Center for Quantum Devices - Most Downloaded Journal Articles

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16.	Recent Advances in LWIR Type-II InAs/GaSb Superlattice Photodetectors and Focal Plane Arrays at the Center for Quantum Devices M. Razeghi, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, M.Z. Tidrow, and V. Nathan IEEE Proceedings, Vol. 97, No. 6, p. 1056-1066-- June 1, 2009 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs, and imaging applications. They now appear to be a possible alternative to the state-of-the-art HgCdTe (MCT) technology in the long and very long wavelength infrared regimes. At the Center for Quantum Devices, we have successfully realized very high quantum efficiency, very high dynamic differential resistance R₀A - product LWIR Type – II InAs/GaSb superlattice photodiodes with efficient surface passivation techniques. The demonstration of high quality LWIR Focal Plane Arrays that were 100 % fabricated in - house reaffirms the pioneer position of this university-based laboratory. [reprint (PDF)]
16.	Ga₂O₃ Metal-oxide-semiconductor Field Effect Transistors on Sapphire Substrate by MOCVD Ji-Hyeon Park, Ryan McClintock and Manijeh Razeghi Semiconductor Science and Technology, Volume 34, Number 8-- June 26, 2019 ...[Visit Journal] Si-doped gallium oxide (Ga₂O₃) thin films were grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) and fabricated into metal oxide semiconductor field effect transistors (MOSFETs). The Ga₂O₃ MOSFETs exhibited effective gate modulation of the drain current with a complete channel pinch-off for VG < −25 V, and the three-terminal off-state breakdown voltage was 390 V. The device shows a very low gate leakage current (~50 pA/mm), which led to a high on/off ratio of ~10⁸. These transistor characteristics were stable from room temperature to 250 °C [reprint (PDF)]
16.	Sharp/Tuneable UVC Selectivity and Extreme Solar Blindness in Nominally Undoped Ga2O3 MSM Photodetectors Grown by Pulsed Laser Deposition D. J. Rogers, A. Courtois, F. H. Teherani, V. E. Sandana, P. Bove, X. Arrateig, L. Damé, P. Maso, M. Meftah, W. El Huni, Y. Sama, H. Bouhnane, S. Gautier, A. Ougazzaden & M. Razeghi Proc. SPIE 11687 (2021) 116872D-1 ...[Visit Journal] Ga2O3layers were grown on c-sapphire substrates by pulsed laser deposition. Optical transmission spectra were coherent with a bandgap engineering from 4.9 to 6.2 eV controlled via the growth conditions. X-ray diffraction revealed that the films were mainly β-Ga2O3(monoclinic) with strong (-201) orientation. Metal-Semiconductor-Metal photodetectors based on gold/nickel Inter- Digitated-Transducer structures were fabricated by single-step negative photolithography. 240 nm peak response sensors gave over 2 orders-of-magnitude of separation between dark and light signal with state-of-the-art solar and visible rejection ratios ((I240 : I290) of > 3 x 105 and (I240 : I400) of > 2 x 106) and dark signals of <50 pA (at a bias of -5V). Spectral responsivities showed an exceptionally narrow linewidth (16.5 nm) and peak values exhibited a slightly superlinear increase with applied bias up to a value of 6.5 A/W (i.e. a quantum efficiency of > 3000%) at 20V bias. [reprint (PDF)]
16.	Fabrication of Indium Bumps for Hybrid Infrared Focal Plane Array Applications J. Jiang, S. Tsao, T. O'Sullivan, M. Razeghi, and G.J. Brown Infrared Physics and Technology, 45 (2)-- March 1, 2004 ...[Visit Journal] Hybrid infrared focal plane arrays (FPAs) have found many applications. In hybrid IR FPAs, FPA and Si read out integrated circuits (ROICs) are bonded together with indium bumps by flip-chip bonding. Taller and higher uniformity indium bumps are always being pursued in FPA fabrication. In this paper, two indium bump fabrication processes based on evaporation and electroplating techniques are developed. Issues related to each fabrication technique are addressed in detail. The evaporation technique is based on a unique positive lithography process. The electroplating method achieves taller indium bumps with a high aspect ratio by a unique “multi-stack” technique. This technique could potentially benefit the fabrication of multi-color FPAs. Finally, a proposed low-cost indium bump fabrication technique, the “bump transfer”, is given as a future technology for hybrid IR FPA fabrication. [reprint (PDF)]
