Center for Quantum Devices - Most Downloaded Journal Articles

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15.	Development of high power, InP-based quantum cascade lasers on alternative epitaxial platforms Steven Slivken, Nirajman Shrestha, Manijeh Razeghi Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 1289503 (28 January - 1 February 2024, San Francisco) doi: 10.1117/12.3009335 ...[Visit Journal] In this talk, challenges and solutions associated with the monolithic, epitaxial integration of mid- and longwave- infrared, InP-based quantum cascade lasers on GaAs and Si wafers will be discussed. Initial results, including room temperature, high power, and continuous wave operation, will be described. [reprint (PDF)]
15.	Quantum cascade lasers: from tool to product M. Razeghi, Q. Y. Lu, N. Bandyopadhyay, W. Zhou, D. Heydari, Y. Bai, and S. Slivken Optics Express Vol. 23, Issue 7, pp. 8462-8475-- March 25, 2015 ...[Visit Journal] The quantum cascade laser (QCL) is an important laser source in the mid-infrared and terahertz frequency range. The past twenty years have witnessed its tremendous development in power, wall plug efficiency, frequency coverage and tunability, beam quality, as well as various applications based on QCL technology. Nowadays, QCLs can deliver high continuous wave power output up to 5.1 W at room temperature, and cover a wide frequency range from 3 to 300 μm by simply varying the material components. Broadband heterogeneous QCLs with a broad spectral range from 3 to 12 μm, wavelength agile QCLs based on monolithic sampled grating design, and on-chip beam QCL combiner are being developed for the next generation tunable mid-infrared source for spectroscopy and sensing. Terahertz sources based on nonlinear generation in QCLs further extend the accessible wavelength into the terahertz range. Room temperature continuous wave operation, high terahertz power up to 1.9 mW, and wide frequency tunability form 1 to 5 THz makes this type of device suitable for many applications in terahertz spectroscopy, imaging, and communication. [reprint (PDF)]
15.	Investigations on the substrate dependence of the properties in nominally-undoped β-Ga2O3 thin films grown by PLD F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; C. Ton-That ; L. L. C. Lem ; E. Chikoidze ; M. Neumann-Spallart ; Y. Dumont ; T. Huynh ; M. R. Phillips ; P. Chapon ; R. McClintock ; M. Razeghi Proc. SPIE 10105, Oxide-based Materials and Devices VIII, 101051R-OLD-- March 23, 2017 ...[Visit Journal] Nominally-undoped Ga₂O₃ layers were deposited on a-, c- and r-plane sapphire substrates using pulsed laser deposition. Conventional x-ray diffraction analysis for films grown on a- and c-plane sapphire showed the layers to be in the β-Ga₂O₃ phase with preferential orientation of the (-201) axis along the growth direction. Pole figures revealed the film grown on r-plane sapphire to also be in the β-Ga₂O₃ phase but with epitaxial offsets of 29.5°, 38.5° and 64° from the growth direction for the (-201) axis. Optical transmission spectroscopy indicated that the bandgap was ~5.2eV, for all the layers and that the transparency was > 80% in the visible wavelength range. Four point collinear resistivity and Van der Pauw based Hall measurements revealed the β-Ga₂O₃ layer on r-plane sapphire to be 4 orders of magnitude more conducting than layers grown on a- and c-plane sapphire under similar conditions. The absolute values of conductivity, carrier mobility and carrier concentration for the β-Ga₂O₃ layer on r-sapphire (at 20Ω-1.cm^-1, 6 cm²/Vs and 1.7 x 10¹⁹ cm^-3, respectively) all exceeded values found in the literature for nominally-undoped β-Ga₂O₃ thin films by at least an order of magnitude. Gas discharge optical emission spectroscopy compositional depth profiling for common shallow donor impurities (Cl, F, Si and Sn) did not indicate any discernable increase in their concentrations compared to background levels in the sapphire substrate. It is proposed that the fundamentally anisotropic conductivity in β-Ga₂O₃ combined with the epitaxial offset of the (-201) axis observed for the layer grown on r-plane sapphire may explain the much larger carrier concentration, electrical conductivity and mobility compared with layers having the (-201) axis aligned along the growth direction. [reprint (PDF)]
