Center for Quantum Devices - Most Downloaded Journal Articles

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16.	Extremely high electron mobility in a GaAs‐GaxIn1−xP heterostructure grown by metalorganic chemical vapor deposition M. Razeghi; M. Defour; F. Omnes; M. Dobers; J. P. Vieren; Y. Guldner Appl. Phys. Lett. 55, 457–459 (1989)-- June 17, 1989 ...[Visit Journal] On studying the magnetoresistivity of GaAs-GalnP heterostructures grown by low-pressure metalorganic chemical vapor deposition in magnetic fields up to 12 T and at liquid-helium temperatures, we have observed extremely high electron mobilities. Using the persistent photoconductivity effect, by illumination with red light, we reached a mobility of 780 000 cm2 / (V s) at an electron density of 4.1 X lOll cm- 2 . This high electron mobility is confirmed by cyclotron resonance measurements< [reprint (PDF)]
16.	Demonstration of mid-wavelength infrared nBn photodetectors based on type-II InAs/InAs_1-xSb_x superlattice grown by metal-organic chemical vapor deposition Donghai Wu, Arash Dehzangi, and Manijeh Razeghi Appl. Phys. Lett. 115, 061102-- August 6, 2019 ...[Visit Journal] We report design, growth, and characterization of midwavelength infrared nBn photodetectors based on a type-II InAs/InAs_1-xSb_x superlattice on a GaSb substrate grown by metal-organic chemical vapor deposition. An InAs/AlAs_1-ySb_y/InAs/InAs_1-xSb_x superlattice design was used as the large bandgap electron barrier in the photodetectors. At 150 K, the photodetector exhibits a peak responsivity of 1.23 A/W, corresponding to a quantum efficiency of 41% at an applied bias voltage of −100 mV under front-side illumination, with a 50% cut-off wavelength of 4.6 μm. With an R × A of 356 Ω·cm² and a dark current density of 1.6 × 10⁻⁴ A/cm² under an applied bias of −100 mV at 150 K, the photodetector exhibits a specific detectivity of 1.4 × 10¹¹ cm·Hz^1/2/W. [reprint (PDF)]
16.	First observation of the quantum Hall effect in a Ga0.47In0.53As‐InP heterostructure with three electric subbands M. Razeghi; J. P. Duchemin; J. C. Portal; L. Dmowski; G. Remeni; R. J. Nicholas; A. Briggs M. Razeghi, J. P. Duchemin, J. C. Portal, L. Dmowski, G. Remeni, R. J. Nicholas, A. Briggs; First observation of the quantum Hall effect in a Ga0.47In0.53As‐InP heterostructure with three electric subbands. Appl. Phys. Lett. 17 March 1986; 48 (11)-- March 17, 1986 ...[Visit Journal] Shubnikov–de Haas and quantum Hall effects have been studied in GaInAs‐InP heterojunctions grown by modified low pressure metalorganic chemical vapor deposition. In contrast to the results reported up till now on GaInAs‐InP heterojunctions with nearly the same channel electron density, not one but three electric subbands, E0, E1, and E2, are occupied in zero magnetic field. Two electric subbands E0 and E1 contribute to the quantum Hall effect. Magnetic depopulation of the higher (E1 and E2) subbands is observed in both perpendicular and tilted magnetic field orientations. This enables a demonstration of the importance of intersubband scattering in resistivity and cyclotron resonance. [reprint (PDF)]
16.	New design strategies for multifunctional and inexpensive quantum cascade lasers Steven Slivken; Manijeh Razeghi Proc. SPIE 10926, Quantum Sensing and Nano Electronics and Photonics XVI, 1092611-- February 1, 2019 ...[Visit Journal] This manuscript describes some of the new advances in active mid-infrared photonic integrated circuits enabled by new quantum cascade laser technologies. This includes monolithic beam steering which was achieved via the integration of a widely tunable QCL and a tapered grating outcoupler. A record 17.9 degrees of steering with a low divergence beam (0.5 degrees) was achieved. In addition, the use of surface emitting architectures is proposed as a means to reduce the manufacturing cost of next-generation QCLs. A reflective outcoupler is demonstrated which can allow for stable surface emission from a quantum cascade laser and has potential for cost-effective wafer-scale manufacturing. This outcoupler is integrated with an amplified, electrically tunable laser architecture to demonstrate high power surface emission at a wavelength near 4.9 μm. Single mode peak power up to 6.7 W is demonstrated with >6 W available over a 90 cm⁻¹ (215 nm) spectral range. All of this is achieved while maintaining a high quality output beam, similar to a standard edge emitter. [reprint (PDF)]