16.	Type-II superlattice photodetectors for MWIR to VLWIR focal plane arrays M. Razeghi, Y. Wei, A. Hood, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E. Michel and R. McClintock SPIE Infrared Technology and Applications Conference, April 17-21, 2006, Orlando, FL Proceedings – Infrared Technology and Applications XXXII, Vol. 6206, p. 62060N-1-- April 21, 2006 ...[Visit Journal] Results obtained on GaSb/InAs Type-II superlattices have shown performance comparable to HgCdTe detectors, with the promise of higher performance due to reduced Auger recombination and dark current through improvements in device design and material quality. In this paper, we discuss advancements in Type-II IR sensors that cover the 3 to > 30 µm wavelength range. Specific topics covered will be device design and modeling using the Empirical Tight Binding Method (ETBM), material growth and characterization, device fabrication and testing, as well as focal plane array processing and imaging. Imaging has been demonstrated at room temperature for the first time with a 5 µm cutoff wavelength 256×256 focal plane array. [reprint (PDF)]
15.	Long-Wavelength Infrared Photodetectors Based on InSbBi Grown on GaAs Substrates J.J. Lee, J.D. Kim, and M. Razeghi Applied Physics Letters 71 (16)-- October 20, 1997 ...[Visit Journal] We demonstrate the operation of InSbBi infrared photoconductive detectors grown by low-pressure metalorganic chemical vapor deposition on semi-insulating GaAs substrates. The fabricated photodetector showed a cutoff wavelength of 7.7 μm at 77 K. The responsivity of the InSbBi photodetector at 7 μm was about 3.2 V/W at 77 K. The corresponding Johnson-noise limited detectivity was 4.7×10⁸ cm· Hz^½/W. The carrier lifetime was estimated to be about 86 ns from the voltage-dependent responsivity measurements. [reprint (PDF)]
15.	Surface leakage current reduction in long wavelength infrared type-II InAs/GaSb superlattice photodiodes S. Bogdanov, B.M. Nguyen, A.M. Hoang, and M. Razeghi Applied Physics Letters, Vol. 98, No. 18, p. 183501-1-- May 2, 2011 ...[Visit Journal] Dielectric passivation of long wavelength infrared Type-II InAs/GaSb superlattice photodetectors with different active region doping profiles has been studied. SiO₂ passivation was shown to be efficient as long as it was not put in direct contact with the highly doped superlattice. A hybrid graded doping profile combined with the shallow etch technique reduced the surface leakage current in SiO₂ passivated devices by up to two orders of magnitude compared to the usual design. As a result, at 77 K the SiO(2) passivated devices with 10.5 μm cutoff wavelength exhibit an R₀A of 120 Ω·cm², R_maxA of 6000 Ω·cm², and a dark current level of 3.5×10⁻⁵ A·cm⁻² at −50 mV bias. [reprint (PDF)]
15.	High-Performance Focal Plane Arrays Based on InAs-GaSb Superlattices with a 10-micron Cutoff Wavelegth P.Y. Delaunay, B.M. Nguyen, D. Hoffman and M. Razeghi IEEE Journal of Quantum Electronics, Vol. 44, No. 5, p. 462-467-- May 1, 2008 ...[Visit Journal] We report on the demonstration of a focal plane array based on Type-II InAs/GaSb superlattices grown on N-type GaSb substrate with a 50%-cutoff wavelength at 10 μm. The surface leakage occurring after flip-chip bonding and underfill in the Type-II devices was suppressed using a double heterostructure design. The R₀A of diodes passivated with SiO₂ was 23 Ω·cm² after underfill. A focal plane array hybridized to an Indigo readout integrated circuit demonstrated a noise equivalent temperature difference of 33 mK at 81 K, with an integration time of 0.23 ms. [reprint (PDF)]
15.	Back-illuminated separate absorption and multiplication GaN avalanche photodiodes J.L. Pau, C. Bayram, R. McClintock, M. Razeghi and D. Silversmith Applied Physics Letters, Vol. 92, No. 10, p. 101120-1-- March 10, 2008 ...[Visit Journal] The performance of back-illuminated avalanche photodiodes with separate absorption and multiplication regions is presented. Devices with an active area of 225 µm² show a maximum multiplication gain of 41,200. The calculation of the noise equivalent power yields a minimum value of 3.3×10⁻¹⁴ W·Hz^−1/2 at a gain of 3000, increasing to 2.0×10⁻¹³ W·Hz^−1/2 at a gain of 41,200. The broadening of the response edge has been analyzed as a function of bias. [reprint (PDF)]
