Center for Quantum Devices - Most Downloaded Journal Articles

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14.	Anomalous Hall Effect in InSb Layers Grown by MOCVD on GaAs Substrates C. Besikci, Y.H. Choi, R. Sudharsanan, and M. Razeghi Journal of Applied Physics 73 (10)-- May 15, 1993 ...[Visit Journal] InSb epitaxial layers have been grown on GaAs substrates by low‐pressure metalorganic chemical vapor deposition. A 3.15 μm thick film yielded an x‐ray full width at half maximum of 171 arcsec. A Hall mobility of 76 200 cm²/V· s at 240 K and a full width at half maximum of 174 arcsec have been measured for a 4.85 μm thick epilayer. Measured Hall data have shown anomalous behavior. A decrease in Hall mobility with decreasing temperature has been observed and room‐temperature Hall mobility has increased with thickness. In order to explain the anomalous Hall data, and the thickness dependence of the measured parameters, the Hall coefficient and Hall mobility have been simulated using a three‐layer model including a surface layer, a bulklike layer, and an interface layer with a high density of defects. Theoretical analysis has shown that anomalous behavior can be attributed to donor-like defects caused by the large lattice mismatch and to a surface layer which dominates the transport in the material at low temperatures. [reprint (PDF)]
14.	Injector doping level dependent continuous-wave operation of InP-based QCLs at λ~ 7.3 µm above room temperature J.S. Yu, S. Slivken, and M. Razeghi Semiconductor Science and Technology (SST), Vol. 25, No. 12, p. 125015-- December 1, 2010 ...[Visit Journal] We report the continuous-wave (CW) operation of InGaAs/InAlAs quantum cascade lasers (QCLs) operating at λ ~ 7.3 µm above room temperature. The injector doping level–dependent CW characteristics above room temperature are investigated for doping densities between 7 × 10¹⁶ cm⁻³ and 2 × 10¹⁷ cm⁻³. The device performance, i.e. threshold current density, output power, operating temperature and characteristic temperature, depends strongly on the injector doping density. For a relatively low injector doping density of 7 × 10¹⁶ cm⁻³, a high-reflectivity-coated 10 µm wide and 4 mm long laser exhibits an improved device performance with an output power of 152 mW and a threshold current density of 1.37 kA cm⁻² at 298 K under CW mode, operating up to 343 K. The thermal characteristics are also analyzed by the estimation from the experimentally measured data for the QCLs with different injector doping densities. [reprint (PDF)]
14.	Etching of ZnO Towards the Development of ZnO Homostructure LEDs K. Minder, F.H. Teherani, D. Rogers, C. Bayram, R. McClintock, P. Kung, and M. Razeghi SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Zinc Oxide Materials and Devices II, Vol. 6474, p. 64740Q-1-6-- January 29, 2007 ...[Visit Journal] Although ZnO has recently gained much interest as an alternative to the III-Nitride material system, the development of ZnO based optoelectonic devices is still in its infancy. Significant material breakthroughs in p-type doping of ZnO thin films and improvements in crystal growth techniques have recently been achieved, making the development of optoelectonic devices possible. First, a survey of current ZnO processing methods is presented, followed by the results of our processing research. [reprint (PDF)]
14.	EPR STUDY OF Mn 2. AROUND THE FERROELASTIC TRANSITION POINT OF Pb3(PO4)2 M. Razeghi, B. Houlier and M. Yuste M. Razeghi et al. EPR STUDY OF Mn 2. AROUND THE FERROELASTIC TRANSITION POINT OF Pb3(PO4)2, Solid State Communications, Vol. 26, pp. 665-668. -- January 26, 1978 ...[Visit Journal] The spin Hamiltonian parameters of Mn 2÷ have been measured above and below the transition point (180"C) of the lead phosphate. They show that Mn 2+ substitutes a Pbl ion. Between 175 and 180vC the principal axis OX of the fine tensor is parallel to the wave vector of the soft mode which condensates at the transition point. An exaltation of the linewidth is observed. The linewidth remains constant within 50C of Te; in this temperature range, the "static regime" is achieved, and the correlation time of the fluctuations is less than 10 -s sec. [reprint (PDF)]
