Center for Quantum Devices - Most Downloaded Journal Articles

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18.	Very low threshold buried ridge structure lasers emitting at 1.3 μm grown by low pressure metalorganic chemical vapor deposition M. Razeghi; R. Blondeau; K. Kazmierski; M. Krakowski; J. P. Duchemin Appl. Phys. Lett. 46 (2): 131–133.-- January 15, 1985 ...[Visit Journal] GaInAsP‐InP buried ridge structure lasers emitting at 1.3 μm have been fabricated on material grown completely by low pressure metalorganic chemical vapor deposition. These lasers have low threshold (11 mA), exhibit linear (kink‐free) light‐current characteristics up to high powers (10 mW/facets), and can be operated at high temperatures (70 °C). Excellent uniformity over 10 cm2 has been obtained, and an external quantum efficiency of 60% for two faces has been measured. [reprint (PDF)]
18.	Room temperature quantum cascade lasers with 27% wall plug efficiency Y. Bai, N. Bandyopadhyay, S. Tsao, S. Slivken and M. Razeghi Applied Physics Letters, Vol. 98, No. 18, p. 181102-1-- May 3, 2011 ...[Visit Journal] Using the recently proposed shallow-well design, we demonstrate InP based quantum cascade lasers (QCLs) emitting around 4.9 μm with 27% and 21% wall plug efficiencies in room temperature (298 K) pulsed and continuous wave (CW) operations, respectively. The laser core consists of 40 QCL-stages. The highest cw efficiency is obtained from a buried-ridge device with a ridge width of 8 μm and a cavity length of 5 mm. The front and back facets are antireflection and high-reflection coated, respectively. The maximum single facet cw power at room temperature amounts to 5.1 W. [reprint (PDF)]
18.	Dark current reduction in microjunction-based compound electron barrier type-II InAs/InAs1-xSbx superlattice-based long-wavelength infrared photodetectors Romain Chevallier, Abbas Haddadi, Manijeh Razeghi Proc. SPIE 10540, Quantum Sensing and Nano Electronics and Photonics XV Page. 1054007-1-- January 26, 2018 ...[Visit Journal] Reduction of dark current density in microjunction-based InAs/InAs_1-xSb_x type-II superlattice long-wavelength infrared photodetectors was demonstrated. A double electron barrier design was used to suppress both generation-recombination and surface dark currents. The photodetectors exhibited high surface resistivity after passivation with SiO₂, which permits the use of small size features without having strong surface leakage current degrading the electrical performance. Fabricating a microjunction structure (25×25 μm² mesas with 10×10 μm² microjunctions) with this photodetector double barrier design results in a dark current density of 6.3×10^-6 A/cm² at 77 K. The device has an 8 μm cut-off wavelength at 77 K and exhibits a quantum efficiency of 31% for a 2 μm-thick absorption region, which results in a specific detectivity value of 1.2×10¹² cm·Hz^1/2/W at 77 K. [reprint (PDF)]
18.	Improved performance of IR photodetectors with 3D gap engineering J. Piotrowski and M. Razeghi Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995 ...[Visit Journal] The ultimate signal-to-noise performance of the semiconductor photodetector is limited by the statistical fluctuations of the thermal generation and recombination rates in photodetector material. Cooling is an effective but impractical way of suppression of the thermal processes. The performance of uncooled detectors can be improved by minimizing the thermal generation and recombination rates and reducing the actual volume of photodetector. This can be realized in 3D heterostructure devices. In these devices, the incident radiation is absorbed in small regions of narrow gap semiconductor, buried in wide gap volume and supplied with wide gap electric contacts and radiation concentrators. The practical near room-temperature 1 - 12 μm IR heterostructure photodetectors are reported. The devices are based on variable gap Hg_1-xCd_xTe. The 3D heterostructures have been obtained by Isothermal Vapor Growth Epitaxy in a reusable growth system which enables in situ doping during growth with foreign impurities. Ion milling was extensively used in preparation of the devices. Monolithic optical immersion has been applied for further improvement of performance. The 3D heterostructure devices exhibit performance exceeding that of conventional photodetectors. [reprint (PDF)]
