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1.  AlxGa1-xN p-i-n Photodiodes on Sapphire Substrates
D. Walker, P. Kung, P. Sandvik, J. Wu, M. Hamilton, I.H. Lee, J. Diaz, and M. Razeghi
SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal]
We report the fabrication and characterization of AlxGa1-xN p-i-n photodiodes (0.05 ≤ to X ≤ 0.30) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The devices present a visible-rejection of about four orders of magnitude with a cutoff wavelength that shifts from 350 nm to 291 nm. They also exhibit a constant responsivity for five decades (30 mW/m² to 1 kW/m²) of optical power density. Using capacitance measurements, the values for the acceptor concentration in the p-AlxGa1-xN region and the unintentional donor concentration in the intrinsic region are found. Photocurrent decays are exponential for high load resistances, with a time constant that corresponds to the RC product of the system. For low load resistances the transient response becomes non-exponential, with a decay time longer than the RC constant. [reprint (PDF)]
 
1.  Amorphous ZnO films grown by room temperature pulsed laser deposition on paper and mylar for transparent electronics applications
D.J. Rogers, V.E. Sandana, F. Hosseini Teherani, R. McClintock, M. Razeghi, and H.J. Drouhin
SPIE Proceedings, San Francisco, CA (January 22-27, 2011), Vol. 7940, p. 79401K-- January 24, 2011 ...[Visit Journal]
Recently, there has been a surge of activity in the development of next-generation transparent thin film transistors for use in applications such as electronic paper and flexible organic light emitting diode panels. Amongst the transparent conducting oxides attracting the most interest at present are Amorphous Oxide Semiconductors (AOS) based on ZnO because they exhibit enhanced electron mobility (μ), superior capacity for processability in air and improved thermodynamic stability compared with conventional covalent amorphous semiconductors and existing AOS. Moreover, they give excellent performance when fabricated at relatively low temperature and can readily be made in large area format. Thus, they are projected to resolve the trade-off between processing temperature and device performance and thereby allow fabrication on inexpensive heatsensitive substrates. For the moment, however, an undesireable post-deposition annealing step at a temperature of about 200ºC is necessary in order to obtain suitable electrical and optical properties. This paper demonstrates the possibility of directly engineering amorphous ZnO with relatively high conductiviy at room temperature on paper and mylar substrates using pulsed laser deposition. [reprint (PDF)]
 
1.  Investigation of surface leakage reduction for small pitch shortwave infrared photodetectors
Arash Dehzangi, Quentin Durlin, Donghai Wu, Ryan McClintock, Manijeh Razeghi
Semiconductor Science and Technology, 34(6), 06LT01-- May 25, 2019 ...[Visit Journal]
Different passivation techniques are investigated for reducing leakage current in small pixel (down to 9 μm) heterostructure photodetectors designed for the short-wavelength infrared range. Process evaluation test chips were fabricated using the same process as for focal plane arrays. Arrays of small photodetectors were electrically characterized under dark conditions from 150 K to room temperature. In order to evaluate the leakage current, we studied the relation between the inverse of dynamic resistance at −20 mV and zero bias and perimeter over area P/A ratio as the pixel size is scaled down. At 150 K, leakage current arising from the perimeter dominates while bulk leakage dominates at room temperature. We find that in shortwave devices directly underfilling hybridized devices with a thermoset epoxy resin without first doing any additional passivation/protection after etching gives the lowest leakage with a surface resistance of 4.2 × 109 and 8.9 × 103 Ω· cm−1 at 150 and 300 K, for −20 mV of bias voltage, respectively. [reprint (PDF)]
 
1.  High-power, room-temperature and continuous-wave operation of distributed-feedback quantum-cascade lasers at λ = 4.8 µm
J.S. Yu, S. Slivken, S.R. Darvish, A. Evans, B. Gokden and M. Razeghi
Virtual Journal of Nanoscale Science and Technology 12 (5)-- August 1, 2005 ...[Visit Journal][reprint (PDF)]
 
