Center for Quantum Devices - Most Downloaded Journal Articles

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15.	Growth of AlGaN on silicon substrates: a novel way to make back-illuminated ultraviolet photodetectors Ryan McClintock ; Manijeh Razeghi Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 95550U-- August 28, 2015 ...[Visit Journal] AlGaN, with its tunable wide-bandgap is a good choice for the realization of ultraviolet photodetectors. AlGaN films tend to be grown on foreign substrates such as sapphire, which is the most common choice for back-illuminated devices. However, even ultraviolet opaque substrates like silicon holds promise because, silicon can be removed by chemical treatment to allow back-illumination,1 and it is a very low-cost substrate which is available in large diameters up to 300 mm. However, Implementation of silicon as the solar-blind PD substrates requires overcoming the lattice-mismatch (17%) with the AlxGa1-xN that leads to high density of dislocation and crack-initiating stress. In this talk, we report the growth of thick crack-free AlGaN films on (111) silicon substrates through the use of a substrate patterning and mask-less selective area regrowth. This technique is critical as it decouples the epilayers and the substrate and allows for crack-free growth; however, the masking also helps to reduce the dislocation density by inclining the growth direction and encouraging dislocations to annihilate. A back-illuminated p-i-n PD structure is subsequently grown on this high quality template layer. After processing and hybridizing the device we use a chemical process to selectively remove the silicon substrate. This removal has minimal effect on the device, but it removes the UV-opaque silicon and allows back-illumination of the photodetector. We report our latest results of back-illuminated solar-blind photodetectors growth on silicon. [reprint (PDF)]
15.	High Detectivity InAs Quantum-Dot Infrared Photodetectors Grown on InP by Metalorganic Chemical Vapor Deposition W. Zhang, H. Lim, M. Taguchi, S. Tsao, B. Movaghar, and M. Razeghi Applied Physics Letters, 86 (19)-- May 9, 2005 ...[Visit Journal] We report a high-detectivity InAs quantum-dot infrared photodetector. The InAs quantum dots were grown by self-assembly on InP substrates via low-pressure metal–organic chemical–vapor deposition. Highly uniform quantum dots with a density of 4×10¹⁰ cm² were grown on a GaAs/InP matrix. Photoresponse was observed at temperatures up to 160 K with a peak of 6.4 µm and cutoff of 6.6 µm. Very low dark currents and noise currents were obtained by inserting Al_0.48In_0.52As current blocking layers. The background-limited performance temperature was 100 K. A detectivity of 1.0×10¹⁰ cm·Hz^½/W was obtained at 77 K with a bias of –1.1 V. [reprint (PDF)]
15.	ZnO Thin Film Templates for GaN-based Devices D.J. Rogers, F. Hosseini Teherani, A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, M. Razeghi and G. Garry SPIE Conference, Jose, CA, Vol. 5732, pp. 412-- January 22, 2005 ...[Visit Journal] GaN-based optoelectronic devices are plagued by a tendency to non-radiative transitions linked to defects in the active layers. ZnO is promising as a substrate material for GaN because it has the same wurtzite structure and a relatively small lattice mismatch (~1.8%). In this paper, we discuss use of ZnO thin films as templates for GaN based LED. [reprint (PDF)]
15.	Recent advances in III-Nitride materials, characterization and device applications M. Razeghi, X. Zhang, P. Kung, A. Saxler, D. Walker, K.Y. Lim, and K.S. Kim SPIE Conference: Solid State Crystals in Optoelectronics and Semiconductor Technology; Proceedings 3179-- October 7, 1996 ...[Visit Journal] High-quality AlN, GaN, AlGaN have been grown on sapphire substrate by low-pressure metalorganic chemical vapor deposition (LP-MOCVD). The x-ray rocking curve of AlN and GaN were 100 arcsecs and 30 arcsecs respectively with Pendelloesung oscillations, which are the best reported to date. GaN with high crystallinity simultaneously exhibited high optical and electrical quality. Photoluminescence linewidth of GaN at 77K was as low as 17 meV, which is the best reported to date. Si-doped GaN had a mobility higher than 300 cm²/V·s. GaN has been also successfully grown on LiGaO₂ substrate with LP-MOCVD for the first time. AlGaN for the entire composition range has