Center for Quantum Devices - Most Downloaded Journal Articles

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2.	Investigations of p-type signal for ZnO thin films grown on (100) GaAs substrates by pulsed laser deposition D.J. Rogers, F. Hosseini Teherani, T. Monteiro, M. Soares, A. Neves, M. Carmo, S. Periera, M.R. Correia, A. Lusson, E. Alves, N.P. Barradas, J.K. Morrod, K.A. Prior, P. Kung, A. Yasan, and M. Razeghi Phys. Stat. Sol. C, 3 (4)-- March 1, 2006 ...[Visit Journal] n this work we investigated ZnO films grown on semi-insulating (100) GaAs substrates by pulsed laser deposition. Samples were studied using techniques including X-ray diffraction (XRD), scanning electron microscopy, atomic force microscopy, Raman spectroscopy, temperature dependent photoluminescence, C-V profiling and temperature dependent Hall measurements. [reprint (PDF)]
2.	Fabrication of GaN Nanotubular Material using MOCVD with an Aluminium Oxide Membrane W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi Nanotechnology 17-- January 1, 2006 ...[Visit Journal] GaN nanotubular material is fabricated with an aluminium oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminium oxide membrane with ordered nanoholes is used as a template. Gallium nitride is deposited at the inner wall of the nanoholes in the aluminium oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis conditions in MOCVD are obtained successfully for the gallium nitride nanotubular material in this research. The diameter of the GaN nanotube fabricated is approximately 200–250 nm and the wall thickness is about 40–50 nm. [reprint (PDF)]
2.	Effect of contact doping on superlattice-based minority carrier unipolar detectors B.M. Nguyen, G. Chen, A.M. Hoang, S. Abdollahi Pour, S. Bogdanov, and M. Razeghi Applied Physics Letters, Vol. 99, No. 3, p. 033501-1-- July 18, 2011 ...[Visit Journal] We report the influence of the contact doping profile on the performance of superlattice-based minority carrier unipolar devices for mid-wave infrared detection. Unlike in a photodiode, the space charge in the p-contact of a pMp unipolar device is formed with accumulated mobile carriers, resulting in higher dark current in the device with highly doped p-contact. By reducing the doping concentration in the contact layer, the dark current is decreased by one order of magnitude. At 150 K, 4.9 μm cut-off devices exhibit a dark current of 2 × 10⁻⁵A/cm² and a quantum efficiency of 44%. The resulting specific detectivity is 6.2 × 10¹¹ cm·Hz^1/2/W at 150 K and exceeds 1.9 × 10¹⁴ cm·Hz^1/2/W at 77 K. [reprint (PDF)]
2.	Gallium nitride on silicon for consumer & scalable photonics C. Bayram, K.T. Shiu, Y. Zhu, C.W. Cheng, D.K. Sadana, Z. Vashaei, E. Cicek, R. McClintock and M. Razeghi SPIE Proceedings, Vol. 8631, p. 863112-1, Photonics West, San Francisco, CA-- February 4, 2013 ...[Visit Journal] Gallium Nitride (GaN) is a unique material system that has been heavily exploited for photonic devices thanks to ultraviolet-to-terahertz spectral tunability. However, without a cost effective approach, GaN technology is limited to laboratory demonstrations and niche applications. In this investigation, integration of GaN on Silicon (100) substrates is attempted to enable widespread application of GaN based optoelectronics. Controlled local epitaxy of wurtzite phase GaN on on-axis Si(100) substrates is demonstrated via metal organic chemical vapor deposition (MOCVD). CMOS-compatible fabrication scheme is used to realize [SiO2-Si{111}-Si{100}] groove structures on conventional 200-mm Si(100) substrates. MOCVD growth (surface treatment, nucleation, initiation) conditions are studied to achieve controlled GaN epitaxy on such grooved Si(100) substrates. Scanning electron microscopy and transmission electron microscopy techniques are used to determine uniformity and defectivity of the GaN. Our results show that aforementioned groove structures along with optimized MOCVD growth conditions can be used to achieve controlled local epitaxy of wurtzite phase GaN on on-axis Si(100) substrates. [reprint (PDF)]
