Center for Quantum Devices - Most Downloaded Journal Articles

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1.	Negative luminescence of InAs/GaSb superlattice photodiodes F. Fuchs, D. Hoffman, A. Gin, A. Hood, Y. Wei, and M. Razeghi Phys. Stat. Sol. C 3 (3)-- February 22, 2006 ...[Visit Journal] The emission behaviour of InAs/GaSb superlattice photodiodes has been studied in the spectral range between 8 µm and 13 μm. With a radiometric calibration of the experimental set-up the internal quantum efficiency has been determined in the temperature range between 80 K and 300 K for both, the negative and positive luminescence. The quantitative analysis of the internal quantum efficiency of the non-equilibrium radiation enables the determination of the Auger coefficient. [reprint (PDF)]
1.	Back-illuminated solar-blind photodetectors for imaging applications R. McClintock, A. Yasan, K. Mayes, P. Kung, and M. Razeghi SPIE Conference, Jose, CA, Vol. 5732, pp.175-- January 22, 2005 ...[Visit Journal] Back-illuminated solar-blind ultraviolet p-i-n photodetectors and focal plane arrays are investigated. We initially study single-pixel devices and then discuss the hybridization to a read-out integrated circuit to form focal plane arrays for solar-blind UV imaging. [reprint (PDF)]
1.	Advanced InAs/GaSb Superlattice Photovoltaic Detectors for Very-Long Wavelength Infrared Applications Y. Wei, A. Gin, M. Razeghi, and G.J. Brown Applied Physics Letters 80 (18)-- May 6, 2002 ...[Visit Journal] We report on the temperature dependence of the photoresponse of very long wavelength infrared type-II InAs/GaSb superlattice based photovoltaic detectors grown by molecular-beam epitaxy. The detectors had a 50% cutoff wavelength of 18.8 μm and a peak current responsivity of 4 A·W^-1 at 80 K. A peak detectivity of 4.5×10¹⁰ cm· Hz^½·W^-1 was achieved at 80 K at a reverse bias of 110 mV. The generation–recombination lifetime was 0.4 ns at 80 K. The cutoff wavelength increased very slowly with increasing temperature with a net shift from 20 to 80 K of only 1.2 μm [reprint (PDF)]
1.	Al_xGa_1-xN Materials and Device Technology for Solar Blind Ultraviolet Photodetector Applications R. McClintock, P. Sandvik, K. Mi, F. Shahedipour, A. Yasan, C. Jelen, P. Kung, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 4288, pp. 219-- January 22, 2001 ...[Visit Journal] There has been a growing interest for the development of solar blind ultraviolet (UV) photodetectors for use in a variety of applications, including early missile threat warning, flame monitoring, UV radiation monitoring and chemical/biological reagent detection. The Al_xGa_1-xN material system has emerged as the most promising approach for such devices. However, the control of the material quality and the device technology are still rather immature. We report here the metalorganic chemical vapor deposition, the n-type and the p-type doping of high quality Al_xGa_1-xN thin films on sapphire substrates over a wide range of Al concentration. [reprint (PDF)]
1.	Exciton localization in group-III nitride quantum wells V.I. Litvinov and M. Razeghi Physical Review B 59 (15)-- May 15, 1999 ...[Visit Journal] Exciton density of states broadened by compositional disorder in the group-III nitride quantum well is calculated. The excitonic photoluminescence linewidth is estimated and related to the material parameters of the alloy for two limiting cases of two-dimensional (2D) and three-dimensional excitons in the quantum well. It is shown that the effect of the compositional fluctuations depends on dimensionality of the exciton: the 2D excitons are more sensitive to the inhomogeneities than 3D ones. The broad near-band-gap energy states distribution for quasi-two-dimensional excitons is consistent with the experimental evidence of the spontaneous and stimulated emissions from excitonic states localized on compositional fluctuations. [reprint (PDF)]