14.	ZnO nanorod electrodes for hydrogen evolution and storage Harinipriya, S.; Usmani, B.; Rogers, D. J.; Sandana, V. E.; Teherani, F. Hosseini; Lusson, A.; Bove, P.; Drouhin, H.-J.; Razeghi, M. Proc. SPIE 8263, Oxide-based Materials and Devices III, 82631Y (February 9, 2012)-- February 9, 2012 ...[Visit Journal] Due to the attractive combination of a relatively high specific heat of combustion with a large specific energy capacity, molecular hydrogen (H2) is being investigated for use as an alternative to fossil fuels. Energy-efficient H₂ production and safe storage remain key technical obstacles to implementation of an H₂ based economy, however. ZnO has been investigated for use as an alternative photocatalytic electrode to TiO₂ for solarpowered photo-electro-chemical (PEC) electrolysis, in which H₂ is generated by direct water splitting in a cell with a metal cathode and a semiconducting anode. In this investigation, ZnO NR grown on Si (100) substrates by pulsed laser deposition were investigated for use as electrodes in the Hydrogen Evolution Reaction (HER). The electrochemical potential and Fermi energy of the ZnO NR were estimated from the electrochemical current density in acid and alkaline solutions via phenomenological thermodynamic analysis. As well as acting as an effective electrocalytic cathode, the ZnO NR appear to operate as a hydrogen reservoir. These results indicate that the ZnO NR have excellent potential for the storage of evolved H₂. [reprint (PDF)]
14.	Room temperature operation of In_xGa_1-xSb/InAs type-II quantum well infrared photodetectors grown by MOCVD D. H. Wu, Y. Y. Zhang, and M. Razeghi Applied Physics Letters 112, 111103-- March 14, 2018 ...[Visit Journal] We demonstrate room temperature operation of In_0.5Ga_0.5Sb/InAs type-II quantum well photodetectors on InAs substrate grown by metal-organic chemical vapor deposition. At 300 K, the detector exhibits a dark current density of 0.12 A/cm², peak responsivity of 0.72 A/W corresponding to a quantum efficiency of 23.3%, with calculated specific detectivity of 2.4×10⁹ cm.Hz^1/2/W at 3.81 μm. [reprint (PDF)]
14.	Growth of Al_xGa_1-xN:Ge on sapphire and silicon substrates X. Zhang, P. Kung, A. Saxler, D. Walker, T.C. Wang, and M. Razeghi Applied Physics Letters 67 (12)-- September 18, 1995 ...[Visit Journal] Al_xGa_1–xN were grown on (00.1) sapphire and (111) silicon substrates in the whole composition range (0 <= x <= 1). The high optical quality of the epilayers was assessed by room-temperature optical absorption and photoluminescence measurements. Layers with higher Al composition are more resistive. Resistive Al_xGa_1–xN epilayers were successfully doped with Ge and free-electron concentration as high as 3 × 10¹⁹ cm^–3 was achieved. [reprint (PDF)]
14.	Recent advances in high performance antimonide-based superlattice FPAs E.K. Huang, B.M. Nguyen, S.R. Darvish, S. Abdollahi Pour, G. Chen, A. Haddadi, and M.A. Hoang SPIE Proceedings, Infrared technology and Applications XXXVII, Orlando, FL, Vol. 8012, p. 80120T-1-- April 25, 2011 ...[Visit Journal] Infrared detection technologies entering the third generation demand performances for higher detectivity, higher operating temperature, higher resolution and multi-color detection, all accomplished with better yield and lower manufacturing/operating costs. Type-II antimonide based superlattices (T2SL) are making firm steps toward the new era of focal plane array imaging as witnessed in the unique advantages and significant progress achieved in recent years. In this talk, we will present the four research themes towards third generation imagers based on T2SL at the Center for Quantum Devices. High performance LWIR megapixel focal plane arrays (FPAs) are demonstrated at 80K with an NEDT of 23.6 mK using f/2 optics, an integration time of 0.13 ms and a 300 K background. MWIR and LWIR FPAs on non-native GaAs substrates are demonstrated as a proof of concept for the cost reduction and mass production of this technology. In the MWIR regime, progress has been made to elevate the operating temperature of the device, in order to avoid the burden of liquid nitrogen cooling. We have demonstrated a quantum efficiency above 50%, and a specific detectivity of 1.05x10¹² cm·Hz^1/2/W at 150 K for 4.2 μm cut-off single element devices. Progress on LWIR/LWIR dual color FPAs as well as novel approaches for FPA fabrication will also be discussed. [reprint (PDF)]