2.	Very high wall plug efficiency of quantum cascade lasers Y. Bai, S. Slivken, S.R. Darvish, and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 76080F-1-- January 22, 2010 ...[Visit Journal] We demonstrate very high wall plug efficiency (WPE) of mid-infrared quantum cascade lasers (QCLs) in low temperature pulsed mode operation (53%), room temperature pulsed mode operation (23%), and room temperature continuous wave operation (18%). All of these values are the highest to date for any QCLs. The optimization of WPE takes the route of understanding the limiting factors of each sub-efficiency, exploring new designs to overcome the limiting factor, and constantly improving the material quality. [reprint (PDF)]
2.	Stability of far fields in double heterostructure and multiple quantum well InAsSb/InPAsSb/InAs midinfrared lasers H. Yi, A. Rybaltowski, J. Diaz, D. Wu, B. Lane, Y. Xiao, and M. Razeghi Applied Physics Letters 70 (24)-- June 16, 1997 ...[Visit Journal] Far fields in perpendicular direction to the junction are investigated in double heterostructure (DH) and multiple quantum well (MQW) midwave-infrared InAsSb/InPAsSb/InAs lasers (λ = 3.2–3.6 μm). Strong broadening of the far fields in the DH lasers was observed with increases in temperature and/or current. On the contrary, MQW lasers with otherwise identical structure exhibit very stable far fields as narrow as 23° for all the operating conditions investigated. Our experiment and theoretical modeling suggest that these different behaviors of far fields in DH and MQW lasers are attributed to the refractive index fluctuation in the InAsSb laser active region. [reprint (PDF)]
2.	320x256 infrared focal plane array based on type-II InAs/GaSb superlattice with a 12 μm cutoff wavelength P.Y. Delaunay, B.M. Nguyen, D. Hoffman, and M. Razeghi SPIE Porceedings, Vol. 6542, Orlando, FL 2007, p. 654204-- April 9, 2007 ...[Visit Journal] In the past few years, significant progress has been made in the structure design, growth and processing of Type-II InAs/GaSb superlattice photodetectors. Type-II superlattice demonstrated its ability to perform imaging in the middle and long infra-red range, becoming a potential competitor for technologies such as QWIP and HgCdTe. Using an empirical tight-binding model, we developed a superlattice design that matches the lattice parameter of GaSb substrates and presents a cutoff wavelength of 12 μm. Electrical and optical measurements performed on single element detectors at 77 K showed an R₀A averaging 13 Ω·cm² and a quantum efficiency as high as 54%. We demonstrated high quality material growth with x-ray FWHM below 30 arcsec and an AFM rms roughness of 1.5 Å over an area of 20x20 μm². A 320x256 array of 25x25μm² pixels, hybridized to an Indigo Read Out Integrated Circuit, performed thermal imaging up to 185 K with an operability close to 97%. The noise equivalent temperature difference at 81 K presented a peak at 270 mK, corresponding to a mean value of 340 mK. [reprint (PDF)]
2.	High Detectivity InAs Quantum-Dot Infrared Photodetectors Grown on InP by Metalorganic Chemical Vapor Deposition W. Zhang, H. Lim, M. Taguchi, S. Tsao, B. Movaghar, and M. Razeghi Applied Physics Letters, 86 (19)-- May 9, 2005 ...[Visit Journal] We report a high-detectivity InAs quantum-dot infrared photodetector. The InAs quantum dots were grown by self-assembly on InP substrates via low-pressure metal–organic chemical–vapor deposition. Highly uniform quantum dots with a density of 4×10¹⁰ cm² were grown on a GaAs/InP matrix. Photoresponse was observed at temperatures up to 160 K with a peak of 6.4 µm and cutoff of 6.6 µm. Very low dark currents and noise currents were obtained by inserting Al_0.48In_0.52As current blocking layers. The background-limited performance temperature was 100 K. A detectivity of 1.0×10¹⁰ cm·Hz^½/W was obtained at 77 K with a bias of –1.1 V. [reprint (PDF)]