1.	Band-gap narrowing and potential fluctuation in Si-doped GaN I.H. Lee, J.J. Lee, P. Kung, F.J. Sanchez, and M. Razeghi Applied Physics Letters 74 (1)-- January 4, 1999 ...[Visit Journal] We investigate the optical properties of two sets of Si-doped GaN epitaxial layers with different degree of compensation. The electron concentration dependence of the band-gap energy measured by photoluminescence is interpreted as band-gap narrowing effect and evaluated by a simple relation. The photoluminescence peak positions of heavily compensated samples are shifted downward with respect to those of moderately compensated samples, and the down shift becomes larger at higher electron density. Based on analysis of photoluminescence spectra, these prominent behaviors are accounted for by band-edge potential fluctuation associated with inhomogeneous residual impurities. [reprint (PDF)]
1.	Growth and characterization of InSbBi for long wavelength infrared photodetectors J.J. Lee, J.D. Kim, and M. Razeghi Applied Physics Letters 70 (24)-- June 16, 1997 ...[Visit Journal] The epitaxial growth of InSbBi ternary alloys by low-pressure metalorganic chemical vapor deposition is reported on. X-ray diffraction spectra showed well resolved peaks of InSbBi and InSb films. Bi incorporation was confirmed by energy dispersive x-ray analysis. Photoresponse spectrum up to 9.3 μm which corresponds to 0.13 eV energy band gap has been measured in a sample with Bi composition of 5.8 at.% at 77 K. Electron mobility at room temperature ranges from 44 100 to 4910 cm²/V·s as Bi composition increases. [reprint (PDF)]
1.	Growth of Al_xGa_1-xN:Ge on sapphire and silicon substrates X. Zhang, P. Kung, A. Saxler, D. Walker, T.C. Wang, and M. Razeghi Applied Physics Letters 67 (12)-- September 18, 1995 ...[Visit Journal] Al_xGa_1–xN were grown on (00.1) sapphire and (111) silicon substrates in the whole composition range (0 <= x <= 1). The high optical quality of the epilayers was assessed by room-temperature optical absorption and photoluminescence measurements. Layers with higher Al composition are more resistive. Resistive Al_xGa_1–xN epilayers were successfully doped with Ge and free-electron concentration as high as 3 × 10¹⁹ cm^–3 was achieved. [reprint (PDF)]
1.	Ga₂O₃ Metal-oxide-semiconductor Field Effect Transistors on Sapphire Substrate by MOCVD Ji-Hyeon Park, Ryan McClintock and Manijeh Razeghi Semiconductor Science and Technology, Volume 34, Number 8-- June 26, 2019 ...[Visit Journal] Si-doped gallium oxide (Ga₂O₃) thin films were grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) and fabricated into metal oxide semiconductor field effect transistors (MOSFETs). The Ga₂O₃ MOSFETs exhibited effective gate modulation of the drain current with a complete channel pinch-off for VG < −25 V, and the three-terminal off-state breakdown voltage was 390 V. The device shows a very low gate leakage current (~50 pA/mm), which led to a high on/off ratio of ~10⁸. These transistor characteristics were stable from room temperature to 250 °C [reprint (PDF)]
1.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
1.	Surface plasmon enhanced light emission from AlGaN-based ultraviolet light-emitting diodes grown on Si (111) Chu-Young Cho, Yinjun Zhang, Erdem Cicek, Benjamin Rahnema, Yanbo Bai, Ryan McClintock, and Manijeh Razeghi Appl. Phys. Lett. 102, 211110 (2013)-- May 31, 2013 ...[Visit Journal] We report on the development of surface plasmon (SP) enhanced AlGaN-based multiple quantum wells (MQWs) ultraviolet (UV) light-emitting diodes (LEDs) grown on silicon (111) substrates. In order to generate SP-coupling with the radiating dipoles in MQWs, an aluminum layer is selectively deposited in holes etched in the top p-AlGaN to p-GaN layers. After flip-chip bonding and substrate removal, an optical output power of ∼1.2 mW is achieved at an emission wavelength of 346 nm; the output power of these UV LEDs with Al layer is increased by 45% compared to that of conventional UV LEDs without Al layer. This enhancement can be attributed to an increase in the spontaneous emission rate and improved internal quantum efficiency via resonance coupling between excitons in MQWs and SPs in the aluminum layer. [reprint (PDF)]
