Center for Quantum Devices - Most Downloaded Journal Articles

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3.	A Review of III-Nitride Research at the Center for Quantum Devices M. Razeghi and R. McClintock Journal of Crystal Growth, Vol. 311, No. 10-- May 1, 2009 ...[Visit Journal] In this paper, we review the history of the Center for Quantum Devices’ (CQD) III-nitride research covering the past 15 years. We review early work developing III-nitride material growth. We then present a review of laser and light-emitting diode (LED) results covering everything from blue lasers to deep UV LEDs emitting at 250 nm. This is followed by a discussion of our UV photodetector research from early photoconductors all the way to current state of the art Geiger-mode UV single photon detectors. [reprint (PDF)]
2.	-- November 30, 1999
2.	Advances in APDs for UV astronomy Melville P. Ulmer; Ryan M. McClintock; Jose L. Pau; Manijeh Razeghi Proc. SPIE 6686, UV, X-Ray, and Gamma-Ray Space Instrumentation for Astronomy XV, 668605 (September 13, 2007)-- November 13, 2007 ...[Visit Journal] We report the most recent work of our group of the development of avalanche photo diodes based on (Al)GaN. The goal of this group is to achieve single photon counting. In this paper we first give the scientific motivation for making such a device in the context of UV astronomy and then describe current work and plans for future development. The development includes improving the sensitivity to be able to carry out single photon detection and the fabrication of arrays. [reprint (PDF)]
2.	Etching of ZnO Towards the Development of ZnO Homostructure LEDs K. Minder, F.H. Teherani, D. Rogers, C. Bayram, R. McClintock, P. Kung, and M. Razeghi SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Zinc Oxide Materials and Devices II, Vol. 6474, p. 64740Q-1-6-- January 29, 2007 ...[Visit Journal] Although ZnO has recently gained much interest as an alternative to the III-Nitride material system, the development of ZnO based optoelectonic devices is still in its infancy. Significant material breakthroughs in p-type doping of ZnO thin films and improvements in crystal growth techniques have recently been achieved, making the development of optoelectonic devices possible. First, a survey of current ZnO processing methods is presented, followed by the results of our processing research. [reprint (PDF)]
2.	Microstructural compositional, and optical characterization of GaN grown by metal organic vapor phase epitaxy on ZnO epilayers D.J. Rogers, F. Hosseini Teherani, T. Moudakir, S. Gautier, F. Jomard, M. Molinari, M. Troyon, D. McGrouther, J.N. Chapman, M. Razeghi and A. Ougazzaden Journal of Vacuum Science and Technology B, Vol. 27, No. 3, May/June, p. 1655-1657-- May 29, 2009 ...[Visit Journal] This article presents the results of microstructural, compositional, and optical characterization of GaN films grown on ZnO buffered c-sapphire substrates. Transmission electron microscopy showed epitaxy between the GaN and the ZnO, no degradation of the ZnO buffer layer, and no evidence of any interfacial compounds. Secondary ion mass spectroscopy revealed negligible Zn signal in the GaN layer away from the GaN/ZnO interface. After chemical removal of the ZnO, room temperature (RT) cathodoluminescence spectra had a single main peak centered at ~ 368 nm (~3.37 eV), which was indexed as near-band-edge (NBE) emission from the GaN layer. There was no evidence of the ZnO NBE peak, centered at ~379 nm (~3.28 eV), which had been observed in RT photoluminescence spectra prior to removal of the ZnO. [reprint (PDF)]
2.	-- November 30, 1999
2.	Free-space optical communication using mid-infrared or solar-blind ultraviolet sources and detectors R. McClintock, A. Haddadi and M. Razeghi SPIE Proceedings, Vol. 8268, p. 826810-- January 22, 2012 ...