Center for Quantum Devices - Most Downloaded Journal Articles

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1.	A Review of III-Nitride Research at the Center for Quantum Devices M. Razeghi and R. McClintock Journal of Crystal Growth, Vol. 311, No. 10-- May 1, 2009 ...[Visit Journal] In this paper, we review the history of the Center for Quantum Devices’ (CQD) III-nitride research covering the past 15 years. We review early work developing III-nitride material growth. We then present a review of laser and light-emitting diode (LED) results covering everything from blue lasers to deep UV LEDs emitting at 250 nm. This is followed by a discussion of our UV photodetector research from early photoconductors all the way to current state of the art Geiger-mode UV single photon detectors. [reprint (PDF)]
1.	Substrate removal for high quantum efficiency back side illuminated type-II InAs/GaSb photodetectors P.Y. Delaunay, B.M. Nguyen, D. Hoffman and M. Razeghi Applied Physics Letters, Vol. 91, No. 23, p. 231106-- December 3, 2007 ...[Visit Journal] A substrate removal technique using an InAsSb etch stop layer improves by a factor of 2 the quantum efficiency of back side illuminated type-II InAs/GaSb superlattice photodetectors. After etching of the GaSb substrate with a CrO₃ based solution, the quantum efficiency of the diodes presents Fabry-Pérot oscillations averaging at 56%. Due to the confinement of the infrared light inside the devices, the quantum efficiency for certain devices reaches 75% at 8.5 µm. The implementation of this new technique to a focal plane array resulted in a decrease of the integration time from 0.23 to 0.08 ms. [reprint (PDF)]
1.	High operating temperature 320 x 256 middle-wavelength infrared focal plane array imaging based on an InAs/InGaAs/InAlAs/InP quantum dot infrared photodetector S. Tsao, H. Lim, W. Zhang, and M. Razeghi Applied Physics Letters, Vol. 90, No. 20, p. 201109-- May 14, 2007 ...[Visit Journal] This letter reports a 320×256 middle-wavelength infrared focal plane array operating at temperatures up to 200 K based on an InAs quantum dot/InGaAs quantum well/InAlAs barrier detector grown on InP substrate by low pressure metal organic chemical vapor deposition. The device's low dark current density and the persistence of the photocurrent up to room temperature enabled the high temperature imaging. The focal plane array had a peak detection wavelength of 4 µm, a responsivity of 34 mA/W, a conversion efficiency of 1.1%, and a noise equivalent temperature difference of 344 mK at an operating temperature of 120 K. [reprint (PDF)]
1.	Gain and recombination dynamics of quantum-dot infrared photodetectors H. Lim, B. Movaghar, S. Tsao, M. Taguchi, W. Zhang, A.A. Quivy, and M. Razeghi Physical Review B, 74 (20)-- November 15, 2006 ...[Visit Journal] In this paper we present a theory of diffusion and recombination in QDIPs which is an attempt to explain the recently reported values of gain in these devices. We allow the kinetics to encompass both the diffusion and capture rate limited regimes of carrier relaxation using rigorous random walk and diffusion methods. The photoconductive gains are calculated and compared with the experimental values obtained from InGaAs/InGaP/GaAs and InAs/InP QDIPs using the generation-recombination noise analysis. [reprint (PDF)]
1.	Capacitance-voltage investigation of high purity InAs/GaSb superlattice photodiodes A. Hood, D. Hoffman, Y. Wei, F. Fuchs, and M. Razeghi Applied Physics Letters 88 (6)-- February 6, 2006 ...[Visit Journal] The residual carrier backgrounds of binary type-II InAs/GaSb superlattice photodiodes with cutoff wavelengths around 5 μm have been studied in the temperature range between 20 and 200 K. By applying a capacitance-voltage measurement technique, a residual background concentration below 10¹⁵ cm^–3 has been found. [reprint (PDF)]
1.	Advanced Monolithic Quantum Well Infrared Photodetector Focal Plane Array Integrated with Silicon Readout Integrated Circuit J. Jiang, S. Tsao, K. Mi, M. Razeghi, G.J. Brown, C. Jelen and M.Z. Tidrow Infrared Physics and Technology, 46 (3)-- January 1, 2005 ...[Visit Journal] Today, most infrared focal plane arrays (FPAs) utilize a hybrid scheme. To achieve higher device reliability and lower cost, monolithic FPAs with Si based readout integrated circuits (ROICs) are the trend of the future development. In this paper, two approaches for monolithic FPAs are proposed: double sided integration and selective epitaxy integration. For comparison, the fabrication process for hybrid quantum well infrared photodetectors (QWIP) FPAs are also described. Many problems, such as the growth of QWIPs on Si substrate and processing incompatibility between Si and III–V semiconductors, need to be solved before monolithic FPAs can be realized. Experimental work on GaInAs/InP QWIP-on-Si is given in this paper. A record high detectivity of 2.3×10⁹ jones was obtained for one QWIP-on-Si detector at 77 K. [reprint (PDF)]