1.	Toward realizing high power semiconductor terahertz laser sources at room temperature Manijeh Razeghi Proc. SPIE 8023, Terahertz Physics, Devices, and Systems V: Advance Applications in Industry and Defense, 802302 (May 25, 2011)-- May 25, 2011 ...[Visit Journal] The terahertz (THz) spectral range offers promising applications in science, industry, and military. THz penetration through nonconductors (fabrics, wood, plastic) enables a more efficient way of performing security checks (for example at airports), as illegal drugs and explosives could be detected. Being a non-ionizing radiation, THz radiation is environment-friendly enabling a safer analysis environment than conventional X-ray based techniques. However, the lack of a compact room temperature THz laser source greatly hinders mass deployment of THz systems in security check points and medical centers. In the past decade, tremendous development has been made in GaAs/AlGaAs based THz Quantum Cascade Laser (QCLs), with maximum operating temperatures close to 200 K (without magnetic field). However, higher temperature operation is severely limited by a small LO-phonon energy (∼ 36 meV) in this material system. With a much larger LO-phonon energy of ∼ 90 meV, III-Nitrides are promising candidates for room temperature THz lasers. However, realizing high quality material for GaN-based intersubband devices presents a significant challenge. Advances with this approach will be presented. Alternatively, recent demonstration of InP based mid-infrared QCLs with extremely high peak power of 120 W at room temperature opens up the possibility of producing high power THz emission with difference frequency generation through two mid-infrared wavelengths. [reprint (PDF)]
1.	Room temperature neagtive differential resistance characteristics of polar III-nitride resonant tunneling diodes C. Bayram, Z. Vashaei, and M. Razeghi Applied Physics Letters, Vol. 97, No. 9, p. 092104-1-- August 30, 2010 ...[Visit Journal] III-nitride resonant tunneling diodes (RTDs), consisting Al_0.2Ga_0.8N/GaN double-barrier (DB) active layers, were grown on c-plane lateral epitaxial overgrowth (LEO) GaN/sapphire and c-plane freestanding (FS) GaN. RTDs on both templates, fabricated into mesa diameters ranging from 5 to 35 μm, showed negative differential resistance (NDR) at room temperature. NDR characteristics (voltage and current density at NDR onset and current-peak-to-valley ratio) were analyzed and reported as a function of device size and substrate choice. Our results show that LEO RTDs perform as well as FS ones and DB active layer design and quality have been the bottlenecks in III-nitride RTDs. [reprint (PDF)]
1.	Material and design engineering of (Al)GaN for high-performance avalanche photodiodes and intersubband applications M. Razeghi and C. Bayram SPIE Proceedings, Dresden, Germany (May 4-6, 2009), Vol. 7366, p. 73661F-1-- May 20, 2009 ...[Visit Journal] Numerous applications in scientific, medical, and military areas demand robust, compact, sensitive, and fast ultraviolet (UV) detection. Our (Al)GaN photodiodes pose high avalanche gain and single-photon detection efficiency that can measure up to these requirements. Inherit advantage of back-illumination in our devices offers an easier integration and layout packaging via flip-chip hybridization for UV focal plane arrays that may find uses from space applications to hostile-agent detection. Thanks to the recent (Al)GaN material optimization, III-Nitrides, known to have fast carrier dynamics and short relaxation times, are employed in (Al)GaN based superlattices that absorb in near-infrared regime. In this work, we explain the origins of our high performance UV APDs, and employ our (Al)GaN material knowledge for intersubband applications. We also discuss the extension of this material engineering into the far infrared, and even the terahertz (THz) region. [reprint (PDF)]
