Center for Quantum Devices - Most Downloaded Journal Articles

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19.	First cw operation of a Ga0.25In0.75As0.5P0.5‐InP laser on a silicon substrate M. Razeghi; M. Defour; R. Blondeau; F. Omnes; P. Maurel; O. Acher; F. Brillouet; J. C. C‐Fan; J. Salerno Appl. Phys. Lett. 53, 2389–2390 (1988) -- December 12, 1988 ...[Visit Journal] We report the first successful room-temperature cw operations of a GaO. 25 1110.75 ASo. 5 po. s -InP buried ridge structure laser emitting at 1.3 f-tm grown by two-step low-pressure metalorganic chemical vapor deposition on a silicon substrate. An output power of 20 m W with an external quantum efficiency of 16% at room temperature has been obtained. A threshold current as low as 45 rnA under cw operation at room temperature has been measured. The first cw aging test at room temperature, at 2 mW during 5 h, shows a very low degradation (Ill 11,;;5%). [reprint (PDF)]
19.	Metalorganic chemical vapor deposition of undoped In1−xAlxAs on InP M. A. di Forte‐Poisson; M. Razeghi; J. P. Duchemin M. A. di Forte‐Poisson, M. Razeghi, J. P. Duchemin; Metalorganic chemical vapor deposition of undoped In1−xAlxAs on InP. J. Appl. Phys. 1 December 1983; 54 (12): 7187–7189. https://doi.org/10.1063/1.331956-- December 1, 1983 ...[Visit Journal] In1−x Alx As epitaxial layers were grown on (100) InP substrates by the organometallic vapor phase epitaxy method. Undoped layers with mirror smooth surfaces were obtained for substrate temperatures of 600–650 °C. By adjusting the relative ratio of In and Al, lattice matched In0.52 Al0.48 As epilayers were reproducibly grown on InP substrates. X‐ray measurements, scanning Auger analyses, and electron mobilities are presented. These results show that the quality of the epilayers obtained here was comparable to the best reported layers grown by other methods. [reprint (PDF)]
19.	Antimonite-based gap-engineered type-II superlattice materials grown by MBE and MOCVD for the third generation of infrared imagers Manijeh Razeghi, Arash Dehzangi, Donghai Wu, Ryan McClintock, Yiyun Zhang, Quentin Durlin, Jiakai Li, Fanfei Meng Proc. SPIE Defense + Commercial Sensing,Infrared Technology and Applications XLV, 110020G -- May 7, 2019 ...[Visit Journal] Third generation of infrared imagers demand performances for higher detectivity, higher operating temperature, higher resolution, and multi-color detection all accomplished with better yield and lower manufacturing costs. Antimonidebased gap-engineered Type-II superlattices (T2SLs) material system is considered as a potential alternative for MercuryCadmium-Telluride (HgCdTe) technology in all different infrared detection regimes from short to very long wavelengths for the third generation of infrared imagers. This is due to the incredible growth in the understanding of its material properties and improvement of device processing which leads to design and fabrication of better devices. We will present the most recent research results on Antimonide-based gap-engineered Type-II superlattices, such as highperformance dual-band SWIR/MWIR photo-detectors and focal plane arrays for different infrared regimes, toward the third generation of infrared imaging systems at the Center for Zuantum Devices. Comparing metal-organic chemical vapor deposition (MOCVD), vs molecular beam epitaxy (MBE). [reprint (PDF)]
19.	Extended short wavelength infrared heterojunction phototransistors based on type II superlattices Arash Dehzangi , Ryan McClintock, Donghai Wu , Abbas Haddadi, Romain Chevallier , and Manijeh Razeghi Applied Physics Letters 114, 191109-- May 17, 2019 ...[Visit Journal] A two terminal extended short wavelength infrared heterojunction phototransistor based on type-II InAs/AlSb/GaSb on a GaSb substrate is designed, fabricated, and investigated. With the base thickness of 40 nm, the device exhibited a 100% cut-off wavelength of 2.3 λ at 300 K. The saturated peak responsivity value is 320.5 A/W at 300 K, under front-side illumination without any antireflection coating. A saturated optical gain of 245 at 300K was measured. At the same temperature, the device exhibited a collector dark current density (at unity optical gain) and a DC current gain of 7.8 X 10³ A/cm² and 1100, respectively. The device exhibited a saturated dark current shot noise limited specific detectivity of 4.9 X 10¹¹ cm·Hz^½/W at 300 K which remains constant over a broad range of wavelengths and applied biases. [reprint (PDF)]