1.	Al_xGa_1-xN for Solar-Blind UV Detectors P. Sandvik, K. Mi, F. Shahedipour, R. McClintock, A. Yasan, P. Kung, and M. Razeghi Journal of Crystal Growth 231 (2001)-- January 1, 2001 ...[Visit Journal] We report on the metalorganic chemical vapor deposition of high quality AlGaN thin films on sapphire substrates over a wide range of Al concentrations. The quality of these AlGaN materials was verified through a demonstration of high performance visible and solar-blind UV p–i–n photodiodes with peak cutoff wavelengths ranging from 227 to 364 nm. External quantum efficiencies for these devices reached as high as 69% with over five orders rejection ratio from the peak to visible wavelengths. [reprint (PDF)]
1.	High power asymmetrical InAsSb/InAsSbP/AlAsSb double heterostructure lasers emitting at 3.4 μm D. Wu, B. Lane, H. Mohseni, J. Diaz and M. Razeghi Applied Physics Letters 74 (9)-- March 1, 1999 ...[Visit Journal] Midinfrared lasers with an asymmetrical InPAsSb/InAsSb/AlAsSb double heterostructure are reported. Using the asymmetrical double heterostructure, p- and n-cladding layers are separately optimized; high energy-gap AlAsSb (Eg ≈ 1.5 eV) for the p-type cladding layer to reduce the leakage current, and thus to increase To, and low energy-gap InPAsSb (Eg ≈ 0.5 eV) for the n-cladding layer to have low turn-on voltage. 100-μm-width broad-area lasers with 1000 μm cavity length exhibited peak output powers of 1.88 W in pulse and 350 mW in continuous wave modes per two facets at T=80 K with To of 54 K and turn-on voltage of 0.36 V. Maximum peak output powers up to 6.7 W were obtained from a laser bar of total aperture of 400 μm width and cavity length of 1000 μm, with a differential efficiency of 34% and far-field beam divergence narrower than 40° at 80 K. [reprint (PDF)]
1.	Temperature insensitivity of the Al-free InGaAsP/GaAs lasers for λ = 808 and 908 nm M. Razeghi, H. Yi, J. Diaz, S. Kim, and M. Erdtmann SPIE Conference, San Jose, CA; Proceedings 3001-- February 12, 1997 ...[Visit Journal] n this work, we present our recent achievements for the reliability of the Al-free lasers at high temperatures and high powers. Laser operations up to 30,000 hours were achieved without any degradation in the lasers characteristics from 7 randomly selected InGaAsP/GaAs diodes for λ = 808 nm. The test were performed for lasers without mirror-coating for optical power of 0.5 to 1 W CW at 50 approximately 60 °C. To the best of our knowledge, this is the first direct demonstration of the extremely high reliability of Al-free diodes operations at high powers and temperatures for periods of time much longer than practical need (approximately 3 years). The characteristics during the tests are discussed in detail. [reprint (PDF)]
1.	Reliability of Aluminum-Free 808 nm High-Power Laser Diodes with Uncoated Mirrors I. Eliashevich, J. Diaz, H. Yi, L. Wang, and M. Razeghi Applied Physics Letters 66 (23)-- June 5, 1995 ...[Visit Journal] The reliability of uncoated InGaAsP/GaAs high‐power diode lasers emitting at 808 nm wavelength has been studied. 47 W of quasicontinuous wave output power (pulse width 200 μs, frequency 20 Hz) have been obtained from a 1 cm wide laser bar. A single‐stripe diode without mirror coating has been life tested at 40 °C for emitting power of 800 mW continuous wave (cw) and showed no noticeable degradation and no change of the lasing wavelength after 6000 h of operation. [reprint (PDF)]
1.	InTlSb alloys for infrared detection E. Bigan, Y.H. Choi, G. Labeyrie, and M. Razeghi Proceedings, SPIE Nonlinear Optics for High-Speed Electronics and Optical Frequency Conversion, Vol. 2145-- January 24, 1994 ...[Visit Journal] InTISb alloys have been grown by low-pressure metalorganic chemical vapor deposition, and characterized. Photoconductors exhibit a cutoff wavelength that can be tailored from 5.5 μm up to 9 μm by varying the thallium content. Experimental observations suggest that this can be further extended by increasing the thallium content. An InTISb photoconductor having a 9 μm cutoff wavelength exhibited a D* of 10⁹ cm·Hz^½·W^-1 at 7 μm operating wavelength. [reprint (PDF)]