15.	Effect of contact doping on superlattice-based minority carrier unipolar detectors B.M. Nguyen, G. Chen, A.M. Hoang, S. Abdollahi Pour, S. Bogdanov, and M. Razeghi Applied Physics Letters, Vol. 99, No. 3, p. 033501-1-- July 18, 2011 ...[Visit Journal] We report the influence of the contact doping profile on the performance of superlattice-based minority carrier unipolar devices for mid-wave infrared detection. Unlike in a photodiode, the space charge in the p-contact of a pMp unipolar device is formed with accumulated mobile carriers, resulting in higher dark current in the device with highly doped p-contact. By reducing the doping concentration in the contact layer, the dark current is decreased by one order of magnitude. At 150 K, 4.9 μm cut-off devices exhibit a dark current of 2 × 10⁻⁵A/cm² and a quantum efficiency of 44%. The resulting specific detectivity is 6.2 × 10¹¹ cm·Hz^1/2/W at 150 K and exceeds 1.9 × 10¹⁴ cm·Hz^1/2/W at 77 K. [reprint (PDF)]
15.	Solar-Blind Deep UV Avalanche Photodetectors Using Reduced Area Epitaxy Lakshay Gautam , Junhee Lee, Michael Richards, and Manijeh Razeghi , Lakshay Gautam, Manijeh Razeghi, IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 59, NO. 6, 10.1109/JQE.2023.3325254 ...[Visit Journal] We report high gain avalanche photodetectors operating in the deep UV wavelength regime. The high gain was leveraged through reduced area epitaxy by patterning AlN on Sapphire substrate. This helps in a substantial reduction of crack formation due to overgrowth on individually isolated AlN mesas. Reproducible gain on the order of 105 was reported for multiple diodes in different areas of 320 × 256 focal plane array. [reprint (PDF)]
15.	Characterization of high quality GaInP/GaAs superlattices grown on GaAs and Si substrates by gas source molecular beam epitaxy C. Jelen, S. Slivken, X.G. He, and M. Razeghi and S. Shastry Journal of Vacuum Science and Technology B 12 (2)-- March 1, 1994 ...[Visit Journal] We report an analysis of the heteroepitaxial interfaces in high quality GaInP–GaAs superlattices grown simultaneously on GaAs and Si substrates by gas source molecular beam epitaxy. These two superlattices have been studied using high resolution x-ray diffraction measurements. Sharp superlattice satellites, with very little broadening, are observed within a 6° range for the sample on GaAs. Photoluminescence peaks with full widths at half-maximums of 5 and 7 meV are obtained at 4 K for samples with 58 Å wells on GaAs and Si, respectively. Room temperature exciton absorption is observed in the photovoltage measurements for a superlattice grown on Si substrate. The thicknesses determined by x-ray analysis are consistent with those obtained by a Kronig–Penny model fitting of the photovoltage spectroscopy. [reprint (PDF)]
15.	Comparison of chemical and laser lift-off for the transfer of InGaN-based p-i-n junctions from sapphire to glass substrates D. J. Rogers ; P. Bove ; F. Hosseini Teherani ; K. Pantzas ; T. Moudakir ; G. Orsal ; G. Patriarche ; S. Gautier ; A. Ougazzaden ; V. E. Sandana ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862611 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] InGaN-based p-i-n structures were transferred from sapphire to soda-lime glass substrates using two approaches: (1) laser-lift-off (LLO) and thermo-metallic bonding and (2) chemical lift-off (LLO) by means sacrificial ZnO templates and direct wafer bonding. Both processes were found to function at RT and allow reclaim of the expensive single crystal substrate. Both approaches have also already been demonstrated to work for the wafer-scale transfer of III/V semiconductors. Compared with the industry-standard LLO, the CLO offers the added advantages of a lattice match to InGaN with higher indium contents, no need for an interfacial adhesive layer (which facilitates electrical, optical and thermal coupling), no damaged/contaminated GaN surface layer, simplified sapphire reclaim (GaN residue after LLO may complicate reclaim) and cost savings linked to elimination of the expensive LLO process. [reprint (PDF)]