19.	Engineering future light emitting diodes and photovoltaics with inexpensive materials: Integrating ZnO and Si into GaN-based devices C. Bayram ; K. T. Shiu ; Y. Zhu ; C. W. Cheng ; D. K. Sadana ; F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; Y. Zhang ; S. Gautier ; C.-Y. Cho ; E. Cicek ; Z. Vashaei ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86260L (March 18, 2013)-- March 18, 2013 ...[Visit Journal] Indium Gallium Nitride (InGaN) based PV have the best fit to the solar spectrum of any alloy system and emerging LED lighting based on InGaN technology and has the potential to reduce energy consumption by nearly one half while enabling significant carbon emission reduction. However, getting the maximum benefit from GaN diode -based PV and LEDs will require wide-scale adoption. A key bottleneck for this is the device cost, which is currently dominated by the substrate (i.e. sapphire) and the epitaxy (i.e. GaN). This work investigates two schemes for reducing such costs. First, we investigated the integration of Zinc Oxide (ZnO) in InGaN-based diodes. (Successful growth of GaN on ZnO template layers (on sapphire) was illustrated. These templates can then be used as sacrificial release layers for chemical lift-off. Such an approach provides an alternative to laser lift-off for the transfer of GaN to substrates with a superior cost-performance profile, plus an added advantage of reclaiming the expensive single-crystal sapphire. It was also illustrated that substitution of low temperature n-type ZnO for n-GaN layers can combat indium leakage from InGaN quantum well active layers in inverted p-n junction structures. The ZnO overlayers can also double as transparent contacts with a nanostructured surface which enhances light in/out coupling. Thus ZnO was confirmed to be an effective GaN substitute which offers added flexibility in device design and can be used in order to simultaneously reduce the epitaxial cost and boost the device performance. Second, we investigated the use of GaN templates on patterned Silicon (100) substrates for reduced substrate cost LED applications. Controlled local metal organic chemical vapor deposition epitaxy of cubic phase GaN with on-axis Si(100) substrates was illustrated. Scanning electron microscopy and transmission electron microscopy techniques were used to investigate uniformity and examine the defect structure in the GaN. Our results suggest that groove structures are very promising for controlled local epitaxy of cubic phase GaN. Overall, it is concluded that there are significant opportunities for cost reduction in novel hybrid diodes based on ZnO-InGaN-Si hybridization. [reprint (PDF)]
19.	High power broad area quantum cascade lasers Y. Bai, S. Slivken, S.R. Darvish, A. Haddadi, B. Gokden and M. Razeghi Applied Physics Letters, Vol. 95, No. 22, p. 221104-1-- November 30, 2009 ...[Visit Journal] Broad area quantum cascade lasers (QCLs) are studied with ridge widths up to 400 µm, in room temperature pulsed mode operation at an emission wavelength around 4.45 µm. The peak output power scales linearly with the ridge width. A maximum total peak output power of 120 W is obtained from a single 400-µm-wide device with a cavity length of 3 mm. A stable far field emission characteristic is observed with dual lobes at ±38° for all tested devices, which suggests that these broad area QCLs are highly resistant to filamentation. [reprint (PDF)]