1.	High Power Mid-Infrared Quantum Cascade Lasers Grown on GaAs Steven Slivken and Manijeh Razeghi Photonics 2022, 9(4), 231 (COVER ARTICLE) ...[Visit Journal] The motivation behind this work is to show that InP-based intersubband lasers with high power can be realized on substrates with significant lattice mismatch. This is a primary concern for the integration of mid-infrared active optoelectronic devices on low-cost photonic platforms, such as Si. As evidence, an InP-based mid-infrared quantum cascade laser structure was grown on a GaAs substrate, which has a large (4%) lattice mismatch with respect to InP. Prior to laser core growth, a metamorphic buffer layer of InP was grown directly on a GaAs substrate to adjust the lattice constant. Wafer characterization data are given to establish general material characteristics. A simple fabrication procedure leads to lasers with high peak power (>14 W) at room temperature. These results are extremely promising for direct quantum cascade laser growth on Si substrates. [reprint (PDF)]
1.	Comparison of chemical and laser lift-off for the transfer of InGaN-based p-i-n junctions from sapphire to glass substrates D. J. Rogers ; P. Bove ; F. Hosseini Teherani ; K. Pantzas ; T. Moudakir ; G. Orsal ; G. Patriarche ; S. Gautier ; A. Ougazzaden ; V. E. Sandana ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862611 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] InGaN-based p-i-n structures were transferred from sapphire to soda-lime glass substrates using two approaches: (1) laser-lift-off (LLO) and thermo-metallic bonding and (2) chemical lift-off (LLO) by means sacrificial ZnO templates and direct wafer bonding. Both processes were found to function at RT and allow reclaim of the expensive single crystal substrate. Both approaches have also already been demonstrated to work for the wafer-scale transfer of III/V semiconductors. Compared with the industry-standard LLO, the CLO offers the added advantages of a lattice match to InGaN with higher indium contents, no need for an interfacial adhesive layer (which facilitates electrical, optical and thermal coupling), no damaged/contaminated GaN surface layer, simplified sapphire reclaim (GaN residue after LLO may complicate reclaim) and cost savings linked to elimination of the expensive LLO process. [reprint (PDF)]
1.	Optimizing facet coating of quantum cascade lasers for low power consumption Y. Bai, S.R. Darvish, N. Bandyopadhyay, S. Slivken and M. Razeghi Journal of Applied Physics, Vol. 109, No. 5, p. 053103-1-- March 1, 2011 ...[Visit Journal] Typical high power consumption (∼10 W) of mid-infrared quantum cascade lasers (QCLs) has been a serious limitation for applications in battery powered systems. A partial high-reflection (PHR) coating technique is introduced for power downscaling with shorter cavity lengths. The PHR coating consists of a double layer dielectric of SiO₂ and Ge. With this technique, a 4.6 μm QCL with an ultra low threshold power consumption of less than a watt (0.83 W) is demonstrated in room temperature continuous wave operation. At 25°C, the maximum output power and wall plug efficiency are 192 mW and 8.6%, respectively. [reprint (PDF)]
1.	Background limited performance of long wavelength infrared focal plane arrays fabricated from type-II InAs/GaSb M-structure superlattice P.Y. Delaunay, B.M. Nguyen and M. Razeghi SPIE Porceedings, Vol. 7298, Orlando, FL 2009, p. 72981Q-- April 13, 2009 ...[Visit Journal] Recent advances in growth techniques, structure design and processing have lifted the performance of Type-II InAs/GaSb superlattice photodetectors. The introduction of a M-structure design improved both the dark current and R0A of Type-II photodiodes. This new structure combined with a thick absorbing region demonstrated background limited performance at 77K for a 300K background and a 2-π field of view. A focal plane array with a 9.6 μm 50% cutoff wavelength was fabricated with this design and characterized at 80K. The dark current of individual pixels was measured around 1.3 nA, 7 times lower than previous superlattice FPAs. This led to a higher dynamic range and longer integration times. The quantum efficiency of detectors without anti-reflective coating was 72%. The noise equivalent temperature difference reached 23 mK. The deposition of an anti-reflective coating improved the NEDT to 20 mK and the quantum efficiency to 89%. [reprint (PDF)]
1.	Advances in APDs for UV astronomy Melville P. Ulmer; Ryan M. McClintock; Jose L. Pau; Manijeh Razeghi Proc. SPIE 6686, UV, X-Ray, and Gamma-Ray Space Instrumentation for Astronomy XV, 668605 (September 13, 2007)-- November 13, 2007 ...[Visit Journal] We report the most recent work of our group of the development of avalanche photo diodes based on (Al)GaN. The goal of this group is to achieve single photon counting. In this paper we first give the scientific motivation for making such a device in the context of UV astronomy and then describe current work and plans for future development. The development includes improving the sensitivity to be able to carry out single photon detection and the fabrication of arrays. [reprint (PDF)]