2.	Temperature dependence of threshold current density J_th and differential efficiency of High Power InGaAsP/GaAs ( λ = 0.8 μm) lasers H. Yi, J. Diaz, I. Eliashevich, M. Stanton, M. Erdtmann, X. He, L. Wang, and M. Razeghi Applied Physics Letters 66 (3)-- January 16, 1995 ...[Visit Journal] An experimental and theoretical study on temperature dependence of the threshold current density J_th and differential efficiency ηd for the InGaAsP/GaAs laser diodes emitting at λ=0.8 μm was performed. Threshold current density J_th increases and differential efficiency η_d decreases as temperature is increased mainly because of thermal broadening of the gain spectrum. However, the measured temperature dependence of J_th and η_d could not be explained when only this effect was considered. In this letter, the temperature dependence of momentum relaxation rate ℏ/τ of carriers was investigated by performing the photoluminescence study. At high temperature, increase of the momentum relaxation rate ℏ/τ leads to reduction of the gain and mobility and increase of the optical loss, causing higher J_th and lower η_d as experimentally observed. The resulting theoretical model provides a good explanation for the mechanism of the increase of J_th and decrease of η_d. [reprint (PDF)]
2.	Nanoselective area growth of defect-free thick indium-rich InGaN nanostructures on sacriﬁcial ZnO templates Renaud Puybaret, David J Rogers, Youssef El Gmili, Suresh Sundaram, Matthew B Jordan, Xin Li, Gilles Patriarche, Ferechteh H Teherani, Eric V Sandana, Philippe Bove, Paul L Voss, Ryan McClintock, Manijeh Razeghi, Ian Ferguson, Jean-Paul Salvestrini, and Abdallah Ougazzade Nanotechnology 28 195304-- April 29, 2017 ...[Visit Journal] Nanoselective area growth (NSAG) by metal organic vapor phase epitaxy of high-quality InGaN nanopyramids on GaN-coated ZnO/c-sapphire is reported. Nanopyramids grown on epitaxial low-temperature GaN-on-ZnO are uniform and appear to be single crystalline, as well as free of dislocations and V-pits. They are also indium-rich (with homogeneous 22% indium incorporation) and relatively thick (100 nm). These properties make them comparable to nanostructures grown on GaN and AlN/Si templates, in terms of crystallinity, quality, morphology, chemical composition and thickness. Moreover, the ability to selectively etch away the ZnO allows for the potential lift-off and transfer of the InGaN/GaN nanopyramids onto alternative substrates, e.g. cheaper and/or ﬂexible. This technology offers an attractive alternative to NSAG on AlN/Si as a platform for the fabrication of high quality, thick and indium-rich InGaN monocrystals suitable for cheap, ﬂexible and tunable light-emitting diodes. [reprint (PDF)]
2.	Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi Physica Status Solidi 214 (4), pp. 1770120-- April 4, 2017 ...[Visit Journal] The growth of thick, high quality, and low stress AlN films on Si substrates is highly desired for a number of applications like the development of micro and nano electromechanical system (MEMS and NEMS) technologies [1] and particularly for fabricating AlGaNbased UV LEDs [2–5]. UV LEDs are attractive as they are applied in many areas, such as biomedical instrumentations and dermatology, curing of industrial resins and inks, air purification, water sterilization, and many others [2, 3]. UV LEDs have been generally fabricated on AlN, GaN, Al₂O₃, or SiC substrates because of better lattice mismatching to AlGaN material systems. [reprint (PDF)]
2.	Type-II superlattice-based heterojunction phototransistors for high speed applications Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi Infrared Physics and Technology 108, 1033502-- May 2, 2020 ...[Visit Journal] In this study, high speed performance of heterojunction phototransistors (HPTs) based on InAs/GaSb/AlSb type-II superlattice with 30 nm base thickness and 50% cut-off wavelength of 2.0 μm at room temperature are demonstrated. We studied the relationship between -3 dB cut-off frequency of these HPT versus mesa size, applied bias, and collector layer thickness. For 8 μm diameter circular mesas HPT devices with a 0.5 μm collector layer, under 20 V applied bias voltage, we achieved a -3 dB cut-off frequency of 2.8 GHz. [reprint (PDF)]