15.	Room temperature continuous wave, monolithic tunable THz sources based on highly efficient mid-infrared quantum cascade lasers Quanyong Lu, Donghai Wu, Saumya Sengupta, Steven Slivken, Manijeh Razeghi Nature Scientific Reports 6, Article number: 23595-- March 24, 2016 ...[Visit Journal] A compact, high power, room temperature continuous wave terahertz source emitting in a wide frequency range (ν ~ 1–5 THz) is of great importance to terahertz system development for applications in spectroscopy, communication, sensing, and imaging. Here, we present a strong-coupled strain-balanced quantum cascade laser design for efficient THz generation based on intracavity difference frequency generation. Room temperature continuous wave emission at 3.41 THz with a side-mode suppression ratio of 30 dB and output power up to 14 μW is achieved with a wall-plug efficiency about one order of magnitude higher than previous demonstrations. With this highly efficient design, continuous wave, single mode THz emissions with a wide frequency tuning range of 2.06–4.35 THz and an output power up to 4.2 μW are demonstrated at room temperature from two monolithic three-section sampled grating distributed feedback-distributed Bragg reflector lasers. [reprint (PDF)]
15.	Suppression of surface leakage in gate controlled type-II InAs/GaSb mid-infrared photodetectors G. Chen; B.-M. Nguyen; A.M. Hoang; E.K. Huang; S.R. Darvish; M. Razeghi Proc. SPIE 8268, Quantum Sensing and Nanophotonic Devices IX, 826811 (January 20, 2012)-- January 20, 2012 ...[Visit Journal] One of the biggest challenges of improving the electrical performance in Type II InAs/GaSb superlattice photodetector is suppressing the surface leakage. Surface leakage screens important bulk dark current mechanisms, and brings difficulty and uncertainty to the material optimization and bulk intrinsic parameters extraction such as carrier lifetime and mobility. Most of surface treatments were attempted beyond the mid-infrared (MWIR) regime because compared to the bulk performance, surface leakage in MWIR was generally considered to be a minor factor. In this work, we show that below 150K, surface leakage still strongly affects the electrical performance of the very high bulk performance p-π-M-n MWIR photon detectors. With gating technique, we can effectively eliminate the surface leakage in a controllable manner. At 110K, the dark current density of a 4.7 μm cut-off gated photon diode is more than 2 orders of magnitude lower than the current density in SiO₂ passivated ungated diode. With a quantum efficiency of 48%, the specific detecivity of gated diodes attains 2.5 x 10¹⁴ cm·Hz^1/2/W, which is 3.6 times higher than that of ungated diodes. [reprint (PDF)]
15.	Top-emission ultraviolet light-emitting diodes with peak emission at 280 nm A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, and M. Razeghi Virtual Journal of Nanoscale Science & Technology, 5-- August 5, 2002 ...[Visit Journal][reprint (PDF)]
15.	Very Long Wavelength Infrared Type-II Detectors Operating at 80K H. Mohseni, A. Tahraoui, J. Wojkowski, M. Razeghi, G.J. Brown, W.C. Mitchel, and Y.S. Park Applied Physics Letters 77 (11)-- September 11, 2000 ...[Visit Journal] We report a demonstration of very long wavelength infrared detectors based on InAs/GaSb superlattices operating at T = 80 K. Detector structures with excellent material quality were grown on an optimized GaSb buffer layer on GaAs semi-insulating substrates. Photoconductive devices with 50% cutoff wavelength of λ_c = 17 μm showed a peak responsivity of about 100 mA/W at T = 80 K. Devices with 50% cutoff wavelengths up to λ_c = 22 μm were demonstrated at this temperature. Good uniformity was obtained over large areas even for the devices with very long cutoff wavelengths. [reprint (PDF)]