14.	Reliability in room-temperature negative differential resistance characteristics of low-aluminum contact AlGaN/GaN double-barrier resonant tunneling diodes C. Bayram, Z. Vashaei, and M. Razeghi Applied Physics Letters, Vol. 97, No. 18, p. 181109-1-- November 1, 2010 ...[Visit Journal] AlGaN/GaN resonant tunneling diodes (RTDs), consisting of 20% (10%) aluminum-content in double-barrier (DB) active layer, were grown by metal-organic chemical vapor deposition on freestanding polar (c-plane) and nonpolar (m-plane) GaN substrates. RTDs were fabricated into 35-μm-diameter devices for electrical characterization. Lower aluminum content in the DB active layer and minimization of dislocations and polarization fields increased the reliability and reproducibility of room-temperature negative differential resistance (NDR). Polar RTDs showed decaying NDR behavior, whereas nonpolar ones did not significantly. Averaging over 50 measurements, nonpolar RTDs demonstrated a NDR of 67 Ω, a current-peak-to-valley ratio of 1.08, and an average oscillator output power of 0.52 mW. [reprint (PDF)]
14.	Performance characteristics of high-purity mid-wave and long-wave infrared type-II InAs/GaSb superlattice infrared photodiodes A. Hood, M. Razeghi, V. Nathan and M.Z. Tidrow SPIE Conference, San Jose, CA, Vol. 6127, pp. 61270U-- January 23, 2006 ...[Visit Journal] The authors report on recent advances in the development of mid-, long-, and very long-wavelength infrared (MWIR, LWIR, and VLWIR) Type-II InAs/GaSb superlattice infrared photodiodes. The residual carrier background of binary Type-II InAs/GaSb superlattice photodiodes of cut-off wavelengths around 5 µm has been studied in the temperature range between 10 and 200 K. A four-point, capacitance-voltage technique on mid-wavelength and long-wavelength Type-II InAs/GaSb superlattice infrared photodiodes reveal residual background concentrations around 5×10¹⁴ cm^-3. Additionally, recent progress towards LWIR photodiodes for focal plane array imaging applications is presented. [reprint (PDF)]
14.	Back-illuminated separate absorption and multiplication GaN avalanche photodiodes J.L. Pau, C. Bayram, R. McClintock, M. Razeghi and D. Silversmith Applied Physics Letters, Vol. 92, No. 10, p. 101120-1-- March 10, 2008 ...[Visit Journal] The performance of back-illuminated avalanche photodiodes with separate absorption and multiplication regions is presented. Devices with an active area of 225 µm² show a maximum multiplication gain of 41,200. The calculation of the noise equivalent power yields a minimum value of 3.3×10⁻¹⁴ W·Hz^−1/2 at a gain of 3000, increasing to 2.0×10⁻¹³ W·Hz^−1/2 at a gain of 41,200. The broadening of the response edge has been analyzed as a function of bias. [reprint (PDF)]
14.	Near bulk-limited R0A of long-wavelength infrared type-II InAs/GaSb superlattice photodiodes with polyimide surface passivation Andrew Hood, Pierre-Yves Delaunay, Darin Hoffman, Binh-Minh Nguyen, Yajun Wei, Manijeh Razeghi, and Vaidya Nathan Applied Physics Letters 90, 233513-- June 4, 2007 ...[Visit Journal] Effective surface passivation of Type-II InAs/GaSb superlattice photodiodes with cutoff wavelengths in the long-wavelength infrared is presented. A stable passivation layer, the electrical properties of which do not change as a function of the ambient environment nor time, has been prepared by a solvent-based surface preparation, vacuum desorption, and the application of an insulating polyimide layer. Passivated photodiodes, with dimensions ranging from 400×400 to 25×25 µm², with a cutoff wavelength of ~11 µm, exhibited near bulk-limited R₀A values of ~12 Ω·cm², surface resistivities in excess of 10⁴ Ω·cm, and very uniform current-voltage behavior at 77 K. [reprint (PDF)]