1.	Delta-doping optimization for high qualityp-type GaN C. Bayram, J.L. Pau, R. McClintock and M. Razeghi Journal of Applied Physics, Vol. 104, No. 8-- October 15, 2008 ...[Visit Journal] Delta-doping is studied in order to achieve high quality p-type GaN. Atomic force microscopy, x-ray diffraction, photoluminescence, and Hall measurements are performed on the samples to optimize the delta-doping characteristics. The effect of annealing on the electrical, optical, and structural quality is also investigated for different delta-doping parameters. Optimized pulsing conditions result in layers with hole concentrations near 10¹⁸ cm⁻³ and superior crystal quality compared to conventional p-GaN. This material improvement is achieved thanks to the reduction in the Mg activation energy and self-compensation effects in delta-doped p-GaN. [reprint (PDF)]
1.	High operating temperature 320 x 256 middle-wavelength infrared focal plane array imaging based on an InAs/InGaAs/InAlAs/InP quantum dot infrared photodetector S. Tsao, H. Lim, W. Zhang, and M. Razeghi Virtual Journal of Nanoscale Science and Technology-- May 28, 2007 ...[Visit Journal][reprint (PDF)]
1.	Gain and recombination dynamics of quantum-dot infrared photodetecto H. Lim, B. Movaghar, S. Tsao, M. Taguchi, W. Zhang, A.A. Quivy, and M. Razeghi Virtual Journal of Nanoscale Science & Technology-- December 4, 2006 ...[Visit Journal][reprint (PDF)]
1.	Non-equilibrium radiation of long wavelength InAs/GaSb superlattice photodiodes D. Hoffman, A. Hood, F. Fuchs and M. Razeghi Journal of Applied Physics 99-- February 15, 2006 ...[Visit Journal] The emission behavior of binary-binary type-II InAs/GaSb superlattice photodiodes has been studied in the spectral range between 8 and 13 μm. With a radiometric calibration of the experimental setup the internal and external quantum efficiencies have been determined in the temperature range between 80 and 300 K for both the negative and positive luminescences. [reprint (PDF)]
1.	AlGaN-based deep UV light emitting diodes with peak emission below 255 nm A. Yasan, R. McClintock, K. Mayes, P. Kung, and M. Razeghi SPIE Conference, Jose, CA, Vol. 5732, pp. 197-- January 22, 2005 ...[Visit Journal] We report on the growth and fabrication of AlGaN-based deep ultraviolet light-emitting diodes (LEDs) with peak emission of below 255 nm. In order to achieve such short wavelength UV LEDs, the Al mole fractions in the device layers should be greater than ~60%. This introdues serious challenges on the growth and doping of Al_xGa_1-xN epilayers. However, with the aid of a high-quality AlN template layer and refinement of the growth conditions we have been able to demonstrate UV LEDs emitting below 255 nm. [reprint (PDF)]
1.	Future of Al_xGa_1-xN Materials and Device Technology for Ultraviolet Photodetectors P. Kung, A. Yasan, R. McClintock, S. Darvish, K. Mi, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 4650, pp. 199-- May 1, 2002 ...[Visit Journal] Design of the photodetector structure is one of the key issues in obtaining high performance devices; especially the thickness of the intrinsic region for p-i-n photodiodes is a crucial value and needs to be optimized. We compare the performance of the p-i-n photodiodes with different widths for the depletion region, which shows a trade-off between speed and responsivity of the devices. [reprint (PDF)]