15.	Thermal conductivity tensors of the cladding and active layers of antimonide infrared lasers and detectors Chuanle Zhou, I. Vurgaftman, C. L. Canedy, C. S. Kim, M. Kim, W. W. Bewley, C. D. Merritt, J. Abell, J. R. Meyer, A. Hoang, A. Haddadi, M. Razeghi, and M. Grayson Optical Materials Express. 2013;3(10):1632-1640.-- October 1, 2013 ...[Visit Journal] The in-plane and cross-plane thermal conductivities of the cladding layers and active quantum wells of interband cascade lasers and type-II superlattice infrared detector are measured by the 2-wire 3ω method. The layers investigated include InAs/AlSb superlattice cladding layers, InAs/GaInSb/InAs/AlSb W-active quantum wells, an InAs/GaSb superlattice absorber, an InAs/GaSb/AlSb M-structure, and an AlAsSb digital alloy. The in-plane thermal conductivity of the InAs/AlSb superlattice is 4-5 times higher than the cross-plane value. The isotropic thermal conductivity of the AlAsSb digital alloy matches a theoretical expectation, but it is one order of magnitude lower than the only previously-reported experimental value. [reprint (PDF)]
15.	Photoconductance measurements on InTlSb/InSb/GaAs grown by low-pressure metalorganic chemical vapor deposition P.T. Staveteig, Y.H. Choi, G. Labeyrie, E. Bigan, and M. Razeghi Applied Physics Letters 64 (4)-- January 24, 1994 ...[Visit Journal] We report infrared photoconductors based on InTlSb/InSb grown by low‐pressure metalorganic chemical vapor deposition on semi-insulating GaAs substrates. The photoresponse spectrum extends up to 8 μm at 77 K. The absolute magnitude of the photoresponse is measured as a function of bias. The specific detectivity is estimated to be 3×10⁸ Hz^½·cm·W^-1 at 7 μm wavelength. [reprint (PDF)]
15.	High-power λ ~ 9.5 µm quantum-cascade lasers operating above room temperature in continuous-wave mode J.S. Yu, S. Slivken, A. Evans, S.R. Darvish, J. Nguyen, and M. Razeghi Applied Physics Letters, 88 (9)-- February 27, 2006 ...[Visit Journal] We report high-power continuous-wave (cw) operation of λ~9.5 μm quantum-cascade lasers to a temperature of 318 K. A high-reflectivity-coated 19-μm-wide and 3-mm-long device exhibits cw output powers as high as 150 mW at 288 K and still 22 mW at 318 K. In cw operation at 298 K, a threshold current density of 1.57 kA/cm², a slope efficiency of 391 mW/A, and a maximum wall-plug efficiency of 0.71% are obtained. [reprint (PDF)]
15.	High-Performance InP-Based Mid-IR Quantum Cascade Lasers M. Razeghi IEEE Journal of Selected Topics in Quantum Electronics, Vol. 15, No. 3, May-June 2009, p. 941-951.-- June 5, 2009 ...[Visit Journal] Quantum cascade lasers (QCLs) were once considered as inefficient devices, as the wall-plug efficiency (WPE) was merely a few percent at room temperature. But this situation has changed in the past few years, as dramatic enhancements to the output power andWPE have been made for InP-based mid-IR QCLs. Room temperature continuous-wave (CW) output power as high as 2.8 W and WPE as high as 15% have now been demonstrated for individual devices. Along with the fundamental exploration of refining the design and improving the material quality, a consistent determination of important device performance parameters allows for strategically addressing each component that can be improved potentially. In this paper, we present quantitative experimental evidence backing up the strategies we have adopted to improve the WPE for QCLs with room temperature CW operation. [reprint (PDF)]