[Visit Journal] Free-space optical communication is a promising solution to the “last mile” bottleneck of data networks. Conventional near infrared-based free-space optical communication systems suffer from atmospheric scattering losses and scintillation effects which limit the performance of the data links. Using mid-infrared, we reduce the scattering and thus can improve the quality of the data links and increase their range. Because of the low scattering, the data link cannot be intercepted without a complete or partial loss in power detected by the receiver. This type of communications provides ultra-high bandwidth and highly secure data transfer for both short and medium range data links. Quantum cascade lasers are one of the most promising sources for mid-wavelength infrared sources and Type-II superlattice photodetectors are strong candidates for detection in this regime. The same way that that low scattering makes mid-wavelength infrared ideal for secure free space communications,high scattering can be used for secure short-range free-space optical communications. In the solar-blind ultraviolet (< 280 nm) light is strongly scattered and absorbed. This scattering makes possible non-line-of-sight free-space optical communications. The scattering and absorption also prevent remote eavesdropping. III-Nitride based LEDs and photodetectors are ideal for non-line-of-sight free-space optical communication. [reprint (PDF)]
2.	Room Temperature, Continuous Wave Quantum Cascade Laser Grown Directly on a Si Wafer Steven Slivken and Manijeh Razeghi S. Slivken and M. Razeghi,, Journal of Quantum Electronics, Vol. 59, No. 4, doi: 10.1109/JQE.2023.3282710 ...[Visit Journal] We report the room temperature demonstration of a high power, continuous wave, LWIR quantum cascade laser grown directly on a Si substrate. A new wafer, based on a high efficiency, strain-balanced laser core was processed into a lateral injection buried heterostructure laser geometry. A pulsed efficiency of 11.1% was demonstrated at room temperature, with an emission wavelength of 8.35 μm. With low fidelity, epilayer-up packaging, CW emission up to 343 K was also demonstrated, with a maximum output power of >0.7 W near room temperature. [reprint (PDF)]
2.	Midinfrared Semiconductor Photonics – A Roadmap:Quantum Cascade Lasers MANIJEH RAZEGHI arXiv:2511.03868 [physics.optics] ...[Visit Journal] Mid-wave infrared (IR) quantum cascade lasers (QCLs) offer high output power, excellent efficiency, broad wavelength tunability, and elevated operating temperatures, especially when operating in the 3–12 μm wavelength range. These characteristics make them highly promising for a wide range of applications, including high-resolution molecular spectroscopy, ultra-low-loss optical fiber communications using fluoride-based glasses (with attenuation below 2.5×10⁻⁴ dB/km), trace gas detection, air pollution monitoring (as many molecules, particularly hydrocarbons, exhibiting strong absorption lines in this spectral region), and medical diagnostics. This article presents a comprehensive overview of the development of QCLs, highlighting key milestones, the current state of the technology, and future directions, framed within the broader context of the Semiconductor Mid-Infrared Photonics Roadmap.
2.	Low threshold GaInAsP/InP lasers with good temperature dependence grown by low pressure MOVPE J.-P. Hirtz, M. Razeghi, J.-P. Larivain, S. Hersee, J.-P. Duchemin Electronics Letters Volume 17, Issue 3 https://doi.org/10.1049/el:19810081-- February 1, 1981 ...[Visit Journal] Room temperature pulsed operation has been achieved in the 1.2–1.3 μm region for GaInAsP/InP lasers grown by low pressure metalorganic vapour phase epitaxy. Thresholds as low as 1.2 kA/cm2 and threshold temperature dependences of exp T/T0, with T0 up to 80 K, have been obtained. [reprint (PDF)]
2.	Electron capture processes in optically excited In0.53Ga 0.47As/InP quantum wells U. Cebulla, G. Bacher, A. Forchel, D. Schmitz, H. Jürgensen, M. Razeghi Appl. Phys. Lett. 55, 933–935 (1989)-- September 4, 1989* ...[Visit Journal] We have performed picosecond time-resolved measurements on Ir:.O. 53 GaO. 47 As/lnP quantum wells with varying barrier thicknesses using 10 ps Nd:Y AG excitation. For this excitation, holes and electrons are created in the Ino . 53 GaOA7 As layers. Due to momentum conservation the Nd:YAG excitation accelerates the electrons above the InP barrier where they can diffuse but cannot recombine. By examining the rise time of the quantum well emission, we can show that for samples with thick barriers, the harrier geometry largely controls the dynamic properties of the carriers after Nd:YAG excitation. [reprint (PDF)]
2.	-- November 30, 1999
2.	MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates M. Razeghi, M. Defour , F. Omnes, P. Maurel , E. Bigan , O. Acher, J. Nagle, F. Brillouet , J.C. Portal M. Razeghi, M. Defour, F. Omnes, P. Maurel, E. Bigan, O. Acher, J. Nagle, F. Brillouet, J.C. Portal, MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates, Journal of Crystal Growth, Volume 93, Issues 1–4, 1988, Pages 776-781,-- January 1, 1988 ...[Visit Journal] High quality II[-V semiconductor heterojunctions, quantum wells and superlauices have been grown on lattice matched and alternative substrates such as silicon for photonic and electronic devices, using low pressure metalorganic chemical vapor deposition growth technique. [reprint (PDF)]