18.	Advanced InAs/GaSb Superlattice Photovoltaic Detectors for Very-Long Wavelength Infrared Applications Y. Wei, A. Gin, M. Razeghi, and G.J. Brown Applied Physics Letters 80 (18)-- May 6, 2002 ...[Visit Journal] We report on the temperature dependence of the photoresponse of very long wavelength infrared type-II InAs/GaSb superlattice based photovoltaic detectors grown by molecular-beam epitaxy. The detectors had a 50% cutoff wavelength of 18.8 μm and a peak current responsivity of 4 A·W^-1 at 80 K. A peak detectivity of 4.5×10¹⁰ cm· Hz^½·W^-1 was achieved at 80 K at a reverse bias of 110 mV. The generation–recombination lifetime was 0.4 ns at 80 K. The cutoff wavelength increased very slowly with increasing temperature with a net shift from 20 to 80 K of only 1.2 μm [reprint (PDF)]
18.	State-of-the-art Type II Antimonide-based superlattice photodiodes for infrared detection and imaging M. Razeghi, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, S. Abdollahi Pour, P. Manurkar, and S. Bogdanov SPIE Proceedings, Nanophotonics and Macrophotonics for Space Environments II, San Diego, CA, Vol. 7467, p. 74670T-1-- August 5, 2009 ...[Visit Journal] Type-II InAs/GaSb Superlattice (SL), a system of multi interacting quantum wells was first introduced by Nobel Laureate L. Esaki in the 1970s. Since then, this low dimensional system has drawn a lot of attention for its attractive quantum mechanics properties and its grand potential for the emergence into the application world, especially in infrared detection. In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs and imaging applications which elevated the performances of Type-II InAs/GaSb superlattice photodetectors to a comparable level to the state-of-the-art Mercury Cadmium Telluride. We will present in this talk the current status of the state-of-the-art Type II superlattice photodetectors and focal plane arrays, and the future outlook for this material system. [reprint (PDF)]
18.	Room temperature single-mode terahertz sources based on intracavity difference-frequency generation in quantum cascade lasers Q.Y. Lu, N. Bandyopadhyay, S. Slivken, Y. Bai and M. Razeghi Applied Physics Letters, Vol. 99, Issue 13, p. 131106-1-- September 26, 2011 ...[Visit Journal] We demonstrate room temperature single-mode THz emission at 4 THz based on intracavity difference-frequency generation from mid-infrared dual-wavelength quantum cascade lasers. An integrated dual-period distributed feedback grating is defined on the cap layer to purify both mid-infrared pumping wavelengths and in turn the THz spectra. Single mode operation of the pumping wavelengths results in a single-mode THz operation with a narrow linewidth of 6.6 GHz. A maximum THz power of 8.5 μW with a power conversion efficiency of 10 μW/W² is obtained at room temperature. [reprint (PDF)]
18.	Room temperature operation of 8-12 μm InSbBi infrared photodetectors on GaAs substrates J.J. Lee, J.D. Kim, and M. Razeghi Applied Physics Letters 73 (5)-- August 3, 1998 ...[Visit Journal] We report the room temperature operation of 8–12 μm InSbBi long-wavelength infrared photodetectors. The InSbBi/InSb heterostructures were grown on semi-insulating GaAs (001) substrates by low pressure metalorganic chemical vapor deposition. The voltage responsivity at 10.6 μm was about 1.9 mV/W at room temperature and the corresponding Johnson noise limited detectivity was estimated to be about 1.2×10⁶ cm·Hz^½/W. The carrier lifetime derived from the voltage dependent responsivity measurements was about 0.7 ns. [reprint (PDF)]
18.	Metalorganic chemical vapor deposition of undoped In1−xAlxAs on InP M. A. di Forte‐Poisson; M. Razeghi; J. P. Duchemin M. A. di Forte‐Poisson, M. Razeghi, J. P. Duchemin; Metalorganic chemical vapor deposition of undoped In1−xAlxAs on InP. J. Appl. Phys. 1 December 1983; 54 (12): 7187–7189. https://doi.org/10.1063/1.331956-- December 1, 1983 ...[Visit Journal] In1−x Alx As epitaxial layers were grown on (100) InP substrates by the organometallic vapor phase epitaxy method. Undoped layers with mirror smooth surfaces were obtained for substrate temperatures of 600–650 °C. By adjusting the relative ratio of In and Al, lattice matched In0.52 Al0.48 As epilayers were reproducibly grown on InP substrates. X‐ray measurements, scanning Auger analyses, and electron mobilities are presented. These results show that the quality of the epilayers obtained here was comparable to the best reported layers grown by other methods. [reprint (PDF)]
