Center for Quantum Devices - Most Downloaded Journal Articles

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12.	Growth and Characterization of Long-Wavelength Infrared Type-II Superlattice Photodiodes on a 3-in GaSb Wafer B.M. Nguyen, G. Chen, M.A. Hoang, and M. Razeghi IEEE Journal of Quantum Electronics (JQE), Vol. 47, No. 5, May 2011, p. 686-690-- May 11, 2011 ...[Visit Journal] We report the molecular beam epitaxial growth and characterization of high performance Type-II superlattice photodiodes on 3” GaSb substrates for long wavelength infrared detection. A 7.3 micron thick device structure shows excellent structural homogeneity via atomic force microscopy and x-ray diffraction characterization. Optical and electrical measurements of photodiodes reveal not only the uniformity of the Type-II superlattice material but also of the fabrication process. Across the wafer, at 77 K, photodiodes with a 50% cut-off wavelength of 11 micron exhibit more than 45% quantum efficiency, and a dark current density of 1.0 x 10^-4 A/cm² at 50 mV, resulting in a specific detectivity of 6x10¹¹ cm·Hz^1/2/W. [reprint (PDF)]
12.	Delta-doping optimization for high qualityp-type GaN C. Bayram, J.L. Pau, R. McClintock and M. Razeghi Journal of Applied Physics, Vol. 104, No. 8-- October 15, 2008 ...[Visit Journal] Delta-doping is studied in order to achieve high quality p-type GaN. Atomic force microscopy, x-ray diffraction, photoluminescence, and Hall measurements are performed on the samples to optimize the delta-doping characteristics. The effect of annealing on the electrical, optical, and structural quality is also investigated for different delta-doping parameters. Optimized pulsing conditions result in layers with hole concentrations near 10¹⁸ cm⁻³ and superior crystal quality compared to conventional p-GaN. This material improvement is achieved thanks to the reduction in the Mg activation energy and self-compensation effects in delta-doped p-GaN. [reprint (PDF)]
12.	High-performance InP-based midinfrared quantum cascade lasers at Northwestern University M. Razeghi, Y. Bai, S. Slivken, and S.R. Darvish SPIE Optical Engineering, Vol. 49, No. 11, November 2010, p. 111103-1-- November 15, 2010 ...[Visit Journal] We present recent performance highlights of midinfrared quantum cascade lasers (QCLs) based on an InP material system. At a representative wavelength around 4.7 µm, a number of breakthroughs have been achieved with concentrated effort. These breakthroughs include watt-level continuous wave operation at room temperature, greater than 50% peak wall plug efficiency at low temperatures, 100-W-level pulsed mode operation at room temperature, and 10-W-level pulsed mode operation of photonic crystal distributed feedback quantum cascade lasers at room temperature. Since the QCL technology is wavelength adaptive in nature, these demonstrations promise significant room for improvement across a wide range of mid-IR wavelengths. [reprint (PDF)]
12.	Splitting of the Landau Level Coincidence: A Novel Phase Transition in Tilted Magnetic Fields Razeghi M., S. Koch, R.J. Hang, K.V. Klitzing Phys Rev B 47 (7), 4048 (1993)-- January 1, 1993 ...[Visit Journal] Magnetotransport studies of GaxIn1-xAs/InP heterostructures in strong parallel magnetic fields at mK temperatures reveal a suppression of the coincidence of two Landau levels with opposite spin at filling factor 2. This phenomenon is explained by the occurrence of a phase transition from a spin-unpolarized state (at small tilt angles) to a spin-polarized state (at large tilt angles). [reprint (PDF)]
12.	Responsivity and Noise Performance of InGaAs/InP Quantum Well Infrared Photodetectors C. Jelen, S. Slivken, T. David, G. Brown, and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] Dark current nose measurements were carried out between 10 and 104 Hz at T = 80K on two InGaAs/InP quantum well IR photo detectors (QWIPs) designed for 8 μm IR detection. Using the measured noise data, we have calculated the thermal generation rate, bias-dependent gain, electron trapping probability, and electron diffusion length. The calculated thermal generation rate is similar to AlGaAs/GaAs QWIPs with similar peak wavelengths, but the gain is 50X larger, indicating improved transport and carrier lifetime are obtained in the binary InP barriers. As a result, a large responsivity of 7.5 A/W at 5V bias and detectivity of 5 X 10¹¹ cm·Hz^½/W at 1.2 V bias were measured for the InGaAs/InP QWIPs at T = 80K. [reprint (PDF)]