14.	Photoluminescence linewidth narrowing in Yb-doped GaN and InGaN thin films K. Dasari, J. Wang, W.M. Jadwisienczak, V. Dierolf, M. Razeghi, R. Palai Journal of Luminescence Volume 209, May 2019, Pages 237-243-- January 14, 2019 ...[Visit Journal] We report on photoluminescence (PL) properties of GaN, GaN:Yb, InGaN, and InGaN:Yb thin films grown on (0001) sapphire substrates by plasma assisted molecular beam epitaxy (MBE). X-ray diffraction pattern of the films confirms c-axis oriented growth. The concentration of Yb and In was obtained by X-ray photoelectron spectroscopy (XPS) and was found to be 5 (+/- 0.5) at.% and 30 (+/- 1.5) at.%, respectively. The GaN:Yb and InGaN:Yb thin films show a significant linewidth narrowing in PL spectra compared to GaN and InGaN thin films. This could be attributed to the reduction of the defect related non-radiative recombination paths and suppression of the structural defects and dislocations because of the in situ rare earth (Yb)-doping during the growth. The temperature dependent photoluminescence of GaN:Yb thin film follows the Varshni model, whereas InGaN:Yb film shows a complex S-shaped like behavior, which can be explained by the localization effect using the Band-Tail model. [reprint (PDF)]
14.	A study into the impact of sapphire substrate orientation on the properties of nominally-undoped β-Ga2O3 thin films grown by pulsed laser deposition F. H. Teherani; D. J. Rogers; V. E. Sandana; P. Bove; C. Ton-That; L. L. C. Lem; E. Chikoidze; M. Neumann-Spallart; Y. Dumont; T. Huynh; M. R. Phillips; P. Chapon; R. McClintock; M. Razeghi Proceedings Volume 10105, Oxide-based Materials and Devices VIII; 101051R-- March 23, 2017 ...[Visit Journal] Nominally-undoped Ga2O3 layers were deposited on a-, c- and r-plane sapphire substrates using pulsed laser deposition. Conventional x-ray diffraction analysis for films grown on a- and c-plane sapphire showed the layers to be in the β-Ga2O3 phase with preferential orientation of the (-201) axis along the growth direction. Pole figures revealed the film grown on r-plane sapphire to also be in theβ-Ga2O3 phase but with epitaxial offsets of 29.5°, 38.5° and 64° from the growth direction for the (-201) axis. Optical transmission spectroscopy indicated that the bandgap was ~5.2eV, for all the layers and that the transparency was > 80% in the visible wavelength range. Four point collinear resistivity and Van der Pauw based Hall measurements revealed the β-Ga2O3 layer on r-plane sapphire to be 4 orders of magnitude more conducting than layers grown on a- and c-plane sapphire under similar conditions. The absolute values of conductivity, carrier mobility and carrier concentration for the β-Ga2O3 layer on r-sapphire (at 20Ω-1.cm-1, 6 cm2/Vs and 1.7 x 1019 cm-3, respectively) all exceeded values found in the literature for nominally-undoped β-Ga2O3 thin films by at least an order of magnitude. Gas discharge optical emission spectroscopy compositional depth profiling for common shallow donor impurities (Cl, F, Si and Sn) did not indicate any discernable increase in their concentrations compared to background levels in the sapphire substrate. It is proposed that the fundamentally anisotropic conductivity in β-Ga2O3 combined with the epitaxial offset of the (-201) axis observed for the layer grown on r-plane sapphire may explain the much larger carrier concentration, electrical conductivity and mobility compared with layers having the (-201) axis aligned along the growth direction. [reprint (PDF)]
