Center for Quantum Devices - Most Downloaded Journal Articles

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12.	Toward realizing high power semiconductor terahertz laser sources at room temperature Manijeh Razeghi Proc. SPIE 8023, Terahertz Physics, Devices, and Systems V: Advance Applications in Industry and Defense, 802302 (May 25, 2011)-- May 25, 2011 ...[Visit Journal] The terahertz (THz) spectral range offers promising applications in science, industry, and military. THz penetration through nonconductors (fabrics, wood, plastic) enables a more efficient way of performing security checks (for example at airports), as illegal drugs and explosives could be detected. Being a non-ionizing radiation, THz radiation is environment-friendly enabling a safer analysis environment than conventional X-ray based techniques. However, the lack of a compact room temperature THz laser source greatly hinders mass deployment of THz systems in security check points and medical centers. In the past decade, tremendous development has been made in GaAs/AlGaAs based THz Quantum Cascade Laser (QCLs), with maximum operating temperatures close to 200 K (without magnetic field). However, higher temperature operation is severely limited by a small LO-phonon energy (∼ 36 meV) in this material system. With a much larger LO-phonon energy of ∼ 90 meV, III-Nitrides are promising candidates for room temperature THz lasers. However, realizing high quality material for GaN-based intersubband devices presents a significant challenge. Advances with this approach will be presented. Alternatively, recent demonstration of InP based mid-infrared QCLs with extremely high peak power of 120 W at room temperature opens up the possibility of producing high power THz emission with difference frequency generation through two mid-infrared wavelengths. [reprint (PDF)]
12.	Strain-Induced Metastable Phase Stabilization in Ga₂O₃ Thin Films Yaobin Xu, Ji-hyeon Park, Zhenpeng Yao, Christopher Wolverton, Manijeh Razeghi, Jinsong Wu, and Vinayak P. Dravid Acs Appl Mater Inter 11 (5), 5536 (2019)-- January 10, 2019 ...[Visit Journal] It is well known that metastable and transient structures in bulk can be stabilized in thin films via epitaxial strain (heteroepitaxy) and appropriate growth conditions that are often far from equilibrium. However, the mechanism of heteroepitaxy, particularly how the nominally unstable or metastable phase gets stabilized, remains largely unclear. This is especially intriguing for thin film Ga₂O₃, where multiple crystal phases may exist under varied growth conditions with spatial and dimensional constraints. Herein, the development and distribution of epitaxial strain at the Ga₂O₃/Al₂O₃ film-substrate interfaces is revealed down to the atomic resolution along different orientations, with an aberration-corrected scanning transmission electron microscope (STEM). Just a few layers of metastable α-Ga₂O₃ structure were found to accommodate the misfit strain in direct contact with the substrate. Following an epitaxial α-Ga₂O₃ structure of about couple unit cells, several layers (4~5) of transient phase appear as the intermediate structure to release the misfit strain. Subsequent to this transient crystal phase, the nominally unstable κ-Ga₂O₃ phase is stabilized as the major thin film phase form. We show that the epitaxial strain is gracefully accommodated by rearrangement of the oxygen polyhedra. When the structure is under large compressive strain, Ga3+ ions occupy only the oxygen octahedral sites to form a dense structure. With gradual release of the compressive strain, more and more Ga3+ ions occupy the oxygen tetrahedral sites, leading to volumetric expansion and the phase transformation. The structure of the transition phase is identified by high resolution electron microscopy (HREM) observation, complemented by the density functional theory (DFT) calculations. This study provides insights from the atomic scale and their implications for the design of functional thin film materials using epitaxial engineering. [reprint (PDF)]