19.	Recent advances in LWIR type-II InAs/GaSb superlattice photodetectors and focal plane arrays at the Center for Quantum Devices M. Razeghi, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, and M.Z. Tidrow SPIE Porceedings, Vol. 6940, Orlando, FL 2008, p. 694009-- March 17, 2008 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs, and imaging applications. They now appear to be a possible alternative to the state-of-the-art HgCdTe (MCT) technology in the long and very long wavelength infrared regimes. At the Center for Quantum Devices,we have successfully realized very high quantum efficiency, very high dynamic differential resistance R0A - product LWIR Type – II InAs/GaSb superlattice photodiodes with efficient surface passivation techniques. The demonstration of high quality LWIR Focal Plane Arrays that were 100 % fabricated in - house reaffirms the pioneer position of this university-based laboratory. [reprint (PDF)]
19.	4.5 mW Operation of AlGaN-based 267 nm Deep-Ultraviolet Light-Emitting Diodes A. Yasan, R. McClintock, K. Mayes, D. Shiell, L. Gautero, S.R. Darvish, P. Kung and M. Razeghi Applied Physics Letters, 83 (23)-- December 8, 2003 ...[Visit Journal] We demonstrate 4.5 mW output power from AlGaN-based single quantum well ultraviolet light-emitting diodes at a very short wavelength of 267 nm in pulsed operation mode. The output power in continuous-wave mode reaches a value of 165 µW at an injected current of 435 mA. The measurements were done on arrays of four devices flip chip bonded to AlN submounts for thermal management. [reprint (PDF)]
19.	High quality LEO growth and characterization of GaN films on Al₂O₃ and Si substrates M. Razeghi, P. Kung, D. Walker, M. Hamilton, and J. Diaz SPIE International Conference on Solid State Crystals, Zakopane, Poland; Proceedings 3725-- October 12, 1998 ...[Visit Journal] We report the lateral epitaxial overgrowth (LEO) of GaN films on (00.1) Al₂O₃ and (111) Si substrates by metalorganic chemical vapor deposition. The LEO on Si substrates was possible after achieving quasi monocrystalline GaN template films on (111) Si substrates. X-ray diffraction, photoluminescence, scanning electron microscopy and atomic force microscopy were used to assess the quality of the LEO films. Lateral growth rates more than 5 times as high as vertical growth rates were achieved for both LEO growths of GaN on sapphire and silicon substrates. [reprint (PDF)]
19.	ZnO 3D flower-like nanostructure synthesized on GaN epitaxial layer by simple route hydrothermal process J.M. Jung, C.R. Kim, H. Ryu, M. Razeghi and W.G. Jung Journal of Alloys and Compounds-- September 15, 2007 ...[Visit Journal] The 3D type, flower-like ZnO nanostructures from particle to flower-like or chestnut bur are fabricated on the GaN epitaxial layer substrate through the simple-route hydrothermal process. Structural characterization was made for the ZnO 3D nanostructures synthesized in different pH ranging from 9.5 to 11.0. The growth model was proposed and discussed regarding the fabrication mechanism and morphology of ZnO 3D flower-like nanostructure. The flower-like ZnO is composed of many thin single crystals ZnO nanorods. Bigger and thicker ZnO structure is fabricated with the increase of pH in solution. The enhanced UV emission in the PL measurement and the spectra in the Raman spectroscopy for ZnO–GaN heterojunction material were discussed. [reprint (PDF)]
19.	High power continuous wave operation of single mode quantum cascade lasers up to 5 W spanning λ∼3.8-8.3 µm Quanyong Lu, Steven Slivken, Donghai Wu, and Manijeh Razeghi Optics Express Vol. 28, Issue 10, pp. 15181-15188-- May 4, 2020 ...[Visit Journal] In this work, we report high power continuous wave room-temperature operation single mode quantum cascade lasers in the mid-infrared spectral range from 3.8 to 8.3 µm. Single mode robustness and dynamic range are enhanced by optimizing the distributed feedback grating coupling design and the facet coatings. High power single mode operation is secured by circumventing the over-coupling issue and spatial hole burning effect. Maximum single-facet continuous-wave output power of 5.1 W and wall plug efficiency of 16.6% is achieved at room temperature. Single mode operation with a side mode suppression ratio of 30 dB and single-lobed far field with negligible beam steering is observed. The significantly increased power for single mode emission will boost the QCL applications in long-range free-space communication and remote sensing of hazardous chemicals. [reprint (PDF)]