14.	Minority electron unipolar photodetectors based on Type-II InAs/GaSb/AlSb superlattices for very long wavelength infrared detection B.M. Nguyen, S. Abdollahi Pour, S. Bogdanov and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 760825-1-- January 22, 2010 ...[Visit Journal] The bandstructure tunability of Type-II antimonide-based superlattices has been significantly enhanced since the introduction of the M-structure superlattice, resulting in significant improvements of Type-II superlattice infrared detectors. By using M-structure, we developed the pMp design, a novel infrared photodetector architecture that inherits the advantages of traditional photoconductive and photovoltaic devices. This minority electron unipolar device consists of an M-structure barrier layer blocking the transport of majority holes in a p-type semiconductor, resulting in an electrical transport due to minority carriers with low current density. Applied for the very long wavelength detection, at 77K, a 14µm cutoff detector exhibits a dark current 3.3 mA·cm⁻², a photoresponsivity of 1.4 A/W at 50mV bias and the associated shot-noise detectivity of 4x10¹⁰ Jones. [reprint (PDF)]
14.	Low pressure metalorganic chemical vapor deposition of InP and related compounds M. Razeghi, M. A. Poisson, J. P. Larivain & J. P. Duchemin Razeghi, M., Poisson, M.A., Larivain, J.P. et al. Low pressure metalorganic chemical vapor deposition of InP and related compounds. J. Electron. Mater. 12, 371–395 (1983). https://doi.org/10.1007/BF02651138-- March 1, 1983 ...[Visit Journal] The low pressure metalorganic chemical vapor deposition epitaxial growth and characterization of InP, Ga0.47In0.53 As and GaxIn1-xAsyP1-y, lattice-matched to InP substrate are described. The layers were found to have the same etch pit density (EPD) as the substrate. The best mobility obtained for InP was 5300 cm2 V−1S−1 at 300 K and 58 900 cm2 V−1 S−1 at 772K, and for GaInAs was 11900 cm2 V−1 S−1 at 300 K, 54 600 cm2 V−1 S−1 at 77 K and 90 000 cm V−1S−1 at 2°K. We report the first successful growth of a GaInAs-InP superlattice and the enhanced mobility of a two dimensional electron gas at a GaInAs -InP heterojunction grown by LP-MO CVD. LP MO CVD material has been used for GaInAsPInP, DH lasers emitting at 1.3 um and 1.5 um. These devices exhibit a low threshold current, a slightly higher than liquid phase epitaxy devices and a high differential quantum efficiency of 60%. Fundamental transverse mode oscillation has been achieved up to a power outpout of 10 mW. Threshold currents as low as 200 mA dc have been measured for devices with a stripe width of 9 um and a cavity length of 300 um for emission at 1.5 um. Values of T in the range 64–80 C have been obtained. Preliminary life testing has been carried out at room temperature on a few laser diodes (λ = 1.5μm). Operation at constant current for severalthousand hours has been achieved with no change in the threshold current. [reprint (PDF)]
14.	Al_xGa_1-xN p-i-n Photodiodes on Sapphire Substrates D. Walker, P. Kung, P. Sandvik, J. Wu, M. Hamilton, I.H. Lee, J. Diaz, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] We report the fabrication and characterization of Al_xGa1-xN p-i-n photodiodes (0.05 ≤ to X ≤ 0.30) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The devices present a visible-rejection of about four orders of magnitude with a cutoff wavelength that shifts from 350 nm to 291 nm. They also exhibit a constant responsivity for five decades (30 mW/m² to 1 kW/m²) of optical power density. Using capacitance measurements, the values for the acceptor concentration in the p-Al_xGa_1-xN region and the unintentional donor concentration in the intrinsic region are found. Photocurrent decays are exponential for high load resistances, with a time constant that corresponds to the RC product of the system. For low load resistances the transient response becomes non-exponential, with a decay time longer than the RC constant. [reprint (PDF)]
