Center for Quantum Devices - Most Downloaded Journal Articles

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17.	Schottky barrier heights and conduction-band offsets of In_1-xGa_xAs_1-yP_y lattice matched to GaAs J.K. Lee, Y.H. Cho, B.D. Choe, K.S. Kim, H.I. Jeon, H. Lim and M. Razeghi Applied Physics Letters 71 (7)-- August 18, 1997 ...[Visit Journal] The Schottky barrier heights of Au/In_1−xGa_xAs_1−yP_y contacts have been determined as a function of y by the capacitance–voltage and temperature dependent current–voltage characteristics measurements. The barrier height is observed to increase as y is increased for both n- and p-type materials, with a more rapid increase for the p-type material. The compositional variation of the barrier heights for Au/n-In_1−xGa_xAs_1−yP_y is found to be identical to that of the conduction-band offsets in In_1−xGa_xAs_1−yP_y/GaAs heterojunctions. A possible cause of this phenomenon is also discussed. [reprint (PDF)]
17.	Demonstration of mid-infrared type-II InAs/GaSb superlattice photodiodes grown on GaAs substrate B.M. Nguyen, D. Hoffman, E.K. Huang, S. Bogdanov, P.Y. Delaunay, M. Razeghi and M.Z. Tidrow Applied Physics Letters, Vol. 94, No. 22-- June 8, 2009 ...[Visit Journal] We report the growth and characterization of type-II InAs/GaSb superlattice photodiodes grown on a GaAs substrate. Through a low nucleation temperature and a reduced growth rate, a smooth GaSb surface was obtained on the GaAs substrate with clear atomic steps and low roughness morphology. On the top of the GaSb buffer, a p⁺-i-n⁺ type-II InAs/GaSb superlattice photodiode was grown with a designed cutoff wavelength of 4 μm. The detector exhibited a differential resistance at zero bias (R₀A)in excess of 1600 Ω·cm² and a quantum efficiency of 36.4% at 77 K, providing a specific detectivity of 6 X 10¹¹ cm·Hz^½/W and a background limited operating temperature of 100 K with a 300 K background. Uncooled detectors showed similar performance to those grown on GaSb substrates with a carrier lifetime of 110 ns and a detectivity of 6 X 10⁸ cm·Hz^½/W. [reprint (PDF)]
17.	High Quantum Efficiency Solar-Blind Photodetectors R. McClintock, A. Yasan, K. Mayes, D. Shiell, S. Darvish, P. Kung and M. Razeghi SPIE Conference, Jose, CA, Vol. 5359, pp. 434-- January 25, 2004 ...[Visit Journal] We report AlGaN-based back-illuminated solar-blind p-i-n photodetectors with a record peak responsivity of 150 mA/W at 280 nm, corresponding to a high external quantum efficiency of 68%, increasing to 74% under 5 volts reverse bias. Through optimization of the p-AlGaN layer, we were able to remove the out-of-band negative photoresponse originating from the Schottky-like p-type metal contact, and hence significantly improve the degree of solar-blindness [reprint (PDF)]
17.	Quantum dot in a well infrared photodetectors for high operating temperature focal plane arrays S. Tsao, T. Yamanaka, S. Abdollahi Pour, I-K Park, B. Movaghar and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7234-0V-- January 25, 2009 ...[Visit Journal] InAs quantum dots embedded in InGaAs quantum wells with InAlAs barriers on InP substrate grown by metalorganic chemical vapor deposition are utilized for high operating temperature detectors and focal plane arrays in the middle wavelength infrared. This dot-well combination is unique because the small band offset between the InAs dots and the InGaAs well leads to weak dot confinement of carriers. As a result, the device behavior differs significantly from that in the more common dot systems that have stronger confinement. Here, we present energy level modeling of our QD-QW system and apply these results to interpret the detector behavior. Detectors showed high performance with D* over 10¹⁰ cm·Hz^1/2W^-1 at 150 K operating temperature and with high quantum efficiency over 50%. Focal plane arrays have been demonstrated operating at high temperature due to the low dark current observed in these devices. [reprint (PDF)]