19.	GalnAs AND GaInAsP MATERIALS GROWN BY LOW PRESSURE MOCVD FOR MICROWAVE AND OPTOELECTRONIC APPLICATIONS J.P. Duchemin, J.P. Hirtz, M. Razeghi, M. Bonnet , S.D. Hersee J.P. Duchemin, J.P. Hirtz, M. Razeghi, GaInAs and GaInAsP materials grown by low pressure MOCVD for microwave and optoelectronic applications, Journal of Crystal Growth, 55, 1, 1981, Pages 64-73,-- August 1, 1981 ...[Visit Journal] The low pressure MOCVD technique has been successfully used to grow GaInAsP, lattice-matched to InP, for the complete compositional range between InP (λ=0.91 μm) and the ternary compound Ga0.47In0.53As (λ=1.67 μm). By contrast to LPE growth it has been found that during the MOCVD growth of double heterostructures InP can be grown directly onto the ternary or quaternary with no disturbance of the active layer, i.e. there is no effect equivalent to “melt back”. The compositional grading on both sides of the active layer was measured by scanning Auger spectroscopy on bevelled samples. It was found that the graded regions were typically less than 100 Å wide for GaInAsP active layers and less than 50 Å wide for GaInAs active layers. Single layers of undoped GaInAs exhibited a typical mobility of 6700 cm2 V-1s-1 at 1.5×1017 cm-3. The compositional uniformity of the ternary layers was characterised by measurement of the photoluminescence wavelength at various points on a large sample. The wavelength varied by <3 nm over 95% of the area, which was approximately 8 cm2. Our early MOCVD grown GaInAsP/InP DH lasers exhibited high thresholds due to a poor interface between the p-InP and the active layer. However, recently fabricated broad area lasers emitting at 1.27 μm show an average threshold current density of 1.5 kA cm-2 with a T0 of between 70 to 80 K. Stripe geometry lasers have being fabricated from this material and CW operation has been obtained. [reprint (PDF)]
19.	Near bulk-limited R0A of long-wavelength infrared type-II InAs/GaSb superlattice photodiodes with polyimide surface passivation Andrew Hood, Pierre-Yves Delaunay, Darin Hoffman, Binh-Minh Nguyen, Yajun Wei, Manijeh Razeghi, and Vaidya Nathan Applied Physics Letters 90, 233513-- June 4, 2007 ...[Visit Journal] Effective surface passivation of Type-II InAs/GaSb superlattice photodiodes with cutoff wavelengths in the long-wavelength infrared is presented. A stable passivation layer, the electrical properties of which do not change as a function of the ambient environment nor time, has been prepared by a solvent-based surface preparation, vacuum desorption, and the application of an insulating polyimide layer. Passivated photodiodes, with dimensions ranging from 400×400 to 25×25 µm², with a cutoff wavelength of ~11 µm, exhibited near bulk-limited R₀A values of ~12 Ω·cm², surface resistivities in excess of 10⁴ Ω·cm, and very uniform current-voltage behavior at 77 K. [reprint (PDF)]
19.	High-performance InAs quantum-dot infrared photodetectors grown on InP substrate operating at room temperature H. Lim, S. Tsao, W. Zhang, and M. Razeghi Applied Physics Letters, Vol. 90, No. 13, p. 131112-1-- March 26, 2007 ...[Visit Journal] The authors report a room temperature operating InAs quantum-dot infrared photodetector grown on InP substrate. The self-assembled InAs quantum dots and the device structure were grown by low-pressure metal-organic chemical vapor deposition. The detectivity was 2.8×10¹¹ cm·Hz^1/2/W at 120 K and a bias of −5 V with a peak detection wavelength around 4.1 μm and a quantum efficiency of 35%. Due to the low dark current and high responsivity, a clear photoresponse has been observed at room temperature, which gives a detectivity of 6.7×10⁷ cm·Hz^1/2/W. [reprint (PDF)]
19.	A Review of III-Nitride Research at the Center for Quantum Devices M. Razeghi and R. McClintock Journal of Crystal Growth, Vol. 311, No. 10-- May 1, 2009 ...[Visit Journal] In this paper, we review the history of the Center for Quantum Devices’ (CQD) III-nitride research covering the past 15 years. We review early work developing III-nitride material growth. We then present a review of laser and light-emitting diode (LED) results covering everything from blue lasers to deep UV LEDs emitting at 250 nm. This is followed by a discussion of our UV photodetector research from early photoconductors all the way to current state of the art Geiger-mode UV single photon detectors. [reprint (PDF)]