been grown. These layers exhibited the lowest x-ray FWHM reported to date. The excellent optical quality of these layers have been characterized by room temperature UV transmission and photoluminescence. N-type doping of AlGaN with Si has ben achieved up to 60 percent Al with mobility as high as 78 cm²/V·s. Al_xGa_1-xN/Al_yGa_1-yN superlattice with atomically sharp interface have been demonstrated. Optically-pumped stimulated emission in GaN:Ge and GaN:Si has been observed with threshold optical power density as low as 0.4 MW/cm². AlGaN photoconductors with cut-off wavelengths from 200 nm to 365 nm have been achieved for the first time. GaN p-n junction photovoltaic detector with very selective photoresponse have been demonstrated and theoretically modeled. Ti/AlN/Si metal-insulator- semiconductor capacitor with high capacitance-voltage performances at both low and high frequencies and low interface trap level density have been demonstrated for the first time in this material system. [reprint (PDF)]
15.	Thermal conductivity tensors of the cladding and active layers of antimonide infrared lasers and detectors Chuanle Zhou, I. Vurgaftman, C. L. Canedy, C. S. Kim, M. Kim, W. W. Bewley, C. D. Merritt, J. Abell, J. R. Meyer, A. Hoang, A. Haddadi, M. Razeghi, and M. Grayson Optical Materials Express. 2013;3(10):1632-1640.-- October 1, 2013 ...[Visit Journal] The in-plane and cross-plane thermal conductivities of the cladding layers and active quantum wells of interband cascade lasers and type-II superlattice infrared detector are measured by the 2-wire 3ω method. The layers investigated include InAs/AlSb superlattice cladding layers, InAs/GaInSb/InAs/AlSb W-active quantum wells, an InAs/GaSb superlattice absorber, an InAs/GaSb/AlSb M-structure, and an AlAsSb digital alloy. The in-plane thermal conductivity of the InAs/AlSb superlattice is 4-5 times higher than the cross-plane value. The isotropic thermal conductivity of the AlAsSb digital alloy matches a theoretical expectation, but it is one order of magnitude lower than the only previously-reported experimental value. [reprint (PDF)]
15.	Use of PLD-grown moth-eye ZnO nanostructures as templates for MOVPE growth of InGaN-based photovoltaics Dave Rogers, V. E. Sandana, F. Hosseini Teherani, S. Gautier, G. Orsal, T. Moudakir, M. Molinari, M. Troyon, M. Peres, M. J. Soares, A. J. Neves, T. Monteiro, D. McGrouther, J. N. Chapman, H. J. Drouhin, M. Razeghi, and A. Ougazzaden Renewable Energy and the Environment, OSA Technical Digest paper PWB3, Optical Society of America, (2011)-- November 2, 2011 ...[Visit Journal] At this time, no abstract is available. Scopus has content delivery agreements in place with each publisher and currently contains 30 million records with an abstract. An abstract may not be present due to incomplete data, as supplied by the publisher, or is still in the process of being indexed. [reprint (PDF)]
15.	First room‐temperature cw operation of a GaInAsP/InP light‐emitting diode on a silicon substrate M. Razeghi; R. Blondeau; M. Defour; F. Omnes; P. Maurel; F. Brillouet Appl. Phys. Lett. 53, 854–855 (1988)-- July 4, 1988 ...[Visit Journal] We report in this letter the first successful fabrication of an InP-GalnAsP light-emitting diode, emitting at 1.15 pm grown by low-pressure metalorganic chemical vapor deposition on a silicon substrate. The device has been operated under continuous wave operation at room temperature for 24 h (with an injection current of 200 rnA), and showed no degradation. [reprint (PDF)]
15.	Toward realizing high power semiconductor terahertz laser sources at room temperature Manijeh Razeghi Proc. SPIE 8023, Terahertz Physics, Devices, and Systems V: Advance Applications in Industry and Defense, 802302 (May 25, 2011)-- May 25, 2011 ...