18.	InAsSb/InAsP strained-layer superlattice injection lasers operating at 4.0 μm grown by metal-organic chemical vapor deposition B. Lane, Z. Wu, A. Stein, J. Diaz, and M. Razeghi Applied Physics Letters 74 (23)-- June 7, 1999 ...[Visit Journal] We report high power mid-infrared electrical injection operation of laser diodes based on InAsSb/InAsP strained-layer superlattices grown on InAs substrate by metal-organic chemical vapor deposition. The broad-area laser diodes with 100 μm aperture and 1800 μm cavity length demonstrate peak output powers of 546 and 94 mW in pulsed and cw operation respectively at 100 K with a threshold current density as low as 100 A/cm². [reprint (PDF)]
18.	III-nitride based avalanche photo detectors R. McClintock, E. Cicek, Z. Vashaei, C. Bayram, M. Razeghi and M. Ulmer Proceedings, Vol. 7780, p. 77801B, SPIE Optics and Photonics Symposium, Conference on Detectors and Imaging Devices: Infrared, Focal Plane and Single Photon, San Diego, CA -- August 4, 2010 ...[Visit Journal] Research into III-Nitride based avalanche photodiodes (APDs) is motivated by the need for high sensitivity ultraviolet (UV) detectors in numerous civilian and military applications. By designing III-Nitride photodetectors that utilize low-noise impact ionization high internal gain can be realized-GaN APDs operating in Geiger mode can achieve gains exceeding 1×10⁷. Thus with careful design, it becomes possible to count photons at the single photon level. In this paper we review the current state of the art in III-Nitride visible-blind APDs and discuss the critical design choices necessary to achieve high performance Geiger mode devices. Other major technical issues associated with the realization of visible-blind Geiger mode APDs are also discussed in detail and future prospects for improving upon the performance of these devices are outlined. The photon detection efficiency, dark count rate, and spectral response of or most recent Geiger-mode GaN APDs on free-standing GaN substrates are studied under low photon fluxes, with single photon detection capabilities being demonstrated. We also present our latest results regarding linear mode gain uniformity: the study of gain uniformity helps reveal the spatial origins of gain so that we can better understand the role of defects. [reprint (PDF)]
17.	Bias-selectable three-color short-, extended-short-, and mid-wavelength infrared photodetectors based on type-II InAs/GaSb/AlSb superlattices Abbas Haddadi, and Manijeh Razeghi Optics Letters Vol. 42, Iss. 21, pp. 4275-4278-- October 16, 2017 ...[Visit Journal] A bias-selectable, high operating temperature, three-color short-, extended-short-, and mid-wavelength infrared photodetector based on InAs/GaSb/AlSb type-II superlattices on GaSb substrate has been demonstrated. The short-, extended-short-, and mid-wavelength channels’ 50% cutoff wavelengths were 2.3, 2.9, and 4.4μm, respectively, at 150K. The mid-wavelength channel exhibited a saturated quantum efficiency of 34% at 4μm under +200 mV bias voltage in a front-side illumination configuration and without any antireflection coating. At 200mV, the device exhibited a dark current density of 8.7×10⁻⁵ A/cm² providing a specific detectivity of ∼2×10¹¹ cm·Hz^1/2/W at 150K. The short-wavelength channel achieved a saturated quantum efficiency of 20% at 1.8μm. At −10 mV, the device’s dark current density was 5.5×10⁻⁸ A/cm². At zero bias, its specific detectivity was 1×10¹¹ cm·Hz^1/2/W at 150K. The extended short-wavelength channel achieved a saturated quantum efficiency of 22% at 2.75 μm. Under −2 V bias voltage, the device exhibited a dark current density of 1.8×10⁻⁶ A/cm² providing a specific detectivity of 6.3×10¹¹ cm·Hz^1/2/W at 150K. [reprint (PDF)]
17.	Growth of Al_xGa_1-xN:Ge on sapphire and silicon substrates X. Zhang, P. Kung, A. Saxler, D. Walker, T.C. Wang, and M. Razeghi Applied Physics Letters 67 (12)-- September 18, 1995 ...[Visit Journal] Al_xGa_1–xN were grown on (00.1) sapphire and (111) silicon substrates in the whole composition range (0 <= x <= 1). The high optical quality of the epilayers was assessed by room-temperature optical absorption and photoluminescence measurements. Layers with higher Al composition are more resistive. Resistive Al_xGa_1–xN epilayers were successfully doped with Ge and free-electron concentration as high as 3 × 10¹⁹ cm^–3 was achieved. [reprint (PDF)]