15.	First room‐temperature cw operation of a GaInAsP/InP light‐emitting diode on a silicon substrate M. Razeghi; R. Blondeau; M. Defour; F. Omnes; P. Maurel; F. Brillouet Appl. Phys. Lett. 53, 854–855 (1988)-- July 4, 1988 ...[Visit Journal] We report in this letter the first successful fabrication of an InP-GalnAsP light-emitting diode, emitting at 1.15 pm grown by low-pressure metalorganic chemical vapor deposition on a silicon substrate. The device has been operated under continuous wave operation at room temperature for 24 h (with an injection current of 200 rnA), and showed no degradation. [reprint (PDF)]
15.	Growth of AlGaN on silicon substrates: a novel way to make back-illuminated ultraviolet photodetectors Ryan McClintock ; Manijeh Razeghi Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 95550U-- August 28, 2015 ...[Visit Journal] AlGaN, with its tunable wide-bandgap is a good choice for the realization of ultraviolet photodetectors. AlGaN films tend to be grown on foreign substrates such as sapphire, which is the most common choice for back-illuminated devices. However, even ultraviolet opaque substrates like silicon holds promise because, silicon can be removed by chemical treatment to allow back-illumination,1 and it is a very low-cost substrate which is available in large diameters up to 300 mm. However, Implementation of silicon as the solar-blind PD substrates requires overcoming the lattice-mismatch (17%) with the AlxGa1-xN that leads to high density of dislocation and crack-initiating stress. In this talk, we report the growth of thick crack-free AlGaN films on (111) silicon substrates through the use of a substrate patterning and mask-less selective area regrowth. This technique is critical as it decouples the epilayers and the substrate and allows for crack-free growth; however, the masking also helps to reduce the dislocation density by inclining the growth direction and encouraging dislocations to annihilate. A back-illuminated p-i-n PD structure is subsequently grown on this high quality template layer. After processing and hybridizing the device we use a chemical process to selectively remove the silicon substrate. This removal has minimal effect on the device, but it removes the UV-opaque silicon and allows back-illumination of the photodetector. We report our latest results of back-illuminated solar-blind photodetectors growth on silicon. [reprint (PDF)]
15.	Generalized k·p perturbation theory for atomic-scale superlattices H. Yi and M. Razeghi Physical Review B 56 (7)-- August 15, 1997 ...[Visit Journal] We present a generalized k⋅p perturbation method that is applicable for atomic-scale superlattices. The present model is in good quantitative agreement with full band theories with local-density approximation, and approaches results of the conventional k⋅p perturbation method (i.e., Kane’s Hamiltonian) with the envelope function approximation for superlattices with large periods. The indirect band gap of AlAs/GaAs superlattices with short periods observed in experiments is explained using this method. [reprint (PDF)]
15.	Sampled grating, distributed feedback quantum cascade lasers with broad tunability and continuous operation at room temperature S. Slivken, N. Bandyopadhyay, S. Tsao, S. Nida, Y. Bai, Q.Y. Lu and M. Razeghi Applied Physics Letters, Vol. 100, No. 26, p. 261112-1-- June 25, 2012 ...[Visit Journal] A dual-section, single-mode quantum cascade laser is demonstrated in continuous wave at room temperature with up to 114 nm (50 cm⁻¹) of tuning near a wavelength of 4.8 μm. Power above 100 mW is demonstrated, with a mean side mode suppression ratio of 24 dB. By changing the grating period, 270 nm (120 cm⁻¹) of gap-free electrical tuning for a single gain medium has been realized. [reprint (PDF)]