[Visit Journal] The terahertz (THz) spectral range offers promising applications in science, industry, and military. THz penetration through nonconductors (fabrics, wood, plastic) enables a more efficient way of performing security checks (for example at airports), as illegal drugs and explosives could be detected. Being a non-ionizing radiation, THz radiation is environment-friendly enabling a safer analysis environment than conventional X-ray based techniques. However, the lack of a compact room temperature THz laser source greatly hinders mass deployment of THz systems in security check points and medical centers. In the past decade, tremendous development has been made in GaAs/AlGaAs based THz Quantum Cascade Laser (QCLs), with maximum operating temperatures close to 200 K (without magnetic field). However, higher temperature operation is severely limited by a small LO-phonon energy (∼ 36 meV) in this material system. With a much larger LO-phonon energy of ∼ 90 meV, III-Nitrides are promising candidates for room temperature THz lasers. However, realizing high quality material for GaN-based intersubband devices presents a significant challenge. Advances with this approach will be presented. Alternatively, recent demonstration of InP based mid-infrared QCLs with extremely high peak power of 120 W at room temperature opens up the possibility of producing high power THz emission with difference frequency generation through two mid-infrared wavelengths. [reprint (PDF)]
15.	Back-illuminated separate absorption and multiplication GaN avalanche photodiodes J.L. Pau, C. Bayram, R. McClintock, M. Razeghi and D. Silversmith Applied Physics Letters, Vol. 92, No. 10, p. 101120-1-- March 10, 2008 ...[Visit Journal] The performance of back-illuminated avalanche photodiodes with separate absorption and multiplication regions is presented. Devices with an active area of 225 µm² show a maximum multiplication gain of 41,200. The calculation of the noise equivalent power yields a minimum value of 3.3×10⁻¹⁴ W·Hz^−1/2 at a gain of 3000, increasing to 2.0×10⁻¹³ W·Hz^−1/2 at a gain of 41,200. The broadening of the response edge has been analyzed as a function of bias. [reprint (PDF)]
15.	Intrinsic AlGaN photodetectors for the entire compositional range D. Walker, X. Zhang, A. Saxler, P. Kung, J. Xu, and M. Razeghi SPIE Conference, San Jose, CA, -- February 12, 1997 ...[Visit Journal] Al_xGa_1-xN ultraviolet photoconductors with cut- off wavelengths from 365 nm to 200 nm have been fabricated and characterized. Various characteristics of the devices, such as photoresponse, voltage-dependent responsivity, frequency-dependent responsivity and noise spectral density, were measured and cross-referenced with optical, electrical and structural characteristics of the material to provide information about the mechanisms taking place during detection. The maximum detectivity reached 5.5 X 10⁸ cm·Hz^½/W at a modulating frequency of 14 Hz. The effective majority carrier lifetime in Al_xGa_1-xN materials, derived from frequency-dependent photoconductivity measurements, has been estimated to be from 6 to 35 msec. The frequency-dependent noise-spectrum shows that it is dominated by Johnson-noise at high frequencies for low Al-composition samples. [reprint (PDF)]
15.	Surface leakage current reduction in long wavelength infrared type-II InAs/GaSb superlattice photodiodes S. Bogdanov, B.M. Nguyen, A.M. Hoang, and M. Razeghi Applied Physics Letters, Vol. 98, No. 18, p. 183501-1-- May 2, 2011 ...[Visit Journal] Dielectric passivation of long wavelength infrared Type-II InAs/GaSb superlattice photodetectors with different active region doping profiles has been studied. SiO₂ passivation was shown to be efficient as long as it was not put in direct contact with the highly doped superlattice. A hybrid graded doping profile combined with the shallow etch technique reduced the surface leakage current in SiO₂ passivated devices by up to two orders of magnitude compared to the usual design. As a result, at 77 K the SiO(2) passivated devices with 10.5 μm cutoff wavelength exhibit an R₀A of 120 Ω·cm², R_maxA of 6000 Ω·cm², and a dark current level of 3.5×10⁻⁵ A·cm⁻² at −50 mV bias. [reprint (PDF)]
15.	Crystallography of epitaxial growth of wurtzite-type thin films on sapphire substrates P. Kung, C.J. Sun, A. Saxler, H. Ohsato, and M. Razeghi Journal of Applied Physics 75 (9)-- May 1, 1994 ...[Visit Journal] In this article, we present a crystallographic model to describe the epitaxial growth of wurtzite‐type thin films such as gallium nitride (GaN) on different orientations of sapphire (Al2O3) substrates. Through this model, we demonstrate the thin films grown on (00⋅1)Al₂O₃ have a better epilayer‐substrate interface quality than those grown on (01⋅2)Al₂O₃. We also show the epilayer grown on (00⋅1)Al₂O₃ are gallium‐terminated, and both (00⋅1) and (01⋅2) surfaces of sapphire crystals are oxygen‐terminated. [reprint (PDF)]