1.  Gas Source Molecular Beam Epitaxy Growth and Characterization of Ga0.51In0.49P/InxGa1-xAs/GaAs Modulation-doped Field-effect Transistor Structures
C. Besikci, Y. Civan, S. Ozder, O. Sen, C. Jelen, S. Slivken, and M. Razeghi
Semiconductor Science Technology 12-- January 1, 1997 ...[Visit Journal]
Lattice-matched Ga0.51In0.49P/GaAs and strained Ga0.51In0.49P/InxGa1−xAs/GaAs (0.1 ≤ x ≤ 0.25) modulation-doped field-effect transistor structures were grown by gas source molecular beam epitaxy by using Si as dopant. Detailed electrical characterization results are presented. The Ga0.5In0.49P/In0.25Ga0.75As/GaAs sample yielded dark two-dimensional electron gas densities of 3.75 x 1012 cm-2 (300 K) and 2.3 x 1012 cm-2 (77 K) which are comparable to the highest sheet electron densities reported in AlGaAs/InGaAs/GaAs and InAlAs/InGaAs/InP modulation-doped heterostructures. Persistent photoconductivity was observed in the strained samples only. A 0.797 eV deep level has been detected in the undoped GaInP layers of the structures. Another level, with DLTS peak height dependent on the filling pulse width, has been detected at the interface of the strained samples. Based on the DLTS and Hall effect measurement results, this level, which seems to be the origin of persistent photoconductivity, can be attributed to the strain relaxation related defects. [reprint (PDF)]
 
1.  Passivation of Type-II InAs/GaSb superlattice photodetectors
A. Hood, Y. Wei, A. Gin, M. Razeghi, M. Tidrow, and V. Nathan
SPIE Conference, Jose, CA, Vol. 5732, pp. 316-- January 22, 2005 ...[Visit Journal]
Leakage currents limit the operation of high performance Type-II InAs/GaSb superlattice photodiode technology. Surface leakage current becomes a dominant limiting factor, especially at the scale of a focal plane array pixel (< 25 µm) and must be addressed. A reduction of the surface state density, unpinning the Fermi level at the surface, and appropriate termination of the semiconductor crystal are all aims of effective passivation. Recent work in the passivation of Type-II InAs\GaSb superlattice photodetectors with aqueous sulfur-based solutions has resulted in increased R0A products and reduced dark current densities by reducing the surface trap density. Additionally, photoluminescence of similarly passivated Type-II InAs/GaSb superlattice and InAs GaSb bulk material will be discussed. [reprint (PDF)]
 
1.  Reliability in room-temperature negative differential resistance characteristics of low-aluminum contact AlGaN/GaN double-barrier resonant tunneling diodes
C. Bayram, Z. Vashaei, and M. Razeghi
Applied Physics Letters, Vol. 97, No. 18, p. 181109-1-- November 1, 2010 ...[Visit Journal]
AlGaN/GaN resonant tunneling diodes (RTDs), consisting of 20% (10%) aluminum-content in double-barrier (DB) active layer, were grown by metal-organic chemical vapor deposition on freestanding polar (c-plane) and nonpolar (m-plane) GaN substrates. RTDs were fabricated into 35-μm-diameter devices for electrical characterization. Lower aluminum content in the DB active layer and minimization of dislocations and polarization fields increased the reliability and reproducibility of room-temperature negative differential resistance (NDR). Polar RTDs showed decaying NDR behavior, whereas nonpolar ones did not significantly. Averaging over 50 measurements, nonpolar RTDs demonstrated a NDR of 67 Ω, a current-peak-to-valley ratio of 1.08, and an average oscillator output power of 0.52 mW. [reprint (PDF)]
 