15.	Hole-initiated multiplication in back-illuminated GaN avalanche photodiodes R. McClintock, J.L. Pau, K. Minder, C. Bayram, P. Kung and M. Razeghi Applied Physics Letters, Vol. 90 No. 14, p. 141112-1-- April 2, 2007 ...[Visit Journal] Avalanche p-i-n photodiodes were fabricated on AlN templates for back illumination. Structures with different intrinsic layer thicknesses were tested. A critical electric field of 2.73 MV/cm was estimated from the variation of the breakdown voltage with thickness. From the device response under back and front illumination and the consequent selective injection of holes and electrons in the junction, ionization coefficients were obtained for GaN. The hole ionization coefficient was found to be higher than the electron ionization coefficient as predicted by theory. Excess multiplication noise factors were also calculated for back and front illumination, and indicated a higher noise contribution for electron injection. [reprint (PDF)]
15.	Characterization of high quality GaInP/GaAs superlattices grown on GaAs and Si substrates by gas source molecular beam epitaxy C. Jelen, S. Slivken, X.G. He, and M. Razeghi and S. Shastry Journal of Vacuum Science and Technology B 12 (2)-- March 1, 1994 ...[Visit Journal] We report an analysis of the heteroepitaxial interfaces in high quality GaInP–GaAs superlattices grown simultaneously on GaAs and Si substrates by gas source molecular beam epitaxy. These two superlattices have been studied using high resolution x-ray diffraction measurements. Sharp superlattice satellites, with very little broadening, are observed within a 6° range for the sample on GaAs. Photoluminescence peaks with full widths at half-maximums of 5 and 7 meV are obtained at 4 K for samples with 58 Å wells on GaAs and Si, respectively. Room temperature exciton absorption is observed in the photovoltage measurements for a superlattice grown on Si substrate. The thicknesses determined by x-ray analysis are consistent with those obtained by a Kronig–Penny model fitting of the photovoltage spectroscopy. [reprint (PDF)]
15.	Growth of In_1-xTl_xSb, a New Infrared Material, by Low-Pressure Metalorganic Chemical Vapor Deposition Y.H. Choi, R. Sudharsanan, C, Besikci, and M. Razeghi Applied Physics Letters 63 (3)-- July 19, 1993 ...[Visit Journal] We report the growth of In_1-xTl_xSb, a new III-V alloy for long-wavelength infrared detector applications, by low-pressure metalorganic chemical vapor deposition. In_1-xTl_xSb with good surface morphology was obtained on both GaAs and InSb substrates at a growth temperature of 455 °C. X-ray diffraction measurements showed resolved peaks of In_1-xTl_xSb and InSb films. Infrared absorption spectrum of In_1-xTl_xSb showed a shift toward lower energies compared to InSb spectrum. Hall mobility data on In_1-xTl_xSb/InSb/GaAs structure showed enhanced mobility at low temperatures compared to InSb/GaAs structure. [reprint (PDF)]
15.	Improved performance of quantum cascade lasers through a scalable, manufacturable epitaxial-side-down mounting process A. Tsekoun, R. Go, M. Pushkarsky, M. Razeghi, and C. Kumar N. Patel Proceedings of the National Academy of Sciences 103 (13)-- March 26, 2006 ...[Visit Journal] We report substantially improved performance of high-power quantum cascade lasers (QCLs) by using epitaxial-side-down mounting that provides superior heat dissipation properties. We used aluminum nitride as the heatsink material and gold–tin eutectic solder. We have obtained continuous wave power output of 450 mW at 20°C from mid-IR QCLs. The improved thermal management achieved with epitaxial-side-down mounting combined with a highly manufacturable and scalable assembly process should permit incorporation of mid-IR QCLs in reliable instrumentation. [reprint (PDF)]