12.	Near milliwatt power AlGaN-based ultraviolet light emitting diodes based on lateral epitaxial overgrowth of AlN on Si(111) Y. Zhang, S. Gautier, C. Cho, E. Cicek, Z, Vashaei, R. McClintock, C. Bayram, Y. Bai and M. Razeghi Applied Physics Letters, Vol. 102, No. 1, p. 011106-1-- January 7, 2013 ...[Visit Journal] We report on the growth, fabrication, and device characterization of AlGaN-based thin-film ultraviolet (UV) (λ ∼ 359 nm) light emitting diodes (LEDs). First, AlN/Si(111) template is patterned. Then, a fully coalesced 7-μm-thick lateral epitaxial overgrowth (LEO) of AlN layer is realized on patterned AlN/Si(111) template followed by UV LED epi-regrowth. Metalorganic chemical vapor deposition is employed to optimize LEO AlN and UV LED epitaxy. Back-emission UV LEDs are fabricated and flip-chip bonded to AlN heat sinks followed by Si(111) substrate removal. A peak pulsed power and slope efficiency of ∼0.6 mW and ∼1.3 μW/mA are demonstrated from these thin-film UV LEDs, respectively. For comparison, top-emission UV LEDs are fabricated and back-emission LEDs are shown to extract 50% more light than top-emission ones. [reprint (PDF)]
12.	Optimizing facet coating of quantum cascade lasers for low power consumption Y. Bai, S.R. Darvish, N. Bandyopadhyay, S. Slivken and M. Razeghi Journal of Applied Physics, Vol. 109, No. 5, p. 053103-1-- March 1, 2011 ...[Visit Journal] Typical high power consumption (∼10 W) of mid-infrared quantum cascade lasers (QCLs) has been a serious limitation for applications in battery powered systems. A partial high-reflection (PHR) coating technique is introduced for power downscaling with shorter cavity lengths. The PHR coating consists of a double layer dielectric of SiO₂ and Ge. With this technique, a 4.6 μm QCL with an ultra low threshold power consumption of less than a watt (0.83 W) is demonstrated in room temperature continuous wave operation. At 25°C, the maximum output power and wall plug efficiency are 192 mW and 8.6%, respectively. [reprint (PDF)]
12.	High Detectivity InAs Quantum-Dot Infrared Photodetectors Grown on InP by Metalorganic Chemical Vapor Deposition W. Zhang, H. Lim, M. Taguchi, S. Tsao, B. Movaghar, and M. Razeghi Applied Physics Letters, 86 (19)-- May 9, 2005 ...[Visit Journal] We report a high-detectivity InAs quantum-dot infrared photodetector. The InAs quantum dots were grown by self-assembly on InP substrates via low-pressure metal–organic chemical–vapor deposition. Highly uniform quantum dots with a density of 4×10¹⁰ cm² were grown on a GaAs/InP matrix. Photoresponse was observed at temperatures up to 160 K with a peak of 6.4 µm and cutoff of 6.6 µm. Very low dark currents and noise currents were obtained by inserting Al_0.48In_0.52As current blocking layers. The background-limited performance temperature was 100 K. A detectivity of 1.0×10¹⁰ cm·Hz^½/W was obtained at 77 K with a bias of –1.1 V. [reprint (PDF)]
12.	Responsivity and Noise Performance of InGaAs/InP Quantum Well Infrared Photodetectors C. Jelen, S. Slivken, T. David, G. Brown, and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] Dark current nose measurements were carried out between 10 and 104 Hz at T = 80K on two InGaAs/InP quantum well IR photo detectors (QWIPs) designed for 8 μm IR detection. Using the measured noise data, we have calculated the thermal generation rate, bias-dependent gain, electron trapping probability, and electron diffusion length. The calculated thermal generation rate is similar to AlGaAs/GaAs QWIPs with similar peak wavelengths, but the gain is 50X larger, indicating improved transport and carrier lifetime are obtained in the binary InP barriers. As a result, a large responsivity of 7.5 A/W at 5V bias and detectivity of 5 X 10¹¹ cm·Hz^½/W at 1.2 V bias were measured for the InGaAs/InP QWIPs at T = 80K. [reprint (PDF)]