19.	Low-threshold distributed feedback lasers fabricated on material grown completely by LP-MOCVD M. Razeghi; R. Blondeau; M. Krakowski; J.-C. Bouley; M. Papuchon; B. Cremoux; J. Duchemin IEEE Journal of Quantum Electronics ( Volume: 21, Issue: 6, June 1985)-- June 30, 1985 ...[Visit Journal] GaInAsP-InP distributed feedback (DFB) lasers emitting at 1.57 μm have been fabricated on material grown completely by low-pressure metalorganic chemical vapor deposition (LP-MOCVD). The CW threshold current of 60 mA and an output power of 6 mW per facet at room temperature have been obtained. The lasing wavelength λLunder CW operation showed a temperature coefficient (d_{\lambdaL}/dT) of 0.9 Å/°C for this DFB laser over the range of10-90\degC. A stable single longitudinal mode was maintained under high speed pulse modulation up to 500 ps, and sinusoidal modulation at 1 Ghz. [reprint (PDF)]
19.	Self-Detecting Mid-Infrared Dual-Comb Spectroscopy Based on High-Speed Injection-Locked Quantum Cascade Lasers Yu Ma, Dapeng Wu, Ruixin Huang, Shichen Zhang, Binru Zhou, Zejun Ma, Yongqiang Sun, Junqi Liu, Ning Zhuo, Jinchuan Zhang, Shenqiang Zhai, Shuman Liu, Fengqi Liu, Manijeh Razeghi, and Quanyong Lu Adv. Photonics Res. 2500062 (2025) ...[Visit Journal] Dual-comb spectrometer based on quantum cascade lasers (QCLs) is gaining fast development and revolutionizing the precision measurement with high-frequency and temporal resolutions. In these measurements, high-bandwidth photodetectors are normally used for signal acquisition and processing, which complicates the measurement system. QCL is well-known for its picosecond gain-recovery time with an intrinsic bandwidth of tens of GHz. In this work, a compact self-detecting dual-comb spectroscopy (DCS) is demonstrated based on dispersion-engineered, high-speed packaged QCLs under coherent injection locking. The laser source is designed and fabricated into a hybrid-monolithic-integrated waveguide and epi-down packaged on a wideband-designed submount to fully explore the high-speed feature up to fourth-order harmonic state with a cutoff frequency of 40 GHz. The effective radio frequency (RF) injection locking diminishes the issue of optical feedback and enables high-bandwidth self-detection based on QCLs. Clear and stable multiheterodyne signal corresponding to a spectral range of 68 cm−1 and narrow comb tooth linewidth of ≈10 kHz is observed without using external detector or numerical process. The demonstrated broadband, high-power, self-detecting mid-infrared QCL DCS has a great potential for future applications of molecular sensing and spectroscopy. [reprint (PDF)]
19.	Demonstration of mid-wavelength infrared nBn photodetectors based on type-II InAs/InAs_1-xSb_x superlattice grown by metal-organic chemical vapor deposition Donghai Wu, Arash Dehzangi, and Manijeh Razeghi Appl. Phys. Lett. 115, 061102-- August 6, 2019 ...[Visit Journal] We report design, growth, and characterization of midwavelength infrared nBn photodetectors based on a type-II InAs/InAs_1-xSb_x superlattice on a GaSb substrate grown by metal-organic chemical vapor deposition. An InAs/AlAs_1-ySb_y/InAs/InAs_1-xSb_x superlattice design was used as the large bandgap electron barrier in the photodetectors. At 150 K, the photodetector exhibits a peak responsivity of 1.23 A/W, corresponding to a quantum efficiency of 41% at an applied bias voltage of −100 mV under front-side illumination, with a 50% cut-off wavelength of 4.6 μm. With an R × A of 356 Ω·cm² and a dark current density of 1.6 × 10⁻⁴ A/cm² under an applied bias of −100 mV at 150 K, the photodetector exhibits a specific detectivity of 1.4 × 10¹¹ cm·Hz^1/2/W. [reprint (PDF)]