15.	320x256 infrared focal plane array based on type-II InAs/GaSb superlattice with a 12 μm cutoff wavelength P.Y. Delaunay, B.M. Nguyen, D. Hoffman, and M. Razeghi SPIE Porceedings, Vol. 6542, Orlando, FL 2007, p. 654204-- April 9, 2007 ...[Visit Journal] In the past few years, significant progress has been made in the structure design, growth and processing of Type-II InAs/GaSb superlattice photodetectors. Type-II superlattice demonstrated its ability to perform imaging in the middle and long infra-red range, becoming a potential competitor for technologies such as QWIP and HgCdTe. Using an empirical tight-binding model, we developed a superlattice design that matches the lattice parameter of GaSb substrates and presents a cutoff wavelength of 12 μm. Electrical and optical measurements performed on single element detectors at 77 K showed an R₀A averaging 13 Ω·cm² and a quantum efficiency as high as 54%. We demonstrated high quality material growth with x-ray FWHM below 30 arcsec and an AFM rms roughness of 1.5 Å over an area of 20x20 μm². A 320x256 array of 25x25μm² pixels, hybridized to an Indigo Read Out Integrated Circuit, performed thermal imaging up to 185 K with an operability close to 97%. The noise equivalent temperature difference at 81 K presented a peak at 270 mK, corresponding to a mean value of 340 mK. [reprint (PDF)]
15.	Comparison of PLD-Grown p-NiO/n-Ga2O3 Heterojunctions on Bulk Single Crystal β-Ga2O3 and r-plane Sapphire Substrates D. J. Rogers , V. E. Sandana, F. Hosseini Teherani and M. Razeghi Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 128870J (28 January - 1 February 2024 San Francisco)doi: 10.1117/12.3012511 ...[Visit Journal] p-NiO/n-Ga2O3 heterostructures were formed on single crystal (-201) β (monoclinic) Ga2O3 and r-sapphire substrates by Pulsed Laser Deposition. Ring mesa layer stacks were created using a shadow mask during growth. X-Ray diffraction studies were consistent with the formation of (111) oriented fcc NiO on the bulk Ga2O3 and randomly oriented fcc NiO on (102) oriented β-Ga2O3 /r-sapphire. RT optical transmission studies revealed bandgap energy values of ~3.65 eV and ~5.28 eV for the NiO and Ga2O3 on r-sapphire. p-n junction devices were formed by depositing gold contacts on the layer stacks using shadow masks in a thermal evaporator. Both heterojunctions showed rectifying I/V characteristics. On bulk Ga2O, the junction showed a current density over 16mA/cm2 at +20V forward bias and a reverse bias leakage current over 3 orders of magnitude lower at -20V (1 pA). On Ga2O3/r-sapphire the forward bias current density at +15V was about an order of magnitude lower than for the p-NiO/bulk n-Ga2O3 heterojunction while the reverse bias leakage current at -15V (~ 20 pA) was an order of magnitude higher. Hence the NiO/bulk Ga2O3 junction was more rectifying. Upon illumination with a Xenon lamp a distinct increase in current was observed for the IV curves in both devices (four orders of magnitude for -15V reverse bias in the case of the p-NiO/bulk n-Ga2O3 heterojunction). The p-NiO/n-Ga2O3/rsapphire junction gave a spectral responsivity with a FWHM value of 80nm and two distinct response peaks (with maxima at 230 and 270nm) which were attributed to carriers being photogenerated in the Ga2O3 underlayer. For both devices time response studies showed a 10%/90% rise and fall of the photo generated current upon shutter open and closing which was relatively abrupt (millisecond range), and there was no evidence of significant persistent photoconductivity. [reprint (PDF)]
15.	High performance quantum dot-quantum well infrared focal plane arrays S. Tsao, A. Myzaferi, and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7605, p. 76050J-1-- January 27, 2010 ...[Visit Journal] Quantum dot (QD) devices are a promising technology for high operating temperature detectors. We have studied InAs QDs embedded in an InGaAs/InAlAs quantum well structure on InP substrate for middle wavelength infrared detectors and focal plane arrays (FPAs). This combined dot-well structure has weak dot confinement of carriers, and as a result, the device behavior differs significantly from that in more common dot systems with stronger confinement. We report on our studies of the energy levels in the QDWIP devices and on QD-based detectors operating at high temperature with D* over 10¹⁰ cm·Hz^½/W at 150 K operating temperature and high quantum efficiency over 50%. FPAs have been demonstrated operating at up to 200 K. We also studied two methods of adapting the QDWIP device to better accommodate FPA readout circuit limitations. [reprint (PDF)]