2.	GaN-based nanostructured photodetectors J.L. Pau, C. Bayram, P. Giedraitis, R. McClintock, and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-14-- January 26, 2009 ...[Visit Journal] The use of nanostructures in semiconductor technology leads to the observation of new phenomena in device physics. Further quantum and non-quantum effects arise from the reduction of device dimension to a nanometric scale. In nanopillars, quantum confinement regime is only revealed when the lateral dimensions are lower than 50 nm. For larger mesoscopic systems, quantum effects are not observable but surface states play a key role and make the properties of nanostructured devices depart from those found in conventional devices. In this work, we present the fabrication of GaN nanostructured metal-semiconductor-metal (MSM) and p-i-n photodiodes (PIN PDs) by e-beam lithography, as well as the investigation of their photoelectrical properties at room temperature. The nanopillar height and diameter are about 520 nm and 200 nm, respectively. MSMs present dark currents densities of 0.4 A/cm² at ±100 V. A strong increase of the optical response with bias is observed, resulting in responsivities higher than 1 A/W. The relationship between this gain mechanism and surface states is discussed. PIN PDs yield peak responsivities (R_peak) of 35 mA/W at -4 V and show an abnormal increase of the response (R_peak > 100 A/W) under forward biases. [reprint (PDF)]
2.	Interface roughness scattering in thin, undoped GaInP/GaAs quantum wells W. C. Mitchel, G.J. Brown, I. Lo, S. Elhamri, M. Aboujja, K. Ravindran, R.S. Newrock, M. Razeghi, and X. He Applied Physics Letters 65 (12)-- September 19, 1994 ...[Visit Journal] Electronic transport properties of very thin undoped GaInP/GaAs quantum wells have been measured by temperature dependent low field Hall effect and by Shubnikov–de Haas effect. Strong Shubnikov–de Haas oscillations were observed after increasing the electron concentration via the persistent photocurrent effect. Low temperature mobilities of up to 70 ,000 cm²/V· s at carrier concentrations of 6.5×10¹¹ cm⁻² were observed in a 20 Å quantum well. The results are compared with the theory of interface roughness scattering which indicates extremely smooth interfaces; however, discrepancies between experiment and theory are observed. [reprint (PDF)]
2.	First observation of the quantum Hall effect in a Ga0.47In0.53As‐InP heterostructure with three electric subbands M. Razeghi; J. P. Duchemin; J. C. Portal; L. Dmowski; G. Remeni; R. J. Nicholas; A. Briggs M. Razeghi, J. P. Duchemin, J. C. Portal, L. Dmowski, G. Remeni, R. J. Nicholas, A. Briggs; First observation of the quantum Hall effect in a Ga0.47In0.53As‐InP heterostructure with three electric subbands. Appl. Phys. Lett. 17 March 1986; 48 (11)-- March 17, 1986 ...[Visit Journal] Shubnikov–de Haas and quantum Hall effects have been studied in GaInAs‐InP heterojunctions grown by modified low pressure metalorganic chemical vapor deposition. In contrast to the results reported up till now on GaInAs‐InP heterojunctions with nearly the same channel electron density, not one but three electric subbands, E0, E1, and E2, are occupied in zero magnetic field. Two electric subbands E0 and E1 contribute to the quantum Hall effect. Magnetic depopulation of the higher (E1 and E2) subbands is observed in both perpendicular and tilted magnetic field orientations. This enables a demonstration of the importance of intersubband scattering in resistivity and cyclotron resonance. [reprint (PDF)]
2.	Temperature dependence of the quantized Hall effect H. P. Wei, A. M. Chang, and D. C. Tsui M. Razeghi Phys. Rev. B 32, 7016(R) 1985-- November 15, 1985 ...[Visit Journal] We reported detailed measurements of the temperature dependence of the quantized Hall effect from 4.2 to 50 K in the i=2 plateau region in InGaAs-InP. We deduce from the data that there is a significant density of localized states between the two Landau levels, with a value of ∼1×1010 cm−2 meV−1 at the middle of the mobility gap. We also found that the correlations between 𝜎xx and 𝜎xy show the trend predicted by the recent two-parameter scaling theory of localization in quantized Hall effect. [reprint (PDF)]