12.	Very Long Wavelength Infrared Type-II Detectors Operating at 80K H. Mohseni, A. Tahraoui, J. Wojkowski, M. Razeghi, G.J. Brown, W.C. Mitchel, and Y.S. Park Applied Physics Letters 77 (11)-- September 11, 2000 ...[Visit Journal] We report a demonstration of very long wavelength infrared detectors based on InAs/GaSb superlattices operating at T = 80 K. Detector structures with excellent material quality were grown on an optimized GaSb buffer layer on GaAs semi-insulating substrates. Photoconductive devices with 50% cutoff wavelength of λ_c = 17 μm showed a peak responsivity of about 100 mA/W at T = 80 K. Devices with 50% cutoff wavelengths up to λ_c = 22 μm were demonstrated at this temperature. Good uniformity was obtained over large areas even for the devices with very long cutoff wavelengths. [reprint (PDF)]
12.	Reliability of strain-balanced Ga_0.331In_0.669As/Al_0.659In_0.341As/InP quantum-cascade lasers under continuous-wave room-temperature operation A. Evans and M. Razeghi Applied Physics Letters, 88 (26)-- June 26, 2006 ...[Visit Journal] Constant current aging is reported for two randomly selected high-reflectivity-coated QCLs with an output power over 100 mW. QCLs are tested under continuous-wave operation at a heat sink temperature of 298 K(25 °C) corresponding to an internal temperature of 378 K (105 °C). Over 4000 h of continuous testing is reported without any decrease in output power. [reprint (PDF)]
12.	High quality LEO growth and characterization of GaN films on Al₂O₃ and Si substrates M. Razeghi, P. Kung, D. Walker, M. Hamilton, and J. Diaz SPIE International Conference on Solid State Crystals, Zakopane, Poland; Proceedings 3725-- October 12, 1998 ...[Visit Journal] We report the lateral epitaxial overgrowth (LEO) of GaN films on (00.1) Al₂O₃ and (111) Si substrates by metalorganic chemical vapor deposition. The LEO on Si substrates was possible after achieving quasi monocrystalline GaN template films on (111) Si substrates. X-ray diffraction, photoluminescence, scanning electron microscopy and atomic force microscopy were used to assess the quality of the LEO films. Lateral growth rates more than 5 times as high as vertical growth rates were achieved for both LEO growths of GaN on sapphire and silicon substrates. [reprint (PDF)]
12.	Solar-blind photodetectors based on Ga₂O₃ and III-nitrides Ryan McClintock; Alexandre Jaud; Lakshay Gautam; Manijeh Razeghi Proc. SPIE 11288, Quantum Sensing and Nano Electronics and Photonics XVII, 1128803-- January 31, 2020 ...[Visit Journal] Recently, there has been a surge of interest in the wide bandgap semiconductors for solar blind photo detectors (SBPD). This work presents our recent progress in the growth/doping of AlGaN and Ga₂O₃ thin films for solar blind detection applications. Both of these thin films grown are grown by metal organic chemical vapor deposition (MOCVD) in the same Aixtron MOCVD system. Solar-blind metal-semiconductor-metal photodetectors were fabricated with Ga₂O₃. Spectral responsivity studies of the MSM photodetectors revealed a peak at 261 nm and a maximum EQE of 41.7% for a −2.5 V bias. We have also demonstrated AlGaN based solar-blind avalanche photodiodes with a gain in excess of 57,000 at ~100 volts of reverse bias. This gain can be attributed to avalanche multiplication of the photogenerated carriers within the device. Both of these devices show the potential of wide bandgap semiconductors for solar blind photo detectors. [reprint (PDF)]
12.	Growth of Ga0.47In0.53As‐InP quantum wells by low pressure metalorganic chemical vapor deposition M. Razeghi; J. P. Hirtz; U. O. Ziemelis; C. Delalande; B. Etienne; M. Voos Appl. Phys. Lett. 43, 585–587 (1983)-- September 15, 1983 ...[Visit Journal] We describe the growth of multiquantum well and single quantum well Ga0 ,47 InOS3 As-InP structures by low pressure metalorganic chemical vapor deposition. The multi well structure consists of 2S-, SO-, 100-, and 200-A quantum wells (Ga0 ,47 InOS3 As layers) separated by SOO-A barriers (InP layers). Auger measurements indicate the presence offour distinct wells with abrupt boundaries. Photoluminescence measurements are consistent with the existence of four wells; however, deviations are noted between experimentally determined and theoretically predicted recombination energies. An analogous situation exists for the single (SO and 100 A) quantum well structures. Possible explanations, including variation of well composition, variation of well thickness, and participation of impurities in the recombination process are suggested. [reprint (PDF)]