15.	An accurate method to check chemical interfaces of epitaxial III‐V compounds R. Bisaro; G. Laurencin; A. Friederich; M. Razeghi Appl. Phys. Lett. 40 (11): 978–980 (1982)-- June 1, 1982 ...[Visit Journal] We have developed a method of chemical beveling coupled with line scan Auger measurements to check abrupt interfaces of epitaxial III‐V compounds. Interface widths between 53 and 89 Å have been measured by this method for an InP/Ga0.47In0.53As/InP double heterostructure grown by low pressure metalorganic chemical vapor deposition. The ultimate width checkable by this method lies between 10 and 15 Å and is of the order of magnitude of the escape depth of the Auger electrons selected. [reprint (PDF)]
15.	Elimination of surface leakage in gate controlled Type-II InAs/GaSb mid-infrared photodetectors G. Chen, B.-M. Nguyen, A.M. Hoang, E.K. Huang, S.R. Darvish, and M. Razeghi Applied Physics Letters, Vol. 99, No. 18, p. 183503-1-- October 31, 2011 ...[Visit Journal] The electrical performance of mid-infrared type-II superlattice M-barrier photodetectors is shown to be limited by surface leakage. By applying gate bias on the mesa sidewall surface, leakage current is significantly reduced. Qualitatively IV modeling shows diffusion-dominated behavior of dark current at temperatures greater than 120 K. At 110 K, the dark current of gated device is reduced by more than 2 orders of magnitude, reaching the measurement system noise floor. With a quantum efficiency of 48% in front side illumination configuration, a 4.7μm cut-off gated device attains a specific detectivity of 2.5 × 10¹⁴ cm·Hz^½·W^-1 at 110 K, which is 3.6 times higher than in ungated devices. [reprint (PDF)]
15.	Characteristics of Self-Assembled InGaAs/InGaP Quantum Dot Mid-Infrared Photoconductive Detectors Grown by Low Pressure MOCVD S. Kim, M. Erdtmann, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] We report the first self-assembled InGaAs/InGaP quantum dot intersubband infrared photoconductive detectors (QDIPs) grown on semi-insulating GaAs substrate by low pressure metal organic chemical vapor deposition (MOCVD). The InGaAs quantum dots were constructed on an InGaP matrix as self assembling in Stranski-Krastanow growth mode in optimum growth conditions. The detector structure was prepared for single layer and multi-stacked quantum dots for active region. Normal incident photoconductive response was observed at a peak wavelength of 5.5 μm with a high responsivity of 130 mA/W, and a detectivity of 4.74 X 10⁷ cm·Hz^½/W at 77 K for multi-stack QDIP. Low temperature photoresponse of the single quantum dot photodetector was characterized. Peak response was obtained between 16 K and 60 K. The detailed dark current noise measurements were carried on single and multistack quantum dot infrared detectors. High photoconductive gain as 7.6 x 10³ biased at 0.5 V results in increasing the intersubband carrier relaxation time as two order of magnitude compared quantum well infrared photodetectors. [reprint (PDF)]