1.  High-performance, continuous-wave quantum-cascade lasers operating up to 85° C at λ ~ 8.8 μm
J.S. Yu, S. Slivken, A. Evans, and M. Razeghi
Applied Physics A: Materials Science & Processing, Vo. 93, No. 2, p. 405-408-- November 1, 2008 ...[Visit Journal]
High-temperature, high-power, and continuous-wave (CW) operation of quantum-cascade lasers with 35 active/injector stages at λ∼8.85 μm above room temperature is achieved without using a buried heterostructure. At this long wavelength, the use of a wider ridge waveguide in an epilayer-down bonding scheme leads to a superior performance of the laser. For a high-reflectivity-coated 21 μm×3 mm laser, the output power of 237 mW and the threshold current density of 1.44 kA·cm-2 at 298 K under CW mode are obtained with a maximum wall-plug efficiency of 1.7%. Further improvements were observed by using a 4-mm-long cavity. The device exhibits 294 mW of output power at 298 K and it operates at a high temperature, even up to 358 K (85°C). The full widths at half-maximum of the laser beam in CW operation for the parallel and the perpendicular far-field patterns are 25°and 63°, respectively. [reprint (PDF)]
 
1.  Noise analysis in type-II InAs/GaSb focal plane arrays
P.Y. Delaunay and M. Razeghi
Journal of Applied Physics, Vol. 106, Issue 6, p. 063110-- September 15, 2009 ...[Visit Journal]
A long wavelength infrared focal plane array based on type-II InAs/GaSb superlattices was fabricated and characterized at 80 K. The noise equivalent temperature difference in the array was measured as low as 23 mK for an integration time of 0.129 ms. The noise behavior of the detectors was properly described by a model based on thermal, shot, read out integrated circuit, and photon noises. The noise of the imager was dominated by photon noise for photon fluxes higher than 1.8×1015 ph·s−1·cm−2. At lower irradiance, the imager was limited by the shot noise generated by the dark current or the noise of the testing system. The superlattice detector did not create 1/f noise for frequencies above 4 mHz. As a result, the focal plane array did not require frequent calibrations. [reprint (PDF)]
 
1.  High-quality visible-blind AlGaN p-i-n photodiodes
E. Monroy, M. Hamilton, D. Walker, P. Kung, F.J. Sanchez, and M. Razeghi
Applied Physics Letters 74 (8)-- February 22, 1999 ...[Visit Journal]
We report the fabrication and characterization of AlxGa1−xN p-i-n photodiodes (0 < x < 0.15) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The devices present a visible rejection of six orders of magnitude with a cutoff wavelength that shifts from 365 to 338 nm. Photocurrent decays are exponential for high load resistances, with a time constant that corresponds to the RC product of the system. For low load resistances, the transient response becomes non-exponential, with a decay time longer than the RC constant. This behavior is justified by the strong frequency dependence of the device capacitance. By an admittance analysis, we conclude that speed is not limited by deep levels, but by substitutional Mg capture and emission time. [reprint (PDF)]
 
1.  Optoelectronic Devices Based on III-V Compound Semiconductors Which Have Made a Major Scientific and Technological Impact in the Past 20 Years
M. Razeghi
IEEE Journal of Selected Topics in Quantum Electronics 6 (6), pp.1344 - 1354 -- November 1, 2000 ...[Visit Journal]
This paper reviews some of our pioneering contributions to the field of III–V compound semiconductor materials and low-dimensional optoelectronic devices. These contributions span from the ultraviolet (200 nm) up to the far-infrared (25 μm) portion of the electromagnetic spectrum and have had a major scientific and technological impact on the semiconductor world in the past 20 years. [reprint (PDF)]
 