17.	RT-CW: widely tunable semiconductor THz QCL sources M. Razeghi; Q. Y. Lu Proceedings Volume 9934, Terahertz Emitters, Receivers, and Applications -- September 26, 2016 ...[Visit Journal] Distinctive position of Terahertz (THz) frequencies (ν~0.3 -10 THz) in the electromagnetic spectrum with their lower quantum energy compared to IR and higher frequency compared to microwave range allows for many potential applications unique to them. Especially in the security side of the THz sensing applications, the distinct absorption spectra of explosives and related compounds in the range of 0.1–5 THz makes THz technology a competitive technique for detecting hidden explosives. A compact, high power, room temperature continuous wave terahertz source emitting in a wide frequency range will greatly boost the THz applications for the diagnosis and detection of explosives. Here we present a new strong-coupled strain-balanced quantum cascade laser design for efficient THz generation based intracavity DFG. Room temperature continuous wave operation with electrical frequency tuning range of 2.06-4.35 THz is demonstrated [reprint (PDF)]
17.	Evaluating the size-dependent quantum efficiency loss in a SiO₂-Y₂O₃hybrid gated type-II InAs/GaSb long-infrared photodetector array G. Chen , A. M. Hoang , and M. Razeghi Applied Physics Letters 104 , 103509 (2014)-- March 14, 2014 ...[Visit Journal] Growing Y₂O₃ on 20 nm SiO₂ to passivate a 11 μm 50% cut-off wavelength long-wavelength infrared type-II superlattice gated photodetector array reduces its saturated gate bias (VG_sat ) to −7 V. Size-dependent quantum efficiency (QE) losses are evaluated from 400 μm to 57 μm size gated photodiode. Evolution of QE of the 57 μm gated photodiode with gate bias and diode operation bias reveals different surface recombination mechanisms. At 77 K and VG,sat , the 57 μm gated photodiode exhibits QE enhancement from 53% to 63%, and it has 1.2 × 10⁻⁵ A/cm² dark current density at −200 mV, and a specific detectivity of 2.3 × 10¹² Jones. [reprint (PDF)]
17.	Anomalous Hall Effect in InSb Layers Grown by MOCVD on GaAs Substrates C. Besikci, Y.H. Choi, R. Sudharsanan, and M. Razeghi Journal of Applied Physics 73 (10)-- May 15, 1993 ...[Visit Journal] InSb epitaxial layers have been grown on GaAs substrates by low‐pressure metalorganic chemical vapor deposition. A 3.15 μm thick film yielded an x‐ray full width at half maximum of 171 arcsec. A Hall mobility of 76 200 cm²/V· s at 240 K and a full width at half maximum of 174 arcsec have been measured for a 4.85 μm thick epilayer. Measured Hall data have shown anomalous behavior. A decrease in Hall mobility with decreasing temperature has been observed and room‐temperature Hall mobility has increased with thickness. In order to explain the anomalous Hall data, and the thickness dependence of the measured parameters, the Hall coefficient and Hall mobility have been simulated using a three‐layer model including a surface layer, a bulklike layer, and an interface layer with a high density of defects. Theoretical analysis has shown that anomalous behavior can be attributed to donor-like defects caused by the large lattice mismatch and to a surface layer which dominates the transport in the material at low temperatures. [reprint (PDF)]
17.	High Optical Response in Forward Biased (In,Ga)N-GaN Multiquantum-Well Diodes Under Barrier Illumination J.L. Pau, R. McClintock, C. Bayram, K. Minder, D. Silversmith and M. Razeghi IEEE Journal of Quantum Electronics, Vol. 44, No. 4, p. 346-353.-- April 1, 2008 ...[Visit Journal] The authors report on the current–voltage (I–V) characteristic under forward biases obtained in low leakage, small size p-(In,Ga)N–GaN-n multiquantum well diodes. Under barrier illumination, the devices present a high optical response with capabilities to detect optical powers in the pW range without further amplification. This response is attributed to the screening of the internal electric fields. Recombination times of a few seconds are found to be associated to this mechanism. Moreover, a step-like feature is found in the I– V characteristic before the diode turn-on voltage. Our model proposes tunneling current through the multi-quantum-well structure as responsible of this feature. Fast modulation of the tunneling effect under barrier illumination is used to evaluate the detection of low photon fluxes. [reprint (PDF)]