12.	Growth of In_1-xTl_xSb, a New Infrared Material, by Low-Pressure Metalorganic Chemical Vapor Deposition Y.H. Choi, R. Sudharsanan, C, Besikci, and M. Razeghi Applied Physics Letters 63 (3)-- July 19, 1993 ...[Visit Journal] We report the growth of In_1-xTl_xSb, a new III-V alloy for long-wavelength infrared detector applications, by low-pressure metalorganic chemical vapor deposition. In_1-xTl_xSb with good surface morphology was obtained on both GaAs and InSb substrates at a growth temperature of 455 °C. X-ray diffraction measurements showed resolved peaks of In_1-xTl_xSb and InSb films. Infrared absorption spectrum of In_1-xTl_xSb showed a shift toward lower energies compared to InSb spectrum. Hall mobility data on In_1-xTl_xSb/InSb/GaAs structure showed enhanced mobility at low temperatures compared to InSb/GaAs structure. [reprint (PDF)]
12.	High performance LWIR Type-II InAs/GaSb superlattice photodetectors and infrared focal plane array Y. Wei, A. Hood, A. Gin, V. Yazdanpanah, M. Razeghi and M. Tidrow SPIE Conference, Jose, CA, Vol. 5732, pp. 309-- January 22, 2005 ...[Visit Journal] We report on the demonstration of a focal plane array based on Type-II InAs-GaSb superlattices grown on n-type GaSb substrate with a 50% cutoff wavelength at 10 μm. The surface leakage occurring after flip-chip bonding and underfill in the Type-II devices was suppressed using a double heterostructure design. The R₀A of diodes passivated with SiO₂ was 23 Ω·cm² after underfill. A focal plane array hybridized to an Indigo readout integrated circuit demonstrated a noise equivalent temperature difference of 33 mK at 81 K, with an integration time of 0.23 ms. [reprint (PDF)]
11.	p-Type thin film field effect transistors based on lithium-doped nickel oxide channels grown by pulsed laser deposition V. E. Sandana; D. J. Rogers; F. H. Teherani; P. Bove; R. McClintock; M. Razeghi SPIE Proceedings Volume 10919, Oxide-based Materials and Devices X; 109191H -- March 12, 2019 ...[Visit Journal] Staggered back-gated Field Effect Transistor (FET) structures were made by growing Li-doped NiO on Si₃N₄/SiO₂/Si (111) using room temperature pulsed laser deposition. Optical studies showed over 80% transmission for the NiO:Li channel at wavelengths > 500nm. The MISFET revealed rectifying transfer characteristics, with a V_ON close to zero, a channel mobility of ~ 1 cm²/V·s, a gate leakage current (at +5V) of 0.8 mA and an ION/IOFF ratio (at a Vgs of −15V) of ~ 10³. The transistors showed enhancement-mode output characteristics indicative of a p-type channel with sharp pinchoff, hard saturation, a comparatively high (milliampere range) Id and a relatively low on-resistance of ~11 kΩ. Hence the adoption of Li doping in NiO channels would appear to be a promising approach to obtain p-type TFTs with superior transparency, speed and energy efficiency. [reprint (PDF)]
11.	Growth and Characterization of Type-II Non-Equilibrium Photovoltaic Detectors for Long Wavelength Infrared Range H. Mohseni, J. Wojkowski, A. Tahraoui, M. Razeghi, G. Brown and W. Mitche SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal] Growth and characterization of type-II detectors for mid-IR wavelength range is presented. The device has a p-i-n structure is designed to operate in the non-equilibrium mode with low tunneling current. The active layer is a short period InAs/GaSb superlattice. Wider bandgap p-type AlSb and n-type InAs layers are used to facilitate the extraction of both electronics and holes from the active layer for the first time. The performance of these devices were compared to the performance of devices grown at the same condition, but without the AlSb barrier layers. The processed devices with the AlSb barrier show a peak responsivity of about 1.2 A/W with Johnson noise limited detectivity of 1.1 X 10¹¹ cm·Hz^½/W at 8 μm at 80 K at zero bias. The details of the modeling, growth, and characterizations will be presented. [reprint (PDF)]