2.	Two‐dimensional electron gas in a In0.53Ga0.47As‐InP heterojunction grown by metalorganic chemical vapor deposition Y. Guldner; J. P. Vieren; P. Voisin; M. Voos; M. Razeghi; M. A. Poisson Y. Guldner, J. P. Vieren, P. Voisin, M. Voos, M. Razeghi, M. A. Poisson; Two‐dimensional electron gas in a In0.53Ga0.47As‐InP heterojunction grown by metalorganic chemical vapor deposition. Appl. Phys. Lett. 15 May 1982; 40 (10): 877–879.-- April 15, 1982 ...[Visit Journal] We report, from Shubnikov-de Haas and cyclotron resonance experiments, the first observation of a two-dimensional, high-mobility electron gas in a selectively doped 1110.53 G~l.47 As-InP heterojunction grown by metalorganic chemical vapor deposition. Several parameters of the electronic system under consideration are determined. [reprint (PDF)]
1.	Background Limited Performance in p-doped GaAs/Ga[0.71]In[0.29]As[0.39]P[0.61] Quantum Well Infrared Photodetectors J. Hoff, S. Kim, M. Erdtmann, R. Williams, J. Piotrowski, E. Bigan, M. Razeghi and G. Brown Applied Physics Letters 67 (1)-- July 3, 1995 ...[Visit Journal] Background limited infrared photodetection has been achieved up to 100 K at normal incidence with p-type GaAs/Ga_0.71In_0.29As_0.39P_0.61 quantum well intersubband photodetectors grown by low-pressure metalorganic chemical vapor deposition. Photoresponse covers the wavelength range from 2.5 μm up to 7 μm. The device shows photovoltaic response, the cutoff wavelength increases slightly with bias, and the responsivity increases nonlinearly with bias. These effects are attributed to an asymmetric quantum well profile. [reprint (PDF)]
1.	Recent advances in MOCVD growth of InxGa1-xAsyP1-y alloys M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Recent advances in MOCVD growth of InxGa1-xAsyP1-y alloys, Journal of Crystal Growth, Volume 70, Issues 1–2, 1984, Pages 145-149,-- December 1, 1984 ...[Visit Journal] The low pressure metalorganic chemical vapour deposition (LPMOCVD) growth of GaxIn1-xAsyP1-y-InP lattice matched system, with high mobilities, sharp interfaces, low background doping densities, and the formation of a two-dimensional electron gas (2DEG) at the interfaces, has recently made spectacular advances, as in evidenced by the availability of high quality DH lasers, PIN photodiodes, and Gunn diodes. We present here some new results obtained on the above-mentioned material and devices. [reprint (PDF)]
1.	Low pressure metalorganic chemical vapor deposition of InP and related compounds M. Razeghi, M. A. Poisson, J. P. Larivain & J. P. Duchemin Razeghi, M., Poisson, M.A., Larivain, J.P. et al. Low pressure metalorganic chemical vapor deposition of InP and related compounds. J. Electron. Mater. 12, 371–395 (1983). https://doi.org/10.1007/BF02651138-- March 1, 1983 ...[Visit Journal] The low pressure metalorganic chemical vapor deposition epitaxial growth and characterization of InP, Ga0.47In0.53 As and GaxIn1-xAsyP1-y, lattice-matched to InP substrate are described. The layers were found to have the same etch pit density (EPD) as the substrate. The best mobility obtained for InP was 5300 cm2 V−1S−1 at 300 K and 58 900 cm2 V−1 S−1 at 772K, and for GaInAs was 11900 cm2 V−1 S−1 at 300 K, 54 600 cm2 V−1 S−1 at 77 K and 90 000 cm V−1S−1 at 2°K. We report the first successful growth of a GaInAs-InP superlattice and the enhanced mobility of a two dimensional electron gas at a GaInAs -InP heterojunction grown by LP-MO CVD. LP MO CVD material has been used for GaInAsPInP, DH lasers emitting at 1.3 um and 1.5 um. These devices exhibit a low threshold current, a slightly higher than liquid phase epitaxy devices and a high differential quantum efficiency of 60%. Fundamental transverse mode oscillation has been achieved up to a power outpout of 10 mW. Threshold currents as low as 200 mA dc have been measured for devices with a stripe width of 9 um and a cavity length of 300 um for emission at 1.5 um. Values of T in the range 64–80 C have been obtained. Preliminary life testing has been carried out at room temperature on a few laser diodes (λ = 1.5μm). Operation at constant current for severalthousand hours has been achieved with no change in the threshold current. [reprint (PDF)]