1.  High brightness ultraviolet light-emitting diodes grown on patterned silicon substrate
Yoann Robin, Kai Ding, Ilkay Demir, Ryan McClintock, Sezai Elagoz, Manijeh Razeghi
Materials Science in Semiconductor Processing 90, pp. 87–91-- November 5, 2018 ...[Visit Journal]
We report on the fabrication of high brightness AlGaN-based ultraviolet light emitting diodes (UV-LED) on patterned silicon. Using the lateral epitaxial overgrowth approach, we demonstrate the growth of a 6 μm thick AlN layer of high crystalline quality. X-ray diffraction characterization showed a rocking curve with a full width at half maximum of 553 and 768″ for the (00.2) and (10.2) planes, respectively. The low dislocation density of the AlN template enabled the growth of bright AlGaN/ GaN quantum wells emitting at 336 nm. By appropriate flip-chip bonding and silicon substrate removal processing steps, the patterned AlN surface was exposed and efficient bottom-emission UV-LEDs were realized. Improvement of the AlN quality and the structure design allowed the optical output power to reach the milliwatt range under pulsed current, exceeding the previously reported maximum efficiency. Further investigations of the optical power at different pulsed currents and duty cycles show that thermal management in this device structure is still challenging, especially in continuous wave mode operation. The strategy presented here is of interest, since AlN crystalline quality improvement and optimization of the light extraction are the main issues inhibiting efficient UV emitter on silicon fabrication. [reprint (PDF)]
 
1.  Growth of “moth-eye” ZnO nanostructures on Si(111), c-Al2O3, ZnO and steel substrates by pulsed laser deposition
Vinod E. Sandana, David J. Rogers, Ferechteh Hosseini Teherani, Philippe Bove, Michael Molinari, Michel Troyon, Alain Largeteau, Gérard Demazeau, Colin Scott, Gaelle Orsal, Henri-Jean Drouhin, Abdallah Ougazzaden, Manijeh Razeghi
Phys. Status Solidi C., 1-5 (2013)-- August 6, 2013 ...[Visit Journal]
Self-forming, vertically-aligned, arrays of black-body-like ZnO moth-eye nanostructures were grown on Si(111), c-Al2O3, ZnO and high manganese austenitic steel substrates using Pulsed Laser Deposition. X-ray diffraction (XRD) revealed the nanostructures to be well-crystallised wurtzite ZnO with strong preferential c-axis crystallographic orientation along the growth direction for all the substrates. Cathodoluminescence (CL) studies revealed emission characteristic of the ZnO near band edge for all substrates. Such moth-eye nanostructures have a graded effective refractive index and exhibit black-body characteristics. Coatings with these features may offer improvements in photovoltaic and LED performance. Moreover, since ZnO nanostructures can be grown readily on a wide range of substrates it is suggested that such an approach could facilitate growth of GaN-based devices on mismatched and/or technologically important substrates, which may have been inaccessible till present. [reprint (PDF)]
 
1.  Generalized k·p perturbation theory for atomic-scale superlattices
H. Yi and M. Razeghi
Physical Review B 56 (7)-- August 15, 1997 ...[Visit Journal]
We present a generalized k⋅p perturbation method that is applicable for atomic-scale superlattices. The present model is in good quantitative agreement with full band theories with local-density approximation, and approaches results of the conventional k⋅p perturbation method (i.e., Kane’s Hamiltonian) with the envelope function approximation for superlattices with large periods. The indirect band gap of AlAs/GaAs superlattices with short periods observed in experiments is explained using this method. [reprint (PDF)]
 
1.  Antimonide-Based Type II Superlattices: A Superior Candidate for the Third Generation of Infrared Imaging Systems
M. Razeghi, A. Haddadi, A.M. Hoang, G. Chen, S. Bogdanov, S.R. Darvish, F. Callewaert, P.R. Bijjam, and R. McClintock
Journal of ELECTRONIC MATERIALS, Vol. 43, No. 8, 2014-- August 1, 2014 ...[Visit Journal]
Type II superlattices (T2SLs), a system of interacting multiquantum wells,were introduced by Nobel Laureate L. Esaki in the 1970s. Since then, this material system has drawn a lot of attention, especially for infrared detection and imaging. In recent years, the T2SL material system has experienced incredible improvements in material growth quality, device structure design, and device fabrication techniques that have elevated the performance of T2SL-based photodetectors and focal-plane arrays (FPAs) to a level comparable to state-of-the-art material systems for infrared detection and imaging, such as mercury cadmium telluride compounds. We present the current status of T2SL-based photodetectors and FPAs for imaging in different infrared regimes, from short wavelength to very long wavelength, and dual-band infrared detection and imaging, as well as the future outlook for this material system. [reprint (PDF)]
 