1.	Novel Sb-based Alloys for Uncooled Infrared Photodetector Applications M. Razeghi SPIE Conference, San Jose, CA, -- January 22, 2001 ...[Visit Journal] We report on the growth and characterization of InSbBi, InTlSb, InTlP, and the quaternary alloys for uncooled long- wavelength infrared photodetector applications. The layers were grown on InSb and GaAs substrates by low-pressure metalorganic chemical vapor deposition. The incorporation of Bi and Tl in InSb was investigated with high-resolution x-ray diffraction, energy dispersive x-ray analysis, and optical photoresponse measurements. We also demonstrate the photodetectors fabricated from the grown InSbBi and InTlSb alloys. InSb_0.96Bi_0.04 photoconductive detectors exhibited a responsivity of 3.2 V/W at 77 K. The estimated Johnson noise limited detectivityat 7 micrometers was 1.7 X 10⁸ cm·Hz^½/W at 77 K. A room temperature operating InSb_0.95Bi_0.05 photodetector was also demonstrated.Photoresponse up to 12 micrometers was achieved at 300 K. The responsivity and Johnson noise-limited detectivity at 10.6 μm were 1.9 mV/W and 1.2 X 10⁶ cm·Hz^½/W, respectively. Photoresponse up to 15 μm was achieved at 300 K from quaternary InTlAsSb and InBiAsSb alloys. [reprint (PDF)]
1.	Aluminum gallium nitride short-period superlattices doped with magnesium A. Saxler, W.C. Mitchel, P. Kung and M. Razeghi Applied Physics Letters 74 (14)-- April 9, 1999 ...[Visit Journal] Short-period superlattices consisting of alternating layers of GaN:Mg and AlGaN:Mg were grown by low-pressure organometallic vapor phase epitaxy. The electrical properties of these superlattices were measured as a function of temperature and compared to conventional AlGaN:Mg layers. It is shown that the optical absorption edge can be shifted to shorter wavelengths while lowering the acceptor ionization energy by using short-period superlattice structures instead of bulk-like AlGaN:Mg. [reprint (PDF)]
1.	Interface-induced Suppression of the Auger Recombination in Type-II InAs/GaSb Superlattices H. Mohseni, V.I. Litvinov and M. Razeghi Physical Review B 58 (23)-- December 15, 1998 ...[Visit Journal] The temperature dependence of the nonequilibrium carriers lifetime has been deduced from the measurement of the photocurrent response in InAs/GaSb superlattices. Based on the temperature dependence of the responsivity and modeling of the transport parameters we have found that the carrier lifetime weakly depends on temperature in the high-temperature region. This indicates the temperature dependence of the Auger recombination rate with no threshold that differs it from that in the bulk material and can be attributed to the interface-induced suppression of the Auger recombination in thin quantum wells. [reprint (PDF)]
1.	AlGaN ultraviolet detectors M. Razeghi and A. Rogalski, SPIE Conference, San Jose, CA, -- February 12, 1997 ...[Visit Journal] Hitherto, the semiconductor ultraviolet (UV) detectors have been mainly fabricated using Si. Industries such as the aerospace, automotive, petroleum, and others have continuously provided the impetus pushing the development of fringe technologies which are tolerant of increasingly high temperatures and hostile environments. As a result, the main efforts are currently directed to anew generation of UV detectors fabricated from wide-band-gap semiconductors between them the most promising are diamond and AlGaN. The latest progress in development of AlGaN UV detectors is described in detail. [reprint (PDF)]
1.	p-doped GaAs/Ga_0.51In_0.49P quantum well intersub-band photodetectors J. Hoff, X. He, M. Erdtmann, E. Bigan, M. Razeghi, and G.J. Brown Journal of Applied Physics 78 (3)-- August 1, 1995 ...[Visit Journal] Lattice‐matched p-doped GaAs–Ga_0.51In_0.49P quantum well intersub‐band photodetectors with three different well widths have been grown on GaAs substrates by metal‐organic chemical‐vapor deposition and fabricated into mesa structures. The photoresponse cutoff wavelength varies between 3.5 and 5.5 μm by decreasing the well width from 50 down to 25 Å. Dark current measurements as a function of temperature reveal activation energies for thermionic emission that closely correspond to measured cutoff wavelengths. Experimental results are in reasonable agreement with Kronig–Penney calculations. [reprint (PDF)]

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