12.	Deep Fe and intrinsic defect levels in Ga0.47In0.53As/InP K.‐H. Goetz; D. Bimberg; K.‐A. Brauchle; H. Jürgensen; J. Selders; M. Razeghi; E. Kuphal K.‐H. Goetz, D. Bimberg, K.‐A. Brauchle, H. Jürgensen, J. Selders, M. Razeghi, E. Kuphal; Deep Fe and intrinsic defect levels in Ga0.47In0.53As/InP. Appl. Phys. Lett. 1 February 1985; 46-- February 1, 1985 ...[Visit Journal] Two deep traps in Ga0.47In0.53As/InP:Fe at a depth of 110 meV and 150 meV, respectively, are observed for the first time using low‐temperature photoluminescence and deep level transient spectroscopy. The dependence of luminescence intensity on the growth process itself (liquid phase epitaxy, vapor phase epitaxy, and metalorganic chemical vapor deposition) and its parameters (growth temperature, layer thickness) and the substrate doping is reported and leads to the unambigous identification of the 150‐meV acceptorlike trap as being caused by Fe impurities. Fe diffuses from the substrate to the epitaxial layer during the growth process. This outdiffusion is less pronounced for layers grown at lower temperature. The level at 110 meV which is also observed in layers grown on InP:S substrate is tentatively assigned to an intrinsic defect of Ga0.47In0.53As. [reprint (PDF)]
12.	Defects in Organometallic Vapor-Phase Epitaxy-Grown GaInP Layers Feng S.L., Bourgoin J.C., Omnes F., and Razeghi M. Applied Physics Letters 59 (8), p. 941-- May 28, 1991 ...[Visit Journal] Non-intentionally doped metalorganic vapor‐phase epitaxy Ga_1−x InxP layers, having an alloy composition (x = 0.49) corresponding to a lattice matched to GaAs, grown by metalorganic chemical vapor deposition, have been studied by capacitance‐voltage and deep-level transient spectroscopy techniques. They are found to exhibit a free‐carrier concentration at room temperature of the order of 10¹⁵ cm⁻³. Two electron traps have been detected. The first one, at 75 meV below the conduction band, is in small concentration (∼10¹³ cm⁻³) while the other, at about 0.9 eV and emitting electrons above room temperature, has a concentration in the range 10¹⁴–10¹⁵ cm⁻³. [reprint (PDF)]
12.	Electrical Transport Properties of Highly Doped N-type GaN Epilayers H.J. Lee, M.G. Cheong, E.K. Suh, and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] Temperature-dependent Hall-effects in MOCVD-grown Si-doped GaN epilayers were measured as a function of temperature in the range 10-800 K. The results were satisfactorily analyzed in terms of a two-band model including the (Gamma) and impurity bands at lower temperatures than room. The (Gamma) band electrons are dominant only high temperatures. The ionized impurity scattering is the most important in the (Gamma) band except at very high temperatures. [reprint (PDF)]
12.	High Quantum Efficiency Solar-Blind Photodetectors R. McClintock, A. Yasan, K. Mayes, D. Shiell, S. Darvish, P. Kung and M. Razeghi SPIE Conference, Jose, CA, Vol. 5359, pp. 434-- January 25, 2004 ...[Visit Journal] We report AlGaN-based back-illuminated solar-blind p-i-n photodetectors with a record peak responsivity of 150 mA/W at 280 nm, corresponding to a high external quantum efficiency of 68%, increasing to 74% under 5 volts reverse bias. Through optimization of the p-AlGaN layer, we were able to remove the out-of-band negative photoresponse originating from the Schottky-like p-type metal contact, and hence significantly improve the degree of solar-blindness [reprint (PDF)]
12.	The quantum Hall effect in modulation doped In0.53Ga0.47As-InP heterojunctions Y. Guldner, J.P. Hirtz, J.P. Vieren, P. Voisin, M. Voos, M. Razeghi Journal de Physique Lettres, 43 (16), pp.613-616 (1982)-- November 30, 1999 ...[Visit Journal] We report the first observation of the quantum Hall effect in modulation doped In0.53Ga0.47As-InP heterojunctions at 4.2 and 1.5 K. The results are then compared to data obtained in a GaAs-AlxGa1-xAs heterojunction having similar electronic characteristics. [reprint (PDF)]