1.  ZnO Thin Film Templates for GaN-based Devices
D.J. Rogers, F. Hosseini Teherani, A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, M. Razeghi and G. Garry
SPIE Conference, Jose, CA, Vol. 5732, pp. 412-- January 22, 2005 ...[Visit Journal]
GaN-based optoelectronic devices are plagued by a tendency to non-radiative transitions linked to defects in the active layers. ZnO is promising as a substrate material for GaN because it has the same wurtzite structure and a relatively small lattice mismatch (~1.8%). In this paper, we discuss use of ZnO thin films as templates for GaN based LED. [reprint (PDF)]
 
1.  High-Power CW Mid-IR Quantum Cascade Lasers
J.R. Meyer, W.W. Bewley, J.R. Lindle, I. Vurgaftman, A.J. Evans, J.S. Yu, S. Slivken, and M. Razeghi
SPIE Conference, Jose, CA, -- January 22, 2005 ...[Visit Journal]
We report the cw operation of quantum cascade lasers that do not require cryogenic cooling and emit at λ = 4.7-6.2 µm. At 200 K, more than 1 W of output power is obtained from 12-µm-wide stripes, with a wall-plug efficiency (ηwall) near 10%. Room-temperature cw operation has also been demonstrated, with a maximum output power of 640 mW (ηwall = 4.5%) at 6 µm and 260 mW (ηwall = 2.3%) at 4.8 µm. Far-field characterization indicates that whereas the beam quality remains close to the diffraction limit in all of the tested lasers, in the devices emitting at 6.2 µm the beam tends to steer by as much as 5-10° degrees in either direction with varying temperature and pump current. [reprint (PDF)]
 
1.  Scale-up of the Chemical Lift-off of (In)GaN-based p-i-n Junctions from Sapphire Substrates Using Sacrificial ZnO Template Layers
D. J. Rogers, S. Sundaram, Y. El Gmili, F. Hosseini Teherani, P. Bove, V. Sandana, P. L. Voss, A. Ougazzaden, A. Rajan, K.A. Prior, R. McClintock, & M. Razeghi
Proc. SPIE 9364, Oxide-based Materials and Devices VI, 936424 -- March 24, 2015 ...[Visit Journal]
(In)GaN p-i-n structures were grown by MOVPE on both GaN- and ZnO-coated c-sapphire substrates. XRD studies of the as-grown layers revealed that a strongly c-axis oriented wurtzite crystal structure was obtained on both templates and that there was a slight compressive strain in the ZnO underlayer which increased after GaN overgrowth. The InGaN peak position gave an estimate of 13.6at% for the indium content in the active layer. SEM and AFM revealed that the top surface morphologies were similar for both substrates, with an RMS roughness (5 μm x 5 μm) of about 10 nm. Granularity appeared slightly coarser (40nm for the device grown on ZnO vs 30nm for the device grown on the GaN template) however. CL revealed a weaker GaN near band edge UV emission peak and a stronger broad defect-related visible emission band for the structure grown on the GaN template. Only a strong ZnO NBE UV emission was observed for the sample grown on the ZnO template. Quarter-wafer chemical lift-off (CLO) of the InGaN-based p-i-n structures from the sapphire substrate was achieved by temporary-bonding the GaN surface to rigid glass support with wax and then selectively dissolving the ZnO in 0.1M HCl. XRD studies revealed that the epitaxial nature and strong preferential c-axis orientation of the layers had been maintained after lift-off. This demonstration of CLO scale-up, without compromising the crystallographic integrity of the (In)GaN p-i-n structure opens up the perspective of transferring GaN based devices off of sapphire substrates industrially. [reprint (PDF)]
 