15.	High Frequency Extended Short-Wavelength Infrared Heterojunction Photodetectors Based on InAs/GaSb/AlSb Type-II Superlattices Romain Chevallier, Abbas Haddadi, Ryan McClintock, Arash Dehzangi , Victor Lopez-Dominguez, Pedram Khalili Amiri, Manijeh Razeghi IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 6-- December 1, 2018 ...[Visit Journal] InAs/GaSb/AlSb type-II superlattice-based photodetectors, with 50% cut-off wavelength of 2.1 µm and a −3 dB cut-off frequency of 4.8 GHz, are demonstrated, for 10 µm diameter circular mesas under 15 V applied reverse bias. A study of the cut-off frequency with applied bias and mesa size was performed to evaluate some of the limiting factors of photodetectors high frequency performance. [reprint (PDF)]
15.	First Demonstration of ~ 10 microns FPAs in InAs/GaSb SLS M. Razeghi, P.Y. Delaunay, B.M. Nguyen, A. Hood, D. Hoffman, R. McClintock, Y. Wei, E. Michel, V. Nathan and M. Tidrow IEEE LEOS Newsletter 20 (5)-- October 1, 2006 ...[Visit Journal] The concept of Type-II InAs/GaSb superlattice was first brought by Nobel Laureate L. Esaki, et al. in the 1970s. There had been few studies on this material system until two decades later when reasonable quality material growth was made possible using molecular beam epitaxy. With the addition of cracker cells for the group V sources and optimizations of material growth conditions, the superlattice quality become significantly improved and the detectors made of these superlattice materials can meet the demand in some practical field applications. Especially in the LWIR regime, it provides a very promising alternative to HgCdTe for better material stability and uniformity, etc. We have developed the empirical tight binding model (ETBM) for precise determination of the superlattice bandgap. [reprint (PDF)]
15.	Photoluminescence linewidth narrowing in Yb-doped GaN and InGaN thin films K. Dasari, J. Wang, W.M. Jadwisienczak, V. Dierolf, M. Razeghi, R. Palai Journal of Luminescence Volume 209, May 2019, Pages 237-243-- January 14, 2019 ...[Visit Journal] We report on photoluminescence (PL) properties of GaN, GaN:Yb, InGaN, and InGaN:Yb thin films grown on (0001) sapphire substrates by plasma assisted molecular beam epitaxy (MBE). X-ray diffraction pattern of the films confirms c-axis oriented growth. The concentration of Yb and In was obtained by X-ray photoelectron spectroscopy (XPS) and was found to be 5 (+/- 0.5) at.% and 30 (+/- 1.5) at.%, respectively. The GaN:Yb and InGaN:Yb thin films show a significant linewidth narrowing in PL spectra compared to GaN and InGaN thin films. This could be attributed to the reduction of the defect related non-radiative recombination paths and suppression of the structural defects and dislocations because of the in situ rare earth (Yb)-doping during the growth. The temperature dependent photoluminescence of GaN:Yb thin film follows the Varshni model, whereas InGaN:Yb film shows a complex S-shaped like behavior, which can be explained by the localization effect using the Band-Tail model. [reprint (PDF)]
15.	Fabrication of GaN Nanotubular Material using MOCVD with an Aluminium Oxide Membrane W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi Nanotechnology 17-- January 1, 2006 ...[Visit Journal] GaN nanotubular material is fabricated with an aluminium oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminium oxide membrane with ordered nanoholes is used as a template. Gallium nitride is deposited at the inner wall of the nanoholes in the aluminium oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis conditions in MOCVD are obtained successfully for the gallium nitride nanotubular material in this research. The diameter of the GaN nanotube fabricated is approximately 200–250 nm and the wall thickness is about 40–50 nm. [reprint (PDF)]
15.	Development of high power, InP-based quantum cascade lasers on alternative epitaxial platforms Steven Slivken, Nirajman Shrestha, Manijeh Razeghi Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 1289503 (28 January - 1 February 2024, San Francisco) doi: 10.1117/12.3009335 ...[Visit Journal] In this talk, challenges and solutions associated with the monolithic, epitaxial integration of mid- and longwave- infrared, InP-based quantum cascade lasers on GaAs and Si wafers will be discussed. Initial results, including room temperature, high power, and continuous wave operation, will be described. [reprint (PDF)]
