	Quantum Sensing Using Type-II InAs/GaSb Superlattice for Infrared Detection M. Razeghi, A. Gin, Y. Wei, J. Bae, and J. Nah Microelectronics Journal, 34 (5-8)-- May 1, 2003 ...[Visit Journal] Large, regular arrays of bulk GaSb and InAs/GaSb Type-II superlattice pillars have been fabricated by electron beam lithography and dry etching. A 2.5 keV electron beam lithography system and metal evaporation are used to form the Au mask on superlattice and bulk substrates. Dry etching of these materials has been developed with BCl3:Ar, CH4:H2:Ar and cyclic CH₄:H₂:Ar/O₂ plasmas. Etch temperatures were varied from 20 to 150 °C. The diameter of the superlattice pillars was below 50 nm with regular 200 nm spacing. Bulk GaSb pillars were etched with diameters below 20 nm. Areas of dense nanopillars as large as 500 μm×500 μm were fabricated. The best height/diameter aspect ratio was approximately 10:1. To date, these are the smallest diameter III–V superlattice pillar structures reported, and the first nanopillars in the InAs/GaSb material system. The basic theory of these devices and surface passivation with SiO₂ and Si₃N₄ thin films has also been discussed. [reprint (PDF)]
22.	High Power Mid-Infrared Quantum Cascade Lasers Grown on GaAs Steven Slivken and Manijeh Razeghi Photonics 2022, 9(4), 231 (COVER ARTICLE) ...[Visit Journal] The motivation behind this work is to show that InP-based intersubband lasers with high power can be realized on substrates with significant lattice mismatch. This is a primary concern for the integration of mid-infrared active optoelectronic devices on low-cost photonic platforms, such as Si. As evidence, an InP-based mid-infrared quantum cascade laser structure was grown on a GaAs substrate, which has a large (4%) lattice mismatch with respect to InP. Prior to laser core growth, a metamorphic buffer layer of InP was grown directly on a GaAs substrate to adjust the lattice constant. Wafer characterization data are given to establish general material characteristics. A simple fabrication procedure leads to lasers with high peak power (>14 W) at room temperature. These results are extremely promising for direct quantum cascade laser growth on Si substrates. [reprint (PDF)]

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