16.	Graphene versus oxides for transparent electrode applications Sandana, V. E.; Rogers, D. J.; Teherani, F. Hosseini; Bove, P.; Razeghi, M. Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862603 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] Due to their combination of good electrical conductivity and optical transparency, Transparent Conducting Oxides (TCOs) are the most common choice as transparent electrodes for optoelectronics applications. In particular, devices, such as LEDs, LCDs, touch screens and solar cells typically employ indium tin oxide. However, indium has some significant drawbacks, including toxicity issues (which are hampering manufacturing), an increasing rarefication (due to a combination of relative scarcity and increasing demand [1]) and resulting price increases. Moreover, there is no satisfactory option at the moment for use as a p-type transparent contact. Thus alternative materials solutions are actively being sought. This review will compare the performance and perspectives of graphene with respect to TCOs for use in transparent conductor applications. [reprint (PDF)]
16.	Comparison of the Physical Properties of GaN Thin Films Deposited on (0112) and (0001) Sapphire Substrates C.J. Sun and M. Razeghi Applied Physics Letters 63 (7)-- August 16, 1993 ...[Visit Journal] A direct comparison of the physical properties of GaN thin films is made as a function of the choice of substrate orientations. Gallium nitride single crystals were grown on (0001) and (0112) sapphire substrates by metalorganic chemical vapor deposition. Better crystallinity with fine ridgelike facets is obtained on the (0112) sapphire. Also lower carrier concentration and higher mobilities indicate both lower nitrogen vacancies and less oxygen incorporation on the (0112) sapphire. The results of this study show better physical properties of GaN thin films achieved on (0112) sapphire. [reprint (PDF)]
16.	Reliable GaN-based resonant tunneling diodes with reproducible room-temperature negative differential resistance C. Bayram, D.K. Sadana, Z. Vashaei and M. Razeghi SPIE Proceedings, Vol. 8268, p. 826827-- January 22, 2012 ...[Visit Journal] negative differential resistance (NDR). Compared to other negative resistance devices such as (Esaki) tunnel and transferred-electron devices, RTDs operate much faster and at higher temperatures. III-nitride materials, composed of AlGaInN alloys, have wide bandgap, high carrier mobility and thermal stability; making them ideal for high power high frequency RTDs. Moreover, larger conduction band discontinuity promise higher NDR than other materials (such as GaAs) and room-temperature operation. However, earlier efforts on GaN-based RTD structures have failed to achieve a reliable and reproducible NDR. Recently, we have demonstrated for the first time that minimizing dislocation density and eliminating the piezoelectric fields enable reliable and reproducible NDR in GaN-based RTDs even at room temperature. Observation of NDR under both forward and reverse bias as well as at room and low temperatures attribute the NDR behaviour to quantum tunneling. This demonstration marks an important milestone in exploring III-nitride quantum devices, and will pave the way towards fundamental quantum transport studies as well as for high frequency optoelectronic devices such as terahertz emitters based on oscillators and cascading structures. [reprint (PDF)]
16.	*A Crystallographic Model of (001) Aluminum Nitride Epitaxial Thin Film Growth on (001) Sapphire Substrate* C.J. Sun, P. Kung, A. Saxler, H. Ohsato, M. Razeghi, and K. Haritos Journal of Applied Physics 75 (8)-- April 15, 1994 ...[Visit Journal] A direct comparison of the physical properties of GaN thin films is made as a function of the choice of substrate orientations. Gallium nitride single crystals were grown on (0001) and (011-bar 2) sapphire substrates by metalorganic chemical vapor deposition. Better crystallinity with fine ridgelike facets is obtained on the (011-bar 2) sapphire. Also lower carrier concentration and higher mobilities indicate both lower nitrogen vacancies and less oxygen incorporation on the (011-bar 2) sapphire. The results of this study show better physical properties of GaN thin films achieved on (011-bar 2) sapphire. [reprint (PDF)]