1.	Engineering of the fermi level in PLD-grown NiO thin films by post-annealing D. Rogers*, E. Sandana, M. Chamberlin, F. Teherani; V. Safarov, M. Konczykowski, R. Grasset, A. Alessi, H. Drouhin ; M. Razeghi We investigate practical routes to engineer the Fermi level—and thus the effective work function—of p-type nickel oxide (NiO) thin films grown on c-sapphire by plasma-assisted pulsed laser deposition (PA-PLD) at room temperature (RT). We examine three levers: (i) oxygen-rich growth at low substrate temperature, (ii) post-deposition annealing in air or oxygen across 320–620 °C, and (iii) impurity (Li) acceptor doping. RT-grown NiO exhibits high crystalline quality with (111) out-of-plane orientation, narrow rocking-curve width, and a film thickness near 60 nm. RT epitaxy yields the lowest resistivity among the studied conditions, and resistance increases progressively with temperature for iso-chronic post-annealing in air. Oxygen ambient post-annealing shows no distinctive monotonic trend in resistivity, although the conductivity falls off for annealing over about 500°C. Optical transmission spectra suggest progressive healing of in-gap defect states with post-annealing temperature. Doping NiO with 20at% of Li lowers resistivity relative to undoped NiO by an order of magnitude. Post-annealing at 300°C under oxygen ambient significantly boosts conductivity. Over a decade of storage, all films exhibited significant loss of conductivity, underscoring the need for stabilisation strategies. The results map practical processing windows to tune the NiO Fermi level for integration in oxide heterojunctions (e.g., p-NiO/n-Ga2O3) used in ultraviolet detection and wide-bandgap electronics.
1.	GaInAs and GaInAsP materials grown by low pressure MOCVD for microwave and optoelectronic applications J.P. Duchemin, J.P. Hirtz, M. Razeghi, M. Bonnet , S.D. Hersee J.P. Duchemin, J.P. Hirtz, M. Razeghi, M. Bonnet, S.D. Hersee, GaInAs and GaInAsP materials grown by low pressure MOCVD for microwave and optoelectronic applications, Journal of Crystal Growth, Volume 55, Issue 1, 1981, Pages 64-73-- October 1, 1981 ...[Visit Journal] The low pressure MOCVD technique has been successfully used to grow GaInAsP, lattice-matched to InP, for the complete compositional range between InP (λ=0.91 μm) and the ternary compound Ga0.47In0.53As (λ=1.67 μm). By contrast to LPE growth it has been found that during the MOCVD growth of double heterostructures InP can be grown directly onto the ternary or quaternary with no disturbance of the active layer, i.e. there is no effect equivalent to “melt back”. The compositional grading on both sides of the active layer was measured by scanning Auger spectroscopy on bevelled samples. It was found that the graded regions were typically less than 100 Å wide for GaInAsP active layers and less than 50 Å wide for GaInAs active layers. Single layers of undoped GaInAs exhibited a typical mobility of 6700 cm2 V-1s-1 at 1.5×1017 cm-3. The compositional uniformity of the ternary layers was characterised by measurement of the photoluminescence wavelength at various points on a large sample. The wavelength varied by <3 nm over 95% of the area, which was approximately 8 cm2. Our early MOCVD grown GaInAsP/InP DH lasers exhibited high thresholds due to a poor interface between the p-InP and the active layer. However, recently fabricated broad area lasers emitting at 1.27 μm show an average threshold current density of 1.5 kA cm-2 with a T0 of between 70 to 80 K. Stripe geometry lasers have being fabricated from this material and CW operation has been obtained. [reprint (PDF)]
1.	Metalorganic chemical vapor deposition of undoped In1−xAlxAs on InP M. A. di Forte‐Poisson; M. Razeghi; J. P. Duchemin M. A. di Forte‐Poisson, M. Razeghi, J. P. Duchemin; Metalorganic chemical vapor deposition of undoped In1−xAlxAs on InP. J. Appl. Phys. 1 December 1983; 54 (12): 7187–7189. https://doi.org/10.1063/1.331956-- December 1, 1983 ...[Visit Journal] In1−x Alx As epitaxial layers were grown on (100) InP substrates by the organometallic vapor phase epitaxy method. Undoped layers with mirror smooth surfaces were obtained for substrate temperatures of 600–650 °C. By adjusting the relative ratio of In and Al, lattice matched In0.52 Al0.48 As epilayers were reproducibly grown on InP substrates. X‐ray measurements, scanning Auger analyses, and electron mobilities are presented. These results show that the quality of the epilayers obtained here was comparable to the best reported layers grown by other methods. [reprint (PDF)]
1.	Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82,-- November 1, 1983 ...[Visit Journal] M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82, [reprint (PDF)]

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