15.	High performance terahertz quantum cascade laser sources based on intracavity difference frequency generation Q.Y. Lu, N. Bandyopadhyay, S. Slivken, Y. Bai and M. Razeghi Optics Express, Vol. 21, No. 1, p. 968-- January 14, 2013 ...[Visit Journal] We demonstrate high power, room temperature, single-mode THz emissions based on intracavity difference frequency generation from mid-infrared quantum cascade lasers. Dual active regions both featuring giant nonlinear susceptibilities are used to enhance the THz power and conversion efficiency. The THz frequency is lithographically tuned by integrated dual-period distributed feedback gratings with different grating periods. Single mode emissions from 3.3 to 4.6 THz with side-mode suppression ratio and output power up to 40 dB and 65 µW are obtained, with a narrow linewidth of 5 GHz. [reprint (PDF)]
15.	Quantum Dot Infrared Photodetectors: Comparison Experiment and Theory H. Lim, W. Zhang, S. Tsao, T. Sills, J. Szafraniec, K. Mi, B. Movaghar, and M. Razeghi Virtual Journal of Nanoscale Science and Technology 12 (9)-- August 29, 2005 ...[Visit Journal][reprint (PDF)]
15.	An accurate method to check chemical interfaces of epitaxial III‐V compounds R. Bisaro; G. Laurencin; A. Friederich; M. Razeghi Appl. Phys. Lett. 40 (11): 978–980 (1982)-- June 1, 1982 ...[Visit Journal] We have developed a method of chemical beveling coupled with line scan Auger measurements to check abrupt interfaces of epitaxial III‐V compounds. Interface widths between 53 and 89 Å have been measured by this method for an InP/Ga0.47In0.53As/InP double heterostructure grown by low pressure metalorganic chemical vapor deposition. The ultimate width checkable by this method lies between 10 and 15 Å and is of the order of magnitude of the escape depth of the Auger electrons selected. [reprint (PDF)]
15.	Midinfrared Semiconductor Photonics – A Roadmap:Quantum Cascade Lasers MANIJEH RAZEGHI arXiv:2511.03868 [physics.optics] ...[Visit Journal] Mid-wave infrared (IR) quantum cascade lasers (QCLs) offer high output power, excellent efficiency, broad wavelength tunability, and elevated operating temperatures, especially when operating in the 3–12 μm wavelength range. These characteristics make them highly promising for a wide range of applications, including high-resolution molecular spectroscopy, ultra-low-loss optical fiber communications using fluoride-based glasses (with attenuation below 2.5×10⁻⁴ dB/km), trace gas detection, air pollution monitoring (as many molecules, particularly hydrocarbons, exhibiting strong absorption lines in this spectral region), and medical diagnostics. This article presents a comprehensive overview of the development of QCLs, highlighting key milestones, the current state of the technology, and future directions, framed within the broader context of the Semiconductor Mid-Infrared Photonics Roadmap.
15.	Self-assembled semiconductor quantum dot infrared photodetector operating at room temperature and focal plane array Ho-Chul Lim; Stanley Tsao; Wei Zhang; Manijen Razeghi Proc. SPIE 6542, Infrared Technology and Applications XXXIII, 65420R (May 14, 2007)-- May 14, 2007 ...[Visit Journal] Self-assembled semiconductor quantum dots have attracted much attention because of their novel properties and thus possible practical applications including the lasers, detectors and modulators. Especially the photodetectors which have quantum dots in their active region have been developed and show promising performances such as high operation temperature due to three dimensional confinement of the carriers and normal incidence in contrast to the case of quantum well detectors which require special optical coupling schemes. Here we report our recent results for mid-wavelength infrared quantum dot infrared photodetector grown by low-pressure metalorganic chemical vapor deposition. The material system we have investigated consists of 25 period self-assembled InAs quantum dot layers on InAlAs barriers, which are lattice-matched to InP substrates, covered with InGaAs quantum well layers and InAlAs barriers. This active region was sandwiched by highly doped InP contact layers. The device operates at 4.1 μm with a peak detectivity of 2.8×10¹¹ cm·Hz^1/2/W at 120 K and a quantum efficiency of 35 %. The photoresponse can be observed even at room temperature resulting in a peak detectivity of 6×10⁷ cm·Hz^1/2/W. A 320×256 focal plane array has been fabricated in this kind of device. Its performance will also be discussed here. [reprint (PDF)]