16.	Gain and recombination dynamics of quantum-dot infrared photodetectors H. Lim, B. Movaghar, S. Tsao, M. Taguchi, W. Zhang, A.A. Quivy, and M. Razeghi Physical Review B, 74 (20)-- November 15, 2006 ...[Visit Journal] In this paper we present a theory of diffusion and recombination in QDIPs which is an attempt to explain the recently reported values of gain in these devices. We allow the kinetics to encompass both the diffusion and capture rate limited regimes of carrier relaxation using rigorous random walk and diffusion methods. The photoconductive gains are calculated and compared with the experimental values obtained from InGaAs/InGaP/GaAs and InAs/InP QDIPs using the generation-recombination noise analysis. [reprint (PDF)]
16.	Molecular Beam Epitaxial Growth of High Quality InSb for p-i-n Photodetectors G. Singh, E. Michel, C. Jelen, S. Slivken, J. Xu, P. Bove, I. Ferguson, and M. Razeghi Journal of Vacuum Science and Technology B, 13 (2)-- March 1, 1995 ...[Visit Journal] The InSb infrared photodetectors grown heteroepitaxially on Si substrates by molecular beam epitaxy (MBE) are reported. Excellent InSb material quality is obtained on 3-inch Si substrates (with a GaAs predeposition) as confirmed by structural, optical, and electrical analysis. InSb infrared photodetectors on Si substrates that can operate from 77 K to room temperature have been demonstrated. The peak voltage-responsitivity at 4 μm is about 1.0×10³ V/W and the corresponding Johnson-noise-limited detectivity is calculated to be 2.8×10¹⁰ cm·Hz^½/W. This is the first important stage in developing InSb detector arrays or monolithic focal plane arrays (FPAs) on silicon. The development of this technology could provide a challenge to traditional hybrid FPA's in the future. [reprint (PDF)]
16.	Cubic Phase GaN on Nano-grooved Si (100) via Maskless Selective Area Epitaxy Bayram, C., Ott, J. A., Shiu, K.-T., Cheng, C.-W., Zhu, Y., Kim, J., Razeghi, M. and Sadana, D. K. Adv. Funct. Mater. 2014-- April 1, 2014 ...[Visit Journal] A method of forming cubic phase (zinc blende) GaN (referred as c-GaN) on a CMOS-compatible on-axis Si (100) substrate is reported. Conventional GaN materials are hexagonal phase (wurtzite) (referred as h-GaN) and possess very high polarization fields (∼MV/cm) along the common growth direction of <0001>. Such large polarization fields lead to undesired shifts (e.g., wavelength and current) in the performance of photonic and vertical transport electronic devices. The cubic phase of GaN materials is polarization-free along the common growth direction of <001>, however, this phase is thermodynamically unstable, requiring low-temperature deposition conditions and unconventional substrates (e.g., GaAs). Here, novel nano-groove patterning and maskless selective area epitaxy processes are employed to integrate thermodynamically stable, stress-free, and low-defectivity c-GaN on CMOS-compatible on-axis Si. These results suggest that epitaxial growth conditions and nano-groove pattern parameters are critical to obtain such high quality c-GaN. InGaN/GaN multi-quantum-well structures grown on c-GaN/Si (100) show strong room temperature luminescence in the visible spectrum, promising visible emitter applications for this technology. [reprint (PDF)]
16.	Demonstration of long wavelength infrared Type-II InAs/InAs_1-xSb_x superlattices photodiodes on GaSb substrate grown by metalorganic chemical vapor deposition D. H. Wu, A. Dehzangi, Y. Y. Zhang, M. Razeghi Applied Physics Letters 112, 241103-- June 12, 2018 ...[Visit Journal] We report the growth and characterization of long wavelength infrared type-II InAs/InAs_1−xSb_x superlattices photodiodes with a 50% cut-off wavelength at 8.0 μm on GaSb substrate grown by metalorganic chemical vapor deposition. At 77 K, the photodiodes exhibited a differential resistance at zero bias (R₀A) 8.0 Ω·cm², peak responsivity of 1.26 A/W corresponding to a quantum efficiency of 21%. A specific detectivity of 5.4×10¹⁰ cm·Hz^1/2/W was achieved at 7.5 μm. [reprint (PDF)]