19.	Novel Method for Reclaim/Reuse of Bulk GaN Substrates using Sacrifical ZnO Release Layers A. Rajan, S. Sundaram, Y. El Gmili, P. L. Voss, K. Pantzas, T. Moudakir, A. Ougazzaden, D. J. Rogers, F. Hosseini Teherani, V. E. Sandana, P. Bove, K. Prior, R. McClintock & M. Razeghi Proc. SPIE 8987, Oxide-based Materials and Devices V, 898719-- April 2, 2014 ...[Visit Journal] Free-standing (0002)-oriented GaN substrates (f = 2”) were coated with 200 nm of ZnO and used as templates for the growth of GaN thin films. SEM and AFM revealed that such GaN layers had a relatively homogenous surface morphology with an RMS roughness (5 μm x 5 μm) of less than 4nm. XRD studies revealed strained ZnO growth on the GaN substrate and the reproduction of the substrate rocking curve for the GaN overlayers after only a hundred nm of growth, thus indicating that the GaN films had superior crystallographic quality compared to those grown on sapphire or ZnO/sapphire substrates. Quarter-wafer areas of GaN were removed from the GaN substrate (by selective chemical etching away of the ZnO interlayer). The expensive GaN substrates were then reclaimed/reused (without the need for polishing) for a second cycle of ZnO and GaN growth, which gave similar XRD, SEM, CL and AFM results to the first cycle. [reprint (PDF)]
19.	Chemical lift-off and direct wafer bonding of GaN/InGaN P-I-N structures grown on ZnO K. Pantzas, D.J. Rogers, P. Bove, V.E. Sandana, F.H. Teherani, Y. El Gmili, M. Molinari, G. Patriarche, L. Largeau, O. Mauguin, S. Suresh, P.L. Voss, M. Razeghi, A. Ougazzaden Journal of Crystal Growth, Volume 435, Pages 105-109-- November 7, 2015 ...[Visit Journal] p-GaN/i-InGaN/n-GaN (PIN) structures were grown epitaxially on ZnO-buffered c-sapphire substrates by metal organic vapor phase epitaxy using the industry standard ammonia precursor for nitrogen. Scanning electron microscopy revealed continuous layers with a smooth interface between GaN and ZnO and no evidence of ZnO back-etching. Energy Dispersive X-ray Spectroscopy revealed a peak indium content of just under 5at% in the active layers. The PIN structure was lifted off the sapphire by selectively etching away the ZnO buffer in an acid and then direct bonded onto a glass substrate. Detailed high resolution transmission electron microscopy and grazing incidence X-ray diffraction studies revealed that the structural quality of the PIN structures was preserved during the transfer process. [reprint (PDF)]
19.	Deep ultraviolet (254 nm) focal plane array E. Cicek, Z. Vashaei, R. McClintock, and M. Razeghi SPIE Proceedings, Conference on Infrared Sensors, Devices and Applications; and Single Photon Imaging II, Vol. 8155, p. 81551O-1-- August 21, 2011 ...[Visit Journal] We report the synthesis, fabrication and testing of a 320 × 256 focal plane array (FPA) of back-illuminated, solarblind, p-i-n, Al_xGa_1-xN-based detectors, fully realized within our research laboratory. We implemented a novel pulsed atomic layer deposition technique for the metalorganic chemical vapor deposition (MOCVD) growth of crackfree, thick, and high Al composition Al_xGa_1-xN layers. Following the growth, the wafer was processed into a 320 × 256 array of 25 μm × 25 μm pixels on a 30 μm pixel-pitch and surrounding mini-arrays. A diagnostic mini-array was hybridized to a silicon fan-out chip to allow the study of electrical and optical characteristics of discrete pixels of the FPA. At a reverse bias of 1 V, an average photodetector exhibited a low dark current density of 1.12×10^-8 A·cm^-2. Solar-blind operation is observed throughout the array with peak detection occurring at wavelengths of 256 nm and lower and falling off three orders of magnitude by 285 nm. After indium bump deposition and dicing, the FPA is hybridized to a matching ISC 9809 readout integrated circuit (ROIC). By developing a novel masking technology, we significantly reduced the visible response of the ROIC and thus the need for external filtering to achieve solar- and visible-blind operation is eliminated. This allowed the FPA to achieve high external quantum efficiency (EQE): at 254 nm, average pixels showed unbiased peak responsivity of 75 mA/W, which corresponds to an EQE of ~37%. Finally, the uniformity of the FPA and imaging properties are investigated. [reprint (PDF)]