17.	Crystallography of epitaxial growth of wurtzite-type thin films on sapphire substrates P. Kung, C.J. Sun, A. Saxler, H. Ohsato, and M. Razeghi Journal of Applied Physics 75 (9)-- May 1, 1994 ...[Visit Journal] In this article, we present a crystallographic model to describe the epitaxial growth of wurtzite‐type thin films such as gallium nitride (GaN) on different orientations of sapphire (Al2O3) substrates. Through this model, we demonstrate the thin films grown on (00⋅1)Al₂O₃ have a better epilayer‐substrate interface quality than those grown on (01⋅2)Al₂O₃. We also show the epilayer grown on (00⋅1)Al₂O₃ are gallium‐terminated, and both (00⋅1) and (01⋅2) surfaces of sapphire crystals are oxygen‐terminated. [reprint (PDF)]
17.	High Quantum Efficiency AlGaN Solar-Blind Photodetectors R. McClintock, A. Yasan, K. Mayes, D. Shiell, S.R. Darvish, P. Kung and M. Razeghi Applied Physics Letters, 84 (8)-- February 23, 2004 ...[Visit Journal] We report AlGaN-based back-illuminated solar-blind ultraviolet p-i-n photodetectors with a peak responsivity of 136 mA/W at 282 nm without bias. This corresponds to a high external quantum efficiency of 60%, which improves to a value as high as 72% under 5 V reverse bias. We attribute the high performance of these devices to the use of a very-high quality AlN and Al_0.87Ga_0.13N/AlN superlattice material and a highly conductive Si–In co-doped Al_0.5Ga_0.5N layer [reprint (PDF)]
17.	Al_xGa_1-xN for Solar-Blind UV Detectors P. Sandvik, K. Mi, F. Shahedipour, R. McClintock, A. Yasan, P. Kung, and M. Razeghi Journal of Crystal Growth 231 (2001)-- January 1, 2001 ...[Visit Journal] We report on the metalorganic chemical vapor deposition of high quality AlGaN thin films on sapphire substrates over a wide range of Al concentrations. The quality of these AlGaN materials was verified through a demonstration of high performance visible and solar-blind UV p–i–n photodiodes with peak cutoff wavelengths ranging from 227 to 364 nm. External quantum efficiencies for these devices reached as high as 69% with over five orders rejection ratio from the peak to visible wavelengths. [reprint (PDF)]
16.	Surface leakage reduction in narrow band gap type-II antimonide-based superlattice photodiodes E.K. Huang, D. Hoffman, B.M. Nguyen, P.Y. Delaunay and M. Razeghi Applied Physics Letters, Vol. 94, No. 5, p. 053506-1-- February 2, 2009 ...[Visit Journal] Inductively coupled plasma (ICP) dry etching rendered structural and electrical enhancements on type-II antimonide-based superlattices compared to those delineated by electron cyclotron resonance (ECR) with a regenerative chemical wet etch. The surface resistivity of 4×10⁵ Ω·cm is evidence of the surface quality achieved with ICP etching and polyimide passivation. By only modifying the etching technique in the fabrication steps, the ICP-etched devices with a 9.3 µm cutoff wavelength revealed a diffusion-limited dark current density of 4.1×10⁻⁶ A/cm² and a maximum differential resistance at zero bias in excess of 5300 Ω·cm² at 77 K, which are an order of magnitude better in comparison to the ECR-etched devices. [reprint (PDF)]
16.	High Frequency Extended Short-Wavelength Infrared Heterojunction Photodetectors Based on InAs/GaSb/AlSb Type-II Superlattices Romain Chevallier, Abbas Haddadi, Ryan McClintock, Arash Dehzangi , Victor Lopez-Dominguez, Pedram Khalili Amiri, Manijeh Razeghi IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 6-- December 1, 2018 ...[Visit Journal] InAs/GaSb/AlSb type-II superlattice-based photodetectors, with 50% cut-off wavelength of 2.1 µm and a −3 dB cut-off frequency of 4.8 GHz, are demonstrated, for 10 µm diameter circular mesas under 15 V applied reverse bias. A study of the cut-off frequency with applied bias and mesa size was performed to evaluate some of the limiting factors of photodetectors high frequency performance. [reprint (PDF)]