16.	Elimination of surface leakage in gate controlled Type-II InAs/GaSb mid-infrared photodetectors G. Chen, B.-M. Nguyen, A.M. Hoang, E.K. Huang, S.R. Darvish, and M. Razeghi Applied Physics Letters, Vol. 99, No. 18, p. 183503-1-- October 31, 2011 ...[Visit Journal] The electrical performance of mid-infrared type-II superlattice M-barrier photodetectors is shown to be limited by surface leakage. By applying gate bias on the mesa sidewall surface, leakage current is significantly reduced. Qualitatively IV modeling shows diffusion-dominated behavior of dark current at temperatures greater than 120 K. At 110 K, the dark current of gated device is reduced by more than 2 orders of magnitude, reaching the measurement system noise floor. With a quantum efficiency of 48% in front side illumination configuration, a 4.7μm cut-off gated device attains a specific detectivity of 2.5 × 10¹⁴ cm·Hz^½·W^-1 at 110 K, which is 3.6 times higher than in ungated devices. [reprint (PDF)]
16.	Effect of contact doping on superlattice-based minority carrier unipolar detectors B.M. Nguyen, G. Chen, A.M. Hoang, S. Abdollahi Pour, S. Bogdanov, and M. Razeghi Applied Physics Letters, Vol. 99, No. 3, p. 033501-1-- July 18, 2011 ...[Visit Journal] We report the influence of the contact doping profile on the performance of superlattice-based minority carrier unipolar devices for mid-wave infrared detection. Unlike in a photodiode, the space charge in the p-contact of a pMp unipolar device is formed with accumulated mobile carriers, resulting in higher dark current in the device with highly doped p-contact. By reducing the doping concentration in the contact layer, the dark current is decreased by one order of magnitude. At 150 K, 4.9 μm cut-off devices exhibit a dark current of 2 × 10⁻⁵A/cm² and a quantum efficiency of 44%. The resulting specific detectivity is 6.2 × 10¹¹ cm·Hz^1/2/W at 150 K and exceeds 1.9 × 10¹⁴ cm·Hz^1/2/W at 77 K. [reprint (PDF)]
16.	*High quality AlN and GaN epilayers grown on (001) sapphire, (100) and (111) silicon substrates P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi Applied Physics Letters 66 (22)-- May 29, 1995** ...[Visit Journal] The growth of high quality AlN and GaN thin films on basal plane sapphire, (100), and (111) silicon substrates is reported using low pressure metalorganic chemical vapor deposition. X-ray rocking curve linewidths of about 100 and 30 arcsec were obtained for AlN and GaN on sapphire, respectively. Room‐temperature optical transmission and photoluminescence (of GaN) measurements confirmed the high quality of the films. The luminescence at 300 and 77 K of the GaN films grown on basal plane sapphire, (100), and (111) silicon was compared. [reprint (PDF)]
16.	Tl incorporation in InSb and lattice contraction of In_1-xTl_xSb J.J. Lee and M. Razeghi Applied Physics Letters 76 (3)-- January 17, 2000 ...[Visit Journal] Ternary In_1−xTl_xSb thin films are grown by low pressure metalorganic chemical vapor deposition in the high In composition region. Infrared photoresponse spectra of the In_1−xTl_xSb epilayers show a clear shift toward a longer wavelength compared to that of InSb. Tl incorporation is confirmed by Auger electron spectroscopy. In contrast to the theoretical expectation, high resolution x-ray diffraction study reveals that the lattice of the In_1−xTl_xSb epilayers is contracted by the incorporation of Tl. As more Tl is incorporated, the lattice contraction is observed to increase gradually in the experimental range. A possible origin of this phenomenon is discussed. Our experimental results suggest that the Tl incorporation behavior in In_1−xTl_xSb differs from that of other group III impurities in III antimonides. [reprint (PDF)]
15.	Photonic crystal distributed feedback quantum cascade lasers with 12 W output power Y. Bai, B. Gokden, S.R. Darvish, S. Slivken, and M. Razeghi Applied Physics Letters, Vol. 95, No. 3-- July 20, 2009 ...[Visit Journal] We demonstrate room temperature, high power, and diffraction limited operation of photonic crystal distributed feedback (PCDFB) quantum cascade lasers emitting around 4.7 µm. PCDFB gratings with three distinctive periods are fabricated on the same wafer. Peak output power up to 12 W is demonstrated. Lasers with different periods show expected wavelength shifts according to the design. Dual mode spectra are attributed to a purer index coupling by putting the grating layer 100 nm away from the laser core. Single lobed diffraction limited far field profiles are observed. [reprint (PDF)]