15.	AlGaN-based deep-ultraviolet 320 x 256 focal plane array E. Cicek, Z. Vashaei, E.K. Huang, R. McClintock and M. Razeghi OSA Optics Letters, Vol. 37, No. 5, p. 896-898-- March 1, 2012 ...[Visit Journal] We report the synthesis, fabrication, and testing of a 320 × 256 focal plane array (FPA) of back-illuminated, solarblind, p-i-n, Al_xGa_1−xN–based detectors, fully realized within our research laboratory. We implemented a pulse atomic layer deposition technique for the metalorganic chemical vapor deposition growth of thick, high-quality, crack-free, high Al composition Al_xGa_1−xN layers. The FPA is hybridized to a matching ISC 9809 readout integrated circuit and operated in a SE-IR camera system. Solar-blind operation is observed throughout the array with peak detection occurring at wavelengths of 256 nm and lower, and falling off three orders of magnitude by ∼285 nm. By developing an opaque masking technology, the visible response of the ROIC is significantly reduced; thus the need for external filtering to achieve solar- and visible-blind operation is eliminated. This allows the FPA to achieve high external quantum efficiency (EQE); at 254 nm, average pixels showed unbiased peak responsivity of 75 mA∕W, which corresponds to an EQE of ∼37%. Finally, the uniformity of the FPA and imaging properties are investigated. [reprint (PDF)]
15.	High performance terahertz quantum cascade laser sources based on intracavity difference frequency generation Q.Y. Lu, N. Bandyopadhyay, S. Slivken, Y. Bai and M. Razeghi Optics Express, Vol. 21, No. 1, p. 968-- January 14, 2013 ...[Visit Journal] We demonstrate high power, room temperature, single-mode THz emissions based on intracavity difference frequency generation from mid-infrared quantum cascade lasers. Dual active regions both featuring giant nonlinear susceptibilities are used to enhance the THz power and conversion efficiency. The THz frequency is lithographically tuned by integrated dual-period distributed feedback gratings with different grating periods. Single mode emissions from 3.3 to 4.6 THz with side-mode suppression ratio and output power up to 40 dB and 65 µW are obtained, with a narrow linewidth of 5 GHz. [reprint (PDF)]
15.	Suppression of surface leakage in gate controlled type-II InAs/GaSb mid-infrared photodetectors G. Chen; B.-M. Nguyen; A.M. Hoang; E.K. Huang; S.R. Darvish; M. Razeghi Proc. SPIE 8268, Quantum Sensing and Nanophotonic Devices IX, 826811 (January 20, 2012)-- January 20, 2012 ...[Visit Journal] One of the biggest challenges of improving the electrical performance in Type II InAs/GaSb superlattice photodetector is suppressing the surface leakage. Surface leakage screens important bulk dark current mechanisms, and brings difficulty and uncertainty to the material optimization and bulk intrinsic parameters extraction such as carrier lifetime and mobility. Most of surface treatments were attempted beyond the mid-infrared (MWIR) regime because compared to the bulk performance, surface leakage in MWIR was generally considered to be a minor factor. In this work, we show that below 150K, surface leakage still strongly affects the electrical performance of the very high bulk performance p-π-M-n MWIR photon detectors. With gating technique, we can effectively eliminate the surface leakage in a controllable manner. At 110K, the dark current density of a 4.7 μm cut-off gated photon diode is more than 2 orders of magnitude lower than the current density in SiO₂ passivated ungated diode. With a quantum efficiency of 48%, the specific detecivity of gated diodes attains 2.5 x 10¹⁴ cm·Hz^1/2/W, which is 3.6 times higher than that of ungated diodes. [reprint (PDF)]
15.	Electrical Transport Properties of Highly Doped N-type GaN Epilayers H.J. Lee, M.G. Cheong, E.K. Suh, and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] Temperature-dependent Hall-effects in MOCVD-grown Si-doped GaN epilayers were measured as a function of temperature in the range 10-800 K. The results were satisfactorily analyzed in terms of a two-band model including the (Gamma) and impurity bands at lower temperatures than room. The (Gamma) band electrons are dominant only high temperatures. The ionized impurity scattering is the most important in the (Gamma) band except at very high temperatures. [reprint (PDF)]

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