1.  Band gap tunability of Type-II Antimonide-based superlattices
M. Razeghi and B.M. Nguyen
Physics Procedia, Vol. 3, Issue 2, p. 1207-1212 (14th International Conference on Narrow Gap Semiconductors and Systems NGSS-14, Sendai, Japan, July 13-17, 2009)-- January 31, 2010 ...[Visit Journal]
Current state-of-the art infrared photon detectors based on bulk semiconductors such as InSb or HgCdTe are now relatively mature and have almost attained the theoretical limit of performance. It means, however, that the technology can not be expected to demonstrate revolutionary improvements, in terms of device performances. In contrasts, low dimensional quantum systems such as superlattices, quantum wells, quantum dots, are still the development stage, yet have shown comparable performance to the bulk detector family. Especially for the Type-II Antimony-based superlattices, recent years have seen significant improvements in material quality, structural design as well as fabrication techniques which lift the performance of Type-II superlattice photodetectors to a new level. In this talk, we will discuss the advantages of Type-II-superlattices, from the physical nature of the material to the practical realisms. We will demonstrate the flexibility in controlling the energy gap and their overall band alignment for the suppression of Auger recombination, as well as to create sophisticated hetero-designs. [reprint (PDF)]
 
1.  Fabrication of GaN nanotubular material using MOCVD with aluminum oxide membrane
W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi
SPIE Conference, San Jose, CA, Vol. 6127, pp. 61270K-- January 23, 2006 ...[Visit Journal]
GaN nanotubular material is fabricated with aluminum oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminum oxide membrane with ordered nano holes is used as template. Gallium nitride is deposited at the inner wall of the nano holes in aluminum oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis condition in MOCVD is obtained successfully for the gallium nitride nanotubular material in this research. The diameter of GaN nanotube fabricated is approximately 200 ~ 250 nm and the wall thickness is about 40 ~ 50 nm. GaN nanotubular material consists of numerous fine GaN particulates with sizes ranging 15 to 30 nm. [reprint (PDF)]
 
1.  Photoluminescence characteristics of polar and nonpolar AlGaN/GaN superlattices
Z. Vashaei, C. Bayram, P. Lavenus, and M. Razeghi
Applied Physics Letters, Vol. 97, No. 12, p. 121918-1-- September 20, 2010 ...[Visit Journal]
High quality Al0.2Ga0.8N/GaN superlattices (SLs) with various (GaN) well widths (1.6 to 6.4 nm) have been grown on polar c-plane and nonpolar m-plane freestanding GaN substrates by metal-organic chemical vapor deposition. Atomic force microscopy, high resolution x-ray diffraction, and photoluminescence (PL) studies of SLs have been carried out to determine and correlate effects of well width and polarization field on the room-temperature PL characteristics. A theoretical model was applied to explain PL energy-dependency on well width and crystalline orientation taking into account internal electric field for polar substrate. Absence of induced-internal electric field in nonpolar SLs was confirmed by stable PL peak energy and stronger PL intensity as a function of excitation power density than polar ones. [reprint (PDF)]
 
1.  InAsSb/InAsP strained-layer superlattice injection lasers operating at 4.0 μm grown by metal-organic chemical vapor deposition
B. Lane, Z. Wu, A. Stein, J. Diaz, and M. Razeghi
Applied Physics Letters 74 (23)-- June 7, 1999 ...[Visit Journal]
We report high power mid-infrared electrical injection operation of laser diodes based on InAsSb/InAsP strained-layer superlattices grown on InAs substrate by metal-organic chemical vapor deposition. The broad-area laser diodes with 100 μm aperture and 1800 μm cavity length demonstrate peak output powers of 546 and 94 mW in pulsed and cw operation respectively at 100 K with a threshold current density as low as 100 A/cm². [reprint (PDF)]
 