1.	Current status of high performance quantum cascade lasers at the center for quantum devices M. Razeghi; A. Evans; Y. Bai; J. Nguyen; S. Slivken; S.R. Darvish; K. Mi Conference Proceedings - International Conference on Indium Phosphide and Related Materials. 588-593:[4266015] (2007)-- May 14, 2007 ...[Visit Journal] Mid-infrared laser sources are highly desired for laser-based trace chemical sensors, military countermeasures, free-space communications, as well as developing medical applications. While application development has been limited by the availability of adequate mid-infrared sources, InP-based quantum cascade lasers (QCLs) hold promise as inexpensive, miniature, portable solutions capable of producing high powers and operating at high temperatures with excellent beam quality and superior reliability. This paper discusses the most recent developments of application-ready high power (> 100 mW), continuous-wave (CW), mid-infrared QCLs operating above room temperature with lifetimes exceeding 13,000 hours. [reprint (PDF)]
1.	Review of III-Nitride Optoelectronic Materials for light Emission and Detection M. Razeghi, A. Yasan, R. McClintock, K. Mayes, D. Shiell, S. Darvish, and P. Kung Physica Status Solidi C S141 - S148-- September 10, 2004 ...[Visit Journal] We review the significant achievements relating to optoelectronic devices based on III-nitrides at the center for quantum devices (CQD). Based on GaN/InGaN multiple-quantum well structures, we demonstrated blue laser diodes at a wavelength of 405 nm. This achievement was particularly significant at the time, because while no defect reduction technique was used, a fairly low threshold current density was achieved (3.8 kA/cm²). In the past few years, however, the interest has shifted towards shorter wavelength light emitters, i.e. ultraviolet LEDs and LDs. Lower crystalline quality and unsatisfactory doping levels of AlGaN compound semiconductors posed serious challenges en route to the realization of UV light emitters. However, steady progress in the growth of AlGaN and AlN epilayers made it possible to overcome some of the difficulties. To date, we have been able to demonstrate UV LEDs at wavelengths as short as 265 nm (corresponding to 45% Al in Al_xGa_1-xN) with optical output powers of over 5 mW. We have addressed the n-type AlGaN doping problem by using a Si-In co-doped scheme. We also employed high-quality AlGaN/AlN superlattice templates for the reduction of defects. We have also demonstrated 280 nm UV LEDs with output powers of over 6 mW and external quantum efficiencies of over 0.25%. Despite all the success in the realization of short-wavelength UV LEDs, UV laser diodes at these short wavelengths are yet to be realized. The main difficulties are the low material quality, high device resistance leading to excessive heating of the device, realization of smooth cavity mirrors, and issues related to the cracking of the material. We have also demonstrated different types of photodetectors in the UV range of the spectrum: photoconductors, MSM photodetector, Schottky barrier photodetectors, and p-i-n photodiodes to name a few. The most promising type of photodetector for realization of UV imaging focal plane arrays is the p-i-n photodiode. Realization of high-efficiency AlGaN-based p-i-n photodiodes becomes more difficult when considering the need for the collection of the light from the backside of the substrate. However, similar to our back-emission UV LED structure, we have demonstrated back-illuminated p-i-n solar-blind photodiodes with external quantum efficiencies as high as 68% under no applied bias and 74% under -5 V of bias. [reprint (PDF)]
1.	Optoelectronic Devices Based on III-V Compound Semiconductors Which Have Made a Major Scientific and Technological Impact in the Past 20 Years M. Razeghi IEEE Journal of Selected Topics in Quantum Electronics 6 (6), pp.1344 - 1354 -- November 1, 2000 ...[Visit Journal] This paper reviews some of our pioneering contributions to the field of III–V compound semiconductor materials and low-dimensional optoelectronic devices. These contributions span from the ultraviolet (200 nm) up to the far-infrared (25 μm) portion of the electromagnetic spectrum and have had a major scientific and technological impact on the semiconductor world in the past 20 years. [reprint (PDF)]