12.	Delta-doping optimization for high qualityp-type GaN C. Bayram, J.L. Pau, R. McClintock and M. Razeghi Journal of Applied Physics, Vol. 104, No. 8-- October 15, 2008 ...[Visit Journal] Delta-doping is studied in order to achieve high quality p-type GaN. Atomic force microscopy, x-ray diffraction, photoluminescence, and Hall measurements are performed on the samples to optimize the delta-doping characteristics. The effect of annealing on the electrical, optical, and structural quality is also investigated for different delta-doping parameters. Optimized pulsing conditions result in layers with hole concentrations near 10¹⁸ cm⁻³ and superior crystal quality compared to conventional p-GaN. This material improvement is achieved thanks to the reduction in the Mg activation energy and self-compensation effects in delta-doped p-GaN. [reprint (PDF)]
12.	p-Type thin film field effect transistors based on lithium-doped nickel oxide channels grown by pulsed laser deposition V. E. Sandana; D. J. Rogers; F. H. Teherani; P. Bove; R. McClintock; M. Razeghi SPIE Proceedings Volume 10919, Oxide-based Materials and Devices X; 109191H -- March 12, 2019 ...[Visit Journal] Staggered back-gated Field Effect Transistor (FET) structures were made by growing Li-doped NiO on Si₃N₄/SiO₂/Si (111) using room temperature pulsed laser deposition. Optical studies showed over 80% transmission for the NiO:Li channel at wavelengths > 500nm. The MISFET revealed rectifying transfer characteristics, with a V_ON close to zero, a channel mobility of ~ 1 cm²/V·s, a gate leakage current (at +5V) of 0.8 mA and an ION/IOFF ratio (at a Vgs of −15V) of ~ 10³. The transistors showed enhancement-mode output characteristics indicative of a p-type channel with sharp pinchoff, hard saturation, a comparatively high (milliampere range) Id and a relatively low on-resistance of ~11 kΩ. Hence the adoption of Li doping in NiO channels would appear to be a promising approach to obtain p-type TFTs with superior transparency, speed and energy efficiency. [reprint (PDF)]
12.	InAsSbP/InAsSb/InAs Diode Lasers Emitting at 3.2 μm Grown by Metalorganic Chemical Vapor Deposition D. Wu, E. Kaas, J. Diaz, B. Lane, A. Rybaltowski, H.J. Yi, and M. Razeghi IEEE Photonics Technology Letters 9 (2)-- February 1, 1997 ...[Visit Journal] InAsSb-InAsSbP double heterostructure diode lasers have been grown by metal-organic chemical vapor deposition on (100) InAs substrates. High-output powers of 660 mW in pulse mode and 300 mW in continuous wave operation with 400-μm cavity length and 100-μm-wide aperture at 78 K have been obtained. These devices showed low threshold current density of 40 A/cm2, low internal loss of 3.0 cm/sup -1/, far-field /spl theta//sub /spl perp// of 34/spl deg/ with differential efficiency of 90% at 78 K, and high operating temperatures of 220 K. [reprint (PDF)]
12.	Recent Advances in LWIR Type-II InAs/GaSb Superlattice Photodetectors and Focal Plane Arrays at the Center for Quantum Devices M. Razeghi, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, M.Z. Tidrow, and V. Nathan IEEE Proceedings, Vol. 97, No. 6, p. 1056-1066-- June 1, 2009 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs, and imaging applications. They now appear to be a possible alternative to the state-of-the-art HgCdTe (MCT) technology in the long and very long wavelength infrared regimes. At the Center for Quantum Devices, we have successfully realized very high quantum efficiency, very high dynamic differential resistance R₀A - product LWIR Type – II InAs/GaSb superlattice photodiodes with efficient surface passivation techniques. The demonstration of high quality LWIR Focal Plane Arrays that were 100 % fabricated in - house reaffirms the pioneer position of this university-based laboratory. [reprint (PDF)]
12.	Roadmap of Semiconductor Infrared Lasers and Detectors for the 21st Century M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] Since the first discovery, semiconductor infrared lasers and detectors have found many various applications in military, communications, medical, and industry sections. In this paper, the current status of semiconductor infrared lasers and detectors will be reviewed. Advantages and disadvantages of different methods and techniques is discussed later. Some basic physical limitations of current technology are studied and the direction to overcome these problems will be suggested. [reprint (PDF)]