16.	Investigation of the Heteroepitaxial Interfaces in the GaInP/GaAs Superlattices by High Resolution X-Ray Diffraction and Dynamical Solutions Xiaoguang He and Manijeh Razeghi Journal of Applied Physics 73 (7)-- April 1, 1993 ...[Visit Journal] Two GaAs/GaInP superlattices grown on GaAs substrates by low‐pressure metalorganic chemical vapor deposition have been studied using high resolution x‐ray diffraction measurements and simulations by solving Tagaki–Taupin equations. The strained layers at both interfaces of the GaAs well are identified from the simulations of the measured diffraction patterns. The purging of indium at the interface of GaInP/GaAs accounts for the strained layer at the GaInP/GaAs interface while the pressure difference in the gas lines, which results in the different traveling time to the sample surface, is attributed to the indium‐poor strained layer at the GaAs/GaInP interface. It is shown that high‐resolution x‐ray diffraction measurements combined with a dynamical simulation, are sensitive tools to study the heteroepitaxial interfaces on an atomic layer scale. In addition, the influence of a miscut of the substrate on the measurement is discussed in the article. It is shown that even though the miscut is small, the diffraction geometry is already an asymmetric one. More than 10% error in the superlattice period for a 2° miscut substrate can result when the miscut substrate is considered a symmetric geometry. [reprint (PDF)]
16.	Temperature dependence of the dark current and activation energy at avalanche onset of GaN Avalanche Photodiodes M.P. Ulmer, E. Cicek, R. McClintock, Z. Vashaei and M. Razeghi SPIE Proceedings, Vol. 8460, p. 84601G-1-- August 15, 2012 ...[Visit Journal] We report a study of the performance of an avalanche photodiode (APD) as a function of temperature from 564 K to 74 K. The dark current at avalanche onset decreases from 564 K to 74 K by approximately a factor of 125 and from 300 K to 74K the dark current at avalanche offset is reduced by a factor of about 10. The drop would have been considerably larger if the activation energy at avalanche onset (Ea) did not also decrease with decreasing temperature. These data give us insights into how to improve the single-photon counting performance of a GaN based ADP. [reprint (PDF)]
16.	InAsSb/InAsP strained-layer superlattice injection lasers operating at 4.0 μm grown by metal-organic chemical vapor deposition B. Lane, Z. Wu, A. Stein, J. Diaz, and M. Razeghi Applied Physics Letters 74 (23)-- June 7, 1999 ...[Visit Journal] We report high power mid-infrared electrical injection operation of laser diodes based on InAsSb/InAsP strained-layer superlattices grown on InAs substrate by metal-organic chemical vapor deposition. The broad-area laser diodes with 100 μm aperture and 1800 μm cavity length demonstrate peak output powers of 546 and 94 mW in pulsed and cw operation respectively at 100 K with a threshold current density as low as 100 A/cm². [reprint (PDF)]
16.	Low pressure metalorganic chemical vapor deposition of InP and related compounds M. Razeghi, M. A. Poisson, J. P. Larivain & J. P. Duchemin Razeghi, M., Poisson, M.A., Larivain, J.P. et al. Low pressure metalorganic chemical vapor deposition of InP and related compounds. J. Electron. Mater. 12, 371–395 (1983). https://doi.org/10.1007/BF02651138-- March 1, 1983 ...