17.	LEO of III-Nitride on Al₂O₃ and Si Substrates M. Razeghi, P. Kung, P. Sandvik, K. Mi, X. Zhang, V.P. Dravid, J. Freitas, and A. Saxler SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal] Lateral epitaxial overgrowth (LEO) has recently become the method of choice to reduce the density of dislocations in heteroepitaxial GaN thin films, and is thus expected to lead to enhanced performance devices. We present here the LEO growth and characterization of GaN films by low pressure metalorganic chemical vapor deposition. Various substrates were used, including basal plane sapphire and oriented Si substrates. The steps in the LEO growth technology will be briefly reviewed. The characterization results will be discussed in detail. The structural, electrical and optical properties of the films were assessed through scanning, atomic and transmission electron microscopy, x-ray diffraction, capacitance-voltage, deep level transient spectroscopy, photoluminescence, and scanning cathodoluminenscence measurements. Single-step and double- step LEO GaN was achieved on sapphire. Similarly high quality LEO grown GaN films were obtained on sapphire and silicon substrates. Clear and dramatic reduction in the density of defects are observed in LEO grown materials using the various characterization techniques mentioned previously. [reprint (PDF)]
17.	Thin film transistors with wurtzite ZnO channels grown on Si₃N₄/SiO₂/Si (111) substrates by pulsed laser deposition D.J. Rogers; V.E. Sandana; F. Hosseini Teherani; M. Razeghi Proc. SPIE 7603, Oxide-based Materials and Devices, 760318 (March 02, 2010)-- March 7, 2010 ...[Visit Journal] Thin Film Transistors (TFT) were made by growing ZnO on Si₃N₄/SiO₂/Si (111) substrates by pulsed laser deposition. X-ray diffraction and scanning electron microscope studies revealed the ZnO to have a polycrystalline wurtzite structure with a smooth surface, good crystallographic quality and a strong preferential c-axis orientation. Transmission studies in similar ZnO layers on glass substrates showed high transmission over the whole visible spectrum. Electrical measurements of a back gate geometry FET showed an enhancement-mode response with hard saturation, mA range Id and a V_ON ∼ 0V. When scaled down, such TFTs may be of interest for high frequency applications. [reprint (PDF)]
17.	Nickel oxide growth on Si (111), c-Al₂O₃ and FTO/glass by pulsed laser deposition V. E. Sandana ; D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; R. McClintock ; M. Razeghi 03/07/2014-- March 7, 2014 ...[Visit Journal] NiO was grown on Si (111), c-Al₂O₃ and FTO/glass substrates by pulsed laser deposition (PLD). X-Ray Diffraction (XRD) and scanning electron microscope (SEM) studies revealed that layers grown on c-Al₂O₃ were fcc NiO with a dense morphology of cubic grains that were strongly (111) oriented along the growth direction. The relatively low ω rocking curve linewidth, of 0.12°suggests that there may have been epitaxial growth on the c-Al₂O₃ substrate. XRD and SEM indicated that films grown on Si (111) were also fcc NiO, with cubic grains, but that the grain orientation was random. This is consistent with the presence of an amorphous SiO₂ layer at the surface of the Si substrate, which precluded epitaxial growth. NiO grown at lower temperature (200°C) on temperature-sensitive FTO/glass substrates showed no evidence of crystallinity in XRD and SEM studies. After flash annealing in air, however, peaks characteristic of randomly oriented fcc NiO appeared in the XRD scans and the surface morphology became more granular in appearance. Such layers appear promising for the development of future dye-sensitised solar cell devices based on NiO grown by PLD. [reprint (PDF)]
17.	Room temperature operation of In_xGa_1-xSb/InAs type-II quantum well infrared photodetectors grown by MOCVD D. H. Wu, Y. Y. Zhang, and M. Razeghi Applied Physics Letters 112, 111103-- March 14, 2018 ...[Visit Journal] We demonstrate room temperature operation of In_0.5Ga_0.5Sb/InAs type-II quantum well photodetectors on InAs substrate grown by metal-organic chemical vapor deposition. At 300 K, the detector exhibits a dark current density of 0.12 A/cm², peak responsivity of 0.72 A/W corresponding to a quantum efficiency of 23.3%, with calculated specific detectivity of 2.4×10⁹ cm.Hz^1/2/W at 3.81 μm. [reprint (PDF)]
17.	Ultraviolet Detector Materials and Devices Studied by Femtosecond Nonlinear Optical Techniques M. Wraback, H. Shen, P. Kung, M. Razeghi, J.C. Carrano, T. Li, and J.C. Campbell SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal] Femtosecond nonlinear optical techniques have been employed in the study of carrier dynamics and transport in UV detector materials. Visible femtosecond pulses derived from the signal beam of a 250 kHz regenerative amplifier-pumped optical parametric amplifier were frequency doubled to obtain pulses tunable from 250 nm to 375 nm. Time-resolved reflectivity experiments indicate that the room-temperature carrier lifetime in GaN grown by double