11.	Near milliwatt power AlGaN-based ultraviolet light emitting diodes based on lateral epitaxial overgrowth of AlN on Si(111) Y. Zhang, S. Gautier, C. Cho, E. Cicek, Z, Vashaei, R. McClintock, C. Bayram, Y. Bai and M. Razeghi Applied Physics Letters, Vol. 102, No. 1, p. 011106-1-- January 7, 2013 ...[Visit Journal] We report on the growth, fabrication, and device characterization of AlGaN-based thin-film ultraviolet (UV) (λ ∼ 359 nm) light emitting diodes (LEDs). First, AlN/Si(111) template is patterned. Then, a fully coalesced 7-μm-thick lateral epitaxial overgrowth (LEO) of AlN layer is realized on patterned AlN/Si(111) template followed by UV LED epi-regrowth. Metalorganic chemical vapor deposition is employed to optimize LEO AlN and UV LED epitaxy. Back-emission UV LEDs are fabricated and flip-chip bonded to AlN heat sinks followed by Si(111) substrate removal. A peak pulsed power and slope efficiency of ∼0.6 mW and ∼1.3 μW/mA are demonstrated from these thin-film UV LEDs, respectively. For comparison, top-emission UV LEDs are fabricated and back-emission LEDs are shown to extract 50% more light than top-emission ones. [reprint (PDF)]
11.	Thin film transistors with wurtzite ZnO channels grown on Si₃N₄/SiO₂/Si (111) substrates by pulsed laser deposition D.J. Rogers; V.E. Sandana; F. Hosseini Teherani; M. Razeghi Proc. SPIE 7603, Oxide-based Materials and Devices, 760318 (March 02, 2010)-- March 7, 2010 ...[Visit Journal] Thin Film Transistors (TFT) were made by growing ZnO on Si₃N₄/SiO₂/Si (111) substrates by pulsed laser deposition. X-ray diffraction and scanning electron microscope studies revealed the ZnO to have a polycrystalline wurtzite structure with a smooth surface, good crystallographic quality and a strong preferential c-axis orientation. Transmission studies in similar ZnO layers on glass substrates showed high transmission over the whole visible spectrum. Electrical measurements of a back gate geometry FET showed an enhancement-mode response with hard saturation, mA range Id and a V_ON ∼ 0V. When scaled down, such TFTs may be of interest for high frequency applications. [reprint (PDF)]
10.	Engineering the Fermi Level in NiO Thin Films D. Rogers, E. Sandana, M. Chamberlin, F. Teherani; V. Safarov, M. Konczykowski, R. Grasset, A. Alessi, H. Drouhin ; M. Razeghi SPIE OPTO PC13897 (2026) ...[Visit Journal] We investigate practical routes to engineer the Fermi level—and thus the effective work function—of p-type nickel oxide (NiO) thin films grown on c-sapphire by plasma-assisted pulsed laser deposition (PA-PLD) at room temperature (RT). We examine three levers: (i) oxygen-rich growth at low substrate temperature, (ii) post-deposition annealing in air or oxygen across 320–620 °C, and (iii) impurity (Li) acceptor doping. RT-grown NiO exhibits high crystalline quality with (111) out-of-plane orientation, narrow rocking-curve width, and a film thickness near 60 nm. RT epitaxy yields the lowest resistivity among the studied conditions, and resistance increases progressively with temperature for iso-chronic post-annealing in air. Oxygen ambient post-annealing shows no distinctive monotonic trend in resistivity, although the conductivity falls off for annealing over about 500°C. Optical transmission spectra suggest progressive healing of in-gap defect states with post-annealing temperature. Doping NiO with 20at% of Li lowers resistivity relative to undoped NiO by an order of magnitude. Post-annealing at 300°C under oxygen ambient significantly boosts conductivity. Over a decade of storage, all films exhibited significant loss of conductivity, underscoring the need for stabilisation strategies. The results map practical processing windows to tune the NiO Fermi level for integration in oxide heterojunctions (e.g., p-NiO/n-Ga2O3) used in ultraviolet detection and wide-bandgap electronics. [reprint (PDF)]
10.	Electrical Transport Properties of Highly Doped N-type GaN Epilayers H.J. Lee, M.G. Cheong, E.K. Suh, and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] Temperature-dependent Hall-effects in MOCVD-grown Si-doped GaN epilayers were measured as a function of temperature in the range 10-800 K. The results were satisfactorily analyzed in terms of a two-band model including the (Gamma) and impurity bands at lower temperatures than room. The (Gamma) band electrons are dominant only high temperatures. The ionized impurity scattering is the most important in the (Gamma) band except at very high temperatures. [reprint (PDF)]