[Visit Journal] The low pressure metalorganic chemical vapor deposition epitaxial growth and characterization of InP, Ga0.47In0.53 As and GaxIn1-xAsyP1-y, lattice-matched to InP substrate are described. The layers were found to have the same etch pit density (EPD) as the substrate. The best mobility obtained for InP was 5300 cm2 V−1S−1 at 300 K and 58 900 cm2 V−1 S−1 at 772K, and for GaInAs was 11900 cm2 V−1 S−1 at 300 K, 54 600 cm2 V−1 S−1 at 77 K and 90 000 cm V−1S−1 at 2°K. We report the first successful growth of a GaInAs-InP superlattice and the enhanced mobility of a two dimensional electron gas at a GaInAs -InP heterojunction grown by LP-MO CVD. LP MO CVD material has been used for GaInAsPInP, DH lasers emitting at 1.3 um and 1.5 um. These devices exhibit a low threshold current, a slightly higher than liquid phase epitaxy devices and a high differential quantum efficiency of 60%. Fundamental transverse mode oscillation has been achieved up to a power outpout of 10 mW. Threshold currents as low as 200 mA dc have been measured for devices with a stripe width of 9 um and a cavity length of 300 um for emission at 1.5 um. Values of T in the range 64–80 C have been obtained. Preliminary life testing has been carried out at room temperature on a few laser diodes (λ = 1.5μm). Operation at constant current for severalthousand hours has been achieved with no change in the threshold current. [reprint (PDF)]
16.	Characterization of ZnO thin films grown on c-sapphire by pulsed laser deposition as templates for regrowth of zno by metal organic chemical vapor deposition D. J. Rogers ; F. Hosseini Teherani ; C. Sartel ; V. Sallet ; F. Jomard ; P. Galtier ; M. Razeghi Proc. SPIE 7217, Zinc Oxide Materials and Devices IV, 72170F (February 17, 2009)-- February 17, 2009 ...[Visit Journal] The use of ZnO template layers grown Pulsed Laser Deposition (PLD) has been seen to produce dramatic improvements in the surface morphology, crystallographic quality and optical properties of ZnO layers grown on c-sapphire substrates by Metal Organic Chemical Vapor Deposition. This paper provides complementary details on the PLD-grown ZnO template properties. [reprint (PDF)]
16.	Capacitance-voltage investigation of high purity InAs/GaSb superlattice photodiodes A. Hood, D. Hoffman, Y. Wei, F. Fuchs, and M. Razeghi Applied Physics Letters 88 (6)-- February 6, 2006 ...[Visit Journal] The residual carrier backgrounds of binary type-II InAs/GaSb superlattice photodiodes with cutoff wavelengths around 5 μm have been studied in the temperature range between 20 and 200 K. By applying a capacitance-voltage measurement technique, a residual background concentration below 10¹⁵ cm^–3 has been found. [reprint (PDF)]
16.	High Power 0.98 μm GaInAs/GaAs/GaInP Multiple Quantum Well Laser K. Mobarhan, M. Razeghi, G. Marquebielle and E. Vassilaki Journal of Applied Physics 72 (9)-- November 1, 1992 ...[Visit Journal] We report the fabrication of high quality Ga_0.8In_0.2As/GaAs/Ga_0.51In_0.49P multiple quantum well laser emitting at 0.98 μm grown by low pressure metalorganic chemical vapor deposition. Continuous wave operation with output power of 500 mW per facet was achieved at room temperature for a broad area laser with 130 μm width and 300 μm cavity length. This is an unusually high value of output power for this wavelength laser in this material system. The differential quantum efficiency exceeded 75% with excellent homogeneity and uniformity. The characteristic temperature, T₀ was in the range of 120–130 K. [reprint (PDF)]
16.	Transport properties in n-type InSb films grown by metalorganic chemical vapor deposition S.N. Song, J.B. Ketterson, Y.H. Choi, R. Sudharsanan, and M. Razeghi Applied Physics Letters 63 (7)-- August 16, 1993 ...[Visit Journal] We have measured the temperature and magnetic field dependence of the Hall mobility and transverse magnetoresistance in n-type InSb films epitaxially grown on GaAs substrates by metalorganic chemical vapor deposition. The films show a giant magnetoresistance: e.g., at 240 K the resistivity increases over 20 times at a magnetic field of 5 T; the low field coefficient of resistivity at 77 K is as high as 47.5 μ·Ω· cm/G. The Hall mobility decreases with magnetic field and saturates at higher fields. By taking the interface carrier transport into account, the observed field dependence of the Hall mobility and magnetoresistance may be understood based on a two-layer model. [reprint (PDF)]