lateral epitaxial overgrowth is about 3 times longer than that of GaN grown on sapphire without benefit of this technique. The electron velocity-field characteristics and saturation velocity in GaN have been obtained form time-resolved studies of electroabsorption in a GaN p-i-n diode. The peak steady- state velocity of 1.9x10⁷ cm/s in this device occurs at 225 kV/cm. Time-resolved transmission measurements have been used to monitor ultrafast carrier relaxation phenomena in a thin AlGaN layer with bandgap in the solar blind region of the spectrum. Excitation intensity and wavelength dependent studies of the photoinduced bleaching decays suggest that they are primarily governed by trapping in a high density of sub-bandgap defect levels. [reprint (PDF)]
17.	High-quality MOCVD-grown heteroepitaxial gallium oxide growth on III-nitrides enabled by AlOx interlayer Junhee Lee, Lakshay Gautam, and Manijeh Razeghi Junhee Lee, Manijeh RazeghiAppl. Phys. Lett. 123, 151902 (2023) https://doi.org/10.1063/5.0170383 ...[Visit Journal] We report high-quality Ga2O3 grown on an AlGaN/AlN/Sapphire in a single growth run in the same Metal Organic Chemical Vapor Deposition reactor with an AlOx interlayer at the Ga2O3/AlGaN interface. AlOx interlayer was found to enable the growth of single crystalline Ga2O3 on AlGaN in spite of the high lattice mismatch between the two material systems. The resulting nitride/oxide heterogenous heterostructures showed superior material qualities, which were characterized by structural, electrical, and optical characterization techniques. In particular, a significant enhancement of the electron mobility of the nitride/oxide heterogenous heterostructure is reported when compared to the individual electron mobilities of the Ga2O3 epilayer on the sapphire substrate and the AlGaN/AlN heterostructure on the sapphire substrate. This enhanced mobility marks a significant step in realizing the next generation of power electronic devices and transistors. [reprint (PDF)]
17.	Impact of scaling base thickness on the performance of heterojunction phototransistors Arash Dehzangi, Abbas Haddadi, Sourav Adhikary, and Manijeh Razeghi Nanotechnology 28, 10LT01-- February 2, 2017 ...[Visit Journal] In this letter we report the effect of vertical scaling on the optical and electrical performance of mid-wavelength infrared heterojunction phototransistors based on type-II InAs/GaSb/AlSb superlattices. The performance of devices with different base thickness was compared as the base was scaled from 60 down to 40 nm. The overall optical performance shows enhancement in responsively, optical gain, and specific detectivity upon scaling the base width. The saturated responsivity for devices with 40 nm bases reaches 8,845 and 9,528 A/W at 77 and 150 K, respectively, which is almost five times greater than devices with 60 nm bases. The saturated optical gain for devices with 40 nm bases is measured as 2,760 at 77 K and 3,081 at 150 K. The devices with 40 nm bases also exhibit remarkable enhancement in saturated current gain, with 17,690 at 77 K, and 19,050 at 150 K. [reprint (PDF)]
17.	High performance monolithic, broadly tunable mid-infrared quantum cascade lasers WENJIA Zhou, DONGHAI Wu, RYAN McCLINTOCK, STEVEN SLIVKEN, AND MANIJEH RAZEGH1 Optica 4(10), p. 1228-- October 10, 2017 ...[Visit Journal] Mid-infrared lasers, emitting in the spectral region of 3-12 µm that contains strong characteristic vibrational transitions of many important molecules, are highly desirable for spectroscopy sensing applications. High-efficiency quantum cascade lasers have been demonstrated with up to watt-level output power in the mid-infrared region. However, the wide wavelength tuning that is critical for spectroscopy applications still largely relies on incorporating external gratings, which have stability issues. Here, we demonstrate a monolithic, broadly tunable quantum cascade laser source emitting between 6.1 and 9.2 µm through an on-chip integration of a sampled grating distributed feedback tunable laser array and a beam combiner. High peak power up to 65 mW has been obtained through a balanced high-gain active region design, efficient waveguide layout, and the development of a broadband antireflection coating. Nearly fundamental transversemode operation is achieved for all emission wavelengths with a pointing stability better than 1.6 mrad (0.1 °). The demonstrated laser source opens new opportunities for mid-infrared spectroscopy. [reprint (PDF)]

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