15.	Responsivity and Noise Performance of InGaAs/InP Quantum Well Infrared Photodetectors C. Jelen, S. Slivken, T. David, G. Brown, and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] Dark current nose measurements were carried out between 10 and 104 Hz at T = 80K on two InGaAs/InP quantum well IR photo detectors (QWIPs) designed for 8 μm IR detection. Using the measured noise data, we have calculated the thermal generation rate, bias-dependent gain, electron trapping probability, and electron diffusion length. The calculated thermal generation rate is similar to AlGaAs/GaAs QWIPs with similar peak wavelengths, but the gain is 50X larger, indicating improved transport and carrier lifetime are obtained in the binary InP barriers. As a result, a large responsivity of 7.5 A/W at 5V bias and detectivity of 5 X 10¹¹ cm·Hz^½/W at 1.2 V bias were measured for the InGaAs/InP QWIPs at T = 80K. [reprint (PDF)]
15.	Comparison of PLD-Grown p-NiO/n-Ga2O3 Heterojunctions on Bulk Single Crystal β-Ga2O3 and r-plane Sapphire Substrates D. J. Rogers , V. E. Sandana, F. Hosseini Teherani and M. Razeghi Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 128870J (28 January - 1 February 2024 San Francisco)doi: 10.1117/12.3012511 ...[Visit Journal] p-NiO/n-Ga2O3 heterostructures were formed on single crystal (-201) β (monoclinic) Ga2O3 and r-sapphire substrates by Pulsed Laser Deposition. Ring mesa layer stacks were created using a shadow mask during growth. X-Ray diffraction studies were consistent with the formation of (111) oriented fcc NiO on the bulk Ga2O3 and randomly oriented fcc NiO on (102) oriented β-Ga2O3 /r-sapphire. RT optical transmission studies revealed bandgap energy values of ~3.65 eV and ~5.28 eV for the NiO and Ga2O3 on r-sapphire. p-n junction devices were formed by depositing gold contacts on the layer stacks using shadow masks in a thermal evaporator. Both heterojunctions showed rectifying I/V characteristics. On bulk Ga2O, the junction showed a current density over 16mA/cm2 at +20V forward bias and a reverse bias leakage current over 3 orders of magnitude lower at -20V (1 pA). On Ga2O3/r-sapphire the forward bias current density at +15V was about an order of magnitude lower than for the p-NiO/bulk n-Ga2O3 heterojunction while the reverse bias leakage current at -15V (~ 20 pA) was an order of magnitude higher. Hence the NiO/bulk Ga2O3 junction was more rectifying. Upon illumination with a Xenon lamp a distinct increase in current was observed for the IV curves in both devices (four orders of magnitude for -15V reverse bias in the case of the p-NiO/bulk n-Ga2O3 heterojunction). The p-NiO/n-Ga2O3/rsapphire junction gave a spectral responsivity with a FWHM value of 80nm and two distinct response peaks (with maxima at 230 and 270nm) which were attributed to carriers being photogenerated in the Ga2O3 underlayer. For both devices time response studies showed a 10%/90% rise and fall of the photo generated current upon shutter open and closing which was relatively abrupt (millisecond range), and there was no evidence of significant persistent photoconductivity. [reprint (PDF)]
15.	Characterization of high quality GaInP/GaAs superlattices grown on GaAs and Si substrates by gas source molecular beam epitaxy C. Jelen, S. Slivken, X.G. He, and M. Razeghi and S. Shastry Journal of Vacuum Science and Technology B 12 (2)-- March 1, 1994 ...[Visit Journal] We report an analysis of the heteroepitaxial interfaces in high quality GaInP–GaAs superlattices grown simultaneously on GaAs and Si substrates by gas source molecular beam epitaxy. These two superlattices have been studied using high resolution x-ray diffraction measurements. Sharp superlattice satellites, with very little broadening, are observed within a 6° range for the sample on GaAs. Photoluminescence peaks with full widths at half-maximums of 5 and 7 meV are obtained at 4 K for samples with 58 Å wells on GaAs and Si, respectively. Room temperature exciton absorption is observed in the photovoltage measurements for a superlattice grown on Si substrate. The thicknesses determined by x-ray analysis are consistent with those obtained by a Kronig–Penny model fitting of the photovoltage spectroscopy. [reprint (PDF)]

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