15.	InAsSbP/InAsSb/InAs Laser Diodes λ = 3.2 μm) Grown by Low-Pressure Metalorganic Chemical Vapor Deposition J. Diaz, G. Lukas, D. Wu, S. Kim, M. Erdtmann, E. Kaas, and M. Razeghi Applied Physics Letters 70 (1)-- January 6, 1997 ...[Visit Journal] We report metal–organic chemical-vapor deposition-grown double heterostructure InAsSbP/InAsSb/InAs diode lasers emitting at 3.2 μm operating at temperatures up to 220 K with threshold current density of 40 A/cm² at 77 K and characteristic temperature up to 42 K. Output powers as high as 260 mW in pulse mode and 60 mW in continuous wave operation have been obtained from an uncoated 100 μm stripe-width broad-area laser at 77 K. Comparison with theory shows that there is no significant nonradiative recombination mechanism for these lasers at 77 K. [reprint (PDF)]
15.	Solar-blind AlGaN photodiodes with very low cutoff wavelength D. Walker, V. Kumar, K. Mi, P. Sandvik, P. Kung, X.H. Zhang, and M. Razeghi Applied Physics Letters 76 (4)-- January 24, 2000 ...[Visit Journal] We report the fabrication and characterization of AlxGa1–xN photodiodes (x~0.70) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The peak responsivity for –5 V bias is 0.11 A/W at 232 nm, corresponding to an internal quantum efficiency greater than 90%. The device response drops four orders of magnitude by 275 nm and remains at low response for the entire near-ultraviolet and visible spectrum. Improvements were made to the device design including a semitransparent Ni/Au contact layer and a GaN:Mg cap layer, which dramatically increased device response by enhancing the carrier collection efficiency. [reprint (PDF)]
15.	Frequency-Shifted Polaron Coupling in Ga0.47In0.53As Heterojunctions R. J. Nicholas, L. C. Brunel, S. Huant, K. Karrai, and J. C. Portal† M. A. Brummell M. Razeghi K. Y. Cheng and A. Y. Cho Phys. Rev. Lett. 55, 883 – 1985-- August 19, 1985* ...[Visit Journal] Frequency-dependent cyclotron-resonance measurements are reported on Ga0.47In0.53As-InP and Ga0.47In0.53A⁢s−A⁢l0.48In0.52As heterojunctions. Discontinuities in the effective mass occur at two frequencies as a result of resonant polaron coupling with both optic-phonon modes present in the Ga0.47In0.53As alloy. The coupling occurs at the frequencies at the TO phonons, in contrast to measurements on bulk materials. Possible changes in the screening and polarization of the optic-phonon modes are considered. [reprint (PDF)]
15.	Photovoltaic effects in GaN structures with p-n junction X. Zhang, P. Kung, D. Walker, J. Piotrowski, A. Rogalski, A. Saxler, and M. Razeghi Applied Physics Letters 67 (14)-- October 2, 1995 ...[Visit Journal] Large-area GaN photovoltaic structures with p-n junctions have been fabricated using atmospheric pressure metalorganic chemical vapor deposition. The photovoltaic devices typically exhibit selective spectral characteristics with two narrow peaks of opposite polarity. This can be related to p-n junction connected back‐to‐back with a Schottky barrier. The shape of the spectral characteristic is dependent on the thickness of the n- and p-type regions. The diffusion length of holes in the n-type GaN region, estimated by theoretical modeling of the spectral response shape, was about 0.1 μm. [reprint (PDF)]
15.	Advanced InAs/GaSb Superlattice Photovoltaic Detectors for Very-Long Wavelength Infrared Applications Y. Wei, A. Gin, M. Razeghi, and G.J. Brown Applied Physics Letters 80 (18)-- May 6, 2002 ...[Visit Journal] We report on the temperature dependence of the photoresponse of very long wavelength infrared type-II InAs/GaSb superlattice based photovoltaic detectors grown by molecular-beam epitaxy. The detectors had a 50% cutoff wavelength of 18.8 μm and a peak current responsivity of 4 A·W^-1 at 80 K. A peak detectivity of 4.5×10¹⁰ cm· Hz^½·W^-1 was achieved at 80 K at a reverse bias of 110 mV. The generation–recombination lifetime was 0.4 ns at 80 K. The cutoff wavelength increased very slowly with increasing temperature with a net shift from 20 to 80 K of only 1.2 μm [reprint (PDF)]