15.	Very high performance LWIR and VLWIR type-II InAs/GaSb superlattice photodiodes with M-structure barrier B.M. Nguyen, D. Hoffman, P.Y. Delaunay, E.K. Huang and M. Razeghi SPIE Proceedings, Vol. 7082, San Diego, CA 2008, p. 708205-- September 3, 2008 ...[Visit Journal] LWIR and VLWIR type-II InAs/GaSb superlattice photodetectors have for long time suffered from a high dark current level and a low dynamic resistance which hampers the its emergence to the infrared detection and imaging industry. However, with the use of M-structure superlattice, a new Type-II binary InAs/GaSb/AlSb superlattice design, as an effective blocking barrier, the dark current in type-II superlattice diode has been significantly reduced. We have obtained comparable differential resistance product to the MCT technology at the cut-off wavelength of 10 and 14μm. Also, this new design is compatible with the optical optimization scheme, leading to high quantum efficiency, high special detectivity devices for photon detectors and focal plane arrays. [reprint (PDF)]
15.	Widely Tunable, Single-Mode, High-Power Quantum Cascade Lasers M. Razeghi, B. Gokden, S. Tsao, A. Haddadi, N. Bandyopadhyay, and S. Slivken SPIE Proceedings, Intergreated Photonics: Materials, Devices and Applications, SPIE Microtechnologies Symposium, Prague, Czech Republic, April 18-20, 2011, Vol. 8069, p. 806905-1-- May 31, 2011 ...[Visit Journal] We demonstrate widely tunable high power distributed feedback quantum cascade laser array chips that span 190 nm and 200 nm from 4.4 um to 4.59 um and 4.5 um to 4.7 um respectively. The lasers emit single mode with a very narrow linewidth and side mode suppression ratio of 25 dB. Under pulsed operation power outputs up to 1.85 W was obtained from arrays with 3 mm cavity length and up to 0.95 W from arrays with 2 mm cavity length at room temperature. Continuous wave operation was also observed from both chips with 2 mm and 3 mm long cavity arrays up to 150 mW. The cleaved size of the array chip with 3 mm long cavities was around 4 mm x 5 mm and does not require sensitive external optical components to achieve wide tunability. With their small size and high portability, monolithically integrated DFB QCL Arrays are prominent candidates of widely tunable, compact, efficient and high power sources of mid-infrared radiation for gas sensing. [reprint (PDF)]
15.	MOCVD grown β-Ga₂O₃ metal-oxide-semiconductor field effect transistors on sapphire Ji-Hyeon Park , Ryan McClintock, Alexandre Jaud, Arash Dehzangi , Manijeh Razeghi Applied Physics Express 12, 095503-- August 28, 2019 ...[Visit Journal] We fabricated β-Ga₂O₃:Si metal-oxide field-effect transistors (MOSFETs) on c-plane sapphire substrates which typically showed maximum drain current of 100 mA·mm⁻¹. β-Ga₂O₃:Si thin films were realized on c-plane sapphire substrates through a combination of metalorganic chemical vapor deposition and post-annealing. The MOSFET device presented excellent on/off drain current ratio of ∼10¹¹ with very low gate leakage current, sharp pinch off behavior, and a breakdown voltage of 400 V at VG = −40 V. The growth and fabrication of β-Ga₂O₃:Si MOSFETs on c-plane sapphire is valuable to its demonstration of the great potential for future high-power electronic devices. [reprint (PDF)]
15.	Stranski-Krastanov growth of InGaN quantum dots emitting in green spectra C. Bayram and M. Razeghi Applied Physics A: Materials Science and Processing, Vol. 96, No. 2, p. 403-408-- August 1, 2009 ...[Visit Journal] Self-assembled InGaN quantum dots (QDs) were grown on GaN templates by metalorganic chemical vapor deposition. 2D–3D growth mode transition through Stranski–Krastanov mode was observed via atomic force microscopy. The critical thickness for In_0.67Ga_0.33N QDs was determined to be four monolayers. The effects of growth temperature, deposition thickness, and V/III ratio on QD formation were examined. The capping of InGaN QDs with GaN was analyzed. Optimized InGaN quantum dots emitted in green spectra at room temperature. [reprint (PDF)]
15.	8.5 μm Room Temperature Quantum Cascade Lasers Grown by Gas-Source Molecular Beam Epitaxy S. Slivken and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] We report room-temperature pulsed-mode operation of 8.5 μm quantum cascade lasers grown by gas-source molecular beam epitaxy. The theory necessary to understand the operation of the laser is presented and current problems are analyzed. Very good agreement is shown to exist between theoretical and experimental emission wavelengths. The high- temperature operation is achieved with 1 μs pulses at a repetition rate of 200 Hz. Peak output power in these conditions is in excess of 700 mW per 2 facets at 79 K and 25 mW at 300 K. Threshold current as a function of temperature shows an exponential dependence with T₀ equals 188 K for a 1.5 mm cavity. [reprint (PDF)]