19.	Ga2O3/(Al)GaN Heterostructures for Next Generation Power Electronics Manijeh Razeghi, N. Shrestha, V. E. Sandana, D. J. Rogers, F. H. Teherani physica status solidi (b), 2026; 263:e70213 Gallium oxide (Ga2O3) is an emerging semiconductor for high-power electronics, but its low thermal conductivity, lack of viable p-type doping, and limited carrier mobility restrict device performance and prevent high-speed applications. This work presents a novel strategy to simultaneously mitigate the thermal and transport limitations of Ga2O3 through heterojunctions with III-nitride materials. Owing to their higher thermal conductivity and strong polarization fields, III-nitrides can enhance heat dissipation and enable high-density two-dimensional electron gases (2DEGs) at the heterointerface, improving switching speed. The role of spontaneous and piezoelectric polarization in 2DEG formation is systematically examined. It is shown that Al-polar AlN/β-Ga2O3 heterojunctions do not support 2DEG formation due to hole accumulation at the interface, whereas N-polar AlN/β-Ga2O3 heterostructures are identified as promising candidates for high 2DEG densities. The band alignment of the AlN/β-Ga2O3 interface is also investigated. Additionally, κ-Ga2O3, recently identified as ferroelectric with strong polarization, is explored in κ-Ga2O3/AlGaN heterostructures. Using epitaxial layer and strain engineering, electron mobilities up to 691 cm2 V−1 s −1 at 77 K were achieved in MOCVD-grown κ-Ga2O3/N-polar AlGaN/AlN heterostructures. These results highlight the potential of III-nitride/Ga2O3 heterostructures for high-power and radiofrequency device applications with enhanced performance and efficiency. [reprint (PDF)]
19.	Investigation of surface leakage reduction for small pitch shortwave infrared photodetectors Arash Dehzangi, Quentin Durlin, Donghai Wu, Ryan McClintock, Manijeh Razeghi Semiconductor Science and Technology, 34(6), 06LT01-- May 25, 2019 ...[Visit Journal] Different passivation techniques are investigated for reducing leakage current in small pixel (down to 9 μm) heterostructure photodetectors designed for the short-wavelength infrared range. Process evaluation test chips were fabricated using the same process as for focal plane arrays. Arrays of small photodetectors were electrically characterized under dark conditions from 150 K to room temperature. In order to evaluate the leakage current, we studied the relation between the inverse of dynamic resistance at −20 mV and zero bias and perimeter over area P/A ratio as the pixel size is scaled down. At 150 K, leakage current arising from the perimeter dominates while bulk leakage dominates at room temperature. We find that in shortwave devices directly underfilling hybridized devices with a thermoset epoxy resin without first doing any additional passivation/protection after etching gives the lowest leakage with a surface resistance of 4.2 × 10⁹ and 8.9 × 10³ Ω· cm⁻¹ at 150 and 300 K, for −20 mV of bias voltage, respectively. [reprint (PDF)]
19.	Effects of well width and growth temperature on optical and structural characteristics of AlN/GaN superlattices grown by metal-organic chemical vapor deposition C. Bayram, N. Pere-Laperne, and M. Razeghi Applied Physics Letters, Vol. 95, No. 20, p. 201906-1-- November 16, 2009 ...[Visit Journal] AlN/GaN superlattices (SLs) employing various well widths (from 1.5 to 7.0 nm) are grown by metal-organic chemical vapor deposition technique at various growth temperatures (Ts) (from 900 to 1035 °C). The photoluminescence (PL), x-ray diffraction, and intersubband (ISB) absorption characteristics of these SLs and their dependency on well width and growth temperature are investigated. Superlattices with thinner wells (grown at the same Ts) or grown at lower Ts (employing the same well width) are shown to demonstrate higher strain effects leading to a higher PL energy and ISB absorption energy. Simulations are employed to explain the experimental observations. ISB absorptions from 1.04 to 2.15 µm are demonstrated via controlling well width and growth temperature. [reprint (PDF)]
19.	High Detectivity InGaAs/InGaP Quantum-Dot Infrared Photodetectors Grown by Low Pressure Metalorganic Chemical Vapor Deposition J. Jiang, S. Tsao, T. O'Sullivan, W. Zhang, H. Lim, T. Sills, K. Mi, M. Razeghi, G.J. Brown, and M.Z. Tidrow Virtual Journal of Nanoscale Science and Technology 9 (12)-- March 29, 2004 ...[Visit Journal][reprint (PDF)]

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