16.	Buried heterostructure quantum cascade lasers with high continuous-wave wall plug efficiency A. Evans, S.R. Darvish, S. Slivken, J. Nguyen, Y. Bai and M. Razeghi Applied Physics Letters, Vol. 91, No. 7, p. 071101-1-- August 13, 2007 ...[Visit Journal] The authors report on the development of ~4.7 µm strain-balanced InP-based quantum cascade lasers with high wall plug efficiency and room temperature continuous-wave operation. The use of narrow-ridge buried heterostructure waveguides and thermally optimized packaging is presented. Over 9.3% wall plug efficiency is reported at room temperature from a single device producing over 0.675 W of continuous-wave output power. Wall plug efficiencies greater than 18% are also reported for devices at a temperature of 150 K, with continuous-wave output powers of more than 1 W. [reprint (PDF)]
16.	Emerging materials for photonics Miriam S. Vitiello, and Manijeh Razeghi APL Materials 5, 03510-- March 31, 2017 ...[Visit Journal] Photonics plays a major role in all aspects of human life. It revolutionized science by addressing fundamental scientiﬁc questions and by enabling key functions in many interdisciplinary ﬁelds spanning from quantum technologies to information andcommunicationscience,andfrombiomedicalresearchtoindustrialprocessmonitoring and life entertainment. [reprint (PDF)]
16.	Photoluminescence Study of AlGaN-based 280 nm Ultraviolet Light-Emitting Diodes A. Yasan, R. McClintock, K. Mayes, D.H. Kim, P. Kung, and M. Razeghi Applied Physics Letters, 83 (20)-- November 17, 2003 ...[Visit Journal] We investigated optical properties of single quantum well AlGaN-based UV 280 nm light-emitting diodes using temperature-dependent photoluminescence (PL) measurement. We found an "S-shaped" temperature dependence of the peak energy. From the Arrhenius plot of integrated PL intensity, we speculate that dislocations as well as thermal emission of carriers out of the quantum well are responsible for the PL quenching behavior. Also a second nonradiative channel with much lower activation energy was found, the origin of which we believe to be quenching of the bound excitons [reprint (PDF)]
16.	Recent Advances in LWIR Type-II InAs/GaSb Superlattice Photodetectors and Focal Plane Arrays at the Center for Quantum Devices M. Razeghi, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, M.Z. Tidrow, and V. Nathan IEEE Proceedings, Vol. 97, No. 6, p. 1056-1066-- June 1, 2009 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs, and imaging applications. They now appear to be a possible alternative to the state-of-the-art HgCdTe (MCT) technology in the long and very long wavelength infrared regimes. At the Center for Quantum Devices, we have successfully realized very high quantum efficiency, very high dynamic differential resistance R₀A - product LWIR Type – II InAs/GaSb superlattice photodiodes with efficient surface passivation techniques. The demonstration of high quality LWIR Focal Plane Arrays that were 100 % fabricated in - house reaffirms the pioneer position of this university-based laboratory. [reprint (PDF)]