15.	New frontiers in InP based quantum devices Manijeh Razeghi Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on, pp.1,4, (2008)-- May 29, 2008 ...[Visit Journal] Recent research activities taking place at center for quantum devices (CQD) based on InP material system, especially the exploration and demonstration of the state-of-art high performance quantum cascade lasers (QCL), greatly facilitate the understanding of the underlining physical principles governing the device operation. Thanks to the endless effort putting into the semiconductor epitaxy technologies, including the Molecular Beam Epitaxy (MBE) and low pressure metal organic chemical vapor deposition (LP-MOCVD), the world has seen a close approaching to the ultimate band gap engineering. Highly sophisticated man-made heterostructure, which incorporates hundreds of alternating layers of GaInAs/AlInAs with each layer thickness and composition specifically designed, can be created within a single growth. The material quality is evidenced by the atomically abrupt interfaces. The versatility of the band gap engineering is greatly enhanced by the strain-balanced technique, which allows for growing structures with continuously tunable conduction band offset with little defects. As a result, the room temperature continuous wave (CW) wall plug efficiency (WPE) and the maximum achievable output optical power from a single device have been constantly improving. Novel waveguide incorporating the photonic crystal distributed feedback (PCDFB) mechanism is also investigated with satisfactory preliminary results. [reprint (PDF)]
15.	High performance InAs quantum dot infrared photodetectors (QDIP) on InP by MOCVD W. Zhang, H. Lim, M. Taguchi, S. Tsao, J. Szafraniec, B. Movaghar, M. Razeghi, and M. Tidrow SPIE Conference, Jose, CA, Vol. 5732, pp. 326-- January 22, 2005 ...[Visit Journal] Inter-subband detectors such as quantum well infrared photodetectors (QWIP) have been widely used in infrared detection. Quantum dot infrared photodetectors (QDIPs) have been predicted to have better performance than QWIPs including higher operation temperature and normal incidence detection. Here we report our recent results of InAs QDIP grown on InP substrate by low-pressure metalorganic chemical vapor deposition (MOCVD). The device structures consist of multiple stacks of InAs quantum dots with InP barriers. High detectivities in the range of 10¹⁰cm·Hz^1/2/W were obtained at 77K. The measurements at higher temperatures show better temperature dependent performance than QWIP. However, the performances of QDIPs are still far from the expected. One of the reasons is the low quantum efficiency due to the low fill factor of quantum dots layer. Resonant cavity enhanced QDIP has been studied to increase the quantum efficiency. Different schemes of mirrors using free carrier plasma and distributed Bragg reflector are discussed. [reprint (PDF)]
15.	Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi Phys. Status Solidi A, pp. 1–6-- September 30, 2016 ...[Visit Journal] AlN layers have been grown on 200 nm period of nanopatterned Si (111) substrates by cantilever epitaxy and compared with AlN layers grown by maskless lateral epitaxial overgrowth (LEO) on micropatterned Si (111) substrates. The material quality of 5–10 µm thick AlN grown by LEO is comparable to that of much thinner layers (2 µm) grown by cantilever epitaxy on the nanopatterned substrates. Indeed, the latter exhibited root mean square (RMS) roughness of 0.65 nm and X-ray diffraction full width at half-maximum (FWHM) of 710 arcsec along the (0002) reflection and 930 arcsec along the (10̅15) reflection. The corresponding room temperature photoluminescence spectra was dominated by a sharp band edge peak. Back emission ultra violet light emitting diodes (UV LEDs) were fabricated by flip chip bonding to patterned AlN heat sinks followed by complete Si (111) substrate removal demonstrating a peak pulsed power of ∼0.7 mW at 344 nm peak emission wavelength. The demonstrated UV LEDs were fabricated on a cost effective epitaxial structure grown on the nanopatterned Si substrate with a total thickness of 3.3 µm [reprint (PDF)]

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