12.	High Frequency Extended Short-Wavelength Infrared Heterojunction Photodetectors Based on InAs/GaSb/AlSb Type-II Superlattices Romain Chevallier, Abbas Haddadi, Ryan McClintock, Arash Dehzangi , Victor Lopez-Dominguez, Pedram Khalili Amiri, Manijeh Razeghi IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 6-- December 1, 2018 ...[Visit Journal] InAs/GaSb/AlSb type-II superlattice-based photodetectors, with 50% cut-off wavelength of 2.1 µm and a −3 dB cut-off frequency of 4.8 GHz, are demonstrated, for 10 µm diameter circular mesas under 15 V applied reverse bias. A study of the cut-off frequency with applied bias and mesa size was performed to evaluate some of the limiting factors of photodetectors high frequency performance. [reprint (PDF)]
12.	Intermixing of GaInP/GaAs Multiple Quantum Wells C. Francis, M.A. Bradley, P. Boucaud, F.H. Julien and M. Razeghi Applied Physics Letters 62 (2)-- January 11, 1993 ...[Visit Journal] The intermixing of GaInP‐GaAs superlattices induced by a heat treatment is investigated as a function of the annealing temperature and duration. Photoluminescence experiments reveal a large red shift of the effective band gap of the annealed quantum wells thus indicating a dominant self‐diffusion of the group III atoms which is confirmed by secondary ion mass spectroscopic measurements. For long enough annealing durations, the red shift saturates and even decreases due to the competing slower self‐diffusion of the group V atoms. Experiments are well understood based on a simple diffusion model. [reprint (PDF)]
12.	High-power InGaAsP/GaAs 0.8 μm laser diodes and peculiarities of operational characteristics J. Diaz, I. Eliashevich, X. He, H. Yi, L. Wang, E. Kolev, D. Garbuzov, and M. Razeghi Applied Physics Letters 65 (8)-- August 22, 1994 ...[Visit Journal] High-power operation of 3 W in pulse mode, 750 mW in quasi-continuous wave and 650 mW in continuous wave per uncoated facet from 100 μm aperture has been demonstrated for 1 mm long cavity InGaAsP/GaAs 808 nm laser diodes prepared by low-pressure metalorganic chemical vapor deposition. Threshold current density of 300 A/cm², differential efficiency of 1.1 W/A, T₀=155 °C, transverse beam divergence of 27°, and less than 2 nm linewidth at 808 nm have been measured. No degradation has been observed after 1000 h of operation in a quasi-continuous wave regime. [reprint (PDF)]
12.	High‐quality GaAs/Ga0.49In0.51P superlattices grown on GaAs and silicon substrates by low‐pressure metalorganic chemical vapor deposition Available M. Razeghi; Ph. Maurel; F. Omnes; M. Defour; C. Boothroyd; W. M. Stobbs; M. Kelly J. Appl. Phys. 63, 4511–4514 (1988) -- May 1, 1988 ...[Visit Journal] We report the successful growth of Ga0.49 Iuo.5 ! P-GaAs superlattices on GaAs and Si substrates by low-pressure metalorganic chemical vapor deposition. The high quality of the structure grown on GaAs and silicon substrates has been evidenced by transmission electron microscopy photographs, that show very sharp interfaces between GaAs wells and Gao.49InO.51 P barriers, with perfect control of thicknesses and compositions. Classical Hall measurements performed on the sample further demonstrated the presence of a twodimensional electron ga.<; with a mobility at T = 4 K , fL (4 K) = 50000 cm2 1V Is, and a carrier concentration n _ (4 K) = 2,9 X 1011 em -2. GaAs/Gao.49 InO. 51 P superlattices have been used, as well as buffer layer in order to grow GaAs on silicon substrates. Mirrorlike single-crystal GaAs has thus been obtained. A GaInP IGaAs heterostructure with electron HaH mobility as high as 6000 cm2 /V Is at 300 K and 80000 cm2 /V Is at 4 K has been grown, which is the highest mobility that has yet been reported for these materials, [reprint (PDF)]

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