16.	Ga₂O₃ Metal-oxide-semiconductor Field Effect Transistors on Sapphire Substrate by MOCVD Ji-Hyeon Park, Ryan McClintock and Manijeh Razeghi Semiconductor Science and Technology, Volume 34, Number 8-- June 26, 2019 ...[Visit Journal] Si-doped gallium oxide (Ga₂O₃) thin films were grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) and fabricated into metal oxide semiconductor field effect transistors (MOSFETs). The Ga₂O₃ MOSFETs exhibited effective gate modulation of the drain current with a complete channel pinch-off for VG < −25 V, and the three-terminal off-state breakdown voltage was 390 V. The device shows a very low gate leakage current (~50 pA/mm), which led to a high on/off ratio of ~10⁸. These transistor characteristics were stable from room temperature to 250 °C [reprint (PDF)]
16.	Improved performance of quantum cascade lasers via manufacturable quality epitaxial side down mounting process utilizing aluminum nitride heatsinks A. Tsekoun, R. Go, M. Pushkarsky, M. Razeghi, C.K.N. Patel SPIE Conference, San Jose, CA, Vol. 6127, pp. 612702-- January 23, 2006 ...[Visit Journal] We report substantially improved performance of high power quantum cascade lasers by utilizing epi-side down mounting that provides superior heat dissipation properties. We have obtained CW power output of 450 mW at 20°C from mid-IR QCLs. The improved thermal management achieved with epi-side down mounting has also permitted us to carry out initial lifetime tests on the mid-IR QCLs. No degradation of power output is seen even after over 300 hours of CW operation at 25°C with power output in excess of 300 mW. We believe these improvements should permit incorporation of mid-IR QCLs in reliable instrumentation. [reprint (PDF)]
16.	Electroluminescence at 375 nm from a Zn0/GaN:Mg/c-Al₂O₃ heterojunction light emitting diodes D.J. Rogers, F.Hosseini Teherani, A. Yasan, K. Minder, P. Kung, and M. Razeghi Applied Physics Letters, 88 (14)-- April 13, 2006 ...[Visit Journal] n-ZnO/p-GaN:Mg heterojunction light emitting diode (LED) mesas were fabricated on c-Al₂O₃ substrates using pulsed laser deposition for the ZnO and metal organic chemical vapor deposition for the GaN:Mg. Room temperature (RT) photoluminescence (PL) showed an intense main peak at 375 nm and a negligibly low green emission indicative of a near band edge excitonic emission from a ZnO layer with low dislocation/defect density. The LEDs showed I-V characteristics confirming a rectifying diode behavior and a RT electroluminescence (EL) peaked at about 375 nm. [reprint (PDF)]
16.	Gallium nitride on silicon for consumer & scalable photonics C. Bayram, K.T. Shiu, Y. Zhu, C.W. Cheng, D.K. Sadana, Z. Vashaei, E. Cicek, R. McClintock and M. Razeghi SPIE Proceedings, Vol. 8631, p. 863112-1, Photonics West, San Francisco, CA-- February 4, 2013 ...[Visit Journal] Gallium Nitride (GaN) is a unique material system that has been heavily exploited for photonic devices thanks to ultraviolet-to-terahertz spectral tunability. However, without a cost effective approach, GaN technology is limited to laboratory demonstrations and niche applications. In this investigation, integration of GaN on Silicon (100) substrates is attempted to enable widespread application of GaN based optoelectronics. Controlled local epitaxy of wurtzite phase GaN on on-axis Si(100) substrates is demonstrated via metal organic chemical vapor deposition (MOCVD). CMOS-compatible fabrication scheme is used to realize [SiO2-Si{111}-Si{100}] groove structures on conventional 200-mm Si(100) substrates. MOCVD growth (surface treatment, nucleation, initiation) conditions are studied to achieve controlled GaN epitaxy on such grooved Si(100) substrates. Scanning electron microscopy and transmission electron microscopy techniques are used to determine uniformity and defectivity of the GaN. Our results show that aforementioned groove structures along with optimized MOCVD growth conditions can be used to achieve controlled local epitaxy of wurtzite phase GaN on on-axis Si(100) substrates. [reprint (PDF)]

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