2.	Investigation of surface leakage reduction for small pitch shortwave infrared photodetectors Arash Dehzangi, Quentin Durlin, Donghai Wu, Ryan McClintock, Manijeh Razeghi Semiconductor Science and Technology, 34(6), 06LT01-- May 25, 2019 ...[Visit Journal] Different passivation techniques are investigated for reducing leakage current in small pixel (down to 9 μm) heterostructure photodetectors designed for the short-wavelength infrared range. Process evaluation test chips were fabricated using the same process as for focal plane arrays. Arrays of small photodetectors were electrically characterized under dark conditions from 150 K to room temperature. In order to evaluate the leakage current, we studied the relation between the inverse of dynamic resistance at −20 mV and zero bias and perimeter over area P/A ratio as the pixel size is scaled down. At 150 K, leakage current arising from the perimeter dominates while bulk leakage dominates at room temperature. We find that in shortwave devices directly underfilling hybridized devices with a thermoset epoxy resin without first doing any additional passivation/protection after etching gives the lowest leakage with a surface resistance of 4.2 × 10⁹ and 8.9 × 10³ Ω· cm⁻¹ at 150 and 300 K, for −20 mV of bias voltage, respectively. [reprint (PDF)]
2.	The correlation between x-ray diffraction patterns and strain distribution inside GaInP/GaAs superlattices X.G. He, M. Erdtmann, R. Williams, S. Kim, and M. Razeghi Applied Physics Letters 65 (22)-- November 28, 1994 ...[Visit Journal] Strong correlation between x‐ray diffraction characteristics and strain distribution inside GaInP/GaAs superlattices has been reported. It is found that the symmetry of (002) diffraction patterns can be used to evaluate the interface strain status. A sample with no interfacial strains has a symmetric (002) diffraction pattern and weak (004) diffraction pattern. It is also demonstrated that strain distribution in superlattices can be readily estimated qualitatively by analyzing x-ray diffraction patterns. [reprint (PDF)]
2.	Use of Sacrificial Zinc Oxide Template Layers for Epitaxial Lift-Off of Yttria-Stabilised Zirconia Thin Films D. J. Rogers, T. Maroutian, V. E. Sandana, P. Lecoeur, F. H. Teherani, P. Bove and M. Razeghi Proc. of SPIE 11687, 116872C (2021) ...[Visit Journal] 275 nm-thick Yttria-stabilised zirconia (YSZ) layers were grown on 240 nm-thick epitaxial (0002)-oriented ZnO buffer layers on c-sapphire substrates by pulsed laser deposition (PLD). X-ray diffraction (XRD) studies revealed high quality epitaxial growth with the YSZ having a preferential (111) orientation and a root mean square surface roughness of 1.4 nm over an area of 10 um x 10 um. The YSZ top surface was then temporary bonded to an Apiezon W wax carrier and the sample was immersed in 0.1M HCl so as to preferentially etch/dissolve away the ZnO underlayer and release of the YSZ from the sapphire substrate. XRD revealed only the characteristic (111) peak of YSZ after lift-off and thus confirmed both the dissolution of the ZnO and the preservation of the crystallographic integrity of the YSZ on the wax carrier. Optical and Atomic Force Microscopy revealed some buckling, roughening and cracking of the lifted YSZ, however, which was probably due to tensile epitaxial strain release. [reprint (PDF)]
2.	Recent performance records for mid-IR quantum cascade lasers M. Razeghi; Y. Bai; S. Slivken; S. Kuboya; S.R. Darvish Terahertz and Mid Infrared Radiation: Basic Research and Practical Applications, 2009. TERA-MIR International Workshop [5379656], (2009) -- November 9, 2009 ...[Visit Journal] The wall plug efficiency of the mid-infrared quantum cascade laser in room temperature continuous wave operation is brought to 17%. Peak output power from a broad area (400 μm x 3 mm) device gives 120 W output power in pulsed mode operation at room temperature. Using a single-well-injector design, specifically made for low temperature operation, a record wall plug efficiency of 53% is demonstrated at 40 K. [reprint (PDF)]