10.	An accurate method to check chemical interfaces of epitaxial III‐V compounds R. Bisaro; G. Laurencin; A. Friederich; M. Razeghi Appl. Phys. Lett. 40 (11): 978–980 (1982)-- June 1, 1982 ...[Visit Journal] We have developed a method of chemical beveling coupled with line scan Auger measurements to check abrupt interfaces of epitaxial III‐V compounds. Interface widths between 53 and 89 Å have been measured by this method for an InP/Ga0.47In0.53As/InP double heterostructure grown by low pressure metalorganic chemical vapor deposition. The ultimate width checkable by this method lies between 10 and 15 Å and is of the order of magnitude of the escape depth of the Auger electrons selected. [reprint (PDF)]
10.	Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi Physica Status Solidi 214 (4), pp. 1770120-- April 4, 2017 ...[Visit Journal] The growth of thick, high quality, and low stress AlN films on Si substrates is highly desired for a number of applications like the development of micro and nano electromechanical system (MEMS and NEMS) technologies [1] and particularly for fabricating AlGaNbased UV LEDs [2–5]. UV LEDs are attractive as they are applied in many areas, such as biomedical instrumentations and dermatology, curing of industrial resins and inks, air purification, water sterilization, and many others [2, 3]. UV LEDs have been generally fabricated on AlN, GaN, Al₂O₃, or SiC substrates because of better lattice mismatching to AlGaN material systems. [reprint (PDF)]
9.	Midinfrared Semiconductor Photonics – A Roadmap:Quantum Cascade Lasers MANIJEH RAZEGHI arXiv:2511.03868 [physics.optics] ...[Visit Journal] Mid-wave infrared (IR) quantum cascade lasers (QCLs) offer high output power, excellent efficiency, broad wavelength tunability, and elevated operating temperatures, especially when operating in the 3–12 μm wavelength range. These characteristics make them highly promising for a wide range of applications, including high-resolution molecular spectroscopy, ultra-low-loss optical fiber communications using fluoride-based glasses (with attenuation below 2.5×10⁻⁴ dB/km), trace gas detection, air pollution monitoring (as many molecules, particularly hydrocarbons, exhibiting strong absorption lines in this spectral region), and medical diagnostics. This article presents a comprehensive overview of the development of QCLs, highlighting key milestones, the current state of the technology, and future directions, framed within the broader context of the Semiconductor Mid-Infrared Photonics Roadmap.
9.	Electron Transport Properties of Ga[0.51]In[0.49]P for Device Applications C. Besikci and M. Razeghi IEEE Transactions on Electron Devices 41 (6)-- June 1, 1994 ...[Visit Journal] We present Monte Carlo calculations of steady-state and transient electron transport properties of Ga0.51In0.49P. We have made a simulation-based comparison between Ga0.51In0.49P and AlxGa1-xAs (x = 0.2, 0.3). Our Monte Carlo data show that transport properties of Ga0.51In0.49P are favorable, and when the other advantages of the GaInP/GaAs system are also taken into account. this material is a good choice to replace AlxGa1-xAs (x greater-than-or-equal-to 0.3). We have also calculated electron drift and Hall mobilities in Ga0.51In0.49P as a function of impurity concentration and temperature, and determined the effects of different scattering mechanisms on the low-field mobility. Calculated results are in good agreement with the measurements on metal organic chemical vapor deposition (MOCVD) grown samples with Hall mobilities within a factor of 0.5 of the calculated theoretical limit. It has also been found that alloy scattering is an important mobility degrading mechanism in lightly doped material at low temperatures. [reprint (PDF)]
8.	Nitrides push performance of UV photodiodes Can Bayram; Manijeh Razeghi Laser Focus World. 45(9), pp. 47-51 (2009)-- September 1, 2009 ...[Visit Journal] The nitrides are known to be useful for creating the UV single-photon detectors with efficiencies of 20%, with its considerable advantages that could further enable quantum computing and data encryption. Such detectors would be well suited for numerous applications in the defense, commercial, and scientific arenas, including covert space-to-space communications, early missile-threat detection, chemical and biological threat detection and spectroscopy. The use of SAM regions is a common approach to reducing multiplication noise and enhancing gain through impact-ionization engineering that could benefit from the higher ionization coefficient by offering lower noise performance and higher gain. The ADPs also enables the realization of single-photon detection by using Geiger-mode operation, which entails operating the ADPs well above the breakdown voltage and using pulse-quenching circuitry. [reprint (PDF)]