1.  Quantum dot in a well infrared photodetectors for high operating temperature focal plane arrays
S. Tsao, T. Yamanaka, S. Abdollahi Pour, I-K Park, B. Movaghar and M. Razeghi
SPIE Proceedings, San Jose, CA Volume 7234-0V-- January 25, 2009 ...[Visit Journal]
InAs quantum dots embedded in InGaAs quantum wells with InAlAs barriers on InP substrate grown by metalorganic chemical vapor deposition are utilized for high operating temperature detectors and focal plane arrays in the middle wavelength infrared. This dot-well combination is unique because the small band offset between the InAs dots and the InGaAs well leads to weak dot confinement of carriers. As a result, the device behavior differs significantly from that in the more common dot systems that have stronger confinement. Here, we present energy level modeling of our QD-QW system and apply these results to interpret the detector behavior. Detectors showed high performance with D* over 1010 cm·Hz1/2W-1 at 150 K operating temperature and with high quantum efficiency over 50%. Focal plane arrays have been demonstrated operating at high temperature due to the low dark current observed in these devices. [reprint (PDF)]
 
1.  High Detectivity InGaAs/InGaP Quantum-Dot Infrared Photodetectors Grown by Low Pressure Metalorganic Chemical Vapor Deposition
J. Jiang, S. Tsao, T. O'Sullivan, W. Zhang, H. Lim, T. Sills, K. Mi, M. Razeghi, G.J. Brown, and M.Z. Tidrow
Applied Physics Letters, 84 (12)-- April 22, 2004 ...[Visit Journal]
We report a high detectivity middle-wavelength infrared quantum dot infrared photodetector (QDIP). The InGaAs quantum dots were grown by self-assembly on an InGaP matrix via low pressure metalorganic chemical vapor deposition. Photoresponse was observed at temperatures above 200 K with a peak wavelength of 4.7 µm and cutoff wavelength of 5.2 µm. The background limited performance temperature was 140 K, and this was attributed to the super low dark current observed in this QDIP. A detectivity of 3.6×1010 cm·Hz½/W, which is comparable to the state-of-the-art quantum well infrared photodetectors in a similar wavelength range, was obtained for this InGaAs/InGaP QDIP at both T = 77 K and T = 95 K at biases of –1.6 and –1.4 V, [reprint (PDF)]
 
1.  Quantum cascade lasers: from tool to product
M. Razeghi, Q. Y. Lu, N. Bandyopadhyay, W. Zhou, D. Heydari, Y. Bai, and S. Slivken
Optics Express Vol. 23, Issue 7, pp. 8462-8475-- March 25, 2015 ...[Visit Journal]
The quantum cascade laser (QCL) is an important laser source in the mid-infrared and terahertz frequency range. The past twenty years have witnessed its tremendous development in power, wall plug efficiency, frequency coverage and tunability, beam quality, as well as various applications based on QCL technology. Nowadays, QCLs can deliver high continuous wave power output up to 5.1 W at room temperature, and cover a wide frequency range from 3 to 300 μm by simply varying the material components. Broadband heterogeneous QCLs with a broad spectral range from 3 to 12 μm, wavelength agile QCLs based on monolithic sampled grating design, and on-chip beam QCL combiner are being developed for the next generation tunable mid-infrared source for spectroscopy and sensing. Terahertz sources based on nonlinear generation in QCLs further extend the accessible wavelength into the terahertz range. Room temperature continuous wave operation, high terahertz power up to 1.9 mW, and wide frequency tunability form 1 to 5 THz makes this type of device suitable for many applications in terahertz spectroscopy, imaging, and communication. [reprint (PDF)]
 

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