2.	First Demonstration of ~ 10 microns FPAs in InAs/GaSb SLS M. Razeghi, P.Y. Delaunay, B.M. Nguyen, A. Hood, D. Hoffman, R. McClintock, Y. Wei, E. Michel, V. Nathan and M. Tidrow IEEE LEOS Newsletter 20 (5)-- October 1, 2006 ...[Visit Journal] The concept of Type-II InAs/GaSb superlattice was first brought by Nobel Laureate L. Esaki, et al. in the 1970s. There had been few studies on this material system until two decades later when reasonable quality material growth was made possible using molecular beam epitaxy. With the addition of cracker cells for the group V sources and optimizations of material growth conditions, the superlattice quality become significantly improved and the detectors made of these superlattice materials can meet the demand in some practical field applications. Especially in the LWIR regime, it provides a very promising alternative to HgCdTe for better material stability and uniformity, etc. We have developed the empirical tight binding model (ETBM) for precise determination of the superlattice bandgap. [reprint (PDF)]
2.	Surface leakage current reduction in long wavelength infrared type-II InAs/GaSb superlattice photodiodes S. Bogdanov, B.M. Nguyen, A.M. Hoang, and M. Razeghi Applied Physics Letters, Vol. 98, No. 18, p. 183501-1-- May 2, 2011 ...[Visit Journal] Dielectric passivation of long wavelength infrared Type-II InAs/GaSb superlattice photodetectors with different active region doping profiles has been studied. SiO₂ passivation was shown to be efficient as long as it was not put in direct contact with the highly doped superlattice. A hybrid graded doping profile combined with the shallow etch technique reduced the surface leakage current in SiO₂ passivated devices by up to two orders of magnitude compared to the usual design. As a result, at 77 K the SiO(2) passivated devices with 10.5 μm cutoff wavelength exhibit an R₀A of 120 Ω·cm², R_maxA of 6000 Ω·cm², and a dark current level of 3.5×10⁻⁵ A·cm⁻² at −50 mV bias. [reprint (PDF)]
2.	Impact of scaling base thickness on the performance of heterojunction phototransistors Arash Dehzangi, Abbas Haddadi, Sourav Adhikary, and Manijeh Razeghi Nanotechnology 28, 10LT01-- February 2, 2017 ...[Visit Journal] In this letter we report the effect of vertical scaling on the optical and electrical performance of mid-wavelength infrared heterojunction phototransistors based on type-II InAs/GaSb/AlSb superlattices. The performance of devices with different base thickness was compared as the base was scaled from 60 down to 40 nm. The overall optical performance shows enhancement in responsively, optical gain, and specific detectivity upon scaling the base width. The saturated responsivity for devices with 40 nm bases reaches 8,845 and 9,528 A/W at 77 and 150 K, respectively, which is almost five times greater than devices with 60 nm bases. The saturated optical gain for devices with 40 nm bases is measured as 2,760 at 77 K and 3,081 at 150 K. The devices with 40 nm bases also exhibit remarkable enhancement in saturated current gain, with 17,690 at 77 K, and 19,050 at 150 K. [reprint (PDF)]
2.	Phase-matched optical second-harmonic generation in GaN and AlN slab waveguides D.N. Hahn, G.T. Kiehne, G.K.L. Wong, J.B. Ketterson, P. Kung, A. Saxler and M. Razeghi Journal of Applied Physics 85 (5)-- March 1, 1999 ...[Visit Journal] Phase-matched optical second-harmonic (SH) generation was observed in GaN and AlN slab waveguides. Phase matching was achieved by waveguide modal dispersion. By tuning the output wavelength of an optical parametric amplifier, several phased-matched SH peaks were observed in the visible spectrum covering blue to red wavelengths. The peak positions are in agreement with the values calculated using the dispersive refractive indices of the film and substrate materials. [reprint (PDF)]