14.	Comparison of PLD-Grown p-NiO/n-Ga2O3 Heterojunctions on Bulk Single Crystal β-Ga2O3 and r-plane Sapphire Substrates D. J. Rogers , V. E. Sandana, F. Hosseini Teherani and M. Razeghi Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 128870J (28 January - 1 February 2024 San Francisco)doi: 10.1117/12.3012511 ...[Visit Journal] p-NiO/n-Ga2O3 heterostructures were formed on single crystal (-201) β (monoclinic) Ga2O3 and r-sapphire substrates by Pulsed Laser Deposition. Ring mesa layer stacks were created using a shadow mask during growth. X-Ray diffraction studies were consistent with the formation of (111) oriented fcc NiO on the bulk Ga2O3 and randomly oriented fcc NiO on (102) oriented β-Ga2O3 /r-sapphire. RT optical transmission studies revealed bandgap energy values of ~3.65 eV and ~5.28 eV for the NiO and Ga2O3 on r-sapphire. p-n junction devices were formed by depositing gold contacts on the layer stacks using shadow masks in a thermal evaporator. Both heterojunctions showed rectifying I/V characteristics. On bulk Ga2O, the junction showed a current density over 16mA/cm2 at +20V forward bias and a reverse bias leakage current over 3 orders of magnitude lower at -20V (1 pA). On Ga2O3/r-sapphire the forward bias current density at +15V was about an order of magnitude lower than for the p-NiO/bulk n-Ga2O3 heterojunction while the reverse bias leakage current at -15V (~ 20 pA) was an order of magnitude higher. Hence the NiO/bulk Ga2O3 junction was more rectifying. Upon illumination with a Xenon lamp a distinct increase in current was observed for the IV curves in both devices (four orders of magnitude for -15V reverse bias in the case of the p-NiO/bulk n-Ga2O3 heterojunction). The p-NiO/n-Ga2O3/rsapphire junction gave a spectral responsivity with a FWHM value of 80nm and two distinct response peaks (with maxima at 230 and 270nm) which were attributed to carriers being photogenerated in the Ga2O3 underlayer. For both devices time response studies showed a 10%/90% rise and fall of the photo generated current upon shutter open and closing which was relatively abrupt (millisecond range), and there was no evidence of significant persistent photoconductivity. [reprint (PDF)]
14.	InAs/InAs_1-xSb_x type-II superlattices for high performance long wavelength infrared detection A. Haddadi , G. Chen , R. Chevallier , A. M. Hoang , and M. Razeghi Appl. Phys. Lett. 105, 121104 (2014)-- September 22, 2014 ...[Visit Journal] High performance long-wavelength infrared nBn photodetectors based on InAs/InAs_1−xSb_x type-II superlattices on GaSb substrate have been demonstrated. The photodetector's 50% cut-off wavelength was ∼10 μm at 77 K. The photodetector with a 6 μm-thick absorption region exhibited a peak responsivity of 4.47 A/W at 7.9 μm, corresponding to a quantum efficiency of 54% at −90 mV bias voltage under front-side illumination and without any anti-reflection coating. With an R × A of 119 Ω·cm² and a dark current density of 4.4 × 10⁻⁴ A/cm² under −90 mV applied bias at 77 K, the photodetector exhibited a specific detectivity of 2.8 × 10¹¹ cm·Hz^1/2·W^-1. [reprint (PDF)]
14.	A Review of III-Nitride Research at the Center for Quantum Devices M. Razeghi and R. McClintock Journal of Crystal Growth, Vol. 311, No. 10-- May 1, 2009 ...[Visit Journal] In this paper, we review the history of the Center for Quantum Devices’ (CQD) III-nitride research covering the past 15 years. We review early work developing III-nitride material growth. We then present a review of laser and light-emitting diode (LED) results covering everything from blue lasers to deep UV LEDs emitting at 250 nm. This is followed by a discussion of our UV photodetector research from early photoconductors all the way to current state of the art Geiger-mode UV single photon detectors. [reprint (PDF)]
14.	Mid-wavelength infrared heterojunction phototransistors based on type-II InAs/AlSb/GaSb superlattices A. Haddadi, S. Adhikary, A. Dehzangi, and M. Razeghi Applied Physics Letters 109, 021107-- July 12, 2016 ...[Visit Journal] A mid-wavelength infrared heterojunction phototransistor based on type-II InAs/AlSb/GaSb superlattices on GaSb substrate has been demonstrated. Near a wavelength of 4 μm saturated optical gains of 668 and 639 at 77 and 150 K, respectively, are demonstrated over a wide dynamic range. At 150 K, the unity optical gain collector dark current density and DC current gain are 1 × 10⁻³ A/cm² and 3710, respectively. This demonstrates the potential for use in high-speed applications. In addition, the phototransistor exhibits a specific detectivity value that is four times higher compared with a state-of-the-art type-II superlattice-based photodiode with a similar cut-off wavelength at 150 K. [reprint (PDF)]