8.	InAs/InAs_1-XSb_x Type-II Superlattices for High-Performance Long-Wavelength Infrared Medical Thermography Manijeh Razeghi, Abbas Haddadi, Guanxi Chen, Romain Chevallier and Ahn Minh Hoang ECS Trans. 2015 66(7): 109-116-- June 1, 2015 ...[Visit Journal] We present the demonstration of a high-performance long-wavelength infrared nBn photodetectors based on InAs/InAs_1-xSb_x type-II superlattices on GaSb substrate. The photodetector’s 50% cut-off wavelength was ~10 μm at 77K. The photodetector with a 6 μm-thick absorption region exhibited a peak responsivity of 4.47 A/W at 7.9 μm, corresponding to a quantum efficiency of 54% at -90 mV applied bias voltage under front-side illumination and without any anti-reflection coating. With an R×A of 119 Ω·cm² and a dark current density of 4.4×10^-4 A/cm² under -90 mV applied bias voltage at 77 K, the photodetector exhibited a specific detectivity of 2.8×10¹¹ Jones. This photodetector opens a new horizon for making infrared imagers with higher sensitivity for medical thermography. [reprint (PDF)]
8.	Planar monolithic integrated photoreceiver for 1.3–1.55 μm wavelength applications using GaInAs‐GaAs heteroepitaxies M. Razeghi; J. Ramdani; H. Verriele; D. Decoster; M. Constant; J. Vanbremeersch Appl. Phys. Lett. 49, 215–217 (1986)-- July 28, 1986 ...[Visit Journal] We report the first fabrication of a monolithic integrated circuit consisting of a G1lo47 IIlo53 As planar photoconductive detector (suitable for 1.3-1.55 f.lm wavelength optical communication systems) associated with a GaAs field-effect transistor. The gain, response times, and noise properties of the photoconductive detector and the integrated photo receiver have been investigated, taking into account particular aspects of the material and integrated circuit structure. [reprint (PDF)]
8.	Finite-Size Scaling in the Dissipative Transport Regime Between Quantum Hall Plateaus Razeghi M., S. Koch, R.J. Hang, K.V. Klitzing, K. Ploog Koch, S., Haug, R.J., v. Klitzing, K., Ploog, K., Razeghi, M. (1992). Finite-Size Scaling in the Dissipative Transport Regime Between Quantum Hall Plateaus. In: Bauer, G., Kuchar, F., Heinrich, H. (eds) Low-Dimensional Electronic Systems. Springer Series in Solid-State Sciences, vol 111. Springer, Berlin, Heidelberg.-- January 1, 1993 ...[Visit Journal] The magnetoresistance of a two-dimensional electron gas shows a novel scaling behaviour in the dissipative transport regime between adjacent integer quantum Hall plateaus when studied in samples of different size. At low temperatures (≥ 25mK) the phase coherence length L in may exceed the size W of small samples (W ≥ 8µm). Under these conditions the width ΔB of the magnetic field region where dissipative transport is observed becomes independent of temperature. Then ΔB only depends on the size of the sample and increases with decreasing size. Thus the critical exponent v of the localization length ξ ∝ (ΔB)−v can be determined directly. The resulting exponent v = 2.3±0.1 does not depend on the specific sample and, furthermore, is independent of the (spin-resolved) Landau level. This experimental result agrees with the predictions of several theoretical approaches to the metal-insulator transition in the quantum Hall regime. The effect described occurs both in Hall bars and in Corbino geometries, with essentially identical results. On the other hand, in a Landau level where spin-splitting is not resolved, a considerably larger value of v = 6.5 ± 0.6 is observed for the localization length exponent. [reprint (PDF)]
8.	Growth of Ga0.47In0.53As‐InP quantum wells by low pressure metalorganic chemical vapor deposition M. Razeghi; J. P. Hirtz; U. O. Ziemelis; C. Delalande; B. Etienne; M. Voos Appl. Phys. Lett. 43, 585–587 (1983)-- September 15, 1983 ...[Visit Journal] We describe the growth of multiquantum well and single quantum well Ga0 ,47 InOS3 As-InP structures by low pressure metalorganic chemical vapor deposition. The multi well structure consists of 2S-, SO-, 100-, and 200-A quantum wells (Ga0 ,47 InOS3 As layers) separated by SOO-A barriers (InP layers). Auger measurements indicate the presence offour distinct wells with abrupt boundaries. Photoluminescence measurements are consistent with the existence of four wells; however, deviations are noted between experimentally determined and theoretically predicted recombination energies. An analogous situation exists for the single (SO and 100 A) quantum well structures. Possible explanations, including variation of well composition, variation of well thickness, and participation of impurities in the recombination process are suggested. [reprint (PDF)]