2.	Radiative recombination of confined electrons at the MgZnO/ ZnO heterojunction interface Sumin Choi, David J. Rogers, Eric V. Sandana, Philippe Bove, Ferechteh H. Teherani, Christian Nenstiel, Axel Hoffmann, Ryan McClintock, Manijeh Razeghi, David Look, Angus Gentle, Matthew R. Phillips & Cuong Ton-That Nature Scientific Reports 7, pp. 7457-- August 7, 2017 ...[Visit Journal] We investigate the optical signature of the interface in a single MgZnO/ZnO heterojunction, which exhibits two orders of magnitude lower resistivity and 10 times higher electron mobility compared with the MgZnO/Al₂O₃ film grown under the same conditions. These impressive transport properties are attributed to increased mobility of electrons at the MgZnO/ZnO heterojunction interface. Depthresolved cathodoluminescence and photoluminescence studies reveal a 3.2 eV H-band optical emission from the heterointerface, which exhibits excitonic properties and a localization energy of 19.6 meV. The emission is attributed to band-bending due to the polarization discontinuity at the interface, which leads to formation of a triangular quantum well and localized excitons by electrostatic coupling. [reprint (PDF)]
2.	High operating temperature 320 x 256 middle-wavelength infrared focal plane array imaging based on an InAs/InGaAs/InAlAs/InP quantum dot infrared photodetector S. Tsao, H. Lim, W. Zhang, and M. Razeghi Applied Physics Letters, Vol. 90, No. 20, p. 201109-- May 14, 2007 ...[Visit Journal] This letter reports a 320×256 middle-wavelength infrared focal plane array operating at temperatures up to 200 K based on an InAs quantum dot/InGaAs quantum well/InAlAs barrier detector grown on InP substrate by low pressure metal organic chemical vapor deposition. The device's low dark current density and the persistence of the photocurrent up to room temperature enabled the high temperature imaging. The focal plane array had a peak detection wavelength of 4 µm, a responsivity of 34 mA/W, a conversion efficiency of 1.1%, and a noise equivalent temperature difference of 344 mK at an operating temperature of 120 K. [reprint (PDF)]
2.	Evaluating the size-dependent quantum efficiency loss in a SiO₂-Y₂O₃hybrid gated type-II InAs/GaSb long-infrared photodetector array G. Chen , A. M. Hoang , and M. Razeghi Applied Physics Letters 104 , 103509 (2014)-- March 14, 2014 ...[Visit Journal] Growing Y₂O₃ on 20 nm SiO₂ to passivate a 11 μm 50% cut-off wavelength long-wavelength infrared type-II superlattice gated photodetector array reduces its saturated gate bias (VG_sat ) to −7 V. Size-dependent quantum efficiency (QE) losses are evaluated from 400 μm to 57 μm size gated photodiode. Evolution of QE of the 57 μm gated photodiode with gate bias and diode operation bias reveals different surface recombination mechanisms. At 77 K and VG,sat , the 57 μm gated photodiode exhibits QE enhancement from 53% to 63%, and it has 1.2 × 10⁻⁵ A/cm² dark current density at −200 mV, and a specific detectivity of 2.3 × 10¹² Jones. [reprint (PDF)]
2.	Scaling in back-illuminated GaN avalanche photodiodes K. Minder, J.L. Pau, R. McClintock, P. Kung, C. Bayram, M. Razeghi and D. Silversmith Applied Physics Letters, Vol. 91, No. 7, p. 073513-1-- August 13, 2007 ...[Visit Journal] Avalanche p-i-n photodiodes of various mesa areas were fabricated on AlN templates for back illumination for enhanced performance through hole-initiated multiplication, and the effects of increased area on device performance were studied. Avalanche multiplication was observed in mesa sizes up to 14,063 µm^2 under linear mode operation. Uniform gain and a linear increase of the dark current with area were demonstrated. [reprint (PDF)]
2.	4.5 mW Operation of AlGaN-based 267 nm Deep-Ultraviolet Light-Emitting Diodes A. Yasan, R. McClintock, K. Mayes, D. Shiell, L. Gautero, S.R. Darvish, P. Kung and M. Razeghi Applied Physics Letters, 83 (23)-- December 8, 2003 ...[Visit Journal] We demonstrate 4.5 mW output power from AlGaN-based single quantum well ultraviolet light-emitting diodes at a very short wavelength of 267 nm in pulsed operation mode. The output power in continuous-wave mode reaches a value of 165 µW at an injected current of 435 mA. The measurements were done on arrays of four devices flip chip bonded to AlN submounts for thermal management. [reprint (PDF)]

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