15.	High Detectivity InAs Quantum-Dot Infrared Photodetectors Grown on InP by Metalorganic Chemical Vapor Deposition W. Zhang, H. Lim, M. Taguchi, S. Tsao, B. Movaghar, and M. Razeghi Applied Physics Letters, 86 (19)-- May 9, 2005 ...[Visit Journal] We report a high-detectivity InAs quantum-dot infrared photodetector. The InAs quantum dots were grown by self-assembly on InP substrates via low-pressure metal–organic chemical–vapor deposition. Highly uniform quantum dots with a density of 4×10¹⁰ cm² were grown on a GaAs/InP matrix. Photoresponse was observed at temperatures up to 160 K with a peak of 6.4 µm and cutoff of 6.6 µm. Very low dark currents and noise currents were obtained by inserting Al_0.48In_0.52As current blocking layers. The background-limited performance temperature was 100 K. A detectivity of 1.0×10¹⁰ cm·Hz^½/W was obtained at 77 K with a bias of –1.1 V. [reprint (PDF)]
15.	Engineering the Fermi Level in NiO Thin Films D. Rogers, E. Sandana, M. Chamberlin, F. Teherani; V. Safarov, M. Konczykowski, R. Grasset, A. Alessi, H. Drouhin ; M. Razeghi SPIE OPTO PC13897 (2026) ...[Visit Journal] We investigate practical routes to engineer the Fermi level—and thus the effective work function—of p-type nickel oxide (NiO) thin films grown on c-sapphire by plasma-assisted pulsed laser deposition (PA-PLD) at room temperature (RT). We examine three levers: (i) oxygen-rich growth at low substrate temperature, (ii) post-deposition annealing in air or oxygen across 320–620 °C, and (iii) impurity (Li) acceptor doping. RT-grown NiO exhibits high crystalline quality with (111) out-of-plane orientation, narrow rocking-curve width, and a film thickness near 60 nm. RT epitaxy yields the lowest resistivity among the studied conditions, and resistance increases progressively with temperature for iso-chronic post-annealing in air. Oxygen ambient post-annealing shows no distinctive monotonic trend in resistivity, although the conductivity falls off for annealing over about 500°C. Optical transmission spectra suggest progressive healing of in-gap defect states with post-annealing temperature. Doping NiO with 20at% of Li lowers resistivity relative to undoped NiO by an order of magnitude. Post-annealing at 300°C under oxygen ambient significantly boosts conductivity. Over a decade of storage, all films exhibited significant loss of conductivity, underscoring the need for stabilisation strategies. The results map practical processing windows to tune the NiO Fermi level for integration in oxide heterojunctions (e.g., p-NiO/n-Ga2O3) used in ultraviolet detection and wide-bandgap electronics. [reprint (PDF)]
15.	Dark current reduction in microjunction-based compound electron barrier type-II InAs/InAs1-xSbx superlattice-based long-wavelength infrared photodetectors Romain Chevallier, Abbas Haddadi, Manijeh Razeghi Proc. SPIE 10540, Quantum Sensing and Nano Electronics and Photonics XV Page. 1054007-1-- January 26, 2018 ...[Visit Journal] Reduction of dark current density in microjunction-based InAs/InAs_1-xSb_x type-II superlattice long-wavelength infrared photodetectors was demonstrated. A double electron barrier design was used to suppress both generation-recombination and surface dark currents. The photodetectors exhibited high surface resistivity after passivation with SiO₂, which permits the use of small size features without having strong surface leakage current degrading the electrical performance. Fabricating a microjunction structure (25×25 μm² mesas with 10×10 μm² microjunctions) with this photodetector double barrier design results in a dark current density of 6.3×10^-6 A/cm² at 77 K. The device has an 8 μm cut-off wavelength at 77 K and exhibits a quantum efficiency of 31% for a 2 μm-thick absorption region, which results in a specific detectivity value of 1.2×10¹² cm·Hz^1/2/W at 77 K. [reprint (PDF)]

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