7.	Novel Green Light Emitting Diodes: Exploring Droop-Free Lighting Solutions for a Sustainable Earth M. Razeghi, C. Bayram, R. McClintock, F. Hosseini Teherani, D.J. Rogers, and V.E. Sandana Journal of Light Emitting Diodes, Vol. 2, No. 1, p. 1-33-- April 30, 2010 ...[Visit Journal] The total annual energy consumption in the United States for lighting is approximately 800 Terawatt-hours and costs $80 billion to the public. The energy consumed for lighting throughout the world entails to greenhouse gas emission equivalent to 70% of the emissions from all the cars in the world. Novel solutions to lighting with higher efficiency will drastically reduce the energy consumption and help greenhouse gas emissions to be lowered. Novel green light emitting diodes are the key components of an affordable, durable and environmentally benign lighting solution that can achieve unique spectral quality and promise superior energy conversion efficiency. Light-emitting diodes (LEDs), based on the InGaN alloy, are currently the most promising candidates for realizing solid state lighting (SSL). InGaN is a direct wide bandgap semiconductor with an emission that can span the entire visible spectrum via compositional tuning. However, InGaN LED performance remains wavelength-dependent. Indeed, ultrabright and efficient blue InGaN-based LEDs are readily available but the performance of InGaN-based green LEDs is still far from adequate for use in SSL. Our recent work demonstrated hybrid green light-emitting diodes (LEDs) comprised of n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN were grown on semi-insulating AlN/sapphire using pulsed laser deposition for the n-ZnO and metal organic chemical vapor deposition for the other layers.. We have shown that atop grown ZnO layer by Pulsed Laser Deposition can be a good replacement for GaN. The green wavelength emission requires significant indium content in the active layer (growth temperature ~ 700ºC) that makes InGaN quantum wells very susceptible to thermal degradation. With our technology, diffusion and segregation of indium in the green emitting active is inhibited thanks to the lower ZnO deposition temperatures (<600ºC) than is required for GaN (>1000ºC). Our novel technology preserves the integrity of the as-grown active layer and demonstrates superior green spectral quality (as demonstrated for LEDs on c-sapphire). The results indicate that hybrid LED structures could hold prospects for the development of green LEDs with superior performance. [reprint (PDF)]
7.	Breakthroughs Bring THz Spectroscopy, Sensing Closer to Mainstream Manijeh Razeghi, Quanyong Lu, Santanu Manna, Donghai Wu & Steven Slivken Photonics Spectra, December Issue, pp. 48-- December 1, 2016 ...[Visit Journal] The terahertz (THz) electromagnetic spectrum (1 to 10 THz), sitting between the infrared wavelengths on the higher frequency side and microwaves on the lower frequency side, lies unique and important properties. THz waves can pass through a number of materials, including synthetics, textiles, paper and cardboard. Many biomolecules, proteins, explosives or narcotics feature characteristic absorption I ines - so-called spectral "fingerprints" - at frequencies between 1 and 10 THz. [reprint (PDF)]
7.	Quantum Devices Based on Modern Band Structure Engineering and Epitaxial Technology M. Razeghi Modern Physics Letters B, Vol. 22, No. 24, p. 2343-2371-- September 20, 2008 ...[Visit Journal] Modern band structure engineering is based both on the important discoveries of the past century and modern epitaxial technology. The general goal is to control the behavior of charge carriers on an atomic scale, which affects how they interact with each other and their environment. Starting from the basic semiconductor heterostructure, band structure engineering has evolved into a powerful discipline, employing lower dimensionality to demonstrate new material properties. Several modern technologies under development are used as examples of how this discipline is enabling new types of devices and new functionality in areas with immediate application.

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