14.	III-Nitride Avalanche Photodiodes P. Kung, R. McClintock, J. Pau Vizcaino, K. Minder, C. Bayram and M. Razeghi SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices IV, Vol. 6479, p. 64791J-1-12-- January 29, 2007 ...[Visit Journal] Wide bandgap III-Nitride semiconductors are a promising material system for the development of ultraviolet avalanche photodiodes (APDs) that could be a viable alternative to photomultiplier tubes. In this paper, we report the epitaxial growth and physical properties of device quality GaN layers on high quality AlN templates for the first backilluminated GaN p-i-n APD structures on transparent sapphire substrates. Under low bias and linear mode avalanche operation where they exhibited gains near 1500 after undergoing avalanche breakdown. The breakdown electric field in GaN was determined to be 2.73 MV/cm. The hole impact ionization coefficients were shown to be greater than those of electrons. [reprint (PDF)]
14.	First GaInAsP‐InP double‐heterostructure laser emitting at 1.27 μm on a silicon substrate M. Razeghi; M. Defour; F. Omnes; Ph. Maurel; J. Chazelas; F. Brillouet Appl. Phys. Lett. 53, 725–727 (1988)-- June 21, 1988 ...[Visit Journal] We report the first successful room-temperature GalnAsP-InP double-heterostructure laser emitting at 1.27 pm, grown by low-pressure metalorganic chemical vapor deposition on a Si substrate. A pulsed threshold current density of 10 kAlcm2 at room temperature with an external quantum efficiency of 10% per facet and an output power of20 mW (for an oxidedefined stripe geometry with 12 pm stripe width and 250 pm cavity length) has been measured. The first aging test in pulse operation shows an increase of threshold current of only 7% for a cumulative time of 80 s at room temperature. [reprint (PDF)]
14.	Continuous-wave operation of λ ~ 4.8 µm quantum-cascade lasers at room temperature A. Evans, J.S. Yu, S. Slivken, and M. Razeghi Applied Physics Letters, 85 (12)-- September 20, 2004 ...[Visit Journal] Continuous-wave (cw) operation of quantum-cascade lasers emitting at λ~4.8 µm is reported up to a temperature of 323 K. Accurate control of layer thickness and strain-balanced material composition is demonstrated using x-ray diffraction. cw output power is reported to be in excess of 370 mW per facet at 293 K, and 38 mW per facet at 323 K. Room-temperature average power measurements are demonstrated with over 600 mW per facet at 50% duty cycle with over 300 mW still observed at 100% (cw) duty cycle. [reprint (PDF)]
14.	High Detectivity InGaAs/InGaP Quantum-Dot Infrared Photodetectors Grown by Low Pressure Metalorganic Chemical Vapor Deposition J. Jiang, S. Tsao, T. O'Sullivan, W. Zhang, H. Lim, T. Sills, K. Mi, M. Razeghi, G.J. Brown, and M.Z. Tidrow Applied Physics Letters, 84 (12)-- April 22, 2004 ...[Visit Journal] We report a high detectivity middle-wavelength infrared quantum dot infrared photodetector (QDIP). The InGaAs quantum dots were grown by self-assembly on an InGaP matrix via low pressure metalorganic chemical vapor deposition. Photoresponse was observed at temperatures above 200 K with a peak wavelength of 4.7 µm and cutoff wavelength of 5.2 µm. The background limited performance temperature was 140 K, and this was attributed to the super low dark current observed in this QDIP. A detectivity of 3.6×10¹⁰ cm·Hz^½/W, which is comparable to the state-of-the-art quantum well infrared photodetectors in a similar wavelength range, was obtained for this InGaAs/InGaP QDIP at both T = 77 K and T = 95 K at biases of –1.6 and –1.4 V, [reprint (PDF)]

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