1.	Comparison of the Physical Properties of GaN Thin Films Deposited on (0112) and (0001) Sapphire Substrates C.J. Sun and M. Razeghi Applied Physics Letters 63 (7)-- August 16, 1993 ...[Visit Journal] A direct comparison of the physical properties of GaN thin films is made as a function of the choice of substrate orientations. Gallium nitride single crystals were grown on (0001) and (0112) sapphire substrates by metalorganic chemical vapor deposition. Better crystallinity with fine ridgelike facets is obtained on the (0112) sapphire. Also lower carrier concentration and higher mobilities indicate both lower nitrogen vacancies and less oxygen incorporation on the (0112) sapphire. The results of this study show better physical properties of GaN thin films achieved on (0112) sapphire. [reprint (PDF)]
1.	Use of Sacrificial Zinc Oxide Template Layers for Epitaxial Lift-Off of Yttria-Stabilised Zirconia Thin Films D. J. Rogers, T. Maroutian, V. E. Sandana, P. Lecoeur, F. H. Teherani, P. Bove and M. Razeghi Proc. of SPIE 11687, 116872C (2021) ...[Visit Journal] 275 nm-thick Yttria-stabilised zirconia (YSZ) layers were grown on 240 nm-thick epitaxial (0002)-oriented ZnO buffer layers on c-sapphire substrates by pulsed laser deposition (PLD). X-ray diffraction (XRD) studies revealed high quality epitaxial growth with the YSZ having a preferential (111) orientation and a root mean square surface roughness of 1.4 nm over an area of 10 um x 10 um. The YSZ top surface was then temporary bonded to an Apiezon W wax carrier and the sample was immersed in 0.1M HCl so as to preferentially etch/dissolve away the ZnO underlayer and release of the YSZ from the sapphire substrate. XRD revealed only the characteristic (111) peak of YSZ after lift-off and thus confirmed both the dissolution of the ZnO and the preservation of the crystallographic integrity of the YSZ on the wax carrier. Optical and Atomic Force Microscopy revealed some buckling, roughening and cracking of the lifted YSZ, however, which was probably due to tensile epitaxial strain release. [reprint (PDF)]
1.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
1.	*High quality AlN and GaN epilayers grown on (001) sapphire, (100) and (111) silicon substrates P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi Applied Physics Letters 66 (22)-- May 29, 1995** ...[Visit Journal] The growth of high quality AlN and GaN thin films on basal plane sapphire, (100), and (111) silicon substrates is reported using low pressure metalorganic chemical vapor deposition. X-ray rocking curve linewidths of about 100 and 30 arcsec were obtained for AlN and GaN on sapphire, respectively. Room‐temperature optical transmission and photoluminescence (of GaN) measurements confirmed the high quality of the films. The luminescence at 300 and 77 K of the GaN films grown on basal plane sapphire, (100), and (111) silicon was compared. [reprint (PDF)]
1.	Effects of substrate quality and orientation on the characteristics of III-nitride resonant tunneling diodes Z. Vashaei, C. Bayram, R. McClintock and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-27, 2011), Vol 7945, p. 79451A-- January 23, 2011 ...[Visit Journal] Al(Ga)N/GaN resonant tunneling diodes (RTDs) are grown by metal-organic chemical vapor deposition. The effects of material quality on room temperature negative differential resistance (NDR) behaviour of RTDs are investigated by growing the RTD structure on AlN, GaN, and lateral epitaxial overgrowth GaN templates. This reveals that NDR characteristics of RTDs are very sensitive to material quality (such as surface roughness and dislocations density). The effects of the aluminum content of AlGaN double barriers (DB) and polarization fields on NDR characteristic of AlGaN/GaN RTDs were also investigated by employing low dislocation density c-plane (polar) and m-plane (nonpolar) freestanding GaN substrates. Lower aluminum content in the DB RTD active layer and minimization of dislocations and polarization fields enabled a more reliable and reproducible NDR behaviour at room temperature. [reprint (PDF)]
1.	Quantum Devices Based on Modern Band Structure Engineering and Epitaxial Technology M. Razeghi Modern Physics Letters B, Vol. 22, No. 24, p. 2343-2371-- September 20, 2008 ...[Visit Journal] Modern band structure engineering is based both on the important discoveries of the past century and modern epitaxial technology. The general goal is to control the behavior of charge carriers on an atomic scale, which affects how they interact with each other and their environment. Starting from the basic semiconductor heterostructure, band structure engineering has evolved into a powerful discipline, employing lower dimensionality to demonstrate new material properties. Several modern technologies under development are used as examples of how this discipline is enabling new types of